Author: claimsbot

1. A self-adjusting device for supporting in a level manner on an uneven surface a ladder having first and second generally parallel side rails joined by rungs, the device comprising:
a first locking member attached to the first and second side rails;
a second locking member movably associated with the first locking member;
a first leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface; and
a second leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface;
wherein the second locking member is moved relative to the first locking member as the first leg is moved into contact with the surface; and
wherein the second locking member is moved into locked engagement with the first locking member as the second leg is moved into contact with the surface and the first and second legs impart a force to the second locking member.
2. The self-adjusting device of claim 1, wherein the first locking member comprises a crossbeam extending generally horizontally between the first and second rails of the ladder.
3. The self-adjusting device of claim 1, wherein the first locking member includes an open-faced channel having a plurality of spaced apart projections disposed therein.
4. The self-adjusting device of claim 2, wherein the second locking member is configured to freely slide horizontally along a length of the first locking member when the first and second legs are not exerting a force thereon, and move vertically into releasable engagement with the first locking member when the first and second legs exert an upward force thereon.
5. The self-adjusting device of claim 3, wherein the second locking member includes at least one projection configured to be inserted between the spaced apart projections of the first locking member so as to lock the first and second locking members into engagement with one another and prevent the second locking member from moving along a length of the first locking member.
6. The self-adjusting device of claim 4, including first and second stops to limit the horizontal movement of the second locking member.
7. The self-adjusting device of claim 1, including a first guide associated with the first rail for guiding the movement of the first leg, and a second guide associated with the second rail for guiding the movement of the second leg.
8. The self-adjusting device of claim 7, wherein the first and second guides each include a roller in spaced relation to the first or second rail.
9. The self-adjusting device of claim 8, wherein the first and second legs are disposed between the first or second rail and the roller.
10. The self-adjusting device of claim 1, including a surface-engaging foot pivotally connected to a second end of the first leg and the second leg.
11. A self-adjusting device for supporting in a level manner on an uneven surface a ladder having first and second generally parallel side rails joined by rungs, the device comprising:
a first locking member comprising a generally horizontally oriented cross bar extending between the first and second side rails;
a second locking member movably associated with the first locking member;
a first leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface;
a second leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface;
a first guide associated with the first rail and the first leg for guiding the movement of the first leg; and
a second guide associated with the second rail and the second leg for guiding the movement of the second leg;
wherein the second locking member is configured to freely slide horizontally along a length of the first locking member when both the first and second legs are not exerting a force thereon, and move vertically into engagement with the first locking member when both the first and second legs exert an upward force thereon.
12. The self-adjusting device of claim 11, wherein the first locking member includes an open-faced channel having a plurality of spaced apart projections disposed therein.
13. The self-adjusting device of claim 12, wherein the second locking member includes at least one projection configured to be inserted between the spaced apart projections of the first locking member so as to lock the first and second locking members into engagement with one another and prevent the second locking member from moving horizontally along a length of the first locking member.
14. The self-adjusting device of claim 11, including first and second stops to limit the horizontal movement of the second locking member.
15. The self-adjusting device of claim 11, wherein the first guide includes a first roller in spaced relation to the first rail, the first leg being disposed between the first rail and the first roller, and the second guide includes a second roller in space relation to the second rail, the second leg being disposed between the second rail and the second roller.
16. The self-adjusting device of claim 11, including a surface-engaging foot pivotally connected to a second end of the first leg and the second leg.
17. A self-adjusting device for supporting in a level manner on an uneven surface a ladder having first and second generally parallel side rails joined by rungs, the device comprising:
a first locking member comprising a generally horizontally oriented cross bar extending between the first and second side rails and defining an open-faced channel having a plurality of spaced apart projections therein;
a second locking member movably associated with the first locking member;
a first leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface;
a surface-engaging foot pivotally connected to a second end of the first leg;
a second leg having a first end pivotally attached to the second locking member and extending downwardly towards the surface;
a surface-engaging foot pivotally connected to a second end of the second leg;
a first guide associated with the first rail and the first leg for guiding the movement of the first leg; and
a second guide associated with the second rail and the second leg for guiding the movement of the second leg;
wherein the second locking member is configured to freely slide horizontally along a length of the first locking member when both the first and second legs are not exerting a force thereon, and move vertically into engagement with the first locking member such that at least one projection of the second locking member is inserted between the first locking member projections to prevent horizontal movement of the second locking member when both the first and second legs exert an upward force thereon.
18. The self-adjusting device of claim 17, including first and second stops to limit the horizontal movement of the second locking member.
19. The self-adjusting device of claim 17, wherein the first guide includes a first roller in spaced relation to the first rail, the first leg being disposed between the first rail and the first roller, and the second guide includes a second roller in space relation to the second rail, the second leg being disposed between the second rail and the second roller.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1-224. (canceled)
225. A system, comprising:
means for detecting a concentration of at least one of a first pharmaceutically-acceptable taggant administered to a subject at least substantially concurrent with a therapeutic agent or a metabolic byproduct of the first pharmaceutically-acceptable taggant, the first pharmaceutically-acceptable taggant having a pharmacokinetic profile;
means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant, the second pharmaceutically-acceptable taggant having a pharmacokinetic profile different from the pharmacokinetic profile of the first pharmaceutically-acceptable taggant;
means for referencing the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the pharmacokinetic profile of the first pharmaceutically-acceptable taggant;
means for referencing the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant to the pharmacokinetic profile of the second pharmaceutically-acceptable taggant; and
means for approximating a time period lapsed between administering the therapeutic agent to the subject and detecting the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
226. The system of claim 225, wherein the second pharmaceutically-acceptable taggant is administered to the subject concurrent with the first pharmaceutically-acceptable taggant.
227. The system of claim 225, wherein the second pharmaceutically-acceptable taggant is administered to the subject subsequent to the first pharmaceutically-acceptable taggant.
228. The system of claim 225, further comprising:
means for detecting a second concentration of at least one of the first pharmaceutically-acceptable taggant or a metabolic byproduct of the first pharmaceutically-acceptable taggant.
229. The system of claim 225, further comprising:
means for detecting a second concentration of at least one of the first pharmaceutically-acceptable taggant or a metabolic byproduct of the first pharmaceutically-acceptable taggant relative to the first concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant.
230. The system of claim 225, wherein at least one of the first pharmaceutically-acceptable taggant or the second pharmaceutically-acceptable taggant is at least substantially co-administered to the subject with the therapeutic agent.
231. The system of claim 225, wherein the therapeutic agent comprises:
a therapeutic agent for at least one of modulating, curing, diagnosing, mitigating, preventing, or treating at least one of a disease or a condition.
232. The system of claim 225, wherein the therapeutic agent comprises:
a therapeutic agent for enhancing at least one of a physical well-being or a mental well-being.
233. The system of claim 225, further comprising:
means for administering the therapeutic agent via at least one of a duodenal route of administration, enterally, epicutaneously, epidurally, gastrically, an inhalational route of administration, intraarterially, an intracardiac route of administration, intradermally, intramuscularly, intranasally, intraocularly, intraosseous infusion, intraperitoneally, intrathecally, an intrauterine route of administration, intravaginally, intravenously, intravesically, intravitreally, nasally, nasogastric intubation, orally, rectally, subcutaneously, sublingually, transdermally, or transmucosally.
234. The system of claim 233, wherein the means for administering the therapeutic agent via at least one of a duodenal route of administration, enterally, epicutaneously, epidurally, gastrically, an inhalational route of administration, intraarterially, an intracardiac route of administration, intradermally, intramuscularly, intranasally, intraocularly, intraosseous infusion, intraperitonealty, intrathecally, an intrauterine route of administration, intravaginally, intravenously, intravesically, intravitreally, nasally, nasogastric intubation, orally, rectally, subcutaneously, sublingually, transdermally, or transmucosally comprises:
means for administering the therapeutic agent via an injection.
235. The system of claim 225, wherein at least one of the first pharmaceutically-acceptable taggant or the second pharmaceutically-acceptable taggant comprises:
at least one of a dye, a fluorophore, an MRI contrast agent, an ultrasound contrast agent, or an x-ray contrast agent.
236. The system of claim 225, wherein the first pharmaceutically-acceptable taggant possesses a half-life different from a half-life for the second pharmaceutically-acceptable taggant.
237. The system of claim 225, wherein at least one of the first pharmaceutically-acceptable taggant or the second pharmaceutically-acceptable taggant possesses a half-life less than or equal to a half-life for the therapeutic agent.
238. The system of claim 225, wherein at least one of the first pharmaceutically-acceptable taggant or the second pharmaceutically-acceptable taggant possesses a half-life greater than or equal to a half-life for the therapeutic agent.
239. The system of claim 225, wherein the first pharmaceutically-acceptable taggant possesses a metabolic absorption rate different from a metabolic absorption rate for the second pharmaceutically-acceptable taggant.
240. The system of claim 225, wherein the means for detecting a concentration of at least one of a first pharmaceutically-acceptable taggant administered to a subject at least substantially concurrent with a therapeutic agent or a metabolic byproduct of the first pharmaceutically-acceptable taggant comprises:
means for performing a noninvasive ex vivo assay.
241. The system of claim 240, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying an expired breath of the subject with a gas-analytic device.
242. The system of claim 240, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying a fluid exuded by the skin of the subject.
243. The system of claim 240, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying at least one of feces, hair, or urine of the subject.
244. The system of claim 225, wherein the means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for performing a noninvasive ex vivo assay.
245. The system of claim 244, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying an expired breath of the subject with a gas-analytic device.
246. The system of claim 244, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying a fluid exuded by the skin of the subject.
247. The system of claim 244, wherein the means for performing a noninvasive ex vivo assay comprises:
means for assaying at least one of feces, hair, or urine of the subject.
248. The system of claim 225, wherein the means for detecting a concentration of at least one of a first pharmaceutically-acceptable taggant administered to a subject at least substantially concurrent with a therapeutic agent or a metabolic byproduct of the first pharmaceutically-acceptable taggant comprises:
means for performing a noninvasive in vivo assay.
249. The system of claim 248, wherein the means for performing a noninvasive in vivo assay comprises:
means for performing at least one of a transdermal measurement or a retinal measurement on the subject.
250. The system of claim 248, wherein the means for performing a noninvasive in vivo assay comprises:
means for detecting the first pharmaceutically-acceptable taggant by at least one of an x-ray fluorescence, an optical fluorescence, an MRI signature, an ultrasound signature, or an x-ray signature.
251. The system of claim 225, wherein the means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for performing a noninvasive in vivo assay.
252. The system of claim 251, wherein the means for performing a noninvasive in vivo assay comprises:
means for performing at least one of a transdermal measurement or a retinal measurement on the subject.
253. The system of claim 251, wherein the means for performing a noninvasive in vivo assay comprises:
means for detecting the second pharmaceutically-acceptable taggant by at least one of an x-ray fluorescence, an optical fluorescence, an MRI signature, an ultrasound signature, or an x-ray signature.
254. The system of claim 225, wherein the means for detecting a concentration of at least one of a first pharmaceutically-acceptable taggant administered to a subject at least substantially concurrent with a therapeutic agent or a metabolic byproduct of the first pharmaceutically-acceptable taggant further comprises:
means for associating a sensor with the subject, the sensor configured to detect the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant.
255. The system of claim 225, wherein the means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant further comprises:
means for associating a sensor with the subject, the sensor configured to detect the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
256. The system of claim 225, wherein the means for detecting a concentration of at least one of a first pharmaceutically-acceptable taggant administered to a subject at least substantially concurrent with a therapeutic agent or a metabolic byproduct of the first pharmaceutically-acceptable taggant comprises:
means for intermittently detecting the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant.
257. The system of claim 225, wherein the means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for intermittently detecting the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
258. The system of claim 225, wherein the means for detecting a concentration of at least one of a second pharmaceutically-acceptable taggant administered to the subject with the first pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant further comprises:
means for detecting a second concentration of at least one of the second pharmaceutically-acceptable taggant or a metabolic byproduct of the second pharmaceutically-acceptable taggant.
259. The system of claim 225, wherein the means for approximating a time period lapsed between administering the therapeutic agent to the subject and detecting the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for adding a time interval to a second time period lapsed between administering the first pharmaceutically-acceptable taggant to the subject and detecting the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant, the time interval starting when the therapeutic agent is administered to the subject and ending when the first pharmaceutically-acceptable taggant is administered to the subject.
260. The system of claim 225, further comprising:
means for determining adherence of the subject to a therapy model.
261. The system of claim 260, further comprising:
means for providing a signal regarding at least one of the compliance or non-compliance of the subject to the therapy model.
262. The system of claim 261, wherein the means for providing a signal regarding at least one of the compliance or non-compliance of the subject to the therapy model comprises:
means for providing the signal regarding the at least one of the compliance or non-compliance of the subject to the therapy model to at least one of the subject, a guardian, a legal representative, or a health care provider.
263. The system of claim 260, further comprising:
means for indicating when it is appropriate for additional therapeutic agent to be administered pursuant to the therapy model.
264. The system of claim 225, further comprising:
means for providing a signal when a predetermined amount of time has lapsed since the time at which the therapeutic agent was administered to the subject.
265. The system of claim 225, further comprising:
means for comparing the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
266. The system of claim 265, wherein the means for comparing the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for performing digital signal processing to compare the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
267. The system of claim 265, wherein the means for comparing the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant comprises:
means for performing a Fourier analysis to compare the concentration of the at least one of the first pharmaceutically-acceptable taggant or the metabolic byproduct of the first pharmaceutically-acceptable taggant to the concentration of the at least one of the second pharmaceutically-acceptable taggant or the metabolic byproduct of the second pharmaceutically-acceptable taggant.
268-317. (canceled)

1. An automatic microscope for examining a specimen, the automatic microscope defining an optical axis and comprising:
an optical system including an illuminating field for illuminating the specimen;
said optical system further including a condenser mounted along said optical axis downstream of said illuminating field;
said condenser defining an aperture diaphragm plane;
said illuminating field being disposed at least approximately in said diaphragm plane;
said optical system further including an imaging optic mounted downstream of said condenser and defining an image plane;
an image-providing sensor mounted in said image plane;
an evaluation and control computer;
a light-source control unit for controlling at least one of the brightness and color temperature of said illuminating field;
said light-source control unit being connected to said evaluation and control computer;
said illuminating field comprising a plurality of individual semiconductor components emitting at respectively different wavelengths;
said light-source control unit functioning to drive said semiconductors individually or in groups of the same type thereby adjusting at least one of the brightness and color temperature of said illuminating field; and,
a microlens array for adapting said illumination field to the specimen to be illuminated.
2. The automatic microscope of claim 1, said imaging optic having a field size and a magnification; and, said field size and said magnification being matched to said image-providing sensor to cause each image point to be resolved to be imaged via said imaging optic onto 2\xd72 sensor pixels of said image-providing sensor.
3. The automatic microscope of claim 1, further comprising a monitor for image display and an evaluating electronic unit; and, said image-providing sensor being connected via said evaluating electronic unit to said monitor for said image display.
4. The automatic microscope of claim 1, wherein said optical system defines an object plane and said specimen has a structure to be resolved and said image-providing sensor has an object-side aperture and said object-side aperture is determined by said structure of said specimen.
5. The automatic microscope of claim 1, wherein said microlens array is disposed in the region of said aperture diaphragm plane.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of selectively and epitaxially forming a silicon-containing material on a substrate surface comprising:
a) placing a substrate comprising a monocrystalline surface and at least a dielectric surface into a process chamber, the process chamber including a first zone and a second zone;
b) exposing the substrate to a silicon-containing deposition gas and maintaining the pressure in the process chamber below about 50 Torr to form an epitaxial layer on the monocrystalline surface and a second material on the dielectric surface; and
c) subsequently stopping the flow of deposition gas to the process chamber, increasing the pressure in the process chamber and exposing the substrate to an etchant gas to maintain a relatively high etchant gas partial pressure and to etch the second material;
d) subsequently stopping the flow of etchant gas to the process chamber and flowing a purge gas into the process chamber; and
e) sequentially repeating steps b), c) and d) at least once.
2. The method of claim 1, further comprising controlling the gas flow to the first zone to the second zone to provide a ratio of first zone gas flow to second zone gas flow and changing the ratio of first zone gas flow to second zone gas flow so that the ratio is different during step b) and step c).
3. The method of claim 2, wherein the first zone includes an inner radial zone and the second zone includes an outer radial zone and the gas is flowed in a manner to provide a ratio of inner zone gas flow to outer zone gas flow (IO) into the process chamber, and maintaining the IO below about one during exposure of the substrate to the deposition gas and maintaining IO above about one during exposure of the substrate to the etchant gas.
4. The method of claim 3, wherein substantially no etchant gas is flowed into the process chamber while the deposition gas is flowing into the process chamber.
5. The method of claim 3, wherein the IO is between about 0.2 and 1.0 during exposure of the substrate to the deposition gas and the IO is greater than about 1.0 and less than about 6.0 during exposure of the substrate to the etchant gas.
6. The method of claim 1, wherein the increase in pressure in the process chamber during exposure to the etchant gas increases the substrate temperature and during exposure to the purge gas, the chamber pressure is decreased thereby decreasing the substrate temperature.
7. The method of claim 6, wherein the pressure in the process chamber during exposure to the etchant gas is at between about two to about ten times the pressure in the process chamber during exposure of the substrate to the deposition gas.
8. The method of claim 6, wherein the temperature in the process is maintained below about 800\xb0 C. during the entire process.
9. The method of claim 7, wherein the temperature in the process is maintained below about 750\xb0 C. during the entire process.
10. A method of selectively and epitaxially forming a silicon-containing material on a substrate surface comprising:
placing a substrate comprising a monocrystalline surface and at least a dielectric surface into a process chamber, the process chamber including a first gas flow zone and second gas flow zone;
flowing a silicon-containing deposition gas into the process chamber at a first pressure and into the first zone and second zone to provide deposition gas flow ratio of the first zone to the second zone of less than one; and
subsequently stopping the flow of deposition gas to the process chamber, increasing the pressure in the process chamber to a second pressure and flowing an etchant gas into the inner radial zone and outer radial zone of process chamber at an etchant gas flow ratio of the first zone gas flow to second zone gas flow of greater than one;
subsequently stopping the flow of etchant gas to the process chamber and flowing a purge gas into the process chamber; and
repeating at least once the sequential steps of flowing the deposition gas, flowing the etchant gas and flowing the purge gas until a silicon-containing material with a desired thickness is formed.
11. The method of claim 10, wherein the increase in pressure in the process chamber during exposure to the etchant gas increases the substrate temperature, and during exposure to the purge gas, the chamber pressure is decreased thereby decreasing the substrate temperature.
12. The method of claim 11, wherein the second pressure is between about 2 and 10 times the first pressure.
13. The method of claim 12, wherein the ratio of the gas flow of the first zone to the second zone during flow of the deposition gas is between about 0.2 and 1.0.
14. The method of claim 12, wherein the ratio of gas flow of the first zone to the second zone during the flow of etchant gas is greater than about 1.0 and less than about 6.0.
15. A method of selectively and epitaxially forming a silicon-containing material on a substrate surface comprising:
placing a substrate comprising a monocrystalline surface and at least a dielectric surface into a process chamber, the process chamber including a first gas flow zone and second gas flow zone;
performing a deposition step comprising flowing a silicon-containing gas into the process chamber during which no etchant gas is flowed into the process chamber;
performing an etching step comprising flowing an etchant gas into the process chamber during which no silicon-containing gas is flowed into the process chamber; and
performing a purging step during which a purging gas is flowed, wherein a single process cycle comprises a deposition step, an etching step and a purging step and the process cycle is repeated at least once, and gas is flowed to the first zone and second zone to provide a pressure in the process chamber and a gas flow ratio between the first zone and second zone during each of the deposition step, etching step and purging step and at least one of the pressure in the process chamber or the gas flow ratio is different during the deposition step and the etching step.
16. The method of claim 15, wherein the pressure in the process chamber is lower during the deposition than during etching, resulting in a lower substrate temperature during deposition than during etching.
17. The method of claim 16, wherein the ratio of gas flow of the first zone to the second zone is less during the deposition step than during the etching step.
18. The method of claim 17, wherein the first zone comprises an inner radial zone of the process chamber and the second zone comprises an outer radial zone of the chamber.
19. The method of claim 17, wherein the pressure during etching is at least twice the pressure during deposition.
20. The method of claim 19, wherein the process is performed at a temperature of less than about 800\xb0 C.