1. A rip fence for a table saw comprising:
a frame having a front portion and a rear portion;
a front clamping lever pivotably supported in the front portion of the frame for movement between a clamped and an unclamped position, the front clamping lever being configured to be moved into and out of engagement with a front guide of the table saw when moved between the clamped and the unclamped positions;
a handle pivotably supported in the front portion of the frame for movement between a locked and an unlocked position, the handle including a lever portion that engages the front clamping lever and moves the front clamping lever from the unclamped to the clamped position when the handle is moved from the unlocked position toward the locked position;
a rear clamping lever attached to the rear portion of the frame and movable between a clamped and unclamped position, the rear clamping lever being configured to be moved into and out of engagement with a rear guide of the table saw when moved between the clamped and unclamped positions;
a linkage that operatively couples the handle and the rear clamping lever;
a member configured to support the front portion of the frame, the member including a clamping portion extending downward from the frame adjacent to an outer surface of the front guide; and
a bearing and alignment assembly attached to the clamping portion of the member, the bearing and alignment assembly including a plurality of roller bearings that are configured to slide within a slot defined in the front guide of the table saw, the plurality of roller bearings being configured to engage opposing surfaces of the slot to maintain the frame at a predetermined orientation with respect to the front guide and the rear guide when the handle is in the unlocked position,
wherein the plurality of roller bearings includes:
at least one stationary roller bearing that is fixedly attached to the member for engaging a first inner surface of the slot; and
at least one spring-loaded roller bearing that is spring-loaded against a second inner surface of the slot opposite the first inner surface; and
wherein, when the front clamping lever is moved to the clamped position by the lever portion of the handle, continued movement of the handle to the locked position results in the handle pulling the linkage and the rear clamping lever toward the front portion of the frame and causes the rear clamping lever to move from the unclamped to the clamped position.
2. The rip fence of claim 1, wherein the handle is movable to an intermediate position between the locked position and the unlocked position, the lever portion of the handle configured to:
move the front clamping lever from the unclamped position to the clamped position and into engagement with the front guide as the handle is moved from the unlocked position toward the intermediate position, and
move the rear clamping lever from the unclamped position to the clamped position and into engagement with the rear guide as the handle is moved from the intermediate position toward the locked position such that the rear clamping lever is moved and engaged with the rear guide after the front clamping lever is moved and engaged with the front guide as the handle is moved from the unlocked position toward the locked position.
3. The rip fence of claim 2, wherein the at least one spring-loaded roller bearing is configured to generate a spring force,
wherein the lever portion of the handle includes a cam portion, the cam portion being configured to apply a first clamping force to the front clamping lever as the handle is moved from the unlocked position to the intermediate position and to apply a second clamping force to the front clamping lever as the handle is moved from the intermediate position to the locked position,
wherein the first clamping force is less than the spring force, and
wherein the second clamping force is greater than the spring force.
4. The rip fence of claim 3, wherein the front portion of the frame is slidable in relation to the rear portion of the frame,
wherein the rear clamping lever is fixedly attached to the rear portion of the frame, and wherein the linkage comprises the rear portion of the frame.
5. The rip fence of claim 4, wherein the front portion of the frame includes an insertion member that is slidably received in a channel defined in the end rear portion of the frame.
6. The rip fence of claim 3, wherein the linkage comprises a rod that is coupled at one end to the handle and at another end to the rear clamping lever,
wherein the rear clamping lever is pivotably attached to the rear end portion of the frame for pivotal movement between the clamped and unclamped positions, and
wherein, when the front clamping lever is moved to clamped position by the lever portion of the handle, continued movement of the handle to locked position results in the handle pulling the rod and the rod in turn pivoting the rear clamping lever from the unclamped to the clamped position.
7. A table saw comprising:
a table including an upper surface and defining a blade opening;
a cutting assembly supported below the table and including a saw blade that extends upwardly through the blade opening;
a front guide rail attached to a front edge portion of the table;
a rear guide rail attached to a rear edge portion of the table; and
a rip fence slidably supported by the front guide rail and the rear guide rail, the rip fence including:
a frame having a front portion and a rear portion;
a front clamping lever pivotably supported in the front portion of the frame for movement between a clamped and an unclamped position, the front clamping lever being configured to be moved into and out of engagement with the front guide rail when moved between the clamped and the unclamped positions;
a handle pivotably supported in the front portion of the frame for movement between a locked and an unlocked position, the handle including a lever portion that engages the front clamping lever and moves the front clamping lever from the unclamped to the clamped position when the handle is moved from the unlocked position toward the locked position;
a rear clamping lever attached to the rear portion of the frame and movable between a clamped and unclamped position, the rear clamping lever being configured to be moved into and out of engagement with the rear guide rail when moved between the clamped and unclamped positions;
a linkage that operatively couples the handle and the rear clamping lever;
a member configured to support the front portion of the frame, the member including a clamping portion extending downward from the frame adjacent to an outer surface of the front guide rail; and
a bearing and alignment assembly attached to the clamping portion of the member, the bearing and alignment assembly including a plurality of roller bearings that are configured to slide within a slot defined in the front guide rail, the plurality of roller bearings being configured to engage opposing surfaces of the slot to maintain the frame at a predetermined orientation with respect to the front guide rail and the rear guide rail when the handle is in the unlocked position, wherein the plurality of roller bearings includes:
at least one stationary roller bearing that is fixedly attached to the member for engaging a first inner surface of the slot; and
at least one spring-loaded roller bearing that is spring-loaded against a second inner surface of the slot opposite the first inner surface,
wherein, when the front clamping lever is moved to the clamped position by the lever portion of the handle, continued movement of the handle to the locked position results in the handle pulling the linkage and the rear clamping lever toward the front portion of the frame and causes the rear clamping lever to move from the unclamped to the clamped position.
8. The table saw of claim 7, wherein the handle is movable to an intermediate position between the locked position and the unlocked position, the lever portion of the handle configured to:
move the front clamping lever from the unclamped position to the clamped position and into engagement with the front guide rail as the handle is moved from the unlocked position toward the intermediate position, and
move the rear clamping lever from the unclamped position to the clamped position and into engagement with the rear guide rail as the handle is moved from the intermediate position toward the locked position such that the rear clamping lever is moved and engaged with the rear guide rail after the front clamping lever is moved and engaged with the front guide rail as the handle is moved from the unlocked position toward the locked position.
9. The table saw of claim 8, wherein the at least one spring-loaded roller bearing is configured to generate a spring force,
wherein the lever portion of the handle includes a cam portion, the cam portion being configured to apply a first clamping force to the front clamping lever as the handle is moved from the unlocked position to the intermediate position and to apply a second clamping force to the front clamping lever as the handle is moved from the intermediate position to the locked position,
wherein the first clamping force is less than the spring force, and
wherein the second clamping force is greater than the spring force.
10. The table saw of claim 9, wherein the front portion of the frame is slidable in relation to the rear portion of the frame,
wherein the rear clamping lever is fixedly attached to the rear portion of the frame, and
wherein the linkage comprises the rear portion of the frame.
11. The table saw of claim 10, wherein the linkage comprises a rod that is coupled at one end to the handle and at another end to the rear clamping lever,
wherein the rear clamping lever is pivotably attached to the rear end portion of the frame for pivotal movement between the clamped and unclamped positions, and
wherein, when the front clamping lever is moved to clamped position by the lever portion of the handle, continued movement of the handle to locked position results in the handle pulling the rod and the rod in turn pivoting the rear clamping lever from the unclamped to the clamped position.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of forming a gate stack in an integrated circuit comprising:
depositing a dielectric layer over a substrate comprising a first region and a second region by an atomic layer deposition process;
depositing a barrier layer directly over the dielectric layer by an atomic layer deposition process such that it overlies both the first and second regions; and
forming a first gate electrode layer over the first region of the substrate and a second gate electrode layer over the second region, wherein the first and second gate electrode layers comprise materials selected from the group consisting of polysilicon, Ti, Ni, Co, TiN, TiAlxNy, TaN, TaAlxNy, Ru, RuO2, Ir, IrO2, HfN, WNxCy, HfAlxNy and HfSixNy; and
forming a first and second gate electrode comprising the first and second gate electrode layers respectively, wherein the barrier layer influences the work function of at least one of the first and second gate electrodes.
2. The method of claim 1, wherein the first region is a PMOS region and the second region is an NMOS region.
3. The method of claim 1, wherein the first and second gate electrode layers are adjacent to each other.
4. The method of claim 1, wherein the first gate electrode layer comprises a first gate electrode material and the second gate electrode layer comprises a second gate electrode material.
5. The method of claim 4, wherein the first and second gate electrode materials are conductive.
6. The method of claim 4, wherein the first and second gate electrode materials are different.
7. The method of claim 5 wherein either the first or second gate electrode material is a metal nitride.
8. The method of claim 1, wherein the barrier layer comprises a conductive material.
9. The method of claim 1, wherein the barrier layer is deposited to a thickness of less than about 100 \u212b.
10. The method of claim 9, wherein the barrier layer is deposited to a thickness of less than about 30 \u212b.
11. The method of claim 1, additionally comprising treating the dielectric layer to remove OH groups on the surface prior to deposition of the barrier layer.
12. The method of claim 11, wherein the dielectric layer is treated with ammonia gas.
13. The method of claim 11, wherein the dielectric layer is treated with radicals.
14. The method of claim 13, wherein the dielectric layer is treated with nitrogen-hydrogen plasma.
15. The method of claim 1, wherein forming a first gate electrode layer over the first region comprises depositing a layer of first gate electrode material over the first and second regions of the substrate.
16. The method of claim 15, wherein forming a first gate electrode layer over the first region additionally comprises removing first gate electrode material from over the second region of the substrate without removing the underlying barrier layer.
17. The method of claim 16, wherein the first gate electrode material is removed from over the second region of the substrate by chemical mechanical polishing.
18. The method of claim 16, wherein forming the second gate electrode layer comprises depositing a layer of second gate electrode material over the first and second regions of the substrate.
19. The method of claim 16, wherein the first gate electrode material is removed from over the second region of the substrate by differential etching.
20. The method of claim 19, wherein forming the second gate electrode layer over the second region comprises depositing a layer of second gate electrode material over the first and second regions of the substrate and removing second gate electrode material from over the first region without removing the underlying barrier layer.
21. The method of claim 1, additionally comprising depositing a layer of conductive material over the first and second gate electrode layers.
22. The method of claim 1, wherein forming a first gate electrode over the first region of the substrate comprises etching the barrier layer over the second region to a thickness of no more than about 100 angstroms.
23. The method of claim 22, wherein forming a second gate electrode over the second region of the substrate comprising depositing a layer of conductive material over the second region.
24. The method of claim 1, wherein the barrier layer comprises a ternary complex.
25. The method of claim 1, wherein the barrier layer determines the work function of at least one of the first and second gate electrodes.
26. A method of forming a first and second electrode in an integrated circuit comprising:
depositing a dielectric layer over a substrate comprising a first region and a second region;
depositing a barrier layer directly over the dielectric layer by atomic layer deposition such that it overlies the first and second regions;
depositing a first gate electrode material over the first and second regions of the substrate;
removing first gate electrode material from over the first region without removing the barrier layer;
depositing a second gate electrode material over the substrate, wherein the first and second gate electrode materials are selected from the group consisting of Ti, Ni, Co, TiN, TiAlxNy, TaN, TaAlxNy, Ru, RuO2, Ir, IrO2, HfN, WNxCy, HfAlxNy and HfSixNy, and
defining a first and second electrode in the first and second region, wherein the barrier layer influences the work function of one or both of the first and second electrodes.
27. The method of claim 26, wherein the barrier layer comprises a ternary complex.
28. The method of claim 26, wherein the barrier layer determines the work function of one or both of the first and second electrodes.