Author: claimsbot

1. A measuring method for analyzing the propagation of components of electromagnetic navigation signals,
wherein at least one representative transmitting unit is assigned to each navigation signal component, resulting in a plurality of transmitting units,
wherein an analysis unit is coupled to a receiving unit and carries out an amplitude detection at a first frequency, characterized in that the multiple representative transmitting units are operated offset in time without time overlap,
wherein every representative transmitting unit of the plurality of transmitting units is assigned a characteristic transmission-free leader pause duration andor transmission-free trailer pause duration for each of its assigned navigation signal components, which is respectively maintained between operating phases of the representative transmitting units,
wherein the analysis unit carries out a time-dependent amplitude detection,
wherein a time curve of received amplitude values is analyzed by the analysis unit to assign the representative transmitting unit and the assigned navigation signal components to timeslots of the received amplitude values, in that the pause durations in the time curve of the amplitude values are assigned to the leader pause durations andor trailer pause durations of the representative transmitting unit.
2. The measuring method according to claim 1 , wherein the propagation of the electromagnetic navigation signal components is analyzed with the aid of the representative transmitting units in scaled measuring environments, wherein the scaled measuring environments are shrunken in relation to the original environments to be analyzed, and
wherein the representative transmitting units assigned to the navigation signal components are operated using scaled, higher frequencies.
3. The method according to claim 1, wherein, for the amplitude detection, received signals around the first frequency are first converted to a lower intermediate frequency before the amplitude analysis is performed.
4. The method according to claim 1, wherein the representative transmitting units are operated using an identical first frequency.
5. The method according to claim 1, wherein the representative transmitting units are operated at various frequencies, which lie within the bandwidth of the amplitude detection.
6. The method according to claim 1 , wherein a plurality of representative transmitting units along a variable emission front is assigned to at least one navigation signal component, to simulate a position change or movement of the navigation signal components.
7. The method according to claim 1, wherein at least two of the representative transmitting units are oriented for emission in different spatial directions.
8. The method according to claim 1, wherein at least two sequential pause durations andor signal receiving durations in the amplitude values are analyzed by the analysis unit to assign the representative transmitting units to timeslots of the received amplitude values.
9. The method according to claim 1, wherein the representative transmitting units emit signals in the gigahertz range.
10. The method according to claim 1, wherein the amplitude detection occurs in the zero span mode of the analysis unit.
11. The method according to claim 1, wherein either active transmitting durations of the representative transmitting units or pause durations of the representative transmitting units are equal.
12. The method according to claim 1, wherein the chronological activation of the representative transmitting units is performed using HF switches andor delay lines.
13. The method according to claim 1, wherein the analysis unit is additionally implemented to analyze the frequency of received signals, in particular to detect Doppler shifts on the signal path.
14. A measuring method for analyzing the propagation of components of electromagnetic navigation signals,
wherein at least one representative transmitting unit is assigned to each navigation signal component, resulting in a plurality of transmitting units,
wherein an analysis unit is coupled to a receiving unit and carries out an amplitude detection at a first frequency, characterized in that the multiple representative transmitting units are operated offset in time without time overlap,
wherein each representative transmitting unit of the plurality of transmitting units is assigned a characteristic transmitting duration for each of its assigned navigation signal components, which is respectively maintained in operating phases of the representative transmitting units,
wherein the analysis unit carries out a time-dependent amplitude detection,
wherein a time curve of received amplitude values is analyzed by the analysis unit to assign the representative transmitting unit and the assigned navigation signal components to timeslots of the received amplitude values, in that the durations of the received signals in the time curve of amplitude values are assigned to the transmitting durations of the representative transmitting unit.
15. The measuring method according to claim 14, wherein the propagation of the electromagnetic navigation signal components is analyzed with the aid of the representative transmitting units in scaled measuring environments, wherein the scaled measuring environments are shrunken in relation to the original environments to be analyzed, and
wherein the representative transmitting units assigned to the navigation signal components are operated using scaled, higher frequencies.
16. The method according to claim 15, wherein at least one representative transmitting unit is fed using various chronological feed schemes, wherein the coupling of the feed is performed in a different manner for each of the feed schemes.
17. The method according to claim 14, wherein, for the amplitude detection, received signals around the first frequency are first converted to a lower intermediate frequency before the amplitude analysis is performed.
18. The method according to claim 14, wherein the representative transmitting units are operated using an identical first frequency.
19. The method according to claim 14, wherein the representative transmitting units are operated at various frequencies, which lie within the bandwidth of the amplitude detection.
20. The method according to claim 14, wherein at least one representative transmitting unit is fed using various chronological feed schemes, wherein the coupling of the feed is performed in a different manner for each of the feed schemes.
21. The method according to claim 14, wherein a plurality of representative transmitting units along a variable emission front is assigned to at least one navigation signal, to simulate a position change or movement of the navigation signal components.
22. The method according to claim 14, wherein at least two of the representative transmitting units are oriented for emission in different spatial directions.
23. The method according to claim 14, wherein at least two sequential pause durations andor signal receiving durations in the amplitude values are analyzed by the analysis unit to assign the representative transmitting units to timeslots of the received amplitude values.
24. The method according to claim 14, wherein the representative transmitting units emit signals in the gigahertz range.
25. The method according to claim 14, wherein the amplitude detection occurs in the zero span mode of the analysis unit.
26. The method according to claim 14, wherein either active transmitting durations of the representative transmitting units or pause durations of the representative transmitting units are equal.
27. The method according to claim 14, wherein the chronological activation of the representative transmitting units is performed using HF switches andor delay lines.
28. The method according to claim 14, wherein the analysis unit is additionally implemented to analyze the frequency of received signals, in particular to detect Doppler shifts on the signal path.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A telescopic sight comprising:
a main tube;
a reticule;
a reticule adjusting device arranged on the main tube for adjusting the reticule;
an optical focusing device and
a focus adjusting device arranged on the main tube for focusing the optical focusing device,
wherein the reticule adjusting device and the focus adjusting device are arranged so as to jointly form of an integrated adjusting device on the main tube.
2. The telescopic sight according to claim 1, wherein the integrated adjusting device is an integrated adjusting turret.
3. The telescopic sight according to claim 1, wherein at least one of the devices selected from the group consisting of the reticule adjusting device and the focus adjusting device has a rotatable or pivotable actuating element.
4. The telescopic sight according to claim 3, wherein the rotatable or pivotable actuating element is configured to be actuatable by hand.
5. The telescopic sight according to claim 3, wherein each of the reticule adjusting device and the focus adjusting device has a rotatable or pivotable actuating element, and the rotatable or pivotable actuating element of the reticule adjusting device is arranged substantially coaxially with the rotatable or pivotable actuating element of the focus adjusting device.
6. The telescopic sight according to claim 3, wherein the rotatable or pivotable actuating element is a rotary knob or a rotary ring.
7. The telescopic sight according to claim 3, wherein each of the reticule adjusting device and the focus adjusting device has a rotatable or pivotable actuating element, and the rotatable or pivotable actuating element of the reticule adjusting device is a rotary knob and the rotatable or pivotable actuating element of the focus adjusting device is a rotary ring.
8. The telescopic sight according to claim 7, wherein the rotary ring surrounds the rotary knob.
9. The telescopic sight according to claim 7, wherein the reticule adjusting device for adjusting the reticule has a spindle which is axially displaceable by rotation.
10. The telescopic sight according to claim 7, wherein the focus adjusting device has an inner ring mounted eccentrically in the rotary ring for converting a rotary movement into a linear movement.
11. The telescopic sight according to claim 1, wherein the reticule adjusting device is configured for at least one adjustment selected from a group consisting of a height adjustment and a lateral adjustment of the reticule.
12. The telescopic sight according to claim 1, wherein the reticule adjusting device and the focus adjusting device are capable of being coupled for automatic ballistic correction.
13. The telescopic sight according to claim 1, wherein the main tube has a central tube arranged between an objective lens region and an eyepiece region and the integrated adjusting device is arranged in the region of the central tube.
14. The telescopic sight according to claim 13, wherein at least one region selected from a group consisting of an objective lens region of the main tube and an eyepiece region of the main tube has a larger diameter than the central tube.
15. The telescopic sight according to claim 1, wherein the integrated adjusting device is arranged on the top on the main tube in an operative position of the telescopic sight.
16. The telescopic sight according to claim 1, wherein the reticule is integrated into a reversal system of the telescopic sight.
17. The telescopic sight according to claim 1, wherein the reticule adjusting device and the focus adjusting device are arranged in a combined adjusting device which is fixed on the main tube.

1. A topical aqueous ophthalmic solution comprising keterolac tromethamine, carboxymethyl cellulose and no preservative.
2. The topical aqueous ophthalmic solution of claim 1 wherein the keterolac tromethamine is present in a concentration of approximately 0.40-0.45 percent by weightvolume.
3. The topical aqueous ophthalmic solution of claim 1 wherein the carboxymethyl cellulose is a combination of medium and high viscosity carboxymethyl cellulose.
4. The topical aqueous ophthalmic solution of claim 1 wherein the keterolac tromethamine is present in a concentration of 0.45 percent by weightvolume.
5. The topical aqueous ophthalmic solution of claim 4 having a pH between 6.8 and 7.4.
6. The topical aqueous ophthalmic solution of claim 5 wherein the concentration of carboxymethylcellulose is from 0.2 to 2 percent by weight.
7. The topical aqueous ophthalmic solution of claim 5 having a pH of approximately 6.8.
8. The topical aqueous solution of claim 4 wherein the solution is surfactant and chelator free.
9. The topical aqueous solution of claim 8 for use in treatment of ocular pain associated with postoperative photorefractive keratectomy.
10. The topical aqueous solution of claim 4 further comprising a mixture of medium and high molecular weight sodium carboxymethyl cellulose.
11. The topical aqueous solution of claim 4 further comprising a mixture of medium and high viscosity sodium carboxymethyl cellulose, sodium chloride, sodium citrate dehydrate, sodium hydroxide, hydrochloric acid and purified water.
12. The topical aqueous solution of claim 10 wherein the combination of carboxymethyl cellulose and keterolac increases the absorption in the eye of a patient more than a solution of keterolac alone.
13. The topical aqueous solution of claim 1 wherein the keterolac tromethamine is present as a racemic mixture of R-(+) and S-(\u2212)-ketorolac tromethamine.
14. The topical aqueous solution of claim 1 wherein the keterolac tromethamine is present in a mixture of crystal forms.
15. The topical aqueous solution of claim 5 wherein the viscosity is from 10 to 30 cps.
16. The topical aqueous solution of claim 6 wherein the carboxymethylcellulose is present in the amount of 0.5% percent by weight.
17. The topical aqueous solution of claim 4 wherein the solution may be administered before or after eye surgery to prevent ocular pain.
18. The topical aqueous solution of claim 4 wherein the solution increases healing time of the eye after surgery in comparison to keterolac solutions containing a preservative.
19. The topical aqueous solution of claim 4 wherein the topical aqueous solution is instilled twice daily to achieve proper efficacy.
20. The topical aqueous solution of claim 4 wherein the aqueous solution is surfactant free.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A method for performing optical adjustments on an exposure apparatus provided with: a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with said illumination light and exposing a mask pattern on a substrate base using said illumination light, comprising:
activating a wide bandwidth light source serving as said light source for generating exposure light and non-exposure light having wavelengths different from wavelengths in said exposure light; and
performing optical adjustments on optical components in at least a part of said illumination optics using said non-exposure light.
2. A method for performing optical adjustments on an exposure apparatus provided with: a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with said illumination light, and exposing a mask pattern on a substrate base using said illumination light, comprising:
activating a wide bandwidth light source serving as said light source for generating exposure light and non-exposure light having wavelengths different from wavelengths in said exposure light;
performing primary optical adjustments for optical components in at least a part of said illumination optics using said non-exposure light; and
performing final optical adjustments for said illumination optics using said exposure light emitted from said wide bandwidth light source.
3. A method according to one of claims 1 or 2, wherein said exposure apparatus is provided with projection optics consisted of reflective components for focusing illumination light exiting from a mask so as to project a pattern fabricated on said mask on a substrate base, wherein adjustments of optical components in at least a part of said illumination optics and said projection optics are performed using said non-exposure light emitted from said wide bandwidth light source.
4. A method according to one of claims 1 or 2, wherein said wide bandwidth light source generates light having wavelengths in an extreme ultraviolet range as said exposure light, and at least one of ultraviolet light or visible light as non-exposure light, wherein said illumination optics consists of reflective optical components.
5. A method for performing optical adjustments for an exposure apparatus provided with: a light source for generating illumination light for exposure; illumination optics for irradiating a mask with said illumination light; and projection optics for projecting a pattern image of said mask on a substrate base; comprising:
activating a wide bandwidth light source serving as said light source for generating exposure light and non-exposure light having wavelengths different from wavelengths in said exposure light; and
performing optical adjustments on optical components in at least a part of said projection optics using said non-exposure light.
6. A method according to claim 5, wherein, after adjusting said optical components using said non-exposure light, repeating optical adjustments on said projection optics using said exposure light emitted from said wide bandwidth light source.
7. A method according to claim 5, wherein said wide bandwidth light source generates light having wavelengths in an extreme ultraviolet range as exposure light, and at least one of ultraviolet light or visible light as non-exposure light, wherein said projection optics consists of reflective optical components.
8. A method according to claim 4, wherein said wide bandwidth light source is a laser excitation plasma source, and said exposure light comprises extreme ultraviolet light having a wavelength in a range of 5 to 20 nanometers.
9. A method according to claim 7, wherein said wide bandwidth light source is a laser excitation plasma source, and said exposure light comprises extreme ultraviolet light having a wavelength in a range of 5 to 20 nanometers.
10. A method according to claim 4, wherein, w hen performing optical adjustments using said non-exposure light, a gaseous substance is supplied to an optical path of said non-exposure light, and when performing exposure or optical adjustments using said exposure light, an optical path of said exposure light is enclosed in an essentially evacuated state.
11. A method according to claim 7, wherein, when performing optical adjustments using non-exposure light, a gaseous substance is supplied to an optical path of said non-exposure light, and when performing exposure or optical adjustments using said exposure light, an optical path of said exposure light is enclosed in an essentially evacuated state.
12. An exposure apparatus for exposing a mask pattern onto a substrate base comprised by: a light source for generating illumination light for exposure; and illumination optics for irradiating said illumination light emitted from said light source on a mask, wherein said light source is a wide bandwidth light source for generating exposure light and non-exposure light having wavelengths different from wavelengths in said exposure light; and said exposure apparatus is provided with a photo-sensor for detecting said non-exposure light that has passed through at least a part of optical components in said illumination optics.
13. An exposure apparatus according to claim 12, wherein said apparatus is provided with projection optics for projecting said mask pattern by focusing illumination light exiting from said mask onto said substrate base, and said photo-sensor detects non-exposure light that has passed through said illumination optics and at least some of optical components in said projection optics.
14. An exposure apparatus for exposing a mask pattern onto a substrate base comprised by: a light source for generating illumination light for exposure; and illumination optics for irradiating said illumination light on a mask, wherein said light source is a wide bandwidth light source for generating exposure light and non-exposure light having wavelengths different from wavelengths in said exposure light; and said apparatus is provided with a photo-sensor for detecting said non-exposure light that has passed through at least a part of said projection optics.
15. An apparatus according to one of claims 13 or 14, wherein said illumination optics and said projection optics are consisted of reflective optical components, and said apparatus is provided with stage system for moving a mask and a substrate base in a given direction; and a control device for scanning said mask and said substrate base concurrently with respect to projection optics, so as to imprint a mask pattern on said substrate base.
16. An apparatus according to one of claims 12 or 14, wherein said wide bandwidth light source generates extreme ultraviolet light as said exposure light and generates at least one of ultraviolet light or visible light as said non-exposure light; and
when using said non-exposure light generated from said wide bandwidth light source, a gaseous substance is supplied to an optical path of said non-exposure light, and when using said exposure light generated from said wide bandwidth light source, an optical path of said exposure light is enclosed in an essentially evacuated state.
17. An apparatus according to one of claims 12 or 14, wherein a wavelength selection device is provided for transmitting one of said exposure light and said non-exposure light, emitted from said wide bandwidth light source, towards illumination optics.
18. An exposure apparatus having an x-ray source for generating x-rays by generating a plasma from a substance so as to use x-rays generated from said x-ray source as exposure light, wherein a light source position observation system is provided to form an image of said x-ray source using light which has a wavelength different from that of said x-rays and is generated concurrently with said x-rays from said x-ray source.
19. An apparatus according to claim 18, wherein said x-ray source is a laser excitation plasma x-ray source for producing plasma generated x-rays by irradiating a substance with a laser to generate a plasma of said substance.
20. An apparatus according to claim 18, wherein said light source position observation device includes a first light source position observation system and a second light source position observation system, which are positioned so as to observe said x-ray source from different directions.
21. An apparatus according to claim 18, wherein said light source position observation device includes a first light source position observation system and a second light source position observation system, optical axes of said first light source position observation system and said second light source position observation system are at least partially parallel with an optical axis of said x-rays, and are disposed so as to be at ninety degrees to an optical axis of x-rays.
22. An apparatus according to claim 18, wherein said x-ray source is disposed inside a vacuum chamber, and said light source position observation system provides for observation of an image of said x-ray source formed by said light from outside said vacuum chamber.
23. A method for positioning an x-ray source for emitting exposure light, comprising: generating x-rays from an x-ray source that produces x-rays by generating a plasma of a substance; and positioning said x-ray source using light which has a wavelength different from that of said x-rays and is generated concurrently with said x-rays from said x-ray source.
24. A method for exposure comprising: generating x-rays from an x-ray source that produces x-rays by generating a plasma of a substance; positioning said x-ray source using light which has a wavelength different from that of said x-rays and is generated concurrently with said x-rays from said x-ray source; and then performing an exposing process.
25. A method for manufacturing an exposure apparatus which comprises a light source for generating first illumination light as exposure light and second illumination light having a wavelength different from that of said first illumination light, comprising:
arranging an optical system in an optical path of said first and second illumination light;
adjusting said optical system by detecting said second illumination light passing through said optical path; and
adjusting said optical system by detecting said first illumination light passing through said optical path.
26. A method according to claim 25, wherein said optical system is a reflective optical system comprising a plurality of reflective optical elements assembled into a barrel.
27. A method according to claim 26, wherein said exposure apparatus comprises a stage system for relatively transferring a first object and a second object in order to expose said second object with said first illumination light via said first object.
28. A method according to claim 27, wherein said first illumination light has a wavelength in a range of 550 nanometers.