Author: claimsbot

1. A device for pushing an anchor through a bore in a bone, comprising:
an elongated shaft having an axis, a proximal end and a distal end;
an anchor carrying assembly disposed at the distal end of said elongated shaft, comprising an anchor fastener formed as a cavity extending longitudinally along the axis of said elongated shaft and a groove arranged on one side of said anchor fastener; and beginning at a distal end of said anchor carrying assembly;
an anchor releasably engaged in said anchor fastener such that the anchor does not extend beyond the distal end of the anchor carrying assembly when received therein;
threads attached to said anchor and positioned in said groove for retaining the anchor in the anchor fastener;
a plunger disposed in said elongated shaft, having a proximal end and a distal end;
wherein said plunger is movable relative to said elongated shaft; and
wherein said plunger has a length that is substantially greater than a length of said elongated shaft such that when the plunger is moved within the elongated shaft, the distal end of the plunger extends outwardly beyond the distal end of the elongated shaft to push said anchor out of the distal end of said elongated shaft and into a bore in a bone.
2. The device according to claim 1, wherein the distal end of said elongated shaft comprises a beveled edge for positioning said anchor carrying assembly in the bore in the bone.
3. The device according to claim 1, further comprising a handle disposed at the proximal end of said elongated shaft.
4. The device according to claim 3, wherein said handle is ergonomically shaped to facilitate gripping and maneuvering of said elongated shaft by a user.
5. The device according to claim 1, further comprising a handle disposed at the proximal end of said plunger.
6. The device according to claim 5, wherein said handle is ergonomically shaped to facilitate gripping and maneuvering of said plunger by a user.
7. The device according to claim 1, wherein the distal end of said plunger is engageable with the anchor by being displaced in direction of the distal end of said elongated shaft and being extended through an opening in said anchor fastener.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A neck traction device adapted to longitudinally elongate a user’s neck with an application of force on the user’s left and right shoulders while supporting the user’s head in a substantially longitudinally stationary position comprising:
a head pad for said user’s head;
a pair of shoulder pads for said user’s left and right shoulders, respectively;
said shoulder pads movably mounted on one or more longitudinal track mounts; and
an undercarriage means for transferring a substantially downward force due to a head weight of said user’s head on said head pad to a longitudinal force on said shoulder pads such that said shoulder pads, in a rest mode, are in an inboard, non-extended position in said one or more longitudinal track mounts and, in an extension mode, said are in an outboard, extended position in said one or more longitudinal track mounts; and
an upward biasing element acting on said head frame element opposite said substantially downward force from said head weight.
2. A neck traction device as claimed in claim 1 wherein said undercarriage means for transferring includes a head frame element, a interconnecting linkage and a shoulder pad frame element, said head pad mounted on said head frame element and said shoulder pads mounted on said shoulder pad frame element, said shoulder frame element longitudinally movably mounted in said one or more track mounts;
said head frame element being pivotally mounted to permit substantially vertical movement due to said substantially downward force of said head weight on said head pad;
said shoulder pad frame element pivotally mounted to said head frame element via said interconnecting linkage and said shoulder pad frame element permitted substantially longitudinal extending movement due to said substantially vertical movement of said head pad and head frame element.
3. A neck traction device as claimed in claim 2 wherein movement of said shoulder pad frame element is limited due to said one or more longitudinal track mounts.
4. A neck traction device as claimed in claim 2 wherein said upward biasing element includes a longitudinal biasing element limiting longitudinal extension of said shoulder frame element operatively coupled to one or both of said head frame element and said shoulder frame element or said interconnecting linkage.
5. A neck traction device as claimed in claim 4 including a support structure with one or more shoulder pad openings, said head frame element movably disposed in said support structure, a vertical limiter on said support structure within which moves said head frame element, said one or more longitudinal track mounts mounted in said support structure near said one or more shoulder pad openings.
6. A neck traction device as claimed in claim 5 wherein said head frame element includes a proximal head frame element end, connected to said interconnecting linkage, and a distal head frame element end, and wherein said interconnecting linkage is a proximal interconnecting linkage and said undercarriage means includes a distal interconnecting linkage having one end pivotally connected to said distal head frame element end, said distal head frame element end and said proximal head frame element end permitting said substantial vertical movement of said head frame element and said head pad, said distal interconnecting linkage interconnecting said distal head frame element end and said support structure.
7. A neck traction device as claimed in claim 6 wherein said distal interconnecting linkage has a first end and a second end, said first end being pivotally connected to said distal head frame element end, said second end fixed at one of several longitudinal fixation positions in said support structure.
8. A neck traction device as claimed in claim 7 wherein said distal interconnecting linkage is coupled to:
either said upward biasing element or said longitudinal biasing element limiting longitudinal extension.
9. A neck traction device adapted to longitudinally elongate a user’s neck with an application of force on the user’s left and right shoulders while supporting the user’s head in a substantially longitudinally stationary position comprising:
a support structure with one or more shoulder pad openings;
a head pad for said user’s head;
a head support frame element which supports said head pad and which is substantially vertically movably mounted in said support structure, said head support frame element having a proximal end closer to said one or more shoulder pad openings than a head support frame distal end;
a pair of shoulder pads for said user’s left and right shoulders, respectively, mounted on a shoulder frame element which is longitudinally movably mounted in said support structure;
a linkage member having one linkage end pivotally connected to said head support frame proximal end and a second linkage end pivotally connected to said shoulder frame element such that a substantially downward force due to a head weight of said user’s head on said head pad is transferred via said head support frame element and said shoulder frame element to a longitudinal force on said shoulder pads; and
an upward biasing element acting on said head frame element opposite said substantially downward force from said head weight.
10. A neck traction device as claimed in claim 9 wherein shoulder frame element moves in said support structure in at least one longitudinal track converting said substantially downward force from said head weight to said longitudinal force on said shoulder pads.
11. A neck traction device as claimed in claim 10 including a longitudinal biasing element acting on said shoulder frame element opposite said longitudinal force on said shoulder pads.
12. A neck traction device as claimed in claim 10 wherein said linkage member moves in a predetermined manner due to said substantially downward force of said head weight and the device includes a biasing element countering said linkage member movement.
13. A neck traction device adapted to longitudinally elongate a user’s neck with an application of force on the user’s left and right shoulders while supporting the user’s head in a substantially longitudinally stationary position comprising:
a support structure with one or more shoulder pad openings;
a head pad for said user’s head;
a head support frame element which supports said head pad and which is substantially vertically movably mounted in said support structure;
a pair of shoulder pads for said user’s left and right shoulders, respectively, mounted on a shoulder frame element which is longitudinally movably mounted in said support structure;
a transmission means for converting a substantially downward force due to a head weight of said user’s head on said head pad to a longitudinal force on said shoulder pads, said transmission means coupled intermediate said head support frame element and said shoulder frame element; and
a biasing element opposing said substantially downward force of said head weight, said biasing element operating either on said head support frame element or through said transmission means.

1. A display system comprising:
means for inputting source image data renderable upon a first display of a first subpixel format having a first resolution;
a second display of a second subpixel format, said second subpixel format comprising fewer subpixels than said first subpixel format; and
means for generating intensity coefficients for each subpixel of said second display, said means for generating intensity coefficients further comprising a two-dimensional area sample mapping of said source image data into a target image data, said target image data renderable upon said second display at said first resolution.
2. The display system of claim 1 wherein said two-dimensional area sample mapping further comprises:
means for dividing the source image data into a plurality of sample areas of said first display;
for each color plane, means for tiling said plurality of sample areas with a plurality of resample areas, each said resample area having an area larger than each said sample area;
means for determining filter kernals, said filter kernals comprising fractional coefficients based upon the amount of overlapping areas of said resample area into said sample areas.
3. The display system of claim 2, wherein each said resample area is one of the group, said group comprising squares, rectangles, triangles, hexagons, octagons, diamonds, staggered squares, staggered rectangles, staggered triangles, Penrose tiles, rhombuses, distorted rhombuses, and staggered diamonds.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A semiconductor device, comprising:
a cylindrical type capacitor structure formed in a cell region over a semiconductor substrate, the structure including a cylindrical type lower electrode, a dielectric and an upper electrode;
a storage node oxide formed in a peripheral region over the semiconductor substrate;
a conductive layer coating a guard ring hole, the guard ring hole at a boundary of the peripheral region that adjoins the cell region over the semiconductor substrate;
a capping oxide partially filling in a part of the conductive layer; and
a gapfill film filling in a remaining part of the conductive layer.
2. The device of claim 1, wherein the gapfill film has an etch selectivity against removal by a wet dip-out process as opposed to the storage node oxide.
3. The device of claim 1, wherein the capping oxide comprises at least one of a low-temperature silicon oxide, PSG-based (phosphorsilicate glass) film or USG-based (undoped silicate glass) film.
4. The device of claim 3, wherein the low-temperature silicon oxide includes SiO2 film obtained by adding O3 to TDMAS (tris(dimethylamino)silane), ALD SiO2 film obtained by adding pyridine to HCD.
5. The device of claim 3, wherein the low-temperature silicon oxide includes SiO2 film obtained by adding O3 to TDMAS (tris(dimethylamino)silane), ALD SiO2 film obtained by adding pyridine to HCD.
6. The device of claim 1, wherein the gapfill film comprises a metallic film selected from the group consisting of TiN, TaN, WN, Pt, Ru, TiSiN, TiSiCN, TiCN and TiAlN, or a silicon-based film selected from the group consisting of Si3N4, SiON, SiBN, Si and SiGe.
7. The device of claim 1, wherein the lower electrode and the gapfill film are made of the same material.
8. The device of claim 1, wherein the storage node oxide includes single layer film made from PSG (phosphorsilicate glass), BSG (boro-silicate glass), BPSG (borophosphorsilicate glass), USG (undoped silicate glass), TEOS (tetraethyl orthosilicate) or a multilayer film thereof.
9. The device of claim 1, wherein the lower electrode includes any of TiN, TaN, WN, Pt, Ru or AlN, or a laminate thereof, or a film made of the aforementioned materials coupled with Si, C, Al and Ge.
10. The device of claim 1, wherein the dielectric includes any of Al2O3, ZrO2, HfO2, Ta2O5, TiO2, STO, BST, PZT, or a multilayer film thereof.
11. The device of claim 1, wherein the upper electrode includes any of TiN, TaN, WWN, WN, Pt, Ru and AlN, or a laminate thereof.
12. The device of claim 1, wherein the gapfill film has an etch selectivity against removal by a wet dip-out process as opposed to the storage node oxide.
13. The device of claim 1, wherein the capping oxide comprises at least one of a low-temperature silicon oxide, PSG-based (phosphorsilicate glass) film or USG-based (undoped silicate glass) film.
14. The device of claim 1, wherein the gapfill film comprises a metallic film selected from the group consisting of TiN, TaN, WN, Pt, Ru, TiSiN, TiSiCN, TiCN and TiAlN, or a silicon-based film selected from the group consisting of Si3N4, SiON, SiBN, Si and SiGe.
15. The device of claim 1, wherein the lower electrode and the gapfill film are made of the same material.
16. The device of claim 1, wherein the storage node oxide includes single layer film made from PSG (phosphorsilicate glass), BSG (boro-silicate glass), BPSG (borophosphorsilicate glass), USG (undoped silicate glass), TEOS (tetraethyl orthosilicate) or a multilayer film thereof.
17. The device of claim 1, wherein the lower electrode includes any of TiN, TaN, WN, Pt, Ru or AlN, or a laminate thereof, or a film made of the aforementioned materials coupled with Si, C, Al and Ge.
18. The device of claim 1, wherein the dielectric includes any of Al2O3, ZrO2, HfO2, Ta2O5, TiO2, STO, BST, PZT, or a multilayer film thereof.
19. The device of claim 1, wherein the upper electrode includes any of TiN, TaN, WWN, WN, Pt, Ru and AlN, or a laminate thereof.
20. A semiconductor device, comprising:
a capacitor structure formed in a cell region over a semiconductor substrate, the structure including a lower electrode, a dielectric and an upper electrode;
a storage node oxide formed in a peripheral region over the semiconductor substrate;
a conductive layer coating a guard ring hole, the guard ring hole at a boundary of the peripheral region that adjoins the cell region over the semiconductor substrate;
a capping oxide partially filling in a part of the conductive layer; and
a gapfill film filling in a remaining part of the conductive layer.