1. An electrode made of a free-standing conductive diamond plate having one of porous or mesh structures wherein the free-standing conductive diamond plate has at least one hole provided by one of laser processing and electrical discharging; wherein said hole extends from one side of the diamond plate through to the other side of the diamond plate; wherein an inner wall of the hole comprises a taper.
2. The electrode as set forth in claim 1 wherein the conductive diamond plate is manufactured by microwave plasma assisted CVD.
3. The electrode as set forth in claim 1 wherein a thickness of the conductive diamond plate is between 0.2 and 1.0 mm.
4. The electrode as set forth in claim 3 wherein a diameter of the hole provided on the diamond plate is between 0.5 and 3.0 mm.
5. The electrode as set forth in claim 4 wherein a plurality of the holes is provided on the diamond plate such that an interval between an outer peripheral of each hole is between 0.2 and 1.5 mm.
6. The electrode as set forth in claim 3 wherein a plurality of the holes is provided on the diamond plate such that an interval between an outer peripheral of each hole is between 0.2 and 1.5 mm.
7. An ozone generator for electrolysis of water comprising: a cathode;
an anode; and
a solid polymer film interposed between the cathode and the anode,
wherein the anode is made of the electrode, set forth in claim 1, and
configured such that a three-phase interface can be formed in which the anode, the solid polymer film, and water contact with one another.
8. The ozone generator as set forth in claim 7 wherein the anode is configured smaller than the solid polymer film, and configured such that the three-phase interface can be formed, in which the anode, the solid polymer film, and water contact with one another, in an outer peripheral of the anode.
9. A method for producing ozone comprising steps of: providing a cathode, an anode, and a solid polymer film interposed between the cathode and the anode; and
electrolyzing water
wherein the electrode, set forth in claim 1, is provided as the anode, and
a three-phase interface is formed in which the anode, the solid polymer film, and water contact with one another.
10. The method for producing ozone as set forth in claim 9 comprising steps of:
configuring the anode smaller than the solid polymer film; and
forming the three-phase interface in an outer peripheral of the anode wherein the anode, the solid polymer film, and water contact with one another.
11. An ozone generator for electrolysis of water comprising:
a cathode;
an anode; and
a solid polymer film interposed between the cathode and the anode,
wherein the anode is made of the electrode, set forth in claim 1, and configured such that a three-phase interface can be formed in which the anode, the solid polymer film, and water contact with one another.
12. A method for producing ozone comprising steps of:
providing a cathode, an anode, and a solid polymer film interposed between the cathode and the anode; and
electrolyzing water
wherein the electrode, set forth in claim 1, is provided as the anode, and a three-phase
interface is formed in which the anode, the solid polymer film, and water contact with one another.
13. An ozone generator for electrolysis of water comprising: a cathode;
an anode; and
a solid polymer film interposed between the cathode and the anode,
wherein the anode is made of a plurality of free-standing conductive diamond, having a columnar shape and disposed parallel to a surface of the solid polymer film, and configured such that a three-phase interface can be formed in which the anode, the solid polymer film, and water contact with one another;
wherein the anode has at least one hole provided by one of laser processing and electrical discharging; wherein said hole extends from one side of the anode through to the other side of the anode; wherein an inner wall of the hole comprises a taper.
14. An ozone generator for electrolysis of water comprising: a cathode;
an anode; and
a solid polymer film interposed between the cathode and the anode,
wherein the anode is made of a plurality of free-standing conductive diamond, having a fragmentary shape and disposed on a surface of the solid polymer film, and configured such that a three-phase interface can be formed in which the anode, the solid polymer film, and water contact with one another;
wherein the anode has at least one hole provided by one of laser processing and electrical discharging; wherein said hole extends from one side of the anode through to the other side of the anode; wherein an inner wall of the hole comprises a taper.
15. A method for producing ozone comprising steps of:
providing a cathode, an anode, and a solid polymer film interposed between the cathode and the anode; and
electrolyzing water
wherein a plurality of free-standing conductive diamond is provided as the anode, the plurality of conductive diamonds having a columnar shape and disposed parallel to a surface of the solid polymer film, and a three-phase interface is formed in which the anode, the solid polymer film, and water contact with one another;
wherein the anode has at least one hole provided by one of laser processing and electrical discharging; wherein said hole extends from one side of the anode through to the other side of the anode; wherein an inner wall of the hole comprises a taper.
16. A method for producing ozone comprising steps of:
providing a cathode, an anode, and a solid polymer film interposed between the cathode and the anode; and
electrolyzing water;
wherein the anode has at least one hole provided by one of laser processing and electrical discharging; wherein said hole extends from one side of the anode through to the other side of the anode; wherein an inner wall of the hole comprises a taper.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A semiconductor device comprising;
a first electrode formed above a first substrate;
an under bump metal film on said first electrode, said under bump metal film being in the shape of a recess; and
a bump electrode embedded in said under bump metal film, said bump electrode having sides and bottom thereof surrounded by said under bump metal film.
2. The semiconductor device of claim 1, wherein said bump electrode has a top surface whose height is substantially equal to height of side walls of said under bump metal film.
3. The semiconductor device of claim 1, wherein at least a part of the side walls of said under bump metal film and being near said first electrode is surrounded by an insulating film.
4. The semiconductor device of claim 1, wherein said bump electrode includes a chamfered upper peripheral edge.
5. The semiconductor device of claim 1 further comprising a second substrate including a second electrode connected to said bump electrode.
6. The semiconductor device of claim 5, wherein said second electrode is a plug, and said second substrate is an interposer.
7. A method of manufacturing a semiconductor device, comprising:
forming an electrode;
forming an insulating film on said electrode, said insulating film having an aperture;
forming an under bump metal film on said insulating film, an inner wall of said aperture and said electrode in said aperture;
forming a bump electrode film on said under bump metal film, and embedding said bump electrode film in said aperture;
removing said bump electrode film and said under bump metal film from portions except for said aperture to from a bump electrode; and
taking off at least a part of a surface of said insulating film.
8. The method of manufacturing a semiconductor device of claim 7, wherein: when forming said insulating film, a first insulating film is formed, and a second insulating film is formed on said first insulating film, said second insulating film having an etching ratio different from an etching ratio of said first insulating film; and when taking off at least a part of a surface at said insulating film, said second insulating film is selectively etched.
9. The method of manufacturing a semiconductor device of claim 7, wherein: when removing said bump electrode film and said under bump metal film, said under bump metal film and said bump electrode film on said insulating film and said aperture are removed by chemical mechanical polishing to form said bump electrode surrounded by said under bump metal film on said inner walls of said aperture and on said electrode in said aperture.
10. The method of manufacturing a semiconductor device of claim 7, wherein after taking off at least a part of the surface of said insulating film, said bump electrode is flattened at a top surface thereof.
11. The method of manufacturing a semiconductor device of claim 7, wherein after taking off at least the surface of said insulating film, said bump electrode is chamfered at a peripheral edge thereof.
12. The method of manufacturing a semiconductor device of claim 7, wherein said bump electrode is a solder bump electrode, and said solder bump electrode is subject to reflowing.
13. A method of manufacturing a semiconductor device, comprising:
forming a first substrate having a first electrode;
forming a second substrate having a second electrode;
applying a non-activated solvent onto a surface of at least one of said first and second electrodes;
bringing said second electrode into contact with said first electrode via said non-activated solvent, and compressing said first and second electrodes; and
activating said solvent at a temperature which is lower than a melting point temperatures of said first and second electrodes, before said first and second electrodes are joined.
14. The method of manufacturing a semiconductor device of claim 13, wherein at least one of said first and second electrodes is a bump electrode.
15. The method of manufacturing a semiconductor device of claim 13, wherein at least one of said first and second electrodes contains at least one of Cu, Ni, Au and Ag.
16. The method of manufacturing a semiconductor device of claim 13, wherein said solvent contains inorganic or organic acid.
17. The method of manufacturing a semiconductor device of claim 13, wherein said solvent is activated by resistance heating, or by irradiating infrared rays, electron beams or laser beams.
18. A method of manufacturing a semiconductor device, comprising:
forming a first substrate having a first electrode;
forming a second substrate having a second electrode;
applying a non-activated solvent onto a surface of at least one of said first and second electrodes, said non-activated solvent being thermally set and being activated at a temperature which is lower than a thermosetting temperature;
bringing said second electrode into contact with said first electrode via said non-activated solvent, and compressing said first and second electrodes;
activating said solvent at a temperature which is lower than a melting point temperatures of said first and second electrodes, before said first and second electrodes are joined; and
heat-curing said solvent after said first and second electrodes are joined.
19. The method of manufacturing a semiconductor device of claim 18, wherein at least one of said first and second electrodes is a bump electrode.
20. The method of manufacturing a semiconductor device of claim 18, wherein at least one of said first and second electrodes contains at least one of Cu, Ni, Au and Ag.
21. The method of manufacturing a semiconductor device of claim 18, wherein said solvent contains inorganic or organic acid.
22. The method of manufacturing a semiconductor device of claim 18, wherein said solvent is activated by resistance heating, or by irradiating infrared rays, electron beams or laser beams.