Author: claimsbot

1. A method of debugging an executable computer application comprising instructions of a first computer architecture instruction set and instructions of a second computer architecture instruction set, the method comprising:
determining whether an instruction being debugged is from the second architecture instruction set;
obtaining debug information from an emulator of a second architecture in a first architecture environment when the instruction being debugged is from the second architecture instruction set, wherein the debug information results from emulation of the instruction being debugged.
2. The method of claim 1, further comprising running a debugger in the first architecture environment.
3. The method of claim 2, wherein the debugger determines whether the instruction being debugged is from the second architecture instruction set according to the value of an instruction pointer.
4. The method of claim 2, wherein the emulator is controlled by the debugger in such a way that the emulator is stoppable when an event occurs and the debugger is notified of the stop.
5. The method of claim 2, wherein the instruction being debugged is obtained from a core dump.
6. The method of claim 5, wherein the core dump comprises instructions that are from the second instruction set, the instructions from the second instruction set are loaded into the emulator.
7. The method of claim 6, wherein the debugger reads emulated debug information from a data area of the emulator.
8. The method of claim 2, wherein the debugger is arranged to control the emulator to single step through the emulated instructions of the non-native library.
9. The method of claim 2, wherein the debugger signals to the emulator to stop emulation after emulating a single instruction.
10. The method of claim 9, wherein the debugger signals to the emulator to stop emulation after each instruction by setting a flag of the emulator.
11. The method of claim 2, wherein a breakpoint is set to stop execution of the computer application at the instruction being debugged.
12. The method of claim 11, wherein when the instruction being debugged is from the instruction set of the second architecture the emulator finishes emulating the instruction before stopping.
13. The method of claim 12, wherein the emulator signals to the debugger that it is safe to stop the emulator when it has finished emulating the instruction
14. The method of claim 12, wherein the debugger signals to the emulator that it should notify the debugger when it has finished emulating the instruction.
15. The method of claim 2, wherein the debugger is arranged to differentiate events that arise from execution of the emulator from events that arise from the computer program, so as to signal that an event has occurred in the execution of the computer program.
16. The method of claim 2, wherein the emulator stores a representation of an emulated register set in a data area, wherein the debugger is arranged to read from and write to the register set in the data area.
17. A debugger for debugging an executable computer application comprising instructions of a first computer architecture instruction set and instructions of a second computer architecture instruction set, the debugger comprising:
a detector for determining whether an instruction being debugged is from the second architecture instruction set;
a reader for obtaining debug information from an emulator of the second architecture in a first architecture environment when the instruction being debugged is from the second architecture instruction set, wherein the debug information results from emulation of the instruction being debugged.
18. An emulator configured for debugging an executable computer application comprising instructions of a first computer architecture instruction set and instructions of a second computer architecture instruction set, the emulator comprising:
an interface to a debugger that can determine whether an instruction being debugged is from the second architecture instruction set, wherein the interface receives from the debugger instructions of the computer program that are from the second architecture instruction set;
an emulation module for emulating the instructions that are from the second architecture instruction set in a first architecture environment and producing debug information from the emulation.
19. An debugging tool set for debugging an executable computer application comprising instructions of a first computer architecture instruction set and instructions of a second computer architecture instruction set, the tool set comprising:
a debugger for determining whether an instruction being debugged is from the second architecture instruction set;
an emulator for emulating the instruction from the second architecture instruction set in a first architecture environment and producing debug information from the emulation.
20. A debugging computer program embodied on a computer readable medium for debugging a target executable computer application comprising instructions of a first computer architecture instruction set and instructions of a second computer architecture instruction set, said debugging computer program comprising instructions for causing a computer processor to:
determine whether an instruction being debugged is from the second architecture instruction set;
obtain debug information from an emulator of the second architecture in a first architecture environment when the instruction being debugged is from the second architecture instruction set, wherein the debug information results from emulation of the instruction being debugged.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A near-field exposure mask comprising:
a substrate;
a concave-convex structure comprising convexities and concavities formed on one surface of the substrate;
a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and
a resin filled in each of the concavities.
2. The mask according to claim 1, wherein the convexities are formed of the near-field light generating film.
3. The mask according to claim 2, wherein a height of at least one of the convexities formed of the near-field light generating film is 50 nm or less.
4. The mask according to claim 3, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
5. The mask according to claim 2, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
6. The mask according to claim 1, wherein the convexities are formed of the substrate, and the near-field light generating film covers a top surface of each of the convexities, and at least part of sides connecting to the top surface of each of the convexities.
7. The mask according to claim 6, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
8. The mask according to claim 1, wherein the substrate is a transparent substrate.
9. The mask according to claim 8, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
10. The mask according to claim 1, wherein the resin filled in each of the concavities is a silicon resin or epoxy resin.
11. The mask according to claim 10, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
12. The mask according to claim 1, wherein the near-field light generating film is a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C.
13. A pattern forming method for forming a pattern using a near-field exposure mask including:
a first substrate;
a concave-convex structure comprising convexities and concavities formed on one surface of the first substrate; and
a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials,
the method comprising:
applying a light-curable resin onto a second substrate;
positioning the near-field exposure mask so that the near-field light generating film arranged to the tip portion of each of the convexities is in contact with a surface of the light-curable resin applied onto the second substrate;
emitting light from either a side of the first substrate or a side of the second substrate; and
detaching the near-field exposure mask from the second substrate.
14. The method according to claim 13, wherein in the near-field exposure mask, a resin is filled in each of the concavities of the concave-convex structure.
15. The method according to claim 13, wherein the convexities of the near-field exposure mask are formed of the near-field light generating film.
16. The method according to claim 13, wherein the convexities of the near-field exposure mask are formed of the first substrate, and the near-field light generating film covers a top surface of each of the convexities and at least part of sides connecting to the top surface of each of the convexities.
17. The method according to claim 13, wherein the first substrate is a transparent substrate, and light is emitted from a side of the first substrate.

1. A printing apparatus for executing print processing based upon print data, comprising:
a storage unit configured to store print data, which is to be reprinted, received from a host computer;
a determination unit configured to determine whether a password for secure print has been appended to the print data, which is to be reprinted, stored in the storage unit;
a print control unit configured to print the print data in accordance with an input of the password for secure print from a user in a case where it is determined by the determination unit that the password for secure print has been appended to the print data;
a deletion unit configured to delete the print data, which is to be reprinted, stored in the storage unit, upon elapse of a prescribed period of time following storage of the print data, which is to be reprinted, in the storage unit; and
a control unit configured to exercise control so as to set, to periods of time that differ from each other, the prescribed period of time regarding the print data determined by the determination unit to have the password for secure print appended thereto and the prescribed period of time regarding the print data determined by the determination unit to not have the password for secure print appended thereto.
2. The apparatus according to claim 1, wherein the control unit makes the prescribed period of time regarding the print data determined by the determination unit to have the password for secure print appended thereto longer than the prescribed period of time regarding the print data determined by the determination unit to not have the password for secure print appended thereto.
3. The apparatus according to claim 1, wherein the control unit makes the prescribed period of time regarding the print data determined by the determination unit to have the password for secure print appended thereto shorter than the prescribed period of time regarding the print data determined by the determination unit to not have the password for secure print appended thereto.
4. A printing apparatus for executing print processing based upon print data, comprising:
a storage unit configured to store print data, which is to be reprinted, received from a host computer;
a determination unit configured to determine whether the print data, which is to be reprinted, stored in the storage unit is print data of a print job that requests a password when the print data is to be reprinted;
a deletion unit configured to delete the print data, which is to be reprinted, stored in the storage unit, upon elapse of a prescribed period of time following storage of the print data, which is to be reprinted, in the storage unit; and
a control unit configured to exercise control so as to set, to periods of time that differ from each other, the prescribed period of time regarding the print data determined by the determination unit to be print data of a print job that requests a password when the print data is to be reprinted and the prescribed period of time regarding the print data determined by the determination unit not to be print data of a print job that requests a password when the print data is to be reprinted.
5. The apparatus according to claim 4, wherein the control unit makes the prescribed period of time regarding the print data determined by the determination unit to be print data of a print job that requests a password when the print data is to be reprinted longer than the prescribed period of time regarding the print data determined by the determination unit not to be print data of a print job that requests a password when the print data is to be reprinted.
6. A control method of controlling a printing apparatus for executing print processing based upon print data, comprising:
a storage step of storing in a memory print data, which is to be reprinted, received from a host computer;
a determination step of determining whether a password for secure print has been appended to the print data, which is to be reprinted, stored in the memory;
a print control step of printing the print data in accordance with input of the password for secure print from a user in a case where it is determined in the determination step that the password for secure print has been appended to the print data;
a deletion step of deleting the print data, which is to be reprinted, stored in the memory in the storage step, upon elapse of a prescribed period of time following storage of the print data, which is to be reprinted, in the memory; and
a control step of exercising control so as to set, to periods of time that differ from each other, the prescribed period of time regarding the print data determined in the determination step to have the password for secure print appended thereto and the prescribed period of time regarding the print data determined in the determination step to not have the password for secure print appended thereto.
7. A control method of controlling a printing apparatus for executing print processing based upon print data, comprising:
a storage step of storing in a memory print data, which is to be reprinted, received from a host computer;
a determination step of determining whether the print data, which is to be reprinted, stored in the memory is print data of a print job that requests a password when the print data is to be reprinted;
a deletion step of deleting the print data, which is to be reprinted, stored in the memory, upon elapse of a prescribed period of time following storage of the print data, which is to be reprinted, in the memory; and
a control step of exercising control so as to set, to periods of time that differ from each other, the prescribed period of time regarding the print data determined in the determination step to be print data of a print job that requests a password when the print data is to be reprinted and the prescribed period of time regarding the print data determined in the determination step not to be print data of a print job that requests a password when the print data is to be reprinted.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A soluble copolymer of vinyl monomers having multiple unsaturation and having the general formula (Ax) (By)n, wherein A and B are vinyl monomers that are insoluble in organic solvent and A is vinyl monomer comprising single unsaturation, B is vinyl monomer containing multiple unsaturation and x, y and n are integral values greater than zero.
2. The soluble copolymer as claimed in claim 1, wherein the vinyl monomer comprising single unsaturation is selected from the group consisting of acrylates, methacrylates, acrylamides comprising of methyl methacrylate, ethyl acrylate, butyl acrylate, acrylic acid, methacrylic acid, acrylonitrile, vinyl acetate, glycidyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxyl propyl methacrylate, 2-amino ethyl acrylate hydrochloride butyl acrylate cetyl acrylate, cetyl methacrylate, phenol methacrylate, N-isopropyl acrylamide, acrylamide, N-t-butyl acrylamide, styrene and styrene sulfonic acid.
3. The soluble copolymers as claimed in claim 1, wherein the vinyl monomer with multiple unsaturations is selected from the group consisting of diacrylates, dimethacrylates, tri or tetra acrylates or methacrylates comprising ethylene glycol dimethacrylate, trimethylol propane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, bisphenol A dimethacrylate, glycerol dimethacrylate, glycerol diacrylate, vinyl methacrylate, vinyl acrylate, trimethylol propane triacrylate, pentaerythritol tetraacrylate or aromatic divinyl compounds.
4. The soluble copolymer as claimed in claim 1, wherein the aromatic divinyl compound is divinyl benzene.
5. The polymer composition as claimed in claim 1, wherein the content of the monomer with multiple unsaturation in the copolymer may be varied from 0.01-99.9%.
6. A process for the preparation of soluble copolymers of vinyl monomers having general formula (Ax)(By)n, wherein A is vinyl monomer comprising one unsaturation, B is vinyl monomer containing multiple unsaturation and x, y and n are integral values greater than zero, the said process comprising the steps of:
a. dissolving an inclusion complex of a monomer, containing multiple unsaturation with a cyclic macromolecular compound in a solvent;
b. adding a vinyl monomer having single unsaturation and a free radical initiator to the reaction mixture of step (a) and polymerizing the solution thus formed to obtain the soluble copolymer.
7. A process as claimed in claim 6, wherein the inclusion complex of the monomer containing multiple unsaturation is obtained by:
(a) dissolving \u03b2-cyclodextrin in water;
(b) adding ethylene glycol dimethacrylate to the reaction mixture of (a) and stirring the same to form a precipitate;
(c) filtering the precipitate and washing the same with water and methanol, and
(d) drying the washed precipitate to obtain the inclusion complex.
8. A process as claimed in claim 6, wherein the vinyl monomer with single unsaturation is selected from the group consisting of acrylates, methacrylates, acrylamides comprising of methyl methacrylate, ethyl acrylate, butyl acrylate, acrylic acid, methacrylic acid, acrylonitrile, vinyl acetate, glycidyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxyl propyl methacrylate, 2-amino ethyl acrylate hydrochloride butyl acrylate cetyl acrylate, cetyl methacrylate, phenol methacrylate, N-isopropyl acrylamide, acrylamide, N-t-butyl acrylamide, styrene and styrene sulfonic acid.
9. A process as claimed in claim 6, wherein the vinyl monomer with multiple unsaturation is selected from the group consisting of diacrylates, dimethacrylates, tri or tetra acrylates or methacrylates comprising ethylene glycol dimethacrylate, trimethylol propane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, bisphenol A dimethacrylate, glycerol dimethacrylate, glycerol diacrylate, vinyl methacrylate, vinyl acrylate, trimethylol propane triacrylate, pentaerythritol tetraacrylate or aromatic divinyl compounds.
10. A process as claimed in claim 6, wherein the aromatic divinyl compound is divinyl benzene.
11. A process as claimed in claim 6 wherein in step (a), the solvent used is polar aprotic solvent.
12. A process as claimed in claim 11, wherein the polar aprotic solvent used is selected from the group comprising of N, N dimethyl formamide, N, N dimethyl acetamide, dimethyl sulfoxide and water.
13. A process as claimed in claim 6 wherein in step (a), the free radical initiator used is a thermal initiator or a photosensitive initiator.
14. A process as claimed in claim 13, wherein the thermal initiator is selected from the group comprising of azo initiators, peroxide type initiators and redox type initiators.
15. A process as claimed in claim 14, wherein the azo initiator use is azobisobutyronitrile.
16. A process as claimed in claim 14, wherein the peroxide initiator used is selected from benzoylperoxide and t-butyl hydroperoxide.
17. A process as claimed in claim 14, wherein the redox initiator used is potassium persulphate and ammonium persulphate.
18. A process as claimed in claim 13, wherein the photosensitive initiator is selected from the group comprising of cumene hydroperoxide, benzoin ethyl ether, 2,2-dimethoxy-2-phenyl acetophenone, 1-hydroxy cyclohexyl-1-phenyl ketone (Irgacure-184), bis(2,4,6-trimethyl benzoyl)phenyl phosphine (Irgacure-819).
19. A process of preparation of a crosslinked polymer from the soluble copolymers of claim 1, the said process comprising the steps of:
a. dissolving soluble copolymer of claim 1 in a solvent along with a free radical initiator, and
b. heating or irradiating the mixture of step (a) to obtain the cross linked polymer.
20. A process as claimed in claim 19, wherein in step (a) the free radical initiator used is a thermal initiator or a photo initiator.
21. A process as claimed in claim 19, wherein the thermal initiator is selected from the group comprising of azo initiators and peroxide type initiators.
22. A process as claimed in claim 21, wherein the azo initiator used is azobisbutyronitrile.
23. A process as claimed in claim 21, wherein the peroxide initiator used is selected from benzoylperoxide and t-butyl hydroperoxide.
24. A process as claimed in claim 19, wherein the photo initiator is selected from the group comprising of cumene hydroperoxide, benzoin ethyl ether, 2,2-diethoxy-2-phenyl acetophenone, 1-hydroxy cyclohexyl-1-phenyl ketone (Irgacure-184), bis(2,4,6-trimethyl benzoyl)phenyl phosphine.
25. A process as claimed in claim 19 wherein in step (b), the reaction mixture is heated upto temperature in the range of 40 to 80\xb0 C. under inert atmosphere to obtain the cross-linked polymer.