Author: claimsbot

1. An ophthalmologic apparatus including an optical system configured to acquire an image of an eye to be inspected, the ophthalmologic apparatus comprising:
a photographing mode selecting unit configured to select one of (a) an anterior segment photographing mode for photographing, by using the optical system, an anterior segment of the eye to be inspected, and (b) a fundus photographing mode for photographing, by using the optical system, a fundus of the eye to be inspected;
a moving unit configured to move an optical unit including the optical system, with respect to the eye to be inspected; and
an area changing unit configured to change a movement area of the optical unit in a case where the anterior segment photographing mode is selected to be smaller than a movement area in a case where the fundus photographing mode is selected.
2. An ophthalmologic apparatus according to claim 1, wherein the anterior segment photographing mode is a mode for photographing a tomographic image of the anterior ocular segment by using the optical system, and
wherein the fundus photographing mode is a mode for photographing a tomographic image of the fundus by using the optical system.
3. An ophthalmologic apparatus according to claim 1, further comprising:
a first objective lens disposed in the optical path of the optical system; and
a determining unit configured to determine whether or not a second objective lens which is an objective lens for an anterior segment exists in the optical path on a side closer to the eye to be inspected than the first objective lens,
wherein, in a case where it is determined that the anterior segment photographing mode is selected and that the second objective lens exists, the area changing unit changes the movement area of the optical unit.
4. An ophthalmologic apparatus according to claim 3, wherein the determining unit determines whether a barrel unit having the second objective lens is attached in or detached from the optical path on the side closer to the eye to be inspected than the first objective lens.
5. An ophthalmologic apparatus according to claim 3, wherein the second objective lens for an anterior segment can be inserted and removed, and
wherein the determining unit determines whether the second objective lens is inserted in or removed from the optical path on the side closer to the eye to be inspected than the first objective lens.
6. An ophthalmologic apparatus according to claim 1, further comprising a control unit configured to control the moving unit so that the optical unit moves in a direction away from the eye to be inspected in a case where the anterior segment photographing mode is selected.
7. A method of controlling an ophthalmologic apparatus including an optical system for acquiring an image of an eye to be inspected, the method comprising the steps of:
selecting one of (a) an anterior segment photographing mode for photographing, by using the optical system, an anterior segment of the eye to be inspected, and (b) a fundus photographing mode for photographing, by using the optical system, a fundus of the eye to be inspected;
changing a movement area of an optical unit including the optical system in a case where the anterior segment photographing mode for photographing an anterior segment of the eye to be inspected is selected to be smaller than a movement area in a case where the fundus photographing mode is selected.
8. A method of controlling an ophthalmologic apparatus according to claim 7, wherein the anterior segment photographing mode is a mode for photographing a tomographic image of the anterior ocular segment by using the optical system, and
wherein the fundus photographing mode is a mode for photographing a tomographic image of the fundus by using the optical system.
9. A method of controlling an ophthalmologic apparatus according to claim 7, further comprising a step of determining whether or not a second objective lens which is an objective lens for an anterior segment exists in an optical path on a side closer to the eye to be inspected than a first objective lens disposed in an optical path of the optical system,
wherein the step of changing includes changing the movement area of the optical unit in a case where it is determined that (a) the anterior segment photographing mode is selected and (b) the second objective lens exists.
10. A non-transitory tangible medium storing a program for causing a computer to perform each step of the method of controlling an ophthalmologic apparatus according to claim 7.
11. An ophthalmologic apparatus according to claim 1, further comprising:
a first objective lens disposed in the optical path of the optical system;
a determining unit configured to determine whether or not a second objective lens which is an objective lens for an anterior segment exists in the optical path on a side closer to the eye to be inspected than the first objective lens; and
an acquiring instruction control unit configured to determine whether an acquiring instruction for instructing an image acquisition is enabled or not based on a determination result of the determining unit, in a case where the anterior segment photographing mode is selected by the photographing mode selecting unit.
12. An ophthalmologic apparatus according to claim 11, wherein the acquiring instruction control unit does not enable the acquiring instruction for instructing the image acquisition, in a case where the determining unit determines that the second objective lens does not exist in the optical path on a side closer to the eye to be inspected than the first objective lens.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

What is claimed is:

1. A computer controlled display system for tracking the development of complex software products having a plurality of developmental lines comprising:
means for setting in each of said plurality of developmental lines, a sequence of checkpoints;
means for tracking each of said developmental lines to determine the reached checkpoints; and
means for displaying said plurality of developmental lines and indicating said reached checkpoints.
2. The computer controlled display system of claim 1 further including:
means for modifying said developmental lines and said checkpoints; and
means for displaying said modifications.
3. The computer controlled display system of claim 2 further including means for displaying at each of said checkpoints, a set of developmental attributes for said checkpoint.
4. The computer controlled display system of claim 3 further including:
means for modifying said developmental attributes for each of said checkpoints; and
means for displaying said modifications at each of said checkpoints.
5. The computer controlled display system of claim 3 wherein said developmental attributes include actions performed in said software product development.
6. The computer controlled display system of claim 5 wherein said means for modifying said actions switch said actions to other of said developmental lines.
7. The computer controlled display system of claim 2 wherein:
said means for tracking are remote from said means for displaying,
and said system further includes:
means for storing, in association with said means for displaying, the data tracked by said means for tracking; and
means for communicating the data tracked to said means for storing.
8. A method for tracking the development of complex software products having a plurality of developmental lines on a computer controlled display comprising:
setting in each of said plurality of developmental lines, a sequence of checkpoints;
tracking each of said developmental lines to determine the reached checkpoints; and
displaying said plurality of developmental lines and indicating said reached checkpoints.
9. The method for tracking of claim 8 further including the steps of:
modifying said developmental lines and said checkpoints; and
displaying said modifications.
10. The method for tracking of claim 9 further including the step of displaying at each of said checkpoints, a set of developmental attributes for said checkpoint.
11. The method for tracking of claim 10 further including the steps of:
modifying said developmental attributes of a plurality of said checkpoints; and
displaying said modifications at each of said modified checkpoints.
12. The method for tracking of claim 10 wherein said developmental attributes include actions performed in said software product development.
13. The method for tracking of claim 12 wherein said step of modifying said actions switches said actions to other of said developmental lines.
14. The method for tracking of claim 9 wherein:
said step of tracking is carried out remote from said displaying step,
and further including the steps of:
storing, in association with said displaying step, the data tracked in said tracking step; and
communicating the data tracked to said storing step.
15. A computer program having code recorded on a computer readable medium for tracking, on a computer controlled display, the development of complex software products having a plurality of developmental lines comprising:
means for setting in each of said plurality of developmental lines, a sequence of checkpoints;
means for tracking each of said developmental lines to determine the reached checkpoints; and
means for displaying said plurality of developmental lines and indicating said reached checkpoints.
16. The computer program of claim 15 further including:
means for modifying said developmental lines and said checkpoints; and
means for displaying said modifications.
17. The computer program of claim 16 further including means for displaying at each of said checkpoints, a set of developmental attributes for said checkpoint.
18. The computer program of claim 17 further including:
means for modifying said developmental attributes for each of said checkpoints; and
means for displaying said modifications at each of said checkpoints.
19. The computer program of claim 17 wherein said developmental attributes include actions performed in said software product development.
20. The computer program of claim 19 wherein said means for modifying said actions switch said actions to other of said developmental lines.
21. The computer program of claim 16 wherein:
said means for tracking are remote from said means for displaying,
and said system further includes:
means for storing, in association with said means for displaying, the data tracked by said means for tracking; and
means for communicating the data tracked to said means for storing.
22. A computer controlled display system for tracking the building of a program product from a functional implementation stage to a complete integrated program product comprising:
a plurality of developmental lines respectively corresponding to each of a plurality of program components to be integrated into said complete program product;
means for setting in each of said plurality of developmental lines, a sequence of checkpoints;
means for tracking each of said developmental lines to determine the reached checkpoints; and
means for displaying said plurality of developmental lines and indicating said reached checkpoints.
23. The computer controlled display system of claim 22 further including means for displaying at each of said checkpoints, a set of attributes for said checkpoint related to the compatibility functions of said checkpoint line.
24. The computer controlled display system of claim 23 further including:
means for modifying said attributes for each of said checkpoints; and
means for displaying said modifications at each of said checkpoints.
25. A method for tracking, on a computer controlled display, the building of a program product from a functional implementation stage to a complete integrated program product comprising:
setting up a plurality of developmental lines respectively corresponding to each of a plurality of program components to be integrated into said complete program product;
setting up in each of said plurality of developmental lines, a sequence of checkpoints;
tracking each of said developmental lines to determine the reached checkpoints; and
displaying said plurality of developmental lines and indicating said reached checkpoints.
26. The method for tracking of claim 25 further including the step of displaying at each of said checkpoints, a set of attributes for said checkpoint related to the compatibility functions of said checkpoint line.
27. The method for tracking of claim 26 further including the steps of:
modifying said attributes for each of said checkpoints; and
displaying said modifications at each of said checkpoints.
28. A computer program having code recorded on a computer readable medium for tracking, on a computer controlled display, the building of a program product from a functional implementation stage to a complete integrated program product comprising:
means for tracking a plurality of developmental lines respectively corresponding to each of a plurality of program components to be integrated into said complete program product;
means for setting in each of said plurality of developmental lines, a sequence of checkpoints;
means for determining the reached checkpoints in each of said plurality of developmental lines; and
means for displaying said plurality of developmental lines and indicating said reached checkpoints.
29. The computer program of claim 28 further including means for displaying at each of said checkpoints, a set of attributes for said checkpoint related to the compatibility functions of said checkpoint line.
30. The computer program of claim 29 further including:
means for modifying said attributes for each of said checkpoints; and
means for displaying said modifications at each of said checkpoints.

1. A circuit comprising:
a radio frequency (RF) switching device having a gate terminal, the RF switching device configured to receive an RF input signal and to pass an RF output signal if the RF switching device is activated;
a gate resistor coupled between the gate terminal and a control terminal, the control terminal configured to receive a control signal to activate the RF switching device; and
a helper circuit coupled in parallel with the gate resistor, the helper circuit configured to provide a temporary conductive path between the control terminal and the gate terminal in response to a state transition of the control signal, wherein the helper circuit includes:
a helper switching device coupled in parallel with the gate resistor, the helper switching device having a helper gate terminal;
a coupling capacitor coupled between the helper gate terminal and the control terminal to turn on the helper switching device in response to the state transition of the control signal; and
a discharge resistor coupled between the helper gate terminal and the gate terminal of the RF switching device to turn off the helper switching device when a voltage at the gate terminal is equal to a voltage at the control terminal.
2. The circuit of claim 1, wherein the helper circuit comprises an open circuit between the control terminal and the gate terminal of the RF switching device during a steady state of the control signal between state transitions.
3. The circuit of claim 1, wherein the RF switching device and the helper switching device comprise field-effect transistors.
4. The circuit of claim 1, wherein dimensions of the helper switching device are smaller than corresponding dimensions of the RF switching device by a factor of ten or more.
5. The circuit of claim 1, wherein the helper switching device is an enhancement type device.
6. The circuit of claim 1, wherein the gate terminal is a first gate terminal, the gate resistor is a first gate resistor, and the helper circuit is a first helper circuit, and wherein the RF switching device further includes a second gate terminal, and wherein the circuit further includes:
a second gate resistor coupled between the second gate terminal and the control terminal; and
a second helper circuit coupled in parallel with the second gate resistor, the second helper circuit configured to provide a conductive path between the control terminal and the second gate terminal in response to the state transition of the control signal.
7. The circuit of claim 6, wherein the helper switching device of the first helper circuit is a first helper switching device, wherein the helper gate terminal of the first helper switching device is a first helper gate terminal, wherein the first helper switching device further includes a second helper gate terminal, and wherein the first helper circuit further includes:
a first helper gate resistor coupled between the first helper gate terminal and a first node;
a second helper gate resistor coupled between the second helper gate terminal and the first node;
wherein the coupling capacitor is coupled between the first node and the control terminal; and
wherein the discharge resistor is coupled between the first node and the first gate terminal of the RF switching device.
8. The circuit of claim 7, wherein the first helper switching device further includes a helper drain terminal and a helper source terminal, and wherein the first helper circuit further includes a first feed-forward capacitor coupled between the first helper gate terminal and the helper drain terminal and a second feed-forward capacitor coupled between the second helper gate terminal and the helper source terminal.
9. A radio frequency (RF) switching apparatus, comprising:
an RF transistor having a gate terminal, a drain terminal and a source terminal, the RF transistor configured to receive an RF input signal at the drain terminal and to pass an RF output signal to the source terminal if the RF transistor is activated;
a gate resistor coupled between the gate terminal and a control terminal, the control terminal configured to receive a control signal to activate the RF transistor;
a helper transistor coupled in parallel with the gate resistor, the helper transistor having a helper gate terminal, a helper drain terminal, and a helper source terminal;
a coupling capacitor coupled between the helper gate terminal and the control terminal; and
a discharge resistor coupled between the helper gate terminal and the gate terminal of the RF transistor
wherein the coupling capacitor is configured to turn on the helper transistor in response to a state transition of the control signal to provide a conductive path between the control terminal and the gate terminal of the RF transistor; and
wherein the discharge resistor is configured to turn off the helper transistor when a voltage at the gate terminal is equal to a voltage at the control terminal.
10. The RF switching apparatus of claim 9, wherein the helper transistor comprises an open circuit between the control terminal and the gate terminal of the RF transistor during a steady state of the control signal between state transitions.
11. The RF switching apparatus of claim 9, wherein the helper gate terminal is a first helper gate terminal, wherein the helper transistor further comprises a second helper gate terminal, and wherein the apparatus further includes:
a first helper gate resistor coupled with the first helper gate terminal; and
a second helper gate resistor coupled with the second helper gate terminal.
12. The RF switching apparatus of claim 11, wherein the helper transistor, the coupling capacitor, the discharge resistor, and the first and second helper gate resistors are included in a first helper circuit, wherein the gate terminal is a first gate terminal, the gate resistor is a first gate resistor, and the RF transistor further comprises a second gate terminal, and wherein the apparatus further comprises:
a second gate resistor coupled between the second gate terminal and the control terminal; and
a second helper circuit coupled in parallel with the second gate resistor.
13. The RF switching apparatus of claim 11, wherein the RF transistor further includes a helper drain terminal and a helper source terminal, and wherein the apparatus further comprises a first feed-forward capacitor coupled between the first helper gate terminal and the helper drain terminal and a second feed-forward capacitor coupled between the second helper gate terminal and the helper source terminal.
14. The RF switching apparatus of claim 9, wherein the helper transistor is an enhancement type field-effect transistor.
15. A system, comprising:
a radio frequency (RF) power amplifier configured to amplify an RF signal; and
an RF switching module coupled with the RF power amplifier, the RF switching module including:
a radio frequency (RF) transistor having a gate terminal, an input terminal, and an output terminal, the RF transistor configured to receive the RF signal at the input terminal and to selectively pass the RF signal to the output terminal if the RF transistor is activated;
a control terminal configured to receive a control signal to activate the RF transistor;
a gate resistor coupled between the gate terminal and the control terminal; and

a helper circuit coupled in parallel with the gate resistor, the helper circuit configured to provide a temporary conductive path between the control terminal and the gate terminal in response to a state transition of the control signal, wherein the helper circuit includes:
a helper switching device coupled in parallel with the gate resistor, the helper switching device having a helper gate terminal;
a coupling capacitor coupled between the helper gate terminal and the control terminal to turn on the helper switching device in response to the state transition of the control signal; and
a discharge resistor coupled between the helper gate terminal and the gate terminal of the RF switching device to turn off the helper switching device when a voltage at the gate terminal is equal to a voltage at the control terminal.
16. The system of claim 15, wherein the gate terminal is a first gate terminal, the gate resistor is a first gate resistor, and the helper circuit is a first helper circuit, wherein the RF transistor further includes a second gate terminal, and wherein the system further includes:
a second gate resistor coupled between the second gate terminal and the control terminal; and
a second helper circuit coupled in parallel with the second gate resistor, the second helper circuit configured to provide a conductive path between the control terminal and the second gate terminal in response to the state transition of the control signal.
17. The circuit of claim 16, wherein the helper gate terminal is a first helper gate terminal, wherein the helper transistor further includes a second helper gate terminal, and wherein the first helper circuit further includes:
a first helper gate resistor coupled with the first helper gate terminal; and
a second helper gate resistor coupled with the second helper gate terminal.
18. The circuit of claim 16, further comprising a shunt capacitor coupled with the output terminal of the RF switching transistor, wherein RF transistor is configured to receive the amplified RF signal at the input terminal and to pass the amplified RF signal to the shunt capacitor if the RF transistor is activated.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of forming a dual damascene wiring pattern, comprising the steps of:
forming an etch stop film and an interlayer dielectric film comprising an SiOC:H group material on a substrate having an electrical connection layer formed thereon;
forming an anti-reflection layer on the interlayer dielectric film;
forming a primary opening by etching the anti-reflection layer and the interlayer dielectric film to expose a surface of the etch stop film;
forming a sacrificial film comprising a low dielectric constant material in the primary opening and on the anti-reflection layer;
plasma-processing the sacrificial film to densify the sacrificial film;
forming a trench photoresist pattern having a width larger than that of the primary opening on the sacrificial film after plasma-processing the sacrificial film;
sequentially etching the sacrificial film, the anti-reflection layer and the interlayer dielectric film using the trench photoresist pattern as an etch mask so as to form a secondary opening of a trench shape, and removing the trench photoresist pattern, said secondary opening extending from an upper portion of the primary opening; and
removing the sacrificial film remaining, removing the exposed etch stop film and anti-reflection layer, and filling the primary and secondary openings with metal so as to be electrically coupled with the electrical connection layer.
2. The method of claim 1, wherein said step of removing the sacrificial film is performed by a dry etch back process.
3. The method of claim 1, wherein said electrical connection layer comprises copper.
4. The method of claim 1, wherein said sacrificial film comprises hydrogen silsesquioxane(HSQ).
5. The method of claim 1, wherein said sacrificial film comprises methyl silsesquioxane(MSQ) MSQ.
6. The method of claim 1, wherein said sacrificial film comprises benzocyclobutene.
7. The method of claim 1, wherein plasma-processing said sacrificial film is performed by using, as plasma source gas, a mixed gas comprising at least one of oxygen, nitrogen, ammonia, helium and hydrogen.
8. The method of claim 1, wherein said etch stop film comprises SiC or SiN.
9. The method of claim 1, wherein said anti-reflection layer comprises SiC or SiON.
10. A method of forming a dual damascene wiring pattern, comprising the steps of:
forming an etch stop film and an interlayer dielectric film comprising an SiOC:H group material on a substrate having an electrical connection layer formed thereon;
forming an anti-reflection layer on the interlayer dielectric film;
forming a primary opening by etching the anti-reflection layer and the interlayer dielectric film to expose a surface of the etch stop film;
forming a sacrificial film comprising a low dielectric constant material in the primary opening and on the anti-reflection layer;
forming a capping thin film on a portion of the sacrificial film that is over the anti-reflection layer, and forming a trench photoresist pattern having a width larger than that of the primary opening on the capping thin film;
sequentially etching the capping thin film, the sacrificial film, the anti-reflection layer and the interlayer dielectric film using the trench photoresist pattern as an etch mask so as to form a secondary opening of a trench shape, and removing the trench photoresist pattern, said secondary opening extending from an upper portion of the primary opening; and
removing the remaining capping thin film and the remaining sacrificial film, removing the exposed etch stop film and anti-reflection layer, and filling the primary and secondary openings with metal so as to be electrically coupled with the electrical connection layer.
11. The method of claim 10, wherein the step of removing the sacrificial film is performed by a dry or wet etch back process.
12. The method of claim 10, wherein said capping thin film comprises an oxide film or an inorganic reflection preventing film.
13. The method of claim 10, wherein the sacrificial film comprises hydrogen silsesquioxane(HSQ).
14. A method of forming a dual damascene wiring pattern, comprising the steps of:
forming an etch stop film and an interlayer dielectric film comprising an SiOC:H group material on a substrate having an electrical connection layer formed thereon;
forming an anti-reflection layer on the interlayer dielectric film;
forming a primary opening by etching the anti-reflection layer and the interlayer dielectric film to expose a surface of the etch stop film;
forming a sacrificial film comprising a low dielectric constant material in the primary opening and on the anti-reflection layer;
forming an anti-reflection coating film on a portion of the sacrificial film that is over the anti-reflection layer, and forming a trench photoresist pattern having a width larger than that of the primary opening on the anti-reflection coating film;
sequentially etching the anti-reflection coating film, the sacrificial film, the anti-reflection layer and the interlayer dielectric film using the trench photoresist pattern as an etch mask so as to form a secondary opening of a trench shape, and removing the trench photoresist pattern, said secondary opening extending from an upper portion of the primary opening; and
removing the remaining anti-reflection coating film and the remaining sacrificial film, removing the exposed etch stop film and anti-reflection layer, and filling the primary and secondary openings with metal so as to be electrically coupled with the electrical connection layer.
15. The method of claim 14, wherein said step of removing the sacrificial film is performed by a dry or wet etch back process.
16. The method of claim 14, wherein said electrical connection layer comprises copper.
17. The method of claim 14, wherein said sacrificial film comprises hydrogen silsesquioxane(HSQ).
18. The method of claim 14, wherein said anti-reflection coating film comprises an organic coating thin film.