1. A transistor comprising:
a semiconductor die;
a plurality of transistor segments organized into a plurality of sections, the sections being arranged substantially across the semiconductor die, each section being substantially square, each transistor segment having a racetrack shape with a length and a width, each transistor segment including:
a pillar that includes an extended drain region that extends in a vertical direction through the semiconductor die;
first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar;
first and second field plates respectively disposed in the first and second dielectric regions, the first and second field plates being fully insulated from the extended drain region, the first field plate being laterally surrounded by the pillar, and the second field plate laterally surrounding the pillar;
wherein a first section comprises transistor segments arranged in a side-by-side relationship with the length oriented in a first lateral direction, and a second section comprises transistor segments arranged in the side-by-side relationship with the length oriented in a second lateral direction substantially orthogonal to the first direction, the first section being disposed adjacent the second section.
2. The transistor of claim 1 wherein the pillar further comprises a source region disposed near a top surface of the semiconductor die, and a body region that vertically separates the source region from the extended drain region.
3. The transistor of claim 1 further comprising a gate disposed within the first and second dielectric regions adjacent the body region, the gate being insulated from the body region and the first and second field plates.
4. The transistor of claim 1 wherein the length is at least 20 times greater than the width.
5. The transistor of claim 1 wherein a fourth section comprises transistor segments arranged in the side-by-side relationship with the length oriented in the first lateral direction, and a third section comprises transistor segments arranged in the side-by-side relationship with the length oriented in the second lateral direction, the first section being disposed adjacent the second section in the second lateral direction and adjacent the third section in the first lateral direction, the fourth section being disposed adjacent the second section in the first lateral direction and adjacent the third section in the second lateral direction.
6. The transistor of claim 1 wherein a ratio of the length to the width of the transistor segments in the first and second sections is in a range of about 30 to 80.
7. The transistor of claim 1 wherein the plurality of sections comprise 2N sections, where N is an integer greater than or equal to one.
8. A transistor comprising:
a semiconductor die;
a plurality of transistor segments organized into a plurality of sections, each transistor segment having a length and a width, the length being at least 20 times greater than the width, each transistor segment including:
a pillar of a semiconductor material, the pillar including an extended drain region that extends in a vertical direction through the die;
first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar;
first and second field plates respectively disposed in the first and second dielectric regions, the first and second field plates being fully insulated from the extended drain region, the first field plate being laterally surrounded by the pillar, and the second field plate laterally surrounding the pillar;
the sections being arranged in rows and columns substantially across the semiconductor die, adjacent sections in a row or a column being oriented such that the length of the transistor segments in a first one of the adjacent sections extends in a first direction, and the length of the transistor segments in a second one of the adjacent sections extends in a second direction, the first direction being substantially orthogonal to the second direction.
9. The transistor of claim 8 wherein the pillar further comprises a source region disposed near a top surface of the semiconductor die, and a body region that vertically separates the source region from the extended drain region.
10. The transistor of claim 9 further comprising a trench gate structure that includes first and second gate members respectively disposed in the first and second dielectric regions near a top of the pillar adjacent the body region.
11. The transistor of claim 8 wherein the pillar extends in the first and second lateral directions to form a racetrack-shaped ring or oval.
12. The transistor of claim 8 wherein a ratio of the length to the width of the transistor segments in the first and second sections is in a range of about 30 to 80.
13. The transistor of claim 8 wherein the plurality of sections comprise 2N sections, where N is an integer greater than or equal to one.
14. A semiconductor wafer comprising:
a substrate;
a plurality of die arranged on the substrate in rows and columns, each die including a transistor having a plurality of transistor segments, each transistor segment having a length that extends substantially across the die and a width, the transistor segments of each die being arranged in a side-by-side relationship along the width substantially across the die, each transistor segment including:
a pillar of a semiconductor material, the pillar including a source region disposed near a top surface of the die, and an extended drain region that extends in a vertical direction through the substrate, the pillar extending in the first and second lateral directions to form a racetrack-shaped ring or oval;
first and second dielectric regions disposed on opposite sides of the pillar, respectively, the first dielectric region being laterally surrounded by the pillar, and the second dielectric region laterally surrounding the pillar;
first and second field plates respectively disposed in the first and second dielectric regions, the first and second field plates being fully insulated from the extended drain region, the first field plate being laterally surrounded by the pillar, and the second field plate laterally surrounding the pillar;
adjacent die in a row or a column being oriented such that the length of the transistor segments in a first one of the adjacent die extends in a first direction and the length of the transistor segments in a second one of the adjacent die extends in a second direction, the first direction being substantially orthogonal to the second direction.
15. The semiconductor wafer of claim 14 wherein each transistor segment further comprises a body region that vertically separates the source and extended drain regions.
16. The semiconductor wafer of claim 15 further comprising a trench gate structure that includes first and second gate members respectively disposed in the first and second dielectric regions near a top of the pillar adjacent the body region.
17. The semiconductor wafer of claim 15 wherein a ratio of the length to the width of the transistor segments is in a range of about 50 to 150.
18. The semiconductor wafer of claim 15 wherein each of the plurality of die are substantially square.
19. The semiconductor wafer of claim 15 wherein each of the plurality of die are substantially identical.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A height adjustment device comprising:
a first chassis having an adjustment hole,
an adjustment screw that stands when threadedly engaged with the adjustment hole in the first chassis,
a second chassis locked by the adjustment screw so as to have a preset separation distance from the first chassis, and
biasing means for biasing the first chassis and the second chassis in the direction of attaining separation therebetween, wherein
the adjustment screw has a tip portion for forming a female thread in the adjustment hole when rotated and inserted into the adjustment hole, a threaded portion having a male thread threadedly engaged with the female thread formed by the tip portion, and a head portion for locking the second chassis against the direction of biasing by the biasing means, in a nearly linear state, and
the distance between the end of the head portion of the adjustment screw on the male thread side and the end of the tip portion on the male thread side is made larger than the sum of the length of the inside diameter portion of the adjustment hole in which the female thread is formed, the maximum value of the distance between the first chassis and the second chassis and the thickness of the second chassis.
2. The height adjustment device in accordance with claim 1, wherein the adjustment hole in the first chassis has a small diameter portion in which the female thread is formed and a large diameter portion having a diameter larger than the outside diameter of the tip portion of the adjustment screw, and the adjustment screw is inserted from the side of the small diameter portion to the side of the large diameter portion.
3. The height adjustment device in accordance with claim 1, wherein the threaded portion of the adjustment screw has the same pitch as that of the tip portion and is provided with thread ridges, the diameter of which is smaller than that of the tip portion.