Author: claimsbot

1. A method for producing a modified conjugated diene-based polymer, wherein the method comprises:
a first step of producing a conjugated diene-based polymer by polymerizing monomers comprising a conjugated diene compound in a hydrocarbon solvent using an organoalkali metal compound and
a second step of adding (I) a compound having a carbonyl group and a substituted amino group and (II) a compound represented by Formula (II-A) to a hydrocarbon solvent containing the conjugated diene-based polymer:
wherein k, l and m are each an integer of 1 to 8; R1, R2, R3, R11, R12, R13, R14, R15, and R16 are each independently a hydrocarbyloxy group or a hydrocarbyl group; at least one group selected from among R1, R2 and R3 is a hydrocarbyloxy group; at least one group selected from among R11, R12 and R13 is a hydrocarbyloxy group; and at least one group selected from among R14, R15 and R16 is a hydrocarbyloxy group.
2. The method according to claim 1, wherein the compound (I) is a compound represented by Formula (I-A):
wherein R4 is an optionally substituted hydrocarbyl group, a hydrocarbylene group which may have a nitrogen andor an oxygen atom where R4 is combined with R5, or a divalent group where R4 is combined with R7; R5 is an optionally substituted hydrocarbyl group or a hydrocarbylene group which may have a nitrogen andor an oxygen atom where R5 is combined with R4; R7 is an optionally substituted hydrocarbyl group, a hydrogen atom or a divalent group where R7 is combined with R4; and R6 is a divalent group; p is 0 or 1.
3. The method according to claim 1, wherein in the second step, the compound (I) is added to the solvent and then the compound (II) is added to the solvent.
4. The method according to claim 1, wherein the amount of the compound (I) to be added to the solvent per mol of the organoalkali metal compound to be used is from 0.01 to 0.9 mol, and the amount of the compound (II) to be added to the solvent per mol of the organoalkali metal compound to be used is from 0.01 to 0.9 mol.
5. A method for producing a vulcanizable polymer, the method comprising kneading a modified conjugated diene-based polymer produced by the method according to claim 1, and a vulcanizing agent in an amount of from 0.1 to 15 parts by weight per 100 parts by weight of the modified conjugated diene-based polymer.
6. The method according to claim 5, wherein a reinforcing agent in an amount of from 10 to 150 parts by weight per 100 parts by weight of the modified conjugated diene-based polymer is kneaded together with the modified conjugated diene-based polymer and the vulcanizing agent.
7. A method for producing a vulcanized polymer, the method comprising heating a vulcanizable polymer produced by the method according to claim 5.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for notifying a user of an event indicated by aggregated data relating to a status of activities, wherein the aggregated data is stored in a plurality of independently managed applications, said method comprising:
identifying an event relating to the aggregated data;
collecting the aggregated data relating to the identified event;
registering a threshold for the identified event; and
notifying the user when the collected data indicates that the event exceeds the registered threshold.
2. The method of claim 1 further comprising notifying the user of the identified event as a function of the aggregated data of the identified event, the threshold and a past event.
3. The method of claim 1 wherein the aggregated data includes multi-dimensional aggregation data and wherein collecting comprises collecting the multi-dimensional aggregation data.
4. The method of claim 1 further comprising maintaining a subscription of a plurality of users each having an identified event and a corresponding threshold.
5. The method of claim 1 wherein the event is a function of a status of activities.
6. The method of claim 1 wherein collecting comprises collecting the aggregated data over a period of time to identify the event.
7. The method of claim 1 wherein identifying comprises identifying an event relating to the aggregated data by an user via a user interface (UI).
8. The method of claim 1 wherein one or more computer-readable media have computer-executable instructions for performing the method recited in claim 1.
9. A system for notifying a user of an event indicated by aggregated data relating to a status of activities, wherein the aggregated data is stored in a plurality of independently managed applications, said system comprising:
an interface for receiving from the user an identification of an event relating to the aggregated data, wherein said interface receives from the user a threshold for the identified event;
an aggregation component for collecting the aggregated data relating to the identified event; and
a notifying component for notifying the user when the aggregated data collected by the aggregation component indicates that the threshold is satisfied.
10. The system of claim 9 further comprising a chronicle for recording values of past events and wherein the notifying component notifies the user of the identified event as a function of the recorded values in the chronicle, aggregated data relating to the identified event and the threshold.
11. The system of claim 9 wherein the aggregated data includes multi-dimensional aggregation data and wherein the aggregation component collects the multi-dimensional aggregation data.
12. The system of claim 9 further comprising a subscription for recording a plurality of users each having an identified event and a corresponding threshold.
13. The system of claim 9 wherein the event is a function of a status of activities.
14. The system of claim 9 wherein the aggregation component collects the aggregation data over a period of time for the identified event identified by the identification component.
15. One or more computer-readable media having computer-executable components for notifying a user of an event indicated by aggregated data relating to a status of activities, wherein the aggregated data is stored in a plurality of independently managed applications, said components comprising:
an interface for receiving from the user an identification of an event relating to the aggregated data, wherein said interface receives from the user a threshold for the identified event;
an aggregation component for collecting the aggregated data relating to the identified event; and
a notifying component for notifying the user when the aggregated data collected by the aggregation component indicates that the threshold is satisfied.
16. The computer-readable media of claim 15 further comprising a chronicle for recording values of past events and wherein the notifying component notifies the user of the identified event as a function of the recorded values in the chronicle, aggregated data relating to the identified event and the threshold.
17. The computer-readable media of claim 15 wherein the aggregated data includes multi-dimensional aggregation data and wherein the aggregation component collects the multi-dimensional aggregation data.
18. The computer-readable media of claim 15 further comprising a subscription for recording a plurality of users each having an identified event and a corresponding threshold.
19. The computer-readable media of claim 15 wherein the event is a function of a status of activities.
20. The computer-readable media of claim 15 wherein the aggregation component collects the aggregated data over a period of time for the identified event identified by the identification component.

1. A method for reducing the switching noise of an electromagnetic switching device including a coil drivable by a supply voltage, and an armature adapted to move moving switching contacts into contact with stationary switching contacts, the method comprising:
defining a first minimum value of the supply voltage, sufficient for at least moving the armature with the moving switching contacts;
using a drive unit to drive the coil, and hence the armature, with the moving switching contacts by the first minimum value of the supply voltage, at least until contact is made; and
increasing, as a function of time, the supply voltage from the first minimum value to a second minimum value, sufficient to move the switching contacts into sufficient mutual contact with the stationary switching contacts with pressure applied;
wherein the drive unit includes a switching element for driving a voltage limiter; and
wherein the switching element is an optocoupler.
2. A conveyor system adapted to perform the method of claim 1.
3. An elevator system, adapted to perform the method of claim 1.
4. An apparatus for reducing the switching noise of an electromagnetic switching device including a coil drivable by a supply voltage, and an armature adapted to move moving switching contacts into contact with stationary switching contacts, comprising:
a voltage control unit, adapted to fix the supply voltage, for moving the armature with the moving switching contacts, at least at a sufficient first minimum value; and
a drive unit, adapted to drive the coil with the first minimum value of the supply voltage at least until contact is made, wherein the supply voltage is then adapted to be increased via the voltage control unit, as a function of time, from the first minimum value to a second minimum value, sufficient to move the moving switching contacts into sufficient mutual contact
wherein the drive unit includes a switching element for driving a voltage limiter; and
wherein the switching element is an optocoupler. with the stationary switching contacts with pressure applied;
5. The apparatus as claimed in claim 4, wherein the drive unit includes a timer, adapted to determine a time for increasing the supply voltage from the first minimum value to the second minimum value.
6. The apparatus as claimed in claim 5, wherein the timer is an RC element.
7. The apparatus as claimed in claim 4, wherein the voltage control unit includes a switching element.
8. The apparatus as claimed in claim 4, wherein the drive unit includes the voltage limiter for limiting the supply voltage to the first minimum value, for allowing the supply voltage to rise to the second minimum value and for driving an actuating element, arranged in the voltage control unit.
9. The apparatus as claimed in claim 8, wherein the actuating element is a part of the voltage control unit for driving the coil.
10. The apparatus as claimed in claim 8, wherein the drive unit includes a reset element for resetting a timer when the supply voltage is switched off.
11. The apparatus as claimed in claim 4, wherein the voltage limiter is a part of the voltage control unit.
12. The apparatus as claimed in claim 4, wherein the drive unit includes a reset element for resetting a timer when the supply voltage is switched off.
13. The apparatus as claimed in claim 4, wherein the switching relationship between the drive unit and the voltage control unit is formed via a switching element.
14. A conveyor system including the apparatus of claim 4.
15. An elevator system including the apparatus of claim 4.
16. An apparatus for reducing the switching noise of an electromagnetic switching device including a coil drivable by a supply voltage, and an armature adapted to move moving switching contacts into contact with stationary switching contacts, comprising:
voltage control means for fixing the supply voltage to at least at a sufficient first minimum value, sufficient to move the armature with the moving switching contacts; and
driving means for driving the coil with the first minimum value of the supply voltage at least until contact is made, wherein the supply voltage is then increased, as a function of time, via the voltage control means from the first minimum value to a second minimum value, sufficient to move the moving switching contacts into sufficient mutual contact with the stationary switching contacts with pressure applied;
wherein the driving means includes a switching element for driving a voltage limiter; and
wherein the switching element is an optocoupler.
17. The apparatus as claimed in claim 16, wherein the driving means includes a timer, adapted to determine a time for increasing the supply voltage from the first minimum value to the second minimum value.
18. The apparatus as claimed in claim 16, wherein the voltage control means includes a switching element.
19. A conveyor system including the apparatus of claim 16.
20. An elevator system including the apparatus of claim 16.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An electron beam exposure apparatus comprising:
a plurality of column cells arranged above a sample and configured to irradiate electron beams in parallel onto a surface of the sample;
an integrated controller configured to generate exposure data including an exposure position, an exposure pattern and an exposure time of each shot of the plurality of column cells;
a column cell control unit provided in each of the column cells and configured to control the column cell based on the exposure data;
a correction parameter storage unit provided in the integrated controller and configured to store a correction parameter for allowing a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells;
a reference exposure time storage unit provided in the integrated controller and configured to store reference exposure time required to form a predetermined reference pattern having a line width as designed in the reference column cell; and
an exposure time calculating unit provided in the integrated controller and configured to obtain exposure time of the correction target column cell by correcting the reference exposure time based on the correction parameter.
2. The electron beam exposure apparatus according to claim 1, wherein
the correction parameter includes a first correction parameter for correcting a slope of the relationship between the exposure intensity and the line width for the correction target column cell, and a second correction parameter for correcting the intercept of the relationship between the exposure intensity and the line width for the correction target column cell.
3. The electron beam exposure apparatus according to claim 2, wherein
the exposure time calculating unit obtains the exposure time of the correction target column cell by adding the second correction parameter to a value obtained by multiplying the reference exposure time by the first correction parameter.
4. The electron beam exposure apparatus according to any one of claims 1 to 3, wherein
the reference pattern is a pattern in which a distance between edges opposite to each other is larger than a range of blurs caused by scattering the corresponding electron beam.
5. The electron beam exposure apparatus according to claim 4, wherein
the exposure time calculating unit obtains exposure time required to expose an exposure target pattern in the reference column cell by multiplying a proximity effect correction coefficient by the reference exposure time, the proximity effect correction coefficient representing the ratio between exposure intensity required to obtain a line width as designed in the exposure target pattern and exposure intensity required to obtain a line width as designed in the reference pattern.
6. The electron beam exposure apparatus according to claim 5, wherein
the first and second correction parameters are expressed by functions of the proximity effect correction coefficient, and values of the first and second correction parameters are determined based on the proximity effect correction coefficient of the exposure target pattern.
7. The electron beam exposure apparatus according to claim 1, wherein
the correction parameter storage unit stores an auxiliary exposure intensity correction parameter for allowing a relationship between auxiliary exposure intensity and the line width for the correction target column cell to coincide with a relationship between auxiliary exposure intensity and the line width for the reference column cell, and
the exposure time calculating unit obtains auxiliary exposure time of the correction target column cell by correcting auxiliary exposure time of the reference column cell based on the auxiliary exposure intensity correction parameter.
8. An electron beam exposure method for exposing a plurality of patterns in parallel on a wafer by use of a plurality of column cells configured to irradiate electron beams, the method comprising the steps of:
obtaining a relationship between exposure intensity and a line width for each of the column cells by exposing a predetermined pattern in the column cell while changing exposure time, and measuring the line width of the pattern;
obtaining a correction parameter for allowing a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between a line width and exposure intensity for a reference column cell selected from among the plurality of column cells;
obtaining reference exposure time required to form a predetermined reference pattern having a line width as designed in the reference column cell;
calculating exposure time of the correction target column cell based on the correction parameter and the reference exposure time; and
performing exposure in the correction target column cell based on the exposure time of the correction target column cell.
9. The electron beam exposure method according to claim 8, wherein
the correction parameter includes a first correction parameter for correcting a slope of the relationship between the exposure intensity and the line width for the correction target column cell, and a second correction parameter for correcting the intercept of the relationship between the exposure intensity and the line width for the correction target column cell.
10. The electron beam exposure method according to claim 9, wherein
the exposure time of the correction target column cell is obtained by adding the second correction parameter to a value obtained by multiplying the reference exposure time by the first correction parameter.
11. The electron beam exposure method according to any one of claims 8 to 10, wherein
the reference pattern is a pattern in which a distance between edges opposite to each other is larger than a range of blurs caused by scattering of the corresponding electron beam.
12. The electron beam exposure method according to claim 11, wherein
exposure time required to expose an exposure target pattern in the reference column cell is obtained by multiplying a proximity effect correction coefficient by the reference exposure time, the proximity effect correction coefficient representing the ratio between exposure intensity required to obtain a line width as designed in the exposure target pattern and exposure intensity required to obtain a line width as designed in the reference pattern.
13. The electron beam exposure method according to claim 12, further comprising the steps of:
obtaining the first and second correction parameters for each of an isolated pattern and a dense pattern, and obtaining dependency of the first and second correction parameters on the proximity effect correction coefficient by linear interpolation; and
determining values of the first and second correction parameters based on a proximity effect correction coefficient of the exposure target pattern.
14. An electron beam exposure method for exposing a plurality of patterns in parallel on a wafer by use of a plurality of column cells configured to irradiate electron beams, and then performing auxiliary exposure to correct the influence of a proximity effect during the exposure, the method comprising the steps of:
obtaining a relationship between auxiliary exposure intensity and a line width for each of the column cells by performing auxiliary exposure on a pattern exposed in the column cell while changing auxiliary exposure time, and measuring a line width of the pattern;
obtaining a correction parameter for allowing a relationship between auxiliary exposure intensity and a line width for a correction target column cell to coincide with a relationship between auxiliary exposure intensity and a line width for a reference column cell selected from among the plurality of column cells;
calculating auxiliary exposure time of the correction target column cell by correcting auxiliary exposure time of the reference column cell based on the correction parameter; and
performing auxiliary exposure in the correction target column cell based on the auxiliary exposure time of the correction target column cell.