Author: claimsbot

1. A multi-mode thin film deposition apparatus, comprising:
a reaction chamber, having a first opening and a second opening penetrating through the reaction chamber, the first opening and the second opening having a same axial direction;
a carrying seat, disposed in the reaction chamber and suitable to carry a substrate;
a first gas inflow system, connected to the first opening and suitable to supply a first process gas during a first thin film deposition process mode;
a showerhead, having a gas mixing room and a plurality of gas holes, wherein the plurality of gas holes is disposed at a side of the reaction chamber and faces to the carrying seat, and the gas mixing room is connected to the reaction chamber through the plurality of gas holes;
an inert gas supplying source, connected to the gas mixing room of the showerhead and suitable to supply an inert gas which is non-reactive to the first process gas; and
a second gas inflow system, connected to the gas mixing room of the showerhead and suitable to supply a second process gas during a second thin film deposition process mode.
2. The multi-mode thin film deposition apparatus as claimed in claim 1, further comprising an elevating mechanism connected to the carrying seat and suitable to adjust the position of the carrying seat.
3. The multi-mode thin film deposition apparatus as claimed in claim 1, further comprising an air-extracting system connected to the second opening of the reaction chamber.
4. The multi-mode thin film deposition apparatus as claimed in claim 1, further comprising a first voltage supplying source connected to the showerhead and suitable to supply a radio frequency bias voltage to the second process gas so as to produce a plasma.
5. The multi-mode thin film deposition apparatus as claimed in claim 1, further comprising a second voltage supplying source connected to the first gas inflow system and suitable to supply a bias voltage to the first process gas so as to produce a plasma.
6. The multi-mode thin film deposition apparatus as claimed in claim 1, wherein the first gas inflow system further comprises a first gas supplying source and a second gas supplying source, the first gas supplying source is connected to the first opening of the reaction chamber via a first gas supplying tube and the second gas supplying source is connected to the first opening of the reaction chamber via a second gas supplying tube.
7. The multi-mode thin film deposition apparatus as claimed in claim 6, wherein the first thin film deposition process mode is an atomic layer deposition (ALD) process mode, and the first process gas comprises a first precursor reactant gas and a second precursor reactant gas supplied from the first gas supplying source and the second gas supplying source, respectively.
8. The multi-mode thin film deposition apparatus as claimed in claim 1, wherein the second thin film deposition process mode is a plasma-enhanced chemical vapor deposition (PECVD) process mode.
9. The multi-mode thin film deposition apparatus as claimed in claim 1, further comprising a flow control unit connected to the first gas inflow system, the second gas inflow system and the inert gas supplying source, respectively, and controlling flow of the first process gas, the second process gas and the inert gas, respectively.
10. A method of depositing a thin film by using a multi-mode thin film deposition apparatus, the method of depositing the thin film comprising:
providing a substrate and deposing the substrate on a carrying seat;
performing a first thin film deposition process mode, including:
opening a first gas inflow system and an inert gas supplying source synchronously, a first process gas being supplied by the first gas inflow system through a first opening to a reaction chamber, and an inert gas entering the reaction chamber via a plurality of gas holes of a showerhead at the same time;
controlling an inflow of the inert gas to make a pressure of the gas mixing room and the gas holes higher than the pressure of the reaction chamber, the inert gas outputted from the showerhead making the first process gas attached to the substrate and forming a first thin film on the substrate; and
closing the first gas inflow system and the inert gas supplying source; and

performing a second thin film deposition process mode, a second process gas entering the reaction chamber through the plurality of gas holes of the showerhead and forming a second thin film on the substrate;
wherein the multi-mode thin film deposition apparatus comprises:
the reaction chamber, having the first opening and a second opening penetrating through the reaction chamber, the first opening and the second opening having a same axial direction;
the carrying seat, disposed in the reaction chamber and suitable to carry the substrate;
the first gas inflow system, connected to the first opening and suitable to supply the first process gas during the first thin film deposition process mode;
the showerhead, having a gas mixing room and the plurality of gas holes, wherein the plurality of gas holes is disposed at a side of the reaction chamber and faces to the carrying seat, and the gas mixing room is connected to the reaction chamber through the plurality of gas holes;
the inert gas supplying source, connected to the gas mixing room of the showerhead and suitable to supply the inert gas which is non-reactive to the first process gas; and
a second gas inflow system, connected to the gas mixing room of the showerhead and suitable to supply the second process gas during the second thin film deposition process mode.
11. The method of depositing the thin film as claimed in claim 10, wherein the first process gas comprises a first precursor reactant gas and a second precursor reactant gas entering to the reaction chamber at time intervals.
12. The method of depositing the thin film as claimed in claim 10, wherein the ratio of the flow rate of the first precursor reactant gas to the flow rate of the inert gas ranges of 23 to 54.
13. A method of depositing a thin film, comprising:
providing a substrate and deposing the substrate in a reaction chamber;
performing an atomic layer deposition (ALD) process mode, including:
supplying a first process gas, the first process gas comprising a first precursor reactant gas and a second precursor reactant gas, the first precursor reactant gas and the second precursor reactant gas entering the reaction chamber through a first opening respectively; and
supplying an inert gas simultaneously when the at least two precursor reactant gases enter the reaction chamber, wherein the inert gas outputted by the showerhead makes the first process gas attach to the substrate and forms a first thin film on the substrate; and

performing a plasma-enhanced chemical vapor deposition (PECVD) process mode, including:
supplying a second process gas from the showerhead to form a second thin film on the substrate;
wherein the ALD process mode and the PECVD process are performed in the same reaction chamber.
14. The method of depositing the thin film as claimed in claim 13, wherein the first precursor reactant gas and the second precursor reactant gas enter to the reaction chamber at time intervals.
15. The method of depositing the thin film as claimed in claim 14, wherein the first precursor reactant gas and the second precursor reactant gas enter to the reaction chamber at time intervals by a gas-extracting system extracting a gas, and the gas-extracting system is connected to a second opening of the reaction chamber.
16. The method of depositing the thin film as claimed in claim 13, wherein the ratio of the flow rate of the first precursor reactant gas to the flow rate of the inert gas in the reaction chamber ranges of 23 to 54.
17. The method of depositing the thin film as claimed in claim 13, wherein the showerhead comprises a gas mixing room and the method of performing the ALD process mode further comprises: controlling an inflow of the inert gas to make a pressure of the gas mixing room higher than the pressure of the reaction chamber.
18. The method of depositing the thin film as claimed in claim 13, wherein when performing the PECVD process mode, a first voltage supplying source connected to the showerhead is turned on.
19. The method of depositing the thin film as claimed in claim 18, wherein when performing the ALD process mode, the first voltage supplying source is turned off.
20. The method of depositing the thin film as claimed in claim 13, wherein when performing the ALD process mode, the second voltage supplying source is turned on, the second voltage supplying source is connected to a first gas inflow system which supplies the first process gas, and one of the first precursor reactant gas and the second precursor reactant gas forms a single wafer plasma and forms a third thin film on the substrate to perform a plasma-enhanced atomic layer deposition (PEALD) process.
21. The method of depositing the thin film as claimed in claim 13, wherein flow of the first process gas, the second process gas, and the inert gas are controlled by a flow control unit.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A cord management sleeve, comprising;
a first and second hollow tubular shells;
said first hollow tubular shell being longer than said second hollow tubular shell;
said second hollow tubular shell being coaxially and movably mounted over a central segment of said first hollow tubular shell;
each of said first and second hollow tubular shells having a C-shaped cross-section along a full length thereof; said C-shaped cross-section defining a slot extending there through, along a full length thereof, and
said slots being movable relative to each other by rotation of said first and second hollow tubular shells relative to each other, for selectively aligning said slots or setting off an alignment of said slots.
2-10. (canceled)
11. The cord management sleeve as claimed in claim 1, wherein said said first hollow tubular shell having a raised shoulder relative to an outside surface thereof, on each end thereof; and said second hollow tubular shell being coaxially and movably mounted over a central segment of said first hollow tubular shell between said raised shoulders.

We claim:

1. A desk system comprising:
(a) a central support having a central axis; first and second opposing side walls; a front wall connected to said first and second side walls and a back wall connected to said first and second side walls, each of said walls including:
(i) a central portion disposed with a plane;
(ii) first and second spaced apart marginal portion; and
(iii) first and second grooves disposed between said central portion and said marginal portion; and
(b) a connector member connected to and extending from a selected one of said first and second opposing side walls, said connector member having a pair of spaced-apart, substantially coplanar tongues slidably receivable within said first and second grooves provided in the selected side wall, said tongues being disposed within a plane generally parallel to the plan of said central portion.
2. A desk system as defined in claim 1, further including a first longitudinal support connected to and extending from a selected one of said front and back walls, said longitudinal support having a pair of spaced apart tongues slidably receivable within said first and second grooves provided in said selected front and back wall.
3. A system as defined in claim 1 further including first and second side central portions disposed within a plane, said tongues being substantially coplanar and being disposed within a plane generally parallel to said plane of said central portion.
4. A system as defined in claim 1 in which each of the said marginal portions of said side walls extend substantially perpendicular to said marginal portions of said front and back walls.
5. A system as defined in claim 1 in which each of said marginal portions of said side walls includes a first edge and in which each of said marginal portions of each of said front and back walls includes a second edge, said first edges being spaced apart from said second edges to define corner grooves.
6. A system as defined in claim 5 in which said corner grooves extend radially outwardly from said central axis of said support.
7. A system as defined in claim 5 in which said central support includes first and second interconnected segments.
8. A system as defined in claim 7 in which said support is generally tubular shaped and in which said system further includes segment connector means for connecting together said first and second segments.
9. A system as defined in claim 8 in which said segment connector means are disposed interiorly of said tubular support.
10. A desk system comprising:
(a) a support having a central axis, first and second opposing side walls, a front wall connected to said first and second side walls and a back wall connected to said first and second side walls, each of said walls including:
(i) a central portion;
(ii) first and second spaced-apart marginal portions; and
(iii) first and second grooves disposed between said central portion and said marginal portions;

(b) a first structural panel connected to and extending from a selected one of said walls, said structural support having a pair of spaced-apart tongues slidably receivable within said first and second grooves provided in said selected wall; and
(c) a first divider panel connected to and extending from a selected one of said walls, said divider panel having a pair of spaced apart tongues slidably receivable within said first and second grooves provided in said selected wall.
11. A system as defined in claim 10 in which said marginal portions of said marginal portions of said side walls extend substantially perpendicular to said marginal portion of said side walls having a first edge and in which each of said marginal portions of each of said front and back walls have a second edge, said first edges being spaced apart from said second edges to define a corner groove, said corner groove extending radially outwardly from said central axis of said support column.
12. A system as defined in claim 10 in which said support includes first and second interconnected segments.
13. A system as defined in claim 12 in which said support column is generally tubular shaped and in which said system further includes segment connector means for connecting together said first and second segments, said segment connector means being disposed interiorly of said tubular support column.
14. A system as defined in claim 12 farther including a second marginal panel port connected to and extending from a selected one of said walls said second structural panel having a pair of spaced-apart tongues slidably receivable within said first and second grooves provided in the said selected side walls.
15. A system as defined in claim 12 further including a second divider panel connected to and extending from a selected one of said walls, said second divider panel having a pair of spaced apart tongues slidably receivable within said first and second grooves provided in the said selected front and back wall.
16. A system as defined in claim 15 in which each of said structural panels comprise:
(a) a pair of spaced-apart end connector members each having spaced-apart tongues slidably receivable within said first and second grooves provided in a selected one of said front, back and side walls;
(b) a first structural beam connected to and spanning said end connector members; and
(c) a first spanner member connected to and spanning said end connector members.
17. A system as defined in claim 16 in which each of said structural panels further comprises first and second side closure panels connected to said structural beam for enclosing said spanner member between said side closure panels.
18. A system as defined in claim 16 in which each of said structural panels includes a second structural beam connected to and spanning said end connector members and a second spanner member connected to and spanning said end connector members.
19. A desk system comprising:
(a) a support assembly comprising first and second interconnected hollow segments, each said segment having a central axis, first and second opposing side walls, a front wall connected to said first and second side walls and a back wall connected to said first and second side walls, each of said side wall including:
(i) a central portion;
(ii) first and second spaced-apart marginal portions; and
(iii) first and second grooves disposed between said central portion and said marginal portions;

(b) a first structural panel connected to and extending from a selected one of said front, back and side walls of said first segment, said structural panel having a pair of spaced-apart tongues slidably receivable within said first and second grooves provided in said selected wall;
(c) a first divider panel connected to and extending from a selected one of said front, back and side walls of said second segment, said divider panel having a pair of spaced-apart tongues slidably receivable within said first and second grooves provided in the said selected wall of said second segment; and
(d) segment connector means disposed interiorly of said support assembly for connecting together said first and second segments.
20. A system as defined in claim 19 in which said segment connector means comprises:
(a) a first internally threaded cinch nut disposed within said first segment;
(b) a second internally threaded cinch nut disposed within said second segment; and
(c) a threaded rod interconnected with and spanning said first and second cinch nuts.
21. A system as defined in claim 19 in which said connector means comprises an elongated stiffener telescopically received within said first and second hollow segments.
22. As system as defined in claim 19 in which said support panel comprises:
(a) a pair of spaced-apart end connector members each having spaced-apart tongues slidably receivable within said first and second grooves provided in a selected one of said front, back and side walls;
(b) a first structural beam connected to and spanning said end connector members; and
(c) a first spanner member connected to and spanning said end connector member.
23. A system as defined in claim 19 further including a ground engaging leg assembly removably connected to said first segment of said support assembly, said leg assembly comprising:
(a) a first side member connected to a selected front, back and side wall of said first segment, said first side member having a pair of spaced-apart tongues slidably receivable with said first and second spaced-apart grooves provided in said selected front, back and side wall; and
(b) a second side member connected to a selected front, back and side wall, said second member having a pair of spaced-apart tongues slidably receivable within said first and second spaced-apart grooves provided in said selected front, back and side wall.
24. A system as defined in claim 23 in which said leg assembly further includes:
(a) a first stabilizer member connected to and extending from said first side member; and
(b) a second stabilizer member connected to and extending from said second side member.
25. A system as defined in claim 23 in which said first side member has a plurality of vertically spaced slits formed therein and in which said desk system further includes a bracket for supporting a work surface, said bracket having a plurality of spaced-apart tabs receivable within said vertically spaced slots.
26. A desk system comprising:
(a) a central support, having a central axis; first and second opposing side walls; a front wall connected to said first and second side walls and a back wall connected to said first and second side walls, each of said walls including:
(i) a central portion;
(ii) first and second spaced-apart marginal portions; and
(iii) first and second grooves disposed between said central portion and said marginal portions; and

(b) a connector member connected to and extending from said first and second opposing side walls, said connector member having a pair of spaced apart substantially coplanar tongues slidably receivable within said first and second grooves provided in the selected side wall and a pair of spaced apart grooves disposed proximate said pair of spaced-apart tongues, said marginal portions being receivable with said grooves of said connector member.
27. A desk system as defined in claim 26 further including a connector connected to and extending from said second of said first and second opoosing side walls.
28. A desk system as defined in claim 26 further including a side member connected to and extending from said connector member.
29. A desk system comprising:
(a) a central support, having a central axis; first and second opposing side walls, each said side wall having a marginal portion including a first edge; a front wall connected to said first and second side walls and a back wall connected to said first and second side walls, each of said front and back walls have a marginal portion including a second edge, said first and second edges being spaced apart to define corner grooves having a back wall, said front wall and said back wall including:
(i) a central portion;
(ii) first and second spaced-apart marginal portions; and
(iii) first and second grooves disposed between said central portion and said marginal portions; and

(b) a connector member connected to and extending from said first and second opposing side walls, said connector member having a pair of spaced apart substantially coplanar tongues slidably receivable within said first and second grooves provided in the selected side wall and a pair of spaced apart grooves disposed proximate said pair of spaced-apart tongues, said marginal portions being receivable with said grooves of said connector member.
30. A desk system as defined in claim 29 in which said central portion of each of said side walls, said front wall and said back wall is curved.
31. A deck system as defined in claim 29 in which each of said back walls of said corner grooves are provided with a plurality of spaced-apart slots.
32. A desk system as defined in claim 31 including at least one support receivable within a selected one of said corner grooves.
33. A desk system as defined in claim 32 in which said at least one support has fingers receivable within said spaced-apart slots.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for treating cancer, wherein said method comprises:
(a) detecting the presence of a normal, elevated, or reduced level of CD14+DR\u2212 cells for said cancer in a mammal having said cancer,
(b) detecting the presence of a normal, elevated, or reduced level of CD4+ cells for said cancer in said mammal, and
(c) administering a non-immune-based therapy, radiation, chemotherapy, or a combination thereof with or without surgery to said mammal if said mammal is determined to be likely to experience a favorable outcome of said cancer based at least in part on said level of CD14+DR\u2212 cells and said level of CD4+ cells, or administering, to said mammal, (i) a non-immune-based therapy, radiation, chemotherapy, or a combination thereof with or without surgery and (ii) a T cell stimulating therapy, a CAR therapy, a DLI therapy, a T cell stimulating antibody therapy, an anti-CD14+HLA-CRneg therapy, a CD14+DRneg stimulating therapy, a TLR stimulating ligand therapy, a Poly I:C therapy, a CpG therapy, a vaccine therapy, a dendritic cell infusion therapy, a cancer vaccine therapy, a CD14+Rneg killing strategy therapy, a CD14+DRneg blocking strategy therapy, a treatment with IDO inhibitors (e.g., NLG8189), a treatment with arginase inhibitors, a treatment with MCSF-R or CSF-R blocking agents, or combinations thereof, if said mammal is determined to be likely to experience an unfavorable outcome of said cancer based at least in part on said level of CD14+DR\u2212 cells and said level of CD4+ cells.
2. The method of claim 1, wherein said mammal is a human.
3. The method of claim 1, wherein said cancer is glioblastoma or lymphoma.
4. The method of claim 1, wherein said mammal has a normal level of CD14+DR\u2212 cells and a normal level of CD4+ cells, and wherein said method comprises administering, to said mammal, a non-immune-based therapy, radiation, chemotherapy, or a combination thereof with or without surgery.
5. The method of claim 1, wherein said mammal has a reduced level of CD14+DR\u2212 cells and a reduced level of CD4+ cells, and wherein said method comprises administering, to said mammal, (i) a non-immune-based therapy, radiation, chemotherapy, or a combination thereof with or without surgery and (ii) a T cell stimulating therapy, a CAR therapy, a DLI therapy, a T cell stimulating antibody therapy, an anti-CD14+HLA-CRneg therapy, a CD14+DRneg stimulating therapy, a TLR stimulating ligand therapy, a Poly I:C therapy, a CpG therapy, a vaccine therapy, a dendritic cell infusion therapy, a cancer vaccine therapy, a CD14+DRneg killing strategy therapy, a CD14+DRneg blocking strategy therapy, a treatment with IDO inhibitors (e.g., NLG8189), a treatment with arginase inhibitors, a treatment with MCSF-R or CSF-R blocking agents, or combinations thereof, if said mammal is determined to be likely to experience an unfavorable outcome of said cancer based at least in part on said level of CD14+DR\u2212 cells and said level of CD4+ cells.