Author: claimsbot

1. An operation region detection device for detecting an operation region of relative rotation in a hollow structure joint for allowing relative rotation of two link members of a robot, said operation region detection device comprising at least one dog, a support member for supporting said at least one dog, and at least one detection switch provided corresponding to said at least one dog and outputting a signal based on contact or noncontact with the corresponding dog,
said support member arranged in the hollow part of said joint and attached to one of said two link members so that a center axis of said support member is substantially aligned with a rotation axis of said relative rotation;
said at least one dog attached to the outer circumference of said support member and having a length corresponding to a predetermined detection region along a peripheral direction of said outer circumference; and
said at least one detection switch provided on the other of said two link members at a position facing said dog, to detect a region to which a current position of said relative rotation belongs based on the state of output of said signal.
2. The operation region detection device according to claim 1, wherein said at least one dog comprises a plurality of dogs and said at least one detection switch comprises a number of detection switches corresponding to the number of said plurality of dogs.
3. The operation region detection device according to claim 2, wherein said plurality of dogs are aligned in a center axial direction of said support member and supported by said support member, and said detection switches are arranged corresponding to said plurality of dogs.
4. An operation range restricting device for a robot joint comprising a restricting means for restricting an operation range of relative rotation in a hollow structure joint for allowing relative rotation of two link members of a robot, wherein
said restricting means restricts an operation range of said relative rotation based on a region to which a current position of said relative rotation belongs detected by said operation region detection device according to claim 1.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. (canceled)
2. A liquid crystal dispensing system comprising:
a container for containing liquid crystal;
measuring means for measuring liquid crystal in the container;
discharging means for discharging an amount of liquid crystal from the container, the amount of liquid crystal discharged from the container being controlled based on data measured by the measuring means; and
a nozzle for dropping liquid crystal discharged from the discharging means onto a substrate.
3. The system of claim 2, wherein the discharging means includes:
a case;
a cylinder in the case, the cylinder having inlet and discharging openings; and
a piston for pumping liquid crystal by rotational and axial movement in the cylinder, the piston having a groove at a lower portion proximate the inlet and discharging openings of the cylinder.
4. The system of claim 3, wherein the amount of liquid crystal discharged from the container is dependent upon a fixing angle of the discharging means.
5. The system of claim 4, wherein the system further comprises a liquid crystal capacity amount controlling member contacting the discharging means to vary the fixing angle of the discharging means.
6. The system of claim 2, wherein the measuring means includes a gravimeter for measuring a weight of liquid crystal in the container.
7. The system of claim 6, wherein the gravimeter includes a load cell.
8. The system of claim 2, wherein the measuring means includes a device that indicates a volume of liquid crystal in the container.
9. The system of claim 8, wherein the device is an ultrasonic sensor.
10. The system of claim 2, further comprising a control unit for controlling a discharge amount of liquid crystal discharged from the discharging means and compensating a dispensing amount of liquid crystal based on the data measured by the measuring means.
11. The system of claim 10, wherein the control unit includes:
a dispensing amount setting unit for setting a selected dispensing amount of liquid crystal to be dropped onto the substrate;
a dispensing amount compensating unit for calculating a current dispensing amount of liquid crystal based on the data measured by the measuring means, and calculating a differential value between the selected dispensing amount of liquid crystal set by the dispensing amount setting unit and the current dispensing amount; and
driving unit for operating the discharging means by driving a motor.
12. The system of claim 11, wherein the dispensing amount compensating unit includes:
a dispensing amount calculating unit for calculating the current dispensing amount of liquid crystal based on the data measured by the measuring means;
a differential value calculating unit for calculating the differential value between the current dispensing amount of liquid crystal measured by the dispensing amount calculating unit and the selected dispensing amount of liquid crystal;
a dispensing amount limitation value setting unit for setting a limitation value of the differential value calculated by the differential value calculator unit; and
a comparing unit for comparing the differential value and the dispensing amount limitation value respectively input from the differential value calculating unit and the dispensing amount limitation value setting unit, and based on a comparison of the differential value and the dispensing amount limitation value outputting a signal to the motor driving unit.
13. The system of claim 12, wherein the dispensing amount calculating unit calculates the current dispensing amount of liquid crystal by subtracting a second amount of liquid crystal measured by the measuring means from a first amount of liquid crystal measured by the measuring means.
14. The system of claim 11, wherein the control unit checks a remaining amount of liquid crystal in the liquid crystal material container based on the data from the measuring means.
15. The system of claim 14, wherein if the remaining amount of liquid crystal is less than the selected dispensing amount of liquid crystal, the driving unit stops the operation of the motor thereby stopping liquid crystal dispensing.
16. The system of claim 2, wherein the substrate includes at least one unit liquid crystal display panel region.
17. The system of claim 16, wherein the liquid crystal from the nozzle is dropped in the at least one unit liquid crystal display panel region.
18. A liquid crystal dispensing system comprising:
a plurality of liquid crystal dispensers including a container for containing liquid crystal, measuring means installed in each liquid crystal dispenser for measuring liquid crystal in the container, discharging means for discharging the liquid crystal from the container, and a nozzle for dropping the liquid crystal discharged from the discharging means onto at least one unit liquid crystal display panel region in a substrate, the amount of the discharged liquid crystal from the container being controlled based on data from the measuring means.
19. The system of claim 2, further comprising a control unit for controlling a discharge amount liquid crystal discharged from the plurality of liquid crystal dispensers and compensating a dispensing amount of liquid crystal based on the data measured by the measuring means.
20. A method of fabricating an LCD device using the system of claim 12 comprising:
placing liquid crystal material on a substrate including at least one unit liquid crystal display panel region with the system;
applying a sealant on the substrate;
joining a second substrate to the first substrate using the sealant; and
separating the unit liquid crystal display panel from the substrate.
21. A method of fabricating an LCD device using the system of claim 18 comprising:
placing liquid crystal material on a substrate including at least one unit liquid crystal display panel region with the system;
applying a sealant on the substrate;
joining a second substrate to the first substrate using the sealant; and
separating the unit liquid crystal display panel from the substrate.
22. A method of dispensing liquid crystal material comprising:
dispensing liquid crystal onto a substrate using dispenser;
measuring an amount of the liquid crystal in the dispenser; and
controlling the dispensing amount of the liquid crystal based on the measured amount of the liquid crystal in the dispenser.
23. The method of claim 22, wherein the dispenser includes:
a container for containing liquid crystal;
measuring means for measuring liquid crystal in the container;
a pump for pumping liquid crystal in the container; and
a nozzle for dropping liquid crystal from the pump onto a substrate.
24. The method of claim 23, wherein the pump includes:
a case, a cylinder, the cylinder having inlet and discharging openings; and
a piston for pumping liquid crystal by rotational and axial movement in the cylinder, the piston having groove at a lower portion to be arranged near the inlet and discharging openings by movement of the piston.
25. The method of claim 22, wherein the measuring the amount of the liquid crystal includes measuring the weight of liquid crystal in the container.
26. The method of claim 22, wherein measuring the amount of the liquid crystal includes measuring the volume of liquid crystal in the container.
27. The method of claim 22, wherein controlling the dispensing amount of the liquid crystal includes:
calculating a differential value between the measured current dispensing amount of liquid crystal in the container and the pre-determined amount of liquid crystal in the container;
comparing the calculated differential value with set value;
compensating the dispensing amount of liquid crystal if the calculated differential value is different from the set value, the compensating amount being calculated based on the calculated differential value and the set value.
28. A method of fabricating liquid crystal display device comprising:
providing first and second substrates;
dispensing liquid crystal onto a plurality of unit liquid crystal display panel region in a substrate using a plurality of dispensers;
measuring an amount of the liquid crystal in each dispenser;
controlling the dispensing amount of the liquid crystal based on the measured amount of the liquid crystal in each dispenser;
joining the first and second substrates using the sealant; and
separating the unit liquid crystal display panel from the substrates.

1. A method for producing a low temperature cofired ceramics substrate structure comprising:
providing the ceramic substrate with the at least one contact element, wherein the at least one contact element has a first metallization (20) arranged on the ceramic substrate or in the ceramic substrate or on and in the ceramic substrate;
covering the first metallization (20) with a diffusion barrier layer (22) through printing or by jetting or dispensing; and,
forming the second metal layer (24) directly on the diffusion barrier layer (22)
without tempering said diffusion barrier layer before said forming the second metal layer on the diffusion barrier layer.
2. The method according to claim 1, wherein said forming the second metal layer (24) comprises
printing with a subsequent tempering step, or,
plating.
3. The method according to claim 1, further comprising applying the second metal layer (24) by jetting or dispensing a paste.
4. The method according to claim 1, further comprising carrying out a tempering step after said forming of the second metal layer (24).
5. A method for producing a low temperature cofired ceramics substrate structure comprising:
providing the ceramic substrate with the at least one contact element, wherein the at least one contact element has a first metallization (20) arranged on the ceramic substrate or in the ceramic substrate or on and in the ceramic substrate;
covering the first metallization (20) with a diffusion barrier layer (22) by printing or by jetting or dispensing a paste;
forming the second metal layer (24) directly on the diffusion barrier layer (22) by printing or plating and
without tempering said diffusion barrier layer before said forming the second metal layer on the diffusion barrier layer; and,

carrying out a tempering step after said forming of the second metal layer (24).

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An electron microscope, comprising:
an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread;
an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image;
a beam separator that separates the illuminating electron beam from reflecting electron beam;
control means for controlling the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant;
wherein the beam separator is formed of an E\xd7B deflector that makes an electric field and a magnetic field orthogonal to each other and superimposed on one another, and the control means controls a voltage and a current which are supplied to the E\xd7B deflector so that a Wien condition by which the deflections caused by the electric field and the magnetic field cancel each other is met with respect to the reflecting electron beam while keeping the deflection angle with respect to the illuminating electron beam substantially constant;
a mirror electron microscope mode that magnifies and projects the mirror electron beam, and a low energy electron microscope mode that magnifies and projects the secondary electron beam or the backscattered electron beam; and
means for changing over the mirror electron microscope mode and the low energy electron microscope mode;
wherein the changeover from the mirror electron microscope mode to the low energy electron microscope mode is conducted by supplying a deflection voltage and a supply current which are obtained by multiplying a deflection voltage and a supply current of the E\xd7B deflector by a value of \u03b3 that is represented by the following expression
\u03b3
=
V
0
V
1
\u2062

2

1
+
V
1
V
0
at the same time as the changeover of the specimen supply voltage when it is assumed that an energy of the electron beam that is supplied to the E\xd7B deflector is eV0, and an energy of the outgoing electron beam that is supplied to the E\xd7B deflector in the low energy electron microscope mode is eV1.
2. An electron microscope, comprising:
electron source voltage applying means for applying an accelerating voltage to an electron source;
specimen voltage applying means for applying a specimen supply voltage to a stage that supports a specimen;
an illuminating lens system that illuminates an electron beam that is emitted from the electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread;
an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image;
a beam separator that separates the illuminating electron beam from the reflecting electron beam;
means for changing over the reflecting electron beam to mirror electrons that is returned back in the vicinity of the surface of the specimen without colliding with the specimen, and secondary electrons that are generated from the specimen or backscattered electrons;
control means for controlling the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant;
wherein the beam separator is formed of an E\xd7B deflector that makes an electric field and a magnetic field orthogonal to each other and superimposed on one another, and the control means controls a voltage and a current which are supplied to the E\xd7B deflector so that a Wien condition by which the deflections caused by the electric field and the magnetic field cancel each other is met with respect to the reflecting electron beam while keeping the deflection angle with respect to the illuminating electron beam substantially constant;
a mirror electron microscope mode that magnifies and projects the mirror electron beam, and a low energy electron microscope mode that magnifies and projects the secondary electron beam or the backscattered electron beam; and
means for changing over the mirror electron microscope mode and the low energy electron microscope mode;
wherein the changeover from the mirror electron microscope mode to the low energy electron microscope mode is conducted by supplying a deflection voltage and a supply current which are obtained by multiplying a deflection voltage and a supply current of the E\xd7B deflector by a value of \u03b3 that is represented by the following expression
\u03b3
=
V
0
V
1
\u2062

2

1
+
V
1
V
0
at the same time as the changeover of the specimen supply voltage when it is assumed that an energy of the electron beam that is supplied to the E\xd7B deflector is eV0, and an energy of the outgoing electron beam that is supplied to the E\xd7B deflector in the low energy electron microscope mode is eV1.
3. The electron microscope according to claim 1 or 2, wherein the changeover from the mirror electron microscope mode to the low energy electron microscope mode is conducted by setting the specimen supply voltage to a positive potential side of the electron source supply voltage.
4. An electron beam inspection system, comprising:
electron source voltage applying means for applying an accelerating voltage to an electron source;
specimen voltage applying means for applying a specimen supply voltage to a stage that supports a specimen;
an illuminating lens system that images the illuminating electron beam emitted from the electron source onto a focal plane of an objective lens by an illuminating lens to make a planar illuminating electron beam having a two-dimensional spread illuminate the specimen;
an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image;
a beam separator that separates the illuminating electron beam from the reflecting electron beam;
control means for controlling the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant;
image detecting means for sequentially illuminating the planar illuminating electron beam to a plurality of illuminating areas of a specimen surface to which a negative potential is applied, imaging the reflecting electron beam generated from the specimen, sequentially forming an magnified electron image of all or a part of the plurality of illuminating areas, and converting the magnified electron image into an electric image signal;
image processing means for detecting a pattern defect formed on the specimen on the basis of the image signals;
means for changing over the reflecting electron beam to mirror electrons that are returned back in the vicinity of the surface of the specimen without colliding with the specimen, and the secondary electrons or the backscattered electrons which are generated from the specimen with colliding the primary electron beam with the specimen by controlling the accelerating voltage and the specimen supply voltage;
a mirror electron microscope mode that magnifies and projects the mirror electrons, and a low energy electron microscope mode that detects, enlarges and projects the secondary electrons or the backscattered electrons; and
means for changing over the mirror electron microscope mode and the low energy electron microscope mode to detect a pattern defect formed in the specimen;
wherein the changeover from the mirror electron microscope mode to the low energy electron microscope mode is conducted by supplying a deflection voltage and a supply current which are obtained by multiplying a deflection voltage and a supply current of the E\xd7B deflector by a value of \u03b3 that is represented by the following expression
\u03b3
=
V
0
V
1
\u2062

2

1
+
V
1
V
0
at the same time as the changeover of the specimen supply voltage when it is assumed that an energy of the electron beam that is supplied to the E\xd7B deflector is eV0, and an energy of the outgoing electron beam that is supplied to the E\xd7B deflector in the low energy electron microscope mode is eV1.
5. The electron beam inspection system according to claim 4, wherein the beam separator is formed of an E\xd7B deflector that makes an electric field and a magnetic field orthogonal to each other and superimposed on one another, and the control means controls a voltage and a current which are supplied to the deflector so that a Wien condition by which the deflections caused by the electric field and the magnetic field cancel each other is met with respect to the reflecting electron beam while keeping the deflection angle with respect to the illuminating electron beam substantially constant.
6. The electron beam inspection system according to claim 4, wherein the image processing means compares the image signals related to the plurality of illuminating areas with each other, or compares the image signals with an image signal related to a desired inspection area of a specimen that is standard, which is stored in advance, to detect a pattern defect formed in the specimen and display the defect as an image.