Author: claimsbot

What is claimed is:

1. A reformer controlling apparatus, comprising:
a reformer having a catalyst unit including a catalyst promoting a steam reforming reaction and a catalyst for promoting a partial oxidation reaction;
a raw fuel gas supplier supplying raw fuel gas containing hydrocarbon and steam to said catalyst unit;
an oxidation gas supplier supplying oxidation gas containing oxygen to said catalyst unit;
a first reaction state detector detecting a state of a reaction progressing at an upstream portion of flows of said raw fuel gas and said oxidation gas in said catalyst unit
a second reaction state detector detecting a state of a reaction in the whole of the catalysts in said catalyst unit;
a first corrector correcting feed amounts of said raw fuel gas and said oxidation gas, which are supplied to said catalyst unit, based on said state of the reaction detected by said second reaction state detector; and
a second corrector correcting the feed amount of said oxidation gas, which is supplied to said catalyst unit andor a feed timing thereof based on said state of the reaction detected by said first reaction state detector.
2. The reformer controlling apparatus according to claim 1, wherein said first reaction state detectors are set in plural positions, and a detection signal switcher is provided, which switches, with passage of time, a detection signal supplied to said second corrector among detection signals indicating said reaction state detected by said first reaction state detector.
3. The reformer controlling apparatus according to claim 1, wherein said first motion state detector detects a temperature state as said reaction state.
4. The reformer controlling apparatus according to claim 1, wherein said first reaction state detector detects a reaction state at a spot of said catalyst unit where the maximum temperature is generated.
5. The reformer controlling apparatus according to claim 1, wherein said first reaction state detectors for detecting a temperature state are set in plural positions, a maximum temperature selector for selecting the highest temperature among detected temperatures output from the first reaction state detectors is provided, and said second corrector uses an output of the maximum temperature selector.
6. The reformer controlling apparatus according to claim 1, wherein said second reaction state detector detects a temperature state as said reaction state.
7. A reformer controlling apparatus, comprising:
a reformer having a catalyst unit including a catalyst for promoting a steam reforming reaction and a catalyst for promoting a partial oxidation reaction;
raw fuel gas supplying means for supplying raw fuel gas containing hydrocarbon and steam to said catalyst unit;
oxidation gas supplying means for supplying oxidation gas containing oxygen to said catalyst unit;
first reaction state detecting means for detecting a state of a reaction progressing at an upstream portion of flows of said raw fuel gas and said oxidation gas in said catalyst unit;
second reaction state detecting means for detecting a state of a con in the whole of the catalysts in said catalyst unit;
first correcting means for correcting feed amounts of said raw fuel gas and said oxidation gas, which are supplied to said catalyst unit, based on said state of the reaction detected by said second reaction state detecting means; and
second correcting means for correcting the feed amount of said oxidation gas, which is supplied to said catalyst unit andor a feed timing thereof based on said state of the reaction detected by said first reaction state detecting means.
8. A method of controlling a reformer, comprising:
promoting a steam reform reaction and a partial oxidation reaction in a catalyst unit of said reformer;
supplying raw fuel gas containing hydrocarbon and steam to said catalyst unit by a raw fuel supplier;
supplying oxidation gas containing oxygen to said catalyst unit by an oxidation gas supplier;
detecting a state of a reaction progressing at an upstream portion of flows of said raw fuel gas and said oxidation gas in said catalyst unit by a first reaction state detector;
detecting a state of a reaction in the whole of the catalysts in said catalyst unit by a second reaction state detector;
correcting feed amounts of said raw fuel gas and said oxidation gas, which are supplied to said catalyst unit by a first corrector, based on said state of the reaction detected by said second reaction state detector; and
correcting the feed amount of said oxidation gas, which is supplied to said catalyst unit andor a feed timing thereof by a second corrector, based on said state of the reaction detected by said first reaction state detector.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A polishing composition for a substrate for memory hard disk, comprising silica particles in an aqueous medium, wherein the silica particles satisfy a relationship between an average particle size (r) of the silica particles on the number basis and a standard deviation (\u03c3) on the number basis of the following formula (1):
\u03c3\u22670.3\xd7r\u2003\u2003(1)
wherein r is an average particle size (nm) of the silica particles on the number basis, and \u03c3 is a standard deviation (nm) on the number basis, wherein the average particle size is obtained by a determination by transmission electron microscope (TEM) observation, and wherein a relationship between a particle size (R) and a cumulative volume frequency (V) in a range of particle sizes of from 60 to 120 nm satisfies the following formulas (2) and (3):
V\u22670.5\xd7R\u2003\u2003(2)
V\u22660.25\xd7R+75\u2003\u2003(3)
wherein R is a particle size (nm) of the silica particles, and V is a cumulative volume frequency (%) counted from a small particle size side of the silica particles.
2. The polishing composition according to claim 1, wherein the silica particles are colloidal silica particles.
3. The polishing composition according to claim 1, further comprising at least one member selected from the group consisting of acids, salts thereof and oxidizing agents.
4. The polishing composition according to claim 2, further comprising at least one member selected from the group consisting of acids, salts thereof and oxidizing agents.
5. The polishing composition according to claim 1, wherein a pH thereof is from 1 to 4.5.
6. The polishing composition according to claim 2, wherein a pH thereof is from 1 to 4.5.
7. The polishing composition according to claim 3, wherein a pH thereof is from 1 to 4.5.
8. The polishing composition according to claim 4, wherein a pH thereof is from 1 to 4.5.
9. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 1.
10. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 2.
11. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 3.
12. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 4.
13. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 5.
14. A method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition of claim 6.
15. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 1.
16. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 2.
17. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 3.
18. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 4.
19. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 5.
20. A method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni\u2014P plated substrate for memory hard disk with the polishing composition of claim 6.

1. A labeling reagent comprising an isotopically substituted reagent having a distinct SERS or SERRS spectral signature.
2. The labeling reagent of claim 1 wherein the reagent comprises a deuterated organic dye.
3. The labeling reagent of claim 1 or 2 wherein the organic dye is selected from xanthene dyes, triarylmethane dyes, and azo dyes.
4. The labeling reagent of claim 2 wherein the deuterated organic dye is obtained from a condensation reaction of a deuterated precursor.
5. The labeling reagent of claim 2 wherein the deuterated organic dye is obtained by isotopic exchange of aromatic protons between the organic dye and a deuterated acidic media.
6. A method quantitatively evaluating an analyte comprising the steps of:
labeling a portion of an analyte with an isotopically substituted SERS or SERRS active reagent,
subjecting the analyte to a separating regimen, and detecting the labeled portion with a Raman spectral detector.
7. The method of claim 6 wherein the labeling step comprises the steps of:
mixing a sample containing the analyte of interest with an isotopically edited internal standard of known concentration, and
incubating the mixture with a SERS active reagent to form a bioconjugate.
8. The method of claim 6 or 7 wherein the analyte of interest is a gene fragment.
9. The method of claim 6 or 7 wherein the analyte of interest is a protein or protein based biomarker.
10. The method of claim 7 wherein the detecting step is periodically repeated during the incubating step to quantify the reaction kinetics associated with the analyte colloid binding and exchange reactions.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A non-uniform axial-stiffness ureteral sheath, comprising:
an inner liner defining a longitudinally extending and generally uniform bore;
a non-uniform axial-stiffness outer jacket defining a longitudinally tapered outer surface; and
a reinforcement layer encaencapsulated between the inner liner and the non-uniform axial stiffness outer jacket
wherein at least a portion of the inner liner is so spaced from the non-uniform axial-stiffness outer jacket as to define a region devoid of reinforcement layer structure.
2. The sheath of claim 1, wherein the non-uniform axial-stiffness outer jacket, defines a longitudinally tapered inner surface of the outer jacket.
3. The sheath of claim 1, wherein the non-uniform axial-stiffness outer jacket comprises at least a jacket proximal portion and a jacket distal portion coaxially and tandemly disposed over the reinforcement layer structure, the jacket proximal portion and the jacket distal portion having dissimilar axial-stiffness, wherein the jacket proximal portion and the jacket distal portion are respectively in contact with a radial outer surface of the inner liner.
4. The sheath of claim 1, wherein the non-uniform axial-stiffness outer jacket conforms to a profile of the reinforcement layer.
5. The sheath of claim 4, wherein the non-uniform axial-stiffness outer jacket encases a portion of the reinforcement layer in material forming the outer jacket.
6. The sheath of claim 1, wherein the region is at least partially occupied by a radiopaque element.
7. The sheath of claim 1, wherein the non-uniform axial-stiffness outer jacket defines a jacket distal portion and jacket proximal portion, and along a length of the sheath spanning the jacket distal portion and the jacket proximal portion, there at least a space between the inner liner and the outer jacket that is devoid of reinforcement layer structure.
8. The sheath of claim 1, wherein the reinforcement layer as non-uniform axial-stiffness.
9. The sheath of claim 8, wherein a proximal portion of the reinforcement layer is thicker than a distal portion of the reinforcement layer.
10. The sheath of claim 9, wherein the reinforcement layer comprises a coil of wire, wherein a diameter of the wire in a proximal portion of the reinforcement layer is larger than a diameter of the wire in a distal portion of the reinforcement layer.
11. The sheath of claim 10, wherein the diameter of the tapers from a relatively larger diameter in the proximal portion of the reinforcement layer to a relatively small diameter in the distal portion of the reinforcement layer.
12. The sheath of claim 8, wherein the non-uniform axial-stiffness outer jacket defines a longitudinally tapered inner surface of the outer jacket.
13. The sheath of claim 8, wherein the non-uniform axial-stiffness outer jacket comprises at least a jacket proximal portion and a jacket distal portion coaxially and tandemly disposed over the reinforcement layer structure, the jacket proximal portion and the jacket distal portion having dissimilar axial-stiffness, wherein the jacket proximal portion and the jacket distal portion are respectively in contact with a radial outer surface of the inner liner.
14. The sheath of claim 8, wherein the non-uniform axial-stiffness outer jacket conforms to a profile of the reinforcement layer.
15. The sheath of claim 14, wherein the non-uniform axial-stiffness outer jacket encases a portion of the reinforcement layer in material forming the outer jacket.
16. The sheath of claim 8, wherein at least a portion of the inner liner is so spaced from the non-uniform axial-stiffness outer jacket as to define a region devoid of reinforcement layer structure.
17. The sheath of claim 16, wherein the region is at least partially occupied by a radiopaque element.
18. The sheath of claim 8, wherein the non-uniform axial-stiffness outer jacket defines a jacket distal portion and jacket proximal portion, and along a length of the sheath spanning the jacket distal portion and the jacket proximal portion, there is at least a space between the inner liner and the outer jacket that is devoid of reinforcement layer structure.