Author: claimsbot

1. A phase change material (PCM) switch comprising:
a resistive heater element;
a PCM element proximate the resistive heater element;
a thermally conductive electrical insulating barrier layer positioned between the PCM heating element and the resistive heating element; and
conductive lines extending from ends of the PCM element and control lines extending from ends of the resistive heater element.
2. The PCM switch of claim 1, wherein the PCM element overlies the resistive heating element.
3. The PCM switch of claim 1, wherein the resistive heating element overlies the PCM element.
4. The PCM switch of claim 1, wherein the resistive heating element comprises a first resistive heating element that overlies the PCM element and a second resistive heating element in which the PCM element overlies the second resistive heating element.
5. The PCM switch of claim 1, wherein the resistive heating element is formed with four sides that substantially surround at least a portion of the PCM element.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A thin film transistor manufacturing method, characterized in that, comprising steps of:
providing a transparent substrate;
forming a gate electrode and a data line on a surface of the transparent substrate;
forming a first insulation layer, which covers the gate electrode and the data line, on the surface of the transparent substrate;
forming an amorphous semiconductor layer on a surface of the first insulation layer in an area corresponding to the gate electrode;
forming a through hole in an area of the surface of the first insulation layer corresponding to the data line;
forming a conductive layer, which covers the amorphous semiconductor layer and the through hole, on the surface of the first insulation layer;
removing a portion of the conductive layer corresponding to the gate electrode to cut the conductive layer, thereby forming a source electrode and a drain electrode of the thin film transistor;
forming a second insulation layer, which covers the amorphous semiconductor layer, the through hole, as well as the source electrode and the drain electrode, on the surface of the first insulation layer; and
irradiating the amorphous semiconductor layer by a laser to increase an ordering degree of a lattice of the amorphous semiconductor layer.
2. The thin film transistor manufacturing method according to claim 1, characterized in that, the amorphous semiconductor layer comprises a first amorphous semiconductor layer and a second amorphous semiconductor layer, which are laminated and have a same conductive type, the first amorphous semiconductor layer is attached to the first insulation layer, the second amorphous semiconductor layer is attached to the source electrode and the drain electrode, a conductivity of the second amorphous semiconductor layer is higher than that of the first amorphous semiconductor layer.
3. The thin film transistor manufacturing method according to claim 2, characterized in that, the amorphous semiconductor layer is formed by utilizing an epitaxizing method, and the first amorphous semiconductor layer and the second amorphous layer are formed by changing concentration of a dopant during epitaxizing.
4. The thin film transistor manufacturing method according to claim 2, characterized in that, the step of cutting the conductive layer further comprises a step of removing a portion of the second amorphous semiconductor layer corresponding to the gate electrode at the same time.
5. The thin film transistor manufacturing method according to claim 3, characterized in that, the step of cutting the second amorphous semiconductor layer further comprises a step of thinning the first amorphous semiconductor layer exposed.
6. The thin film transistor manufacturing method according to claim 1, characterized in that, further comprising a step of removing a portion of the second insulation layer located between the source electrode and the drain electrode after the step of forming the second insulation layer.

1. An optical interconnection structure comprising:
a substrate on which a hole penetrating through a predetermined region is formed; and
an optical guide member fixed to the inside of the hole of the substrate,
wherein the optical guide member and the substrate are fixed by a metal oxide.
2. The optical interconnection structure according to claim 1, wherein a metal layer and a metal oxide layer are provided between the optical guide member and the substrate.
3. The optical interconnection structure according to claim 1, wherein the substrate is a metal substrate, and the metal oxide is an aluminum oxide.
4. A method for manufacturing an optical interconnection structure comprising:
preparing a substrate on which a hole penetrating through a predetermined region is formed, the side wall of the hole being formed with a metal layer;
disposing an optical guide member fixed to the inside of the hole of the substrate; and
forming a metal oxide by oxidizing the metal layer and then fixing the optical guide member to the substrate by the metal oxide.
5. The method for manufacturing the optical interconnection structure according to claim 4, wherein the substrate is a metal substrate.
6. An optical interconnection structure comprising:
a metal substrate;
an optical guide member that is formed through which vertically penetrates a predetermined region of the metal substrate and is fixed by a metal oxidation film formed when the metal substrate is anodized; and
an optical waveguide that is formed on the lower surface of the metal substrate including the oxidation film and is formed by stacking a lower cladding layer, a core layer, and an upper cladding layer.
7. The optical interconnection structure according to claim 6, further comprising a mirror in a predetermined region of the optical waveguide corresponding to the optical guide member.
8. The optical interconnection structure according to claim 6, wherein the optical guide member is an optical fiber.
9. The optical interconnection structure according to claim 6, wherein a first optical device is further provided on the upper portion of the optical guide member.
10. The optical interconnection structure according to claim 6, wherein a seating groove on which the optical device and interconnections can be seated is further provided on the upper portion of the predetermined region of the metal substrate.
11. A method for manufacturing an optical interconnection structure comprising:
(a) preparing a metal substrate;
(b) forming a hole that perpendicularly penetrates through the metal substrate on a predetermined region of the metal substrate;
(c) inserting the optical guide member through a via hole and then forming an oxidation film by the anodization of the metal substrate to fix the optical guide member to the inside of the hole; and
(d) removing the end of the optical guide member that is protruded into the upper and lower surfaces of the metal substrate including the oxidation film and then sequentially stacking a lower cladding layer, a core layer, and an upper cladding layer on the lower surface of the metal substrate including the oxidation film to form an optical waveguide.
12. The method for manufacturing the optical interconnection structure according to claim 11, further comprising:
forming a mirror on a predetermined region of the optical waveguide corresponding to the optical guide member.
13. The method for manufacturing the optical interconnection structure according to claim 11, wherein in step (c), the oxidation film is formed by dipping the metal substrate in any one electrolyte solution that is selected from sulfuric acid, oxalic acid, chromic acid, phosphoric acid, and boric acid and then applying an anode to the metal substrate and applying a cathode to the electrolyte.
14. The method for manufacturing the optical interconnection structure according to claim 11, wherein after step (c), further comprising:
(c-1) forming a mask pattern on the oxidation layer using a lithography process and forming a seating groove by etching the oxidation layer using the mask pattern as a mask so that the metal substrate is exposed;
(c-2) adhering and fixing an optoelectronic device driving driver or a receiver onto the metal substrate exposed inside the seating groove by adhesives; and
(c-3) forming a protective film that protects and supports the laser diode driving driver or between the photo diode receivers inside the seating groove.
15. The method for manufacturing the optical interconnection structure according to claim 11, wherein in step (d), the optical waveguide is formed using any one method selected from a photolithography method, a RIE method, a molding method, a hot embossing method, a UV patterning method, and a laser direct writing method, an oxidation method, a chemical vapor deposition method, a sputtering method, a flame hydrolysis deposition method, and a sol-gel method.
16. The method for manufacturing the optical interconnection structure according to claim 11, wherein in step (e), the mirror is formed using any one method selected from a dicing method using a diamond blade, a laser processing method, a wet etching or a dry etching, a photolithography method, a hot embossing method, and a molding method.
17. The method for manufacturing the optical interconnection structure according to claim 11, wherein step (e) further comprises coating the reflection surface of the mirror with any one metal thin film selected from Ag, Au, and Al, or coating it with a high reflection thin film.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for controlling a flexible display in a portable terminal, the method comprising:
displaying a screen in a view area on a surface of the flexible display;
identifying that the flexible display is bent;
dividing the view area into a main screen area and a sub screen area on a basis of a bent region, wherein the sub screen area includes the bent region; and
outputting first information in the main screen area and second information in the sub screen area on the surface of the flexible display, wherein the first information is related to the second information.
2. The method of claim 1, further comprising:
when the flexible display is unbent, releasing the main screen area and the sub screen area and, through a whole screen of the flexible display, outputting only the first information or outputting an integration of the first information and the second information.
3. The method of claim 1, further comprising:
when control information is designated to the sub screen area, controlling the main screen area according to the control information, and outputting the first information in the main screen area.
4. The method of claim 3, wherein the control information comprises any one of information associated with control of scrolling displayed contents of the main screen area to a corresponding direction, information associated with control of zooming in or out displayed contents of the main screen area, and information associated with control of turning displayed contents of the main screen area to previous displayed contents or next displayed contents.
5. The method of claim 1, wherein dividing the view area into the main screen area and the sub screen area on the basis of the bent region comprises:
distinguishing a non-bent region and the bent region; and
allotting the main screen area to include the non-bent region, and allotting the sub screen area to include the bent region.
6. The method of claim 1, further comprising:
distinguishing a non-bent region and the bent region; and
changing the sub screen area as the bent region changes.
7. The method of claim 1, wherein dividing the view area into the main screen area and the sub screen area on the basis of the bent region comprises:
allotting the main screen area to include a preset first region; and
allotting the sub screen area to include a preset second region.
8. The method of claim 1, wherein dividing the view area into the main screen area and the sub screen area on the basis of the bent region comprises:
determining that a whole screen of the flexible display is to include the main screen area;
further constructing an overlaid screen on the main screen area; and
determining the overlaid screen to include the sub screen area.
9. The method of claim 1, wherein outputting the first information in the main screen area and outputting the second information in the sub screen area comprises outputting the second information through in the sub screen area when the second information associated with the first information exists.
10. The method of claim 1, wherein outputting the first information in the main screen area and outputting the second information in the sub screen area comprises outputting the second information to the sub screen area when a program operated as a background is confirmed and the second information about the program operated as the background exists.
11. An apparatus configured to control a display in a portable terminal, the apparatus comprising:
a flexible display configured to output information and display a screen in a view area on a surface of the flexible display;
a storage unit configured to store data about an operation of the portable terminal; and
a controller configured to:
identify that the flexible display is bent,
divide the view area into a main screen area and a sub screen area on a basis of a bent region, wherein the sub screen area includes the bent region, and
output first information in the main screen area and second information in the sub screen area on the surface of the flexible display, wherein the first information is related to the second information.
12. The apparatus of claim 11, wherein, when the flexible display is unbent, the controller is configured to release the main screen area and the sub screen area and, through a whole screen of the flexible display, output only the first information or output an integration of the first information and the second information.
13. The apparatus of claim 11, wherein, when control information is designated to the sub screen area, the controller is configured to control the main screen area according to the control information, and output the first information in the main screen area.
14. The apparatus of claim 13, wherein the control information comprises any one of information associated with control of scrolling displayed contents of the main screen area to a corresponding direction, information associated with control of zooming in or out displayed contents of the main screen area, and information associated with control of turning displayed contents of the main screen area to previous displayed contents or next displayed contents.
15. The apparatus of claim 11, wherein the controller is configured to distinguish a non-bent region and the bent region, and allot the main screen area as the non-bent region and allot the sub screen area as the bent region.
16. The apparatus of claim 11, wherein the controller is configured to distinguish a non-bent region and the bent region and change the sub screen area as the bent region is changed.
17. The apparatus of claim 11, wherein the controller is configured to allot the main screen area as a preset first region, and allot the sub screen area as a preset second region.
18. The apparatus of claim 11, wherein the controller is configured to decide a whole screen of the flexible display as the main screen area, construct an overlaid screen on the main screen area, and determine the overlaid screen to be the sub screen area.
19. The apparatus of claim 11, wherein the controller is configured to output the second information in the sub screen area when the second information associated with the first information exits.
20. The apparatus of claim 11, wherein the controller is configured to output the second information to the sub screen area when a program operated as a background is confirmed and the second information about the program operated as the background exits.