1461102863-fbdbcfe1-087c-4613-8f3c-def25264e73e

1. An imaging device comprising
an imaging station,
a sheet media tray spaced from said imaging station,
a media guide path between said imaging station and said media tray,
a pivotally mounted media feed system located for driving media through said media guide path,
a pivotally mounted media sensor located for sensing media in said media guide path, said media sensor having an abutment surface,
at least one motor to provide torque to said media feed system, a slip connection between said media feed system and said media sensor to provide torque to said media sensor,
a blocking member located on said imaging device to block said media sensor to limit movement of said media sensor away from said media guide path,
a rotatable member mounted on said imaging device having a ledge and an arm, and being resiliently biased to rotate said ledge to face said abutment surface of said media sensor for preventing pivoting of said media sensor, a lever being located to rotate said rotatable member by contact with said media feed system to move said ledge to not prevent pivoting of said media sensor when said media feed system pivots away from said media guide path a greater distance than said media sensor moves away from said media guide path, and wherein:
said media feed system moves by said motor and said media sensor moves by said slip connection to bring said media sensor to said media for said media sensor to sense said media,
said media feed system moves by said motor away from said media guide path and said media sensor moves away from said media guide path by said slip connection a limited, first amount at which said ledge faces said abutment surface in response to rotation under said bias of said rotatable member,
said media feed system moves by said motor to said media guide path while said media sensor is held by said abutment and ledge and said slip connection slips, and
said media feed system moves away from said media guide path in an amount greater than said first amount to contact said lever to thereby rotate said rotatable member and free said media sensor to move under said slip connection for sensing media in said media feed path.
2. The imaging device of claim 1 in which said slip connection comprises a second member which is rotated by a shaft which rotates said media feed system and which is frictionally engaged with said media sensor under resilient bias.
3. The imaging device of claim 1 in which said media feed system is an autocompensating system.
4. The imaging device of claim 2 in which said media feed system is an autocompensating system.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A nasal implant, comprising:
an elongated body portion, the body portion forming a central axis and having opposing inner body and outer body surfaces, the inner body surface having a ventral groove portion disposed substantially parallel to the central axis, and the outer body surface having a ridge portion, wherein the ventral groove portion comprises a deepest portion in proximate correspondence to a highest portion of the ridge portion with respect to the central axis;
an elongated tail portion, a lower portion of the tail portion in communication with at least an upper portion of the body portion, wherein an angle formable between an axis definable by the tail portion and the central axis is between 0-90 degrees;
a first wing portion, the first wing portion having opposing inner first wing and outer first wing surfaces, wherein an inner portion of the first wing portion is in communication with at least a first outer portion of the body portion;
a head portion, the head portion having opposing inner head and outer head surfaces, wherein the inner head surface is in communication with at least a lower portion of the inner body surface and the outer head surface is in communication with at least a lower portion of the outer body surface;
a second wing portion, the second wing portion having opposing inner second wing and outer second wing surfaces, wherein an inner portion of the second wing portion is in communication with at least a first outer portion of the head portion; and
a leg portion, the leg portion having opposing inner leg and outer leg surfaces, an upper portion of the leg portion in communication with at least a lower portion of the head portion.
2. The nasal implant of claim 1, wherein the deepest portion of the ventral groove portion is operable to receive at least a portion of a dorsal hump when the nasal implant is implanted.
3. The nasal implant of claim 1, wherein a length between a lower portion of the body portion and the upper portion of the body portion is between about 36-44 mm.
4. The nasal implant of claim 1, wherein a thickness between the inner body surface and the outer body surface is between about 0.1-5 mm.
5. The nasal implant of claim 1, wherein the ventral groove portion extends substantially between a lower portion of the body portion and the upper portion of the body portion.
6. The nasal implant of claim 1, wherein a length of the ventral groove portion is between about 26-40 mm.
7. The nasal implant of claim 1, wherein a depth of the deepest portion of the ventral groove portion relative to a plane formable by the lower portion of the inner body surface and an upper portion of the inner body surface is between about 0.5-2 mm.
8. The nasal implant of claim 1, wherein a height of the highest portion of the ridge portion relative to a plane formable by the lower portion of the outer body surface and an upper portion of the outer body surface is between about 0.5-1 mm.
9. The nasal implant of claim 1, wherein the tail portion is adjustably operable to receive at least a portion of a glabella when the nasal implant is implanted.
10. The nasal implant of claim 1, wherein the tail portion is operable to fixably secure the nasal implant at a root of the nose and restrict a movement of the body portion relative to the root when the nasal implant is implanted.
11. The nasal implant of claim 1, wherein a width of an upper portion of the tail portion is less than a width of the lower portion of the tail portion.
12. The nasal implant of claim 1, wherein a length between an upper portion of the tail portion and the lower portion of the tail portion is between about 3-12 mm.
13. The nasal implant of claim 1, wherein a thickness of the tail portion is between about 0.1-2.5 mm.
14. The nasal implant of claim 1, wherein the first wing portion is adjustably operable to receive at least a portion of a lateral cartilage when the nasal implant is implanted.
15. The nasal implant of claim 1, wherein the first wing portion and the body portion cooperate to restrict a movement of the body portion relative to the central axis when the nasal implant is implanted.
16. The nasal implant of claim 1, wherein an outer peripheral portion of the first wing portion opposite the inner portion of the first wing portion comprises a protruding edge portion, wherein a length between the inner portion of the first wing portion and the protruding edge portion is between about 4-8 mm.
17. The nasal implant of claim 16, wherein a thickness of the outer peripheral portion of the first wing portion opposite the inner portion of the first wing portion is between about 0.1-1 mm.
18. The nasal implant of claim 1, further comprising a second first wing portion, the second first wing portion comprising an inner portion of the second first wing portion in communication with at least a second outer portion of the body portion opposite the first outer portion of the body portion.
19. The nasal implant of claim 18, wherein an angle formable between a plane definable by the first wing portion and a plane definable by the second first wing portion is between about 45-110 degrees.
20. The nasal implant of claim 18, wherein the second first wing portion is adjustably operable to receive at least a portion of a lateral cartilage when the nasal implant is implanted.
21. The nasal implant of claim 18, wherein the second first wing portion, the first wing portion, and the body portion cooperate to restrict a movement of the body portion relative to the central axis when the nasal implant is implanted.
22. The nasal implant of claim 18, wherein an outer peripheral portion of the second first wing portion opposite the inner portion of the second first wing portion comprises a protruding edge portion, wherein a length between the inner portion of the second first wing portion and the protruding edge portion of the second first wing portion is between about 4-8 mm.
23. The nasal implant of claim 22, wherein a thickness of the outer peripheral portion of the second first wing portion opposite the inner portion of the second first wing portion is between about 0.1-1 mm.
24. The nasal implant of claim 22, wherein a distance between the protruding edge of the second first wing portion and a corresponding protruding edge of the first wing portion is between about 12-17 mm.
25. The nasal implant of claim 1, further comprising a neck portion, wherein an upper portion of the neck portion is in communication with at least a lower portion of the body portion and a lower portion of the neck portion is in communication with at least an upper portion of the head portion.
26. The nasal implant of claim 25, wherein a width of the neck portion is between about 0.6-4 mm.
27. The nasal implant of claim 25, wherein a thickness of the neck portion is between about 0.1-4 mm.
28. The nasal implant of claim 1, wherein a deepest portion of the inner head surface is operable to receive at least a portion of a greater alar cartilage when the nasal implant is implanted.
29. The nasal implant of claim 1, wherein a width between a first and second outer portion of the head portion is between about 12-17 mm.
30. The nasal implant of claim 1, wherein a thickness between the inner head surface and the outer head surface is between about 0.1-5 mm.
31. The nasal implant of claim 1, wherein an angle formable between an axis definable by the head portion and the central axis is greater than about 15 degrees.
32. The nasal implant of claim 1, wherein the outer head surface comprises a protruded portion.
33. The nasal implant of claim 1, wherein an inner leg surface of the leg portion is operable to receive at least a portion of a columella when the nasal implant is implanted.
34. The nasal implant of claim 1, wherein the leg portion is operable to cooperate with the head portion to restrict a movement of the head portion when the nasal implant is implanted.
35. The nasal implant of claim 1, wherein a length of the leg portion is between about 3-7 mm.
36. The nasal implant of claim 1, wherein a width of the upper portion of the leg portion is greater than a width of a lower portion of the leg portion.
37. The nasal implant of claim 1, wherein a thickness of the leg portion is between about 0.1-2.5 mm.
38. The nasal implant of claim 1, wherein the second wing portion is adjustably operable to receive at least a portion of an alar cartilage when the nasal implant is implanted.
39. The nasal implant of claim 1, wherein the second wing portion and the head portion cooperate to restrict a movement of the body portion when the nasal implant is implanted.
40. The nasal implant of claim 1, wherein an outer peripheral portion of the second wing portion opposite the inner portion of the second wing portion comprises a protruding edge portion, wherein a length between the inner portion of the second wing portion and the protruding edge portion is between about 2-4 mm.
41. The nasal implant of claim 40, wherein a thickness of the outer peripheral portion of the second wing portion opposite the inner portion of the second wing portion is between about 0.1-1 mm.
42. The nasal implant of claim 1, further comprising a second second wing portion, the second second wing portion comprising an inner portion of the second second wing portion in communication with at least a second outer portion of the head portion opposite the first side portion of the head portion.
43. The nasal implant of claim 42, wherein the second second wing portion is adjustably operable to receive at least a portion of an alar cartilage when the nasal implant is implanted.
44. The nasal implant of claim 42, wherein the second second wing portion, the second wing portion, and the head portion cooperate to restrict a movement of the head portion when the nasal implant is implanted.
45. The nasal implant of claim 42, wherein an outer peripheral portion of the second second wing portion opposite to the inner portion of the second second wing portion comprises a protruding edge portion, wherein a length between the inner portion of the second second wing portion and the protruding edge portion of the second second wing portion is between about 2-4 mm.
46. The nasal implant of claim 42, wherein a thickness of the outer peripheral portion of the second second wing portion opposite the inner portion of the second second wing portion is between about 0.1-1 mm.
47. The nasal implant of claim 1, wherein the body portion and the first wing portion are integrally formed as a unitary article.
48. The nasal implant of claim 1, wherein the body portion and the tail portion are integrally formed as a unitary article.
49. The nasal implant of claim 1, wherein the body portion and the head portion are integrally formed as a unitary article.
50. The nasal implant of claim 1, wherein the body portion is in communication with the head portion via a neck portion, the neck portion being integrally formed with the body portion and the head portion as a unitary article.
51. The nasal implant of claim 1, wherein the head portion and the second wing portion are integrally formed as a unitary article.
52. The nasal implant of claim 1, wherein the head portion and the leg portion are integrally formed as a unitary article.
53-120. (canceled)
121. A method of adapting a nasal implant for nasal augmentation, the nasal implant having an elongated body portion, an elongated tail portion in communication with at least an upper portion of the body portion, a first wing portion in communication with at least a first outer portion of the body portion, a head portion in communication with at least a lower portion of the body portion, a second wing portion in communication with at least an outer portion of the head portion, and a leg portion in communication with at least a lower portion of the head portion, the body portion forming a central axis and having opposing inner body and outer body surfaces, the inner body surface having a ventral groove portion disposed substantially parallel to the central axis, the outer body surface having a ridge portion, and the ventral groove portion comprising a deepest portion in proximate correspondence to a highest portion of the ridge portion with respect to the central axis, the method comprising:
identifying an appropriate set of dimensions of the nasal implant for the nasal augmentation; and
adapting the nasal implant for the nasal augmentation by performing a trimming of at least an outer peripheral portion of at least one of:
the body portion;

the tail portion;
the first wing portion;
the neck portion;
the second wing portion;
the head portion; and
the leg portion.
122. The method of claim 121, wherein the deepest portion of the ventral groove is operable to receive at least a portion of a dorsal hump when at least the outer peripheral portion of the body portion is trimmed and the nasal implant is implanted.
123. The method of claim 121, wherein the tail portion is operable to fixably secure the nasal implant at a root of the nose and restrict a movement of the body portion relative to the root when at least the outer peripheral portion of the tail portion is trimmed and the nasal implant is implanted.
124. The method of claim 121, wherein the tail portion is operable to receive at least a portion of a glabella when at least the outer peripheral portion of the tail portion is trimmed and the nasal implant is implanted.
125. The method of claim 121, wherein the first wing portion is operable to receive at least a portion of a lateral cartilage when at least the first wing portion is trimmed and the nasal implant is implanted.
126. The method of claim 121, wherein the first wing portion and the body portion cooperate to restrict a movement of the body portion relative to the central axis when the nasal implant is implanted.
127. The method of claim 121, further comprising trimming at least an outer peripheral portion of a second first wing portion.
128. The method of claim 121, wherein an inner surface of the head portion is operable to receive at least a portion of a greater alar cartridge when at least the head portion is trimmed and the nasal implant is implanted.
129. The method of claim 121, wherein an inner surface of the leg portion is operable to receive at least a portion of a columella when the leg portion is trimmed and the nasal implant is implanted.
130. The method of claim 121, wherein the second wing portion is operable to receive at least a portion of an alar cartilage when the second wing portion is trimmed and the nasal implant is implanted.
131. The method of claim 121, wherein the second wing portion and the head portion cooperate to restrict a movement of the body portion when the nasal implant is implanted.
132. The method of claim 121, further comprising trimming at least an outer peripheral portion of a second second wing portion.
133. The method of claim 121, wherein the outer peripheral portion comprises at least a portion of a side edge.
134. The method of claim 121, wherein the outer peripheral portion comprises at least a portion of a surface.
135. The method of claim 121, wherein the trimming comprises reducing a thickness of a portion of the nasal implant.
136. The method of claim 121, wherein the trimming comprises reducing one or more dimensions of one or more of the body portion, the tail portion, the first wing portion, the tail portion, the head portion, the second wing portion, and the leg portion to correspond with one or more of the identified dimensions.
137. The method of claim 121, wherein the trimming comprises cutting.
138. The method of claim 121, wherein the adapted nasal implant provides for the nasal augmentation when the adapted nasal implant is implanted.
139. The method of claim 121, wherein the identifying is based on identifying at least a location of one or more of a dorsal hump, a root of the nose, a glabella, a lateral cartilage, a greater alar cartridge, a columella, and an alar cartilage.
140. The method of claim 121, wherein the identifying is based on identifying at least a size of one or more of a dorsal hump, a root of the nose, a glabella, a lateral cartilage, a greater alar cartridge, a columella, and an alar cartilage.
141. A method of adapting a nasal implant for nasal augmentation, the nasal implant having an elongated body portion, an elongated tail portion in communication with at least an upper portion of the body portion, a first wing portion in communication with at least a first outer portion of the body portion, a head portion in communication with at least a lower portion of the body portion, a second wing portion in communication with at least an outer portion of the head portion, and a leg portion in communication with at least a lower portion of the head portion, the body portion forming a central axis and having opposing inner body and outer body surfaces, the inner body surface having a ventral groove portion disposed substantially parallel to the central axis, the outer body surface having a ridge portion, and the ventral groove portion comprising a deepest portion in proximate correspondence to a highest portion of the ridge portion with respect to the central axis, the method comprising:
identifying an appropriate set of dimensions of the nasal implant for the nasal augmentation; and
adapting the nasal implant for the nasal augmentation by detaching at least one of:
the body portion;

the tail portion;
the first wing portion;
the neck portion;
the second wing portion;
the head portion; and
the leg portion.
142. The method of claim 141, wherein the detaching comprises cutting.
143. The method of claim 141, wherein the adapted nasal implant provides for the nasal augmentation when the adapted nasal implant is implanted.
144. The method of claim 141, wherein the adapted nasal implant and the at least one detached portion provide for nasal augmentation when the adapted nasal implant and the detached at least one portion are implanted.
145. The method of claim 141, wherein the identifying is based on identifying at least a location of one or more of a dorsal hump, a root of the nose, a glabella, a lateral cartilage, a greater alar cartridge, a columella, and an alar cartilage.
146. The method of claim 141, wherein the identifying is based on identifying at least a size of one or more of a dorsal hump, a root of the nose, a glabella, a lateral cartilage, a greater alar cartridge, a columella, and an alar cartilage.

1461102853-ceaf6cbb-c270-4177-8af2-efda7f01ba0b

1. A computer-implemented method comprising:
defining a debugging script;
defining at least one trigger point and associating the at least one trigger point with the debugging script;
compiling the debugging script on the fly;
identifying a defined trigger point in a section of code during run time of a debuggee; and
executing the debugger script in response to the identification of the defined trigger to automatically debug the code.
2. A method as in claim 1, wherein the defining a debugging script comprises: generating a new debugging script.
3. A method as in claim 1, wherein the defining a debugging script comprises: modifying a pre-defined debugging script.
4. A method as in claim 3, wherein the modifying a pre-defined debugging script comprises: launching a stand-alone editor; populating the stand-alone editor with the pre-defined debugging script; and receiving user-generated input to modify the pre-defined debugging script.
5. A method as in claim 3, wherein the modifying a pre-defined debugging script comprises: accessing an integrated editor during debugging; populating the integrated editor with the pre-defined debugging script; and receiving user-generated input to modify the pre-defined debugging script.
6. A method as in claim 1, further comprising: saving the defined debugging script to a script repository.
7. A method as in claim 1, wherein the defining a trigger point comprises: creating a new trigger point.
8. A method as in claim 1, wherein the defining a debugging script comprises: modifying a pre-defined trigger point.
9. A method as in claim 8, wherein the modifying a pre-defined trigger point comprises: launching a stand-alone editor; populating the stand-alone editor with the pre-defined trigger point; and receiving user-generated input to modify the pre-defined trigger point.
10. A method as in claim 8, wherein the modifying a pre-defined trigger point comprises: accessing an integrated editor during debugging; populating the stand-alone editor with the pre-defined trigger point; and receiving user-generated input to modify the pre-defined trigger point.
11. A method as in claim 1, wherein the defining a trigger point comprises: associating a trigger point with a debugger script or an existing combination of a debugger script with a pre-defined trigger point.
12. A method as in claim 1, wherein the code is in Advanced Business Application Programming language.
13. A method as in claim 1, wherein the debugger script is in Advanced Business Application Programming language.
14. A method as in claim 1, wherein the trigger point is based on a user-defined watchpoint.
15. A method as in claim 1, wherein the trigger point is based on a user-defined breakpoint.
16. A method as in claim 1, wherein the trigger point is the current position of the code of the debuggee.
17. A method as in claim 16, wherein reaching the trigger point causes an immediate execution of the debugging script.
18. A method as in claim 1, wherein the code contains a trigger point after each step traversed by a debugger.
19. A computer-implemented method comprising:
defining one or more trigger points in a section of code to be debugged;
associating the trigger points with a debugger script or with a combination of debugger script and additional trigger points;
creating a debugger and executing the debugger script in response to identifying the defined trigger points during run time of a debuggee to automatically debug the code.
20. A computer-implemented method comprising:
identifying a trigger point within a section of code to be debugged;
launching a debugger script editor;
compile a debugger script generated on the fly in the script editor; and
executing the compiled debugger script to debug the code.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A semiconductor power device comprising:
a source region of a first conductivity type;
a body region of a second conductivity type encompassing said source region;
a first drain region of said first conductivity type disposed outside of edge termination;
a gate separated by an insulating layer from channel region of said body region;
a source metal layer connected to said source regions and said body regions;
a first gate metal connected to said gate;
a first drain metal connected to said first drain region;
said source region, said body region, said gate and said first drain region formed in a top side of semiconductor chip;
a gate-drain clamp diode connected between a second gate metal on the gate-drain clamp diode and said first drain metal, composed of multiple back-to-back polysilicon Zener diodes disposed outside of edge termination area without having said polysilicon Zener diode or said second gate metal cross over said edge termination;
a second drain region formed on a bottom side of said semiconductor chip;
a second drain metal layer connected to said second drain region; and
said first and second gate metals connected together at a gate lead frame through at least one bonding wire.
2. The semiconductor power device of claim 1, wherein said first gate metal and second gate metal connect together to said gate lead frame through two separated bond wires.
3. The semiconductor power device of claim 1, wherein said second gate metal connects to said first gate metal and then said gate lead frame through a single bond wire.
4. The semiconductor power device of claim 1 is a trench MOSFET comprising a plurality of semiconductor power cells in active area with each cell comprising said gate which is a trenched gate surrounded by said source region encompassed in said body region above said second drain region;
said second drain region of said first conductivity type disposed on a bottom surface of a low-resistivity substrate with said first type conductivity, and
said trench MOSFET cell further comprises an epitaxial layer of said first conductivity type over said substrate, said epitaxial layer having a lower doping concentration than said substrate.
5. The semiconductor power device of claim 4 further comprises an on-resistance reduction implantation region having same conductivity type as said source region surrounding trench bottom of each said trenched gate, with doping concentration higher than said epitaxial layer.
6. The semiconductor power device of claim 1 is a trench IGBT wherein:
said gate is a trenched gate;
said source region is an emitter region of said first conductivity type;
said body region is a base region of said second conductivity type;
said first drain region is a first collector region of said first conductivity type;
said source metal is a emitter metal;
said first drain metal is a first collector metal; and
said gate-drain clamp diode is a gate-collector clamp diode.
7. The semiconductor power device of claim 6 further comprises an on-resistance reduction implantation region having same conductivity type as said emitter region surrounding trench bottom of each said trenched gate.
8. The semiconductor power device of claim 6 is a PT trench IGBT further comprising:
a heavily doped substrate of said second conductivity type;
a first epitaxial layer of said first conductivity type grown on said substrate;
a second epitaxial layer of said first conductivity type grown on said first epitaxial layer, having less doping concentration than said first epitaxial layer; and
a second collector region of said second conductivity type is disposed on said bottom side of said substrate.
9. The semiconductor power device of claim 6 is a NPT trench IGBT further comprising:
a lightly doped substrate of said first conductivity type; and
a second collector region of said second conductivity type is disposed on the bottom side of said lightly doped substrate.
10. The semiconductor power device of claim 6 is a NPT trench IGBT further comprising:
a lightly doped substrate of said first conductivity type; and
a second collector region comprising alternately heavily doped regions with said first and second type conductivity formed on the bottom side of said lightly doped substrate.