Author: claimsbot

1. 1,2-Bis(2,2-difluoroethoxy)ethane represented by the following formula (1):
2. 1,2-Bis(2,2-difluoroethoxy)ethane according to claim 1, wherein a content of halide ions (total amount of chlorine ions, bromine ions and iodine ions) is less than 10 ppm by weight.
3. A method for manufacturing 1,2-bis(2,2-difluoroethoxy)ethane according to claim 1 comprising the step of reacting 2-(2,2-difluoroethoxy)ethanol represented by the following formula (2):
with a compound represented by the general formula (3):
in a basic compound or a basic compound-containing solvent, wherein Lg represents an anionic leaving group.
4. The method for manufacturing 1,2-bis(2,2-difluoroethoxy)ethane according to claim 3, wherein the basic compound comprises at least one selected from the group consisting of lithium hydroxide, sodium hydroxide, potassium hydroxide, calcium hydroxide, lithium hydride, sodium hydride, potassium hydride, calcium hydride, metallic sodium, butyl lithium, lithium diisopropylamide, sodium carbonate, potassium carbonate, triethylamine, pyridine, picoline, and lutidine.
5. The method for manufacturing 1,2-bis(2,2-difluoroethoxy)ethane according to claim 3, wherein the basic compound comprises at least one selected from the group consisting of lithium hydride, sodium hydride, potassium hydride, calcium hydride, butyl lithium, and lithium diisopropylamide.
6. The method for manufacturing 1,2-bis(2,2-difluoroethoxy)ethane according to claim 3, wherein the leaving group Lg in the general formula (3) is a p-toluene sulfonyloxy group (p-CH3C6H4SO3\u2014) or a trifluoromethane sulfonyloxy group (CF3SO3\u2014).
7. The method for manufacturing 1,2-bis(2,2-difluoroethoxy)ethane according to claim 6, wherein the synthesis step of 2-(2,2-difluoroethoxy)ethanol represented by the formula (2) comprises reacting 2,2-difluoroethanol with ethylene carbonate.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of removing artifacts from electroencephalogram (EEG) signals, the method comprises:
continuously recording EEG data during a magnetic resonance (MR) scan and segmenting the EEG data by a processor with respect to a time period based on the MR scan, to thereby obtain n temporally consecutive segments of EEG data;
for each segment j of the n segments:
determining whether a movement is detected when the respective segment j is recorded;
if no movement is detected, selecting the segment j for a template k;
if movement is detected, averaging EEG data of segments of the n temporally consecutive segments that have been selected for the template k, thereby modifying, based on data obtained by a movement detector, the template k in which an artifact caused by the movement and detected by the movement detector remained, correcting the artifact by subtracting the average from the EEG data of the segments to minimize the movement artifact in the EEG signals, incrementing k, and selecting the segment j for the template k;
if no movement is detected and j=n, selecting the segment j for the template k and averaging EEG data of segments of the n temporally consecutive segments that have been selected for the template k, thereby modifying, based on the data obtained by said movement detector, the template k in which the artifact caused by the movement and detected by the movement detector remained, and correcting the artifact by subtracting the template k from the EEG data of the segments to minimize the movement artifact in the EEG signals; and
outputting a correspondingly corrected EEG data signal.
2. The method according to claim 1, wherein the time period is a time required for obtaining a volume of MR data in the MR scan.
3. The method according to claim 1, which comprises detecting the movement with an acceleration sensor.
4. A system for removing artifacts from electroencephalograph (EEG) signals, the system comprising:
a segmenting and averaging unit configured to segment EEG data that are continuously recorded during a magnetic resonance (MR) scan of a subject, with respect to a time period based on the MR scan, and to thereby obtain n temporally consecutive segments of EEG data;
a movement detector configured to detect movement of the subject when the EEG data are recorded, and connected to output a movement detection signal to said segment and averaging unit; and
a subtracting unit,
said segmenting and averaging unit being configured, for each segment j of the n segments, to:
select a segment j for a template k, in case the movement detection signal does not indicate movement for the segment j;
in case the movement detection signal indicates movement for the segment j, average EEG data of segments of the n temporally consecutive segments that have been selected for the template k, thereby modifying, based on data obtained by said movement detector, the template k in which an artifact caused by the movement and detected by said movement detector remained, increment k, and select the segment j for the template k;
in case the movement detection signal does not indicate movement for the segment j and j=n, select the segment j for the template k and average EEG data of segments of the n temporally consecutive segments which have been selected for the template k, thereby modifying, based on data obtained by said movement detector, the template k in which an artifact caused by the movement and detected by said movement detector remained; and
said subtracting unit being configured to correct the artifact by subtracting the template k from the EEG data of the segments to minimize the movement artifact in the EEG signals.
5. The system according to claim 4, wherein the time period is a time required for obtaining a volume of MR data in the MR scan.
6. The system according to claim 4, wherein said movement detector comprises an acceleration sensor.
7. A non-transitory computer-readable medium having software code portions stored thereon and configured, when loaded into a computer memory, to carry out an electroencephalograph (EEG) data correction method by programming the computer to:
segment EEG data that are continuously recorded during a magnetic resonance (MR) scan, with respect to a time period based on the MR scan, to thereby obtain n temporally consecutive segments of EEG data;
for each segment j of the n segments:
determine whether movement is detected when the segment j is recorded and:
if no movement is detected, select the segment j for a template k;
if movement is detected, average EEG data of segments of the n temporally consecutive segments that have been selected for the template k, thereby modifying, based on the data obtained by the movement by a movement detector, the template k in which an artifact caused by the movement and detected by the movement detector remained, correct the artifact by subtracting the average from the EEG data of the segments to minimize the movement artifact in the EEG signals, increment k, and select the segment j for the template k; and
if movement is detected and j=n, select the segment j for the template k and average EEG data of segments of the n temporally consecutive segments that have been selected for the template k, to thereby modify, based on the data obtained by the movement detector, the template k in which an artifact caused by the movement and detected by the movement detector remained, and correct the artifact by subtracting the average from the EEG data of the segments to minimize the movement artifact in the EEG signals.

1. A system comprising a seat belt and a structure for a motor vehicle seat proper, the structure comprising:
a rigid frame for said seat proper, the frame extending between a front portion and a rear portion, the frame including a side cheek plate extending from said rear portion of the rigid frame to said front portion of the rigid frame; and
a coupling system comprising a link having a bottom portion mounted to pivot on a base and a top portion mounted to pivot relative to the rear portion of said rigid frame about a first pivot axis so that said bottom portion of the link pivoting relative to said base in a third direction causes said rear portion of the rigid frame to move at least vertically upward relative to said base;
said coupling system having an axial connection member secured to said top portion of the link, and mounted to pivot relative to said cheek plate; and a ring constrained to rotate with the axial connection member and having a first latch surface, so that said first latch surface is constrained to rotate with the link;
said seat structure further comprising an anchoring element provided with a second latch surface and to which said seatbelt is directly secured;
and wherein the anchoring element is mounted to pivot on said rigid frame about a second pivot axis distinct from the first axis, said anchoring element being adapted so that traction exerted by said seatbelt on the anchoring element along a seatbelt traction axis causes the anchoring element to pivot about the second axis in a second direction, from an unlocked position in which the second latch surface of said anchoring element is held at some distance away from the first latch surface of the coupling system by return means exerting forces in a first direction of rotation opposite to the second direction of rotation, and secondly to a locked position in which the second latch surface co-operates with the first latch surface to prevent the bottom portion of the link from pivoting in said third direction relative to said base.
2. A system according to claim 1, in which system said axial connection member passes through an opening provided at least in part in said cheek plate, in which system said cheek plate has an inside face and an outside face facing in the opposite direction to the direction in which said inside face faces, said anchoring element being mounted on said outside face of the cheek plate, and in which system said link is disposed facing said inside face of the cheek plate.
3. A system according to claim 1, in which system said axial connection member passes through an opening provided at least in part in said cheek plate, in which system said cheek plate has an inside face and an outside face facing in the opposite direction to the direction in which said inside face faces, said anchoring element being mounted on said outside face of the cheek plate, and in which system said link is disposed facing said outside face of the cheek plate.
4. A system according to claim 3, in which, on either side of the first latch surface, said ring is further provided with a first bearing piece having a contact surface mounted facing said link and with a second bearing piece having a contact surface mounted facing said cheek plate.
5. A system according to claim 1, in which said structure further comprises a second side cheek plate parallel to the first side cheek plate, and a second link, parallel to the first link, and having a bottom portion mounted to pivot on a base and a top portion mounted to pivot relative to the rear portion of said second cheek plate, said axial connection member being secured to said top portion of the second link and mounted to pivot relative to said second cheek plate;
so that said bottom portions of said links pivoting together relative to said base causes said rear portion of the seat frame to move at least vertically upward relative to said base.
6. A system according to claim 1, in which said first latch surface is provided with teeth, and in which said second latch surface is provided with teeth complementary to the teeth of said first latch surface.
7. A system according to claim 1, in which the frame includes a side cheek plate extending from said rear portion of the rigid frame to said front portion of the rigid frame and in which said anchoring element is mounted to pivot relative to said cheek plate.
8. A system according to claim 1, wherein said structure further comprises at least one runner comprising:
a stationary rail serving to be secured to a vehicle floor; and
a moving rail including at least a portion forming said base.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method of acquiring an offset deflection amount for a shaped beam, comprising:
forming reference images of first and second figures which can be shaped by first and second aperture plates placed on a lithography apparatus;
forming, using design data of a mark, a reference image of the mark;
forming a first convolution reference image obtained by a convolution calculation of the reference image of the mark and the reference image of the first figure and a second convolution reference image obtained by a convolution calculation of the reference image of the mark and the reference image of the second figure;
respectively scanning over the mark with charged particle beams having shaped into the first and second figures by using the first and second aperture plates to acquire optical images of the first and second figures;
forming a first convolution synthesis image obtained by a convolution calculation of the first convolution reference image and the optical image of the first figure and a second convolution synthesis image obtained by a convolution calculation of the second convolution reference image and the optical image of the second figure;
calculating center-of-gravity positions of the first and second convolution synthesis images; and
calculating an offset deflection amount for the charged particle beam having shaped into the second figure to match reference positions of the first and second figures based on the center-of-gravity positions of the first and second convolution synthesis images to output a result calculated.
2. The method according to claim 1, wherein
a quadrangular shape is used as the first figure, and a right triangular shape is used as the second figure.
3. The method according to claim 2, wherein
as the right triangular shape, an isosceles triangular right shape is used.
4. The method according to claim 1, further comprising:
calculating center-of-gravity positions of the first and second convolution reference images; and
calculating an amount of misalignment of the center-of-gravity position of the first convolution reference image and the center-of-gravity position of the second convolution reference image, wherein
when the offset deflection amount is calculated, a difference between the center-of-gravity positions of the first and second convolution synthesis image is corrected by the amount of misalignment.
5. The method according to claim 1, wherein
the acquiring optical images of the first and second figures, the forming the first and second convolution synthesis images, the calculating center-of-gravity positions of the first and second convolution synthesis images, and the calculating the offset deflection amount are repeated, and
when an optical image of the second figure is acquired for a next time, a charged particle beam having shaped into the second figure is deflected by a previously calculated offset deflection amount to scan over the mark.
6. A lithography apparatus comprising:
an emitting unit configured to emit a charged particle beam for forming shots of charged particle beams;
first and second shaping aperture plates configured to shape the charged particle beams of the shots into first and second figures;
a stage configured to be arranged a mark thereon;
a first forming unit configured to form reference images of the first and second figures;
a second forming unit configured to form a reference image of the mark using design data of the mark;
a third forming unit configured to form a first convolution reference image obtained by a convolution calculation of a reference image of the mark and the reference image of the first figure and a second convolution reference image obtained by a convolution calculation of the reference image of the mark and the reference image of the second figure;
a deflector configured to respectively scan over the mark by using the charged particle beams having shaped into the first and second figures;
a detector configured to detect reflected electrons from the mark;
an optical image acquiring unit configured to acquire optical images of the first and second figures using output values from the detector;
a fourth forming unit configured to form a first convolution synthesis image obtained by a convolution calculation of the first convolution reference image and the optical image of the first figure and a second convolution synthesis image obtained by a convolution calculation of the second convolution reference image and the optical image of the second figure;
a first calculating unit configured to calculate center-of-gravity positions of the first and second convolution synthesis images; and
a second calculating unit configured to calculate an offset deflection amount for the charged particle beam having shaped into the second figure to match reference positions of the first and second figures based on the center-of-gravity positions of the first and second convolution synthesis images.
7. The apparatus according to claim 6, wherein
a quadrangular shape is used as the first figure, and a right triangular shape is used as the second figure.
8. The apparatus according to claim 7, wherein
as the right triangular shape, an isosceles right triangular shape is used.
9. The apparatus according to claim 6, further comprising:
a third calculation configured to calculate center-of-gravity positions of the first and second convolution reference images; and
a fourth calculating unit configured to calculate an amount of misalignment of the center-of-gravity position of the first convolution reference image and the center-of-gravity position of the second convolution reference image, wherein
when the offset deflection amount is calculated, the second calculating unit corrects a difference between the center-of-gravity positions of the first and second convolution synthesis images by the amount of misalignment.
10. The apparatus according to claim 6, wherein
the acquisition of optical images of the first and second figures, the formation of the first and second convolution synthesis images, the calculation of center-of-gravity positions of the first and second convolution synthesis images, and the calculation of the offset deflection amount are repeated, and
when an optical image of the second figure is acquired for a next time, the deflector deflects a charged particle beam having shaped into the second figure by a previously calculated offset deflection amount to scan over the mark.