All The Claims

1. A method of fabricating a semiconductor device, comprising:
forming a first film with an opening on an insulating layer formed on a semiconductor substrate;
forming a second film on said first film in such a way that said opening is buried;
forming a trench pattern on said second film located in the upper portion of said opening;
forming a via pattern by etching said first film using said trench pattern to expose said insulating layer; and
forming a via hole and an interconnect trench in the upper portion of said via hole in said insulating layer employing said via pattern and said trench pattern,
wherein a width of said via hold depends on a part of said trench pattern and said opening having a larger width than said width of the via hole.
2. The method of claim 1, wherein one side of said trench pattern is between said opening.
3. The method of claim 1, wherein said first film is a multilayer.
4. The method of claim 1, wherein said second film is a multilayer.
5. The method of claim 1, wherein said insulating layer is a multilayer.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An interconnect apparatus comprising a transaction buffer mechanism including a plurality of transaction buffers, each transaction buffer being operable to buffer transaction packets of a respective type, and a reserve buffer dynamically assignable to one of the transaction buffers where additional capacity is required by that transaction buffer.
2. The interconnect apparatus of claim 1, wherein one transaction buffer is operable to buffer posted transaction packets.
3. The interconnect apparatus of claim 1, wherein one transaction buffer is operable to buffer non-posted transaction packets.
4. The interconnect apparatus of claim 1, wherein one transaction buffer is operable to buffer completion transaction packets.
5. The interconnect apparatus of claim 1, wherein each transaction buffer has a size insufficient to support streaming of packets, but wherein a combination of the capacity of a transaction buffer and the reserve buffer when assigned thereto is sufficient to support packet streaming.
6. The interconnect apparatus of claim 1, comprising control logic for allocating the reserve buffer to a transaction buffer where additional capacity is required by that transaction buffer.
7. The interconnect apparatus of claim 1, comprising control logic for allocating the reserve buffer to a transaction buffer in response to detecting a packet streaming condition.
8. The interconnect apparatus of claim 1, wherein the control logic is configured to report the allocation of the reserve buffer to a transaction buffer as a release of credit for that transaction buffer.
9. The interconnect apparatus of claim 1, operable under a PCI Express protocol.
10. The interconnect apparatus of claim 1, wherein the interconnect apparatus comprises a switch.
11. The interconnect apparatus of claim 1 in the form of an integrated circuit.
12. A computer system comprising a transaction buffer mechanism including a plurality of transaction buffers, each transaction buffer being operable to buffer transaction packets of a respective type, and a reserve buffer dynamically assignable to one of the transaction buffers where additional capacity is required by that transaction buffer.
13. A method of operating an interconnect apparatus comprising a transaction buffer mechanism including a plurality of transaction buffers, the method comprising each transaction buffer buffering transaction packets of a respective type, and dynamically allocating a reserve buffer to one of the transaction buffers where additional capacity is required by that transaction buffer.
14. The method of claim 13, wherein posted transactions are buffered in a first transaction buffer, non-posted transaction packets are buffered in a second transaction buffer, and completed transaction packets are buffered in a third transaction buffer.
15. The method of claim 13, wherein each transaction buffer has a size insufficient to support streaming of packets, but wherein a combination of the
capacity of a transaction buffer and the reserve buffer when assigned thereto is sufficient to support packet streaming.
16. The method of claim 13, wherein the reserve buffer is allocated to a transaction buffer in response to detecting a packet streaming condition.
17. The method of claim 13, wherein the allocation of the reserve buffer to a transaction buffer appears to external devices as a release of credit for that transaction buffer.
18. The method of claim 13, operable under a PCI Express protocol.

1. An isolation valve for use in a subterranean well, the isolation valve comprising:
an actuator member which displaces when the isolation valve is actuated between open and closed configurations;
a closure member;
a pivot connecting the closure member to the actuator member, wherein the pivot displaces with the actuator member; and
first and second annular seats, wherein, in the closed configuration, the closure member is sealingly engaged with the first annular seat on a first side of the closure member, and the closure member is sealingly engaged with the second annular seat on a second side of the closure member opposite the first side.
2. The isolation valve of claim 1, further comprising a profile formed in the isolation valve, and wherein the profile biases the closure member from an open position to a closed position when the isolation valve is actuated from the open configuration to the closed configuration.
3. The isolation valve of claim 1, wherein the closure member comprises a flapper which pivots about the pivot when the isolation valve is actuated between the open and closed configurations.
4. The isolation valve of claim 1, wherein the first annular seat is carried on the actuator member.
5. The isolation valve of claim 1, wherein, in the closed configuration, the closure member prevents fluid flow through a passage extending longitudinally through the isolation valve, the closure member preventing the fluid flow in first and second opposite longitudinal directions through the passage.
6. An isolation valve for use in a subterranean well, the isolation valve comprising:
a pivot connecting a closure member to an actuator member which displaces when the isolation valve is actuated between open and closed configurations;
a profile formed in the isolation valve, the profile biasing the closure member from an open position to a closed position when the isolation valve is actuated from the open configuration to the closed configuration; and
wherein, in the closed configuration, the closure member is sealingly engaged with a first circumferential seat on a first side of the closure member, and the closure member is sealingly engaged with a second circumferential seat on a second side of the closure member opposite the first side.
7. The isolation valve of claim 6, wherein the pivot displaces with the actuator member when the isolation valve is actuated between the open and closed configurations.
8. The isolation valve of claim 6, wherein the closure member comprises a flapper which pivots about the pivot when the isolation valve is actuated between the open and closed configurations.
9. The isolation valve of claim 6, wherein the first circumferential seat is carried on the actuator member.
10. The isolation valve of claim 6, wherein, in the closed configuration, the closure member prevents fluid flow through a passage extending longitudinally through the isolation valve, the closure member preventing the fluid flow in first and second opposite longitudinal directions through the passage.
11. A method of actuating an isolation valve in a subterranean well, the method comprising:
during actuation of the isolation valve between open and closed configurations, simultaneously displacing an actuator member, a closure member, and a pivot which pivotably connects the closure member to the actuator member; and
during actuation of the isolation valve from the open configuration to the closed configuration, sealingly engaging the closure member with a first annular seat on a first side of the closure member, and sealingly engaging the closure member with a second annular seat on a second side of the closure member opposite the first side.
12. The method of claim 11, further comprising interconnecting the isolation valve in a tubular string, the tubular string being installed in the well.
13. The method of claim 11, wherein a profile formed in the isolation valve biases the closure member from an open position to a closed position when the isolation valve is actuated from the open configuration to the closed configuration.
14. The method of claim 11, wherein the closure member comprises a flapper which pivots about the pivot when the isolation valve is actuated between the open and closed configurations.
15. The method of claim 11, wherein the first annular seat is carried on the actuator member.
16. The method of claim 11, further comprising the closure member preventing fluid flow through a passage extending longitudinally through the isolation valve in the closed configuration, and the closure member preventing the fluid flow in first and second opposite longitudinal directions through the passage.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A method for manufacturing liquid crystal display elements comprising the steps of:
forming polarized light by the use of polarizer that has grating to separate polarized light from non-polarized light; and
irradiating thin film with the polarized light to form alignment film.
2. The method for manufacturing liquid crystal display element according to claim 1, wherein the grating is formed on a substrate that transmits ultraviolet light and is formed by the material, shape, and size that all fit to the desired wavelength of the polarized light.
3. The method for manufacturing liquid crystal display element according to claim 2, wherein the substrate that transmits ultraviolet light is made of silica glass.
4. The method for manufacturing liquid crystal display element according to claim 2, wherein the materials of the grating are silicon dioxide (SiO2), calcium fluoride (CaF), or magnesium fluoride (MgF).
5. An apparatus for optically arranging surface of alignment film comprising:
a light source;
a condenser mirror that collects radiated light from the light source,
a collimator lens or collimator mirror that generates parallel beams from the light collected by the condenser mirror;
a grating;
a polarizer that allows the parallel beam to fall on and extract polarized light from non-polarized light;
an integrator lens that uniformizes light intensity distribution of the polarized light; and
a lens that enlarges or contracts the irradiated range of the polarized light.
6. The apparatus for optically arranging surface of alignment film according to claim 5, wherein the substrate to be irradiated with polarized light is collectively irradiated with the polarized light.
7. An apparatus for optically arranging surface of alignment film comprising:
a light source;
a condenser mirror that collects radiated light from the light source,
a collimator lens or collimator mirror that generates parallel beams from the light collected by the condenser mirror;
a grating;
a polarizer that allows the parallel beam to fall on and extract polarized light from non-polarized light; and
an integrator lens that uniformizes light intensity distribution of the polarized light.
8. The apparatus for optically arranging surface of alignment film according to claim 7, wherein the substrate to be irradiated with polarized light is irradiated with the polarized light on divided area sequentially.
9. The apparatus for optically arranging surface of alignment film according to claim 5, wherein the grating is formed on a substrate that transmits ultraviolet ray and is formed by the material, shape, and size that all fit to the desired wavelength of the polarized light.
10. The apparatus for optically arranging surface of alignment film according to claim 7, wherein the grating is formed on a substrate that transmits ultraviolet ray and is formed by the material, shape, and size that all fit to the desired wavelength of the polarized light.
11. The apparatus for optically arranging surface of alignment film according to claim 9, wherein the substrate that transmits ultraviolet light is made of silica glass.