All The Claims

1. A method of controlling gas flow to a processing system that includes a processing chamber coupled to a facility exhaust through a foreline, comprising:
flowing a first gas from a first gas source into a manifold having at least a first outlet port, a second outlet port, a third outlet port and a fourth outlet port, wherein the first outlet port is coupled to the foreline through an evacuation path comprising an isolation valve and a purge line, each of the second and third outlet port is connected to the processing chamber through a respective final valve, each of the second and third outlet port is connected to a pre-flow path through a respective by-pass valve, and the pre-flow path comprises:
a throttle valve upstream to the purge line; and
the purge line upstream to the foreline;
flowing a second gas from a second gas source into the manifold;
selecting an operational state of valves within the manifold to cause the first and second gases to exit through at least one of the second or third outlet ports while in a processing mode;
flowing the first and second gases through at least one of the second or third outlet ports of the manifold into the foreline by-passing the processing chamber through the pre-flow path until a predefine state of the gases within the manifold is obtained, wherein the predefined state is obtained by utilizing the throttle valve to match conditions in the pre-flow path to conditions of the processing chamber;
directing the first and second gases exiting the manifold through at least one of the second or third outlet ports into the processing chamber after the predefine state has been obtained; and
processing a substrate within the processing chamber.
2. The method of claim 1 further comprising:
flowing the first and second gases through the manifold into the foreline by-passing the processing chamber after substrate processing is complete.
3. The method of claim 2 further comprising:
replacing at least one of the first and second gases in the manifold with a third gas provided to the manifold from a third gas source.
4. The method of claim 3 further comprising:
preventing the third gas exiting the manifold from entering the foreline ; and
continuing to draw at least one of the first or second gas into the foreline while the third gas is exiting the manifold.
5. The method of claim 4, wherein preventing the third gas from entering the foreline comprises stopping the flow of the third gas or flowing the third gas into the processing chamber.
6. The method of claim 4, wherein preventing the third gas from entering the foreline comprises:
decoupling the outlet ports through which the third gas is exiting the manifold from the foreline.
7. The method of claim 1 further comprising:
adjusting the operational state of at least one valve in the manifold to obtain a ratio of flows from one gas source through at least two outlet ports.
8. The method of claim 7, wherein adjusting the operational state of the at least one valve in the manifold further comprises:
sensing a metric of the gas exiting the manifold; and
adjusting the operational state of the at least one valve in the manifold to change the ratio of flows through the at least two outlet ports.
9. The method of claim 1 further comprising:
sensing a metric of the gas exiting the manifold; and
adjusting one of the flow of at least one gas entering the manifold, at least one flow ratio controller, a composition of the gas entering the chamber, or a pressure of the gas entering the chamber in response to the sensed metric.
10. The method of claim 1 further comprising:
selecting an operational state of the valves within the manifold to cause at least one of the first and second gases to exit through the fourth outlet port and into a calibration circuit.
11. The method of claim 10, further comprising providing a chocked flow condition in the calibration circuit using an orifice, wherein the orifice is sized to provide a restriction substantially equal to that of the processing chamber.
12. The method of claim 1, further comprising evacuating the manifold by opening the isolation valve to remove the first and second gases from the manifold through the first outlet port and the evacuation path.
13. The method of claim 12, wherein evacuating the manifold further comprises utilizing the throttle valve to control the flow of gases from the manifold to the purge line.
14. The method of 13, wherein evacuating the manifold further comprises opening the by-pass valves coupled to the second and third outlet port to direct gas exiting the second and third outlet ports into the purge line by-passing the processing chamber.
15. A method of controlling gas flow to a processing system that includes a processing chamber coupled to a facility exhaust through a foreline, comprising:
providing a manifold having at least a first, second, third and fourth inlet that may be selectively coupled to at least one of a first, second, third and fourth outlet port, wherein the first outlet port is coupled to the foreline through an evacuation path comprising an isolation valve and a purge line, each of the second and third outlet port is connected to the processing chamber through a respective final valve, each of the second and third outlet port is connected to a pre-flow path through a respective by-pass valve, and the pre-flow path comprises:
a throttle valve upstream to the purge line; and
the purge line upstream to the foreline;
flowing one or more gases through the manifold to the pre-flow path by-passing the processing chamber prior to processing or to the calibration circuit, wherein the throttle valve in the pre-flow path is adjusted to match conditions in the pre-flow path to conditions of the processing chamber; and
flowing the one or more gases into the processing chamber during substrate processing.
16. The method of claim 15, wherein flowing one or more gases through the manifold to the vacuum environment further comprises:
waiting until the flow of gases meets a predefined criteria prior to diverting the flow to the processing chamber.
17. The method of claim 15, wherein predefined criteria is at least one of flow rate, pressure or gas composition.
18. A method of controlling gas flow to a processing system that includes a processing chamber, comprising:
flowing a first gas from a first gas source into a manifold having at least a first outlet port, a second outlet port, a third outlet port and a fourth outlet port, wherein at least the second and third outlet ports are coupled to a processing chamber, the processing chamber is coupled to an exhaust through a foreline, the first outlet port is coupled to the foreline through an evacuation path comprising an isolation valve and a purge line, each of the second and third outlet port is connected to a pre-flow path through a respective by-pass valve, and the pre-flow path comprises:
a throttle valve upstream to the purge line; and
the purge line upstream to the foreline;
selecting an operational state of valves within the manifold to cause the first gas to flow simultaneously through at least second and third outlet ports; and
flowing the first gas through at least one of the second or third outlet ports of the manifold into the foreline by-passing the processing chamber through the pre-flow path until a predefine state of the gas within the manifold is obtained, wherein the predefined state is obtained by utilizing the throttle valve to match conditions in the pre-flow path to conditions of the processing chamber.
19. The method of claim 18 further comprising:
sensing a metric indicative of the flow of the first gas; and
controlling the ratio of first gas flow between the first and second outlet ports in response to a sensed metric.
20. The method of claim 19, wherein sensing further comprises:
sensing at least one of chemistry, pressure or rate of each flow division of the first gas.
21. The method of claim 18 further comprising:
validating, using the sensed metric, that the flow division meets a predefined criteria.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. An apparatus for dispensing a liquid onto a substrate, comprising:
a support for receiving the substrate;
a dispensing head for dispensing the liquid onto the substrate;
a knife ring vertically adjustably mounted beneath said support; and
a vertical adjustment mechanism operably engaging said knife ring for placing said knife ring at selected vertical positions beneath the substrate.
2. The apparatus of claim 1 wherein said vertical adjustment mechanism comprises at least one fluid-actuated ring actuating cylinder.
3. The apparatus of claim 1 wherein said knife ring has a width of about 290 mm.
4. The apparatus of claim 3 wherein said vertical adjustment mechanism comprises at least one fluid-actuated ring actuating cylinder.
5. The apparatus of claim 2 wherein said at least one fluid-actuated ring actuating cylinder comprises a plurality of fluid-actuated ring actuating cylinders.
6. The apparatus of claim 5 wherein said knife ring has a width of about 290 mm.
7. The apparatus of claim 2 wherein said at least one fluid-actuated ring actuating cylinder is actuated by pneumatic pressure.
8. The apparatus of claim 7 wherein said knife ring has a width of about 290 mm.
9. The apparatus of claim 7 wherein said at least one fluid-actuated ring actuating cylinder comprises a plurality of fluid-actuated ring actuating cylinders.
10. The apparatus of claim 9 wherein said knife ring has a width of about 290 mm.
11. An apparatus for dispensing a liquid onto a substrate, comprising:
a support for receiving the substrate;
a dispensing head for dispensing the liquid onto the substrate;
a knife ring vertically adjustably mounted beneath said support; and
at least one hydraulic-powered ring actuating cylinder operably engaging said knife ring for placing said knife ring at selected vertical positions beneath the substrate.
12. The apparatus of claim 11 wherein said knife ring has a width of about 290 mm.
13. The apparatus of claim 11 wherein said at least one ring actuating cylinder comprises a plurality of ring actuating cylinders.
14. The apparatus of claim 13 wherein said knife ring has a width of about 290 mm.
15.-20. (Cancelled)

1. A multiple-optical-axis photoelectric sensor system configured to detect a detection object conveyed by a conveying device,
the multiple-optical-axis photoelectric sensor system comprising:
a projector comprising a plurality of light projecting units arrayed in line;
an optical receiver comprising a plurality of light receiving units that are arranged so as to face the plurality of respective light projecting units;
a light blocking determination unit configured to make a light blocking determination whether each of a plurality of optical axes formed between the plurality of light projecting units and the plurality of light receiving units is in a light blocking state; and
a muting processor configured to temporarily disable the light blocking determination on condition that a detection signal input from an external muting instrument changes according to a predetermined sequence,
wherein the muting processor comprises:
a muting start determination unit configured to start muting based on an output from the muting instrument; and
a muting determination unit configured to determine the sequence of the detection signal from the muting instrument during the muting by dividing the sequence into a plurality of stages,
the muting determination unit accumulates measurement information acquired in each stage, and analyzes the accumulated measurement information, and
the muting processor decides an optimum setting value for a muting operation condition based on an analysis result of the muting determination unit.
2. The multiple-optical-axis photoelectric sensor system according to claim 1, wherein the muting determination unit is configured to accumulate the analysis result together with the measurement information, and update the accumulated measurement information and analysis result at predetermined timing.
3. The multiple-optical-axis photoelectric sensor system according to claim 2, wherein the muting determination unit is configured to accumulate the optimum setting value together with the measurement information and the analysis result, and back up the analysis result and the optimum setting value in units of detection objects.
4. The multiple-optical-axis photoelectric sensor system according to claim 1, further comprising:
an input unit configured to receive a setting input from a user,
wherein the input unit receives a setting concerning the measurement information accumulated in the muting determination unit.
5. The multiple-optical-axis photoelectric sensor system according to claim 4, wherein the input unit receives a setting concerning an analysis technique or an analysis condition in the muting determination unit.
6. The multiple-optical-axis photoelectric sensor system according to claim 4, wherein the input unit receives a setting concerning a condition that is used by the muting processor to decide the optimum setting value.
7. The multiple-optical-axis photoelectric sensor system according to claim 4, wherein the plurality of projectors are coupled to each other in a direction perpendicular to the optical axis,
the plurality of optical receivers are coupled to each other in the direction perpendicular to the optical axis so as to face the plurality of respective projectors, and
the input unit receives selection of at least one set of the projector and the optical receiver as a target of the muting determination unit.
8. The multiple-optical-axis photoelectric sensor system according to claim 1, further comprising:
a presentation unit configured to present the analysis result or the optimum setting value to the user.
9. The multiple-optical-axis photoelectric sensor system according to claim 1, wherein the muting processor automatically reflects the optimum setting value in the sequence.
10. The multiple-optical-axis photoelectric sensor system according to claim 1, wherein the muting processor is configured to switch and use the plurality of sequences according to a shape of a detection object, and
the muting determination unit accumulates and analyzes the measurement information in each detection object.
11. The multiple-optical-axis photoelectric sensor system according to claim 10, further comprising:
an input unit configured to receive a setting input from a user; and
a presentation unit configured to present the analysis result or the optimum setting value to the user,
wherein the input unit receives a setting concerning a type of the detection object presented by the presentation unit.
12. The multiple-optical-axis photoelectric sensor system according to claim 1, further comprising:
an information unit configured to detect an abnormality in the measurement information accumulated in the muting determination unit and inform the user of the abnormality.
13. A method for controlling a multiple-optical-axis photoelectric sensor system configured to detect a detection object conveyed by a conveying device,
the multiple-optical-axis photoelectric sensor system comprising:
a projector comprising a plurality of light projecting units arrayed in line; and
an optical receiver comprising a plurality of light receiving units that are arranged so as to face the plurality of respective light projecting units,
the method comprising the steps of:
making a light blocking deteiiiiination whether each of a plurality of optical axes formed between the plurality of light projecting units and the plurality of light receiving units is in a light blocking state; and
performing muting in order to temporarily disable the light blocking determination on condition that a detection signal input from an external muting instrument changes according to a predetermined sequence,
wherein the muting performing step comprises the steps of:
starting the muting based on an output from the muting instrument;
determining the sequence of the detection signal from the muting instrument during the muting by dividing the sequence into a plurality of stages;
accumulating measurement information acquired in each stage, and analyzing the accumulated measurement information; and
deciding an optimum setting value for a muting operation condition based on an analysis result of the measurement information.
14. A program for controlling a multiple-optical-axis photoelectric sensor system configured to detect a detection object conveyed by a conveying device,
the multiple-optical-axis photoelectric sensor system comprising:
a projector comprising a plurality of light projecting units arrayed in line; and
an optical receiver comprising a plurality of light receiving units that are arranged so as to face the plurality of respective light projecting units,
the program causing a processor to execute the steps of:
making a light blocking determination whether each of a plurality of optical axes formed between the plurality of light projecting units and the plurality of light receiving units is in a light blocking state; and
performing muting in order to temporarily disable the light blocking determination on condition that a detection signal input from an external muting instrument changes according to a predetermined sequence,
wherein, in the muting performing step, the program causes the processor to execute the steps of:
starting the muting based on an output from the muting instrument;
determining the sequence of the detection signal from the muting instrument during the muting by dividing the sequence into a plurality of stages;
accumulating measurement information acquired in each stage, and analyzing the accumulated measurement information; and
deciding an optimum setting value for a muting operation condition based on an analysis result of the measurement infonnation.
15. A processor-readable recording medium in which a program for controlling a multiple-optical-axis photoelectric sensor system configured to detect a detection object conveyed by a conveying device is recorded,
wherein the multiple-optical-axis photoelectric sensor system comprises:
a projector comprising a plurality of light projecting units arrayed in line; and
an optical receiver comprising a plurality of light receiving units that are arranged so as to face the plurality of respective light projecting units,
the program causes a processor to execute the steps of:
making a light blocking determination whether each of a plurality of optical axes formed between the plurality of light projecting units and the plurality of light receiving units is in a light blocking state; and
performing muting in order to temporarily disable the light blocking determination on condition that a detection signal input from an external muting instrument changes according to a predetermined sequence,
in the muting performing step, the program causes the processor to execute the steps of:
starting the muting based on an output from the muting instrument;
determining the sequence of the detection signal from the muting instrument during the muting by dividing the sequence into a plurality of stages;
accumulating measurement information acquired in each stage, and analyzing the accumulated measurement information; and
deciding an optimum setting value for a muting operation condition based on an analysis result of the measurement information.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. Apparatus for applying a coating of positive ions to a substrate comprising:
a vacuum chamber,
a filtered cathodic arc source for providing a plasma beam containing the positive ions,
a substrate to be coated, and
a substrate holder,
wherein the substrate holder is adapted to move the substrate across the beam of positive ions thereby to coat the substrate with the positive ions.
2. Apparatus according to claim 1 comprising magnetic means for scanning the plasma beam over a coating area greater that the area of the plasma beam.
3. Apparatus according to claim 2 wherein scanning of the plasma beam occurs downstream of beam filtering.
4. Apparatus according to claim 2 or 3 comprising means for scanning the plasma beam in a raster.
5. Apparatus according to claim 2, 3 or 4 wherein the beam is scanned to a width of at least 10 cm, preferably at least 20 cm, most preferably at least 30 cm.
6. Apparatus according to any of claims 1-5 wherein the substrate holder is adapted for rotation of the substrate through the plasma beam.
7. Apparatus according to claim 6 wherein the substrate holder is a rotatable drum and the substrate is mounted on the inner or outer periphery of the drum.
8. Apparatus according to any of claims 1-7 for applyingb multi-layer coatings of positive ions to a substrate, the apparatus further comprising at least a second filtered cathodic arc source providing a plasma beam containing positive ions, and a substrate holder adapted to move the substrate across the beams from the respective filtered cathodic arc sources.
9. Apparatus according to any of claims 1-8 wherein a filtered cathodic arc source comprises a first cathode located at a cathode station, means for generating an arc at the station, a second cathode and means for interchanging the cathodes without breaking vacuum.
10. Apparatus according to claim 9 wherein the second cathode is one of a plurality of cathodes stored in a cathode magazine.
11. Apparatus according to any of claims 1-10 comprising means for applying a DC or RF bias to the substrate.
12. Apparatus according to any preceding claim comprising a filtered cathode arc source comprising a filter duct having two bends.
13. Apparatus according to claim 12 in which the filter duct has a first bend in a first plane and a second bend in a second plane that is not co-incident with the first plane.
14. Apparatus according to any preceding claim comprising two filtered cathode arc sources having cathode targets of the same material and adapted for simultaneous operation.
15. Apparatus according to any of claims 1-14 for coating positive ions onto a dielectric optical substrate.
16. Apparatus for applying a coating of positive ions onto a dielectric substrate, the apparatus comprising:
means for generating an arc at a cathode target, the cathode target containing the ions to be deposited on the dielectric substrate,
magnetic means for directing a beam of ions emitted from the cathode along a filter path substantially to remove macroparticles therefrom,
means for holding the dielectric substrate in the filtered ion beam, and
means for applying RF bias to the optical element to dissipate electrostatic charge accruing on the element by deposition of positive ions.
17. Apparatus according to claim 16 comprising a filter duct having two bends.
18. Apparatus according to claim 17 wherein each bend is at least 20 degrees and the bends are in non-coincident planes.