All The Claims

1. A method of processing a polycrystalline nanoparticle, comprising:
exposing a polycrystalline nanoparticle that includes at least two metal oxide crystallites bonded to each other to a composition, the composition including a catalyst including at least one selected from the group consisting of noble metal and transition metal, and
at least partially separating the at least two metal oxide crystallites of the polycrystalline nanoparticle at an interface thereof.
2. The method of claim 1, wherein the catalyst is selected from the group consisting of palladium, gold, silver, platinum, nickel, combinations of the foregoing and molecules incorporating the foregoing.
3. The method of claim 1, wherein the composition further includes a first compound including an amine.
4. The method of claim 1, wherein the composition further includes a second compound of a formula: PR1R2R3, wherein at least one of R1, R2 and R3 is selected from the group consisting of an alkyl and an aryl.
5. The method of claim 1, wherein the composition further includes a second compound including one selected from the group consisting of trialkylphosphine, and triarylphosphine.
6. The method of claim 3, wherein the exposing includes:
mixing the nanoparticle and the first compound to form a first mixture;
forming a second mixture of the catalyst and a second compound of a formula: PR1R2R3, wherein at least one of R1, R2 and R3 is selected from the group consisting of an alkyl and an aryl; and
mixing the first mixture and the second mixture to form a third mixture.
7. The method of claim 6, wherein the exposing further includes heating the third mixture to have a temperature of about 50\xb0 C. to about 400\xb0 C.
8. The method of claim 3, wherein the first compound includes aliphatic amine.
9. The method of claim 1, wherein the catalyst includes metal nanoparticles.
10. The method of claim 1, wherein the catalyst includes a nanoparticle of one selected from the group consisting of palladium, gold, silver, platinum, nickel, palladium-gold, and palladium-platinum.
11. The method of claim 1, wherein the exposing includes forming an outer layer of the nanoparticle.
12. The method of claim 1, wherein the nanoparticle includes one or more transition metal oxide.
13. The method of claim 1, wherein the nanoparticle includes a metal bonded to at least one of the at least two metal oxide crystallites.
14. A method of determining nanoparticle crystallinity, comprising;
exposing a population of nanoparticles to a composition, the composition including a catalyst including at least one selected from the group consisting of noble metal and transition metal, wherein said population of nanoparticles includes one or more of one or more single crystalline nanoparticles or one or more polycrystalline nanoparticles, and wherein the polycrystalline nanoparticles, if present, include at least two metal oxide crystallites bonded to each other;
at least partially separating the at least two metal oxide crystallites of the polycrystalline nanoparticles, if present in the population; and
identifying one or more of single crystalline nanoparticles or polycrystalline nanoparticles within the population of nanoparticles.
15. The method of claim 14, wherein the catalyst includes at least one selected from the group consisting of palladium, gold, silver, platinum, nickel, combinations of the foregoing and molecules incorporating the foregoing.
16. The method of claim 14, wherein the composition further includes a first compound including an amine.
17. The method of claim 14, wherein the composition further includes a second compound of a formula: PR1R2R3, wherein at least one of R1, R2 and R3 is selected from the group consisting of an alkyl and an aryl.
18. The method of claim 14, wherein the composition further includes a second compound including one selected from the group consisting of selected from the group consisting of trialkylphosphine, triarylphosphine, and trioctylphosphine.
19. The method of claim 16, wherein the first compound includes aliphatic amine.
20. The method of claim 14, wherein identifying includes counting polycrystalline nanoparticles within the population of nanoparticles.
21. The method of claim 14, wherein the nanoparticles include at least one metal oxide crystallite.
22. The method of claim 21, wherein the nanoparticles include a metal oxide selected from the group consisting of Fe2O3, Fe3O4, MnFe2O3, Mn2O3 and CoO.
23. The method of claim 14, wherein the population of nanoparticles does not include a polycrystalline nanoparticle.
24. A nanoparticle comprising:
at least two metal oxide crystals; and
an outer layer at least partially surrounding the at least two metal oxide crystals such that the at least two metal oxide crystals and the layer form a single nanoparticle,
wherein the at least two metal oxide crystals are unbonded to each other.
25. The nanoparticle of claim 24, wherein each of the at least two metal oxide crystals includes a transition metal oxide.
26. The nanoparticle of claim 24, wherein the at least two metal oxide crystals are spaced from each other.
27. The nanoparticle of claim 24, wherein the outer layer surrounds the at least two metal oxide crystals.
28. The nanoparticle of claim 24, further comprising a metal interposed between the at least two metal oxide crystals.
29. The nanoparticle of claim 28, wherein the metal includes a noble metal.
30. The nanoparticle of claim 28, wherein the metal includes one selected from the group consisting of palladium, platinum, gold, silver and cobalt.
31. A catalyst comprising the nanoparticles of claim 28.
32. A method of determining nanoparticle crystallinity, comprising;
exposing a population of inorganic nanoparticles to an etchant, wherein said population of inorganic nanoparticles includes one or more of one or more single crystalline nanoparticles or one or more polycrystalline nanoparticles and wherein the polycrystalline nanoparticles, if present, include at least two crystallites bonded to each other;
at least partially separating the at least two crystallites of the polycrystalline nanoparticles, if present in the population; and
identifying one or more of single crystalline nanoparticles or polycrystalline nanoparticles within the population of inorganic nanoparticles.
33. The method of claim 32, wherein the inorganic nanoparticles include one or more nanoparticles selected from the group consisting of metal oxides, metals, and metal chalcogenides.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A co-polymer compound comprising at least one repeating unit represented by the following Formulae in Group A and at least one repeating unit represented by the following Formula in Group B:
Group A:
Group B:
wherein Ar1 is a tetravalent C5-C24 arylene group or a tetravalent C5-C24 heterocyclic ring, which is substituted or unsubstituted with at least one substituent selected from the group consisting of C1-C10 alkyl, C1-C10 alkoxy, C1-C10 haloalkyl and C1-C10 haloalkoxy, or two or more of which are fused together to form a condensation ring or covalently bonded to each other via a functional group selected from the group consisting of O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2 and C(\u2550O)NH;
Ar1\u2032 is a bivalent C5-C24 arylene group or a bivalent C5-C24 heterocyclic ring, which is substituted or unsubstituted with at least one substituent selected from the group consisting of C1-C10 alkyl, C1-C10 alkoxy, C1-C10 haloalkyl and C1-C10 haloalkoxy, or two or more of which are fused together to form a condensation ring or covalently bonded to each other via a functional group selected from the group consisting of O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2 and C(\u2550O)NH;
Ar2 is a bivalent C5-C24 arylene group or a bivalent C5-C24 heterocyclic ring, which is substituted or unsubstituted with at least one substituent selected from the group consisting of C1-C10 alkyl, C1-C10 alkoxy, C1-C10 haloalkyl and C1-C10 haloalkoxy, or two or more of which are fused together to form a condensation ring or covalently bonded to each other via a functional group selected from the group consisting of O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2 and C(\u2550O)NH, provided that Ar1\u2032 and Ar2 are different if either Ar1\u2032 or Ar2 is C6H4, and wherein the other end of Ar2 is bonded to a nitrogen atom;
Q is O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2, C(\u2550O)NH, C(CH3)(CF3), C1-C6 alkyl-substituted phenyl or C1-C6 haloalkyl-substituted phenyl in which Q is linked to opposite both phenyl rings in the position of m-m, m-p, p-m or p-p;
Y\u2033 is \u2014O or S;
n is an integer from 10 to 400; and

l is an integer from 10 to 400.
2. The co-polymer compound according to claim 1, wherein Ar1 is selected from the following compounds:
wherein X is O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2, or C(\u2550O)NH; W is O, S or C(\u2550O); and Z1, Z2 and Z3 are identical to or different from each other and are O, N or S.
3. The co-polymer compound according to claim 1, wherein Ar1 is selected from the following compounds:
4. The co-polymer compound according to claim 1, wherein Ar1\u2032 and Ar2 are selected from the following compounds:
wherein X is O, S, C(\u2550O), CH(OH), S(\u2550O)2, Si(CH3)2, (CH2)p (in which 1\u2266p\u226610), (CF2)q (in which 1\u2266q\u226610), C(CH3)2, C(CF3)2, or C(\u2550O)NH; W is O, S or C(\u2550O); and Z1, Z2 and Z3 are identical to or different from each other and are O, N or S.
5. The co-polymer compound according to claim 1, wherein Ar1\u2032 and Ar2 are selected from the following compounds:
6. The co-polymer compound according to claim 1, wherein Q is selected from the group consisting of CH2, C(CH3)2, C(CF3)2, O, S, S(\u2550O)2 and C(\u2550O).
7. The co-polymer compound according to claim 1,
wherein Ar1 is
and
Q is C(CF3)2.
8. The co-polymer compound according to claim 1, wherein the co-polymer compound is treated by an acidic dopant.
9. The co-polymer compound according to claim 8, wherein the acidic dopant is selected from the group consisting of sulfuric acid, hydrochloric acid, phosphoric acid, nitric acid, HBrO3, HClO4, HPF6, HBF6, 1-methyl-3-methylimidazolium cation (BMIM+) and mixtures thereof.
10. The co-polymer compound according to claim 1, wherein the co-polymer compound includes inorganic oxide selected from the group consisting of fumed silica, zirconium oxide, tetraethoxy silane, montmorillonite clay and mixtures thereof.
11. The co-polymer compound according to claim 1, wherein the co-polymer compound includes inorganic filler selected from the group consisting of phosphotungstic acid (PWA), phosphomolybdenic acid, silicotungstic acid (SiWA), molybdophosphoric acid, silicomolybdic acid, phosphotin acid, zirconium phosphate (ZrP) and mixtures thereof.
12. The co-polymer compound according to claim 1, wherein the co-polymer compound has a fractional free volume (FFV) of 0.18 to 0.40.
13. The co-polymer compound according to claim 1, wherein the co-polymer compound has a d-spacing of 0.58 to 0.80 nm.
14. The co-polymer compound according to claim 1, wherein the co-polymer compound has a cavity radius difference of 0.1 to 0.4 \u212b between maximum cavity radius and minimum cavity radius.
15. The co-polymer compound according to claim 1, wherein Ar2 is selected from the group consisting of:
16. The co-polymer compound according to claim 1, wherein Ar2 is selected from the group consisting of:

1. A method of selectively patterning a magnetic film structure comprising:
(a) providing a magnetic structure comprising at least one pinned bottom magnetic film layer and at least one top magnetic film layer, wherein said at least one top and said at least one pinned bottom magnetic film layers are separated by a tunnel barrier layer, and said at least one top magnetic film layer having a passivating layer located thereon;
(b) forming a patterned resist atop said passivating layer, wherein a portion of said passivating layer is exposed;
(c) selectively etching said exposed portion of said passivating layer by a RIE process to expose a portion of said at least one top magnetic film layer; and
(d) selectively etching said exposed portion of said at least one top magnetic film layer, and underlying portions of said tunnel barrier and said at least one pinned bottom magnetic film layer by a wet etch process which includes an etchant solution comprising an arylsulfonic acid and an aliphatic or alicyclic amine.
2. The method of claim 1 wherein said at least one top magnetic film layer and said at least one pinned bottom magnetic film layer are the same or different, and are NixFey, NixCoyFez, or CoxFey wherein x, y and z are any integers whose sum adds up to 100.
3. The method of claim 1 wherein said at least one top magnetic layer is NixFey and the at least one pinned bottom magnetic film layer is NixFey, or CoxFey.
4. The method of claim 1 wherein said at least one pinned bottom magnetic film layer has an antiferromagnetic layer formed thereunder.
5. The method of claim 4 wherein said antiferromagnetic layer is HxMny wherein H is a noble metal and x and y are any integers whose sum adds up to 100.
6. The method of claim 4 wherein said antiferromagnetic layer is IrxMny, or PtxMny wherein x and y are any integers whose sum adds up to 100.
7. The method of claim 1 wherein said at least one pinned bottom magnetic film layer has a Ru spacer formed thereunder.
8. The method of claim 1 wherein said passivating layer is one of Ti, Ta, TiN or TaN.
9. The method of claim 1 wherein said tunnel barrier layer is Al2O3.
10. The method of claim 1 wherein step (c) is replaced by step (c\u2032) which includes selectively etching said exposed portion of said passivating layer by SF6 RIE plasma etching.
11. The method of claim 1 wherein said arylsulfonic acid in the etchant solution employed in step (d) has one of the following structures:
wherein R1, R2, R3, and R4 are the same or different, and are independently hydrogen, C1-C3 alkyl, halogen, amino, or hydroxyl group.
12. The method of claim 1 wherein said arylsulfonic acid or a salt thereof in the etchant solution employed in step (d) is selected from the group consisting of m-nitrobenzene sulfonic acid, 4-chloro-3-nitrobenzene sulfonic acid; sodium 3-nitrobenzene sulfonate; 4-nitrobenzene sulfonic acid; 2-methyl-5-nitrobenzene sulfonic acid; 2-amino-4-nitrophenol-6-sulfonic acid; 2-nitrobenzene sulfonic acid; 2-chloro-5-nitrobenzene sulfonic acid; 3-amino-4-hydroxy-5-nitrobenzene sulfonic acid; and 3-amino-2-hydroxy-5-nitrobenzene sulfonic acid.
13. The method of claim 1 wherein said aliphatic or alicyclic amine in the etchant solution employed in step (d) is selected from the group consisting of propylamine, ethylenediamine, diethylenetriamine, and triethylenetetramine.
14. The method of claim 1 wherein said etchant solution employed in step (d) further comprising dissolved O2, wherein said dissolved O2 is at an equilibrium concentration under air atmosphere.
15. The method of claim 1 wherein said etchant solution employed in step (d) has a pH of about 5 to about 10.
16. The method of claim 1 wherein step (d) is conducted at a temperature of about 40\xb0-50\xb0 C.
17. The method of claim 1 wherein said etchant solution employed in step (d) is pre-filtered.
18. The method of claim 1 wherein said arylsulfonic acid and said aliphatic or alicyclic amine are present in said etchant in a mole ratio from about 1:3 to about 1:20, respectively.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A suction cleaning module, comprising:
a first housing;
a second housing, connected to the bottom of the first housing, configured with a shell section and a dust collection space in a manner for enabling a suction channel to be formed between the shell section and the first housing while enabling the dust collection space to communicate with the suction channel;
a third housing, configured with a filtered flow outlet while being respectively coupled to the first and second housings; and
a fan blower, coupled to the third housing and configured with a flow inlet and a flow outlet while enabling the flow inlet to be disposed at a position corresponding to the filtered flow outlet.
2. The suction cleaning module of claim 1, wherein the third housing is configured with an inclined surface, provided for the filtered flow outlet and the fan blower to be disposed thereon while enabling the fan blower to be tilted by an angle with respect to the water level.
3. The suction cleaning module of claim 1, wherein the second housing is coupled to the first housing while enabling the second housing to be driven to rotate by an actuating mechanism coupled to the first housing and thus enabling the second housing to abut against the third housing so as to selectively close or open a dust collecting opening disposed at a position between the first housing and the third housing.
4. The suction cleaning module of claim 3, wherein the second housing further comprises:
a base panel,
a front panel, connected to the base panel to be used for forming the shell section;
a pair of side panels, respectively connected to the base panel and the front panel while being sandwiched between the two so as to construct the dust collecting space within the second housing thereby; and
a pivot axle, connected to one of the two side panels while being pivotally coupled to a side of the first housing for allowing the portion of the pivot axle that is protruding out of the first housing to be coupled to a power transmission component.
5. The suction cleaning module of claim 4, wherein the actuating mechanism further comprises a lever that is pivotally coupled to a side of the first housing; and the lever further has a power output component that is coupled to the power transmission component for enabling any rotation driving of the lever to be used for actuating the rotation movement.
6. The suction cleaning module of claim 4, wherein the actuating mechanism further comprises a lever that is slidably fitted inside a groove formed on a side of the first housing; and the lever further has a power output component that is coupled to the power transmission component for enabling any linear driving of the lever to be used for actuating the rotation movement.
7. The suction cleaning module of claim 6, wherein the lever is further connected to a rod.
8. The suction cleaning module of claim 4, wherein there is a sensor being disposed on the first housing or the second housing at a position corresponding to the dust collecting space to be used for detecting a dust collecting status of the suction cleaning module.
9. The suction cleaning module of claim 1, wherein a suction inlet in the suction channel is designed for a cartridge base to fitted thereon whereas the cartridge base is formed with a slotting at a position thereof corresponding to the suction inlet; and the cartridge base is further configured with a dust remover and a flow guide, being disposed respectively at the two sides of the slotting.
10. The suction cleaning module of claim 9, wherein the front panel is further configured with a flow-guiding surface and is enabled to abut against the cartridge base while the second housing is being enabled to abut against the third housing
11. The suction cleaning module of claim 1, further comprising:
a filter, disposed at a position between the third housing and the interface of the first and the second housings.
12. The suction cleaning module of claim 11, wherein the housing is further configured with a sensor for detecting statuses of the filter at a position between the filter and the fan blower.
13. The suction cleaning module of claim 1, wherein the housing is further configured with a powder sensor at a position corresponding to the suction inlet.
14. The suction cleaning module of claim 13, being adapted to be arranged inside a vacuum cleaner, wherein the vacuum cleaner further comprises: a control unit, capable of basing upon the detection of the powder sensor to selectively perform one operation from the group consisting of: adjusting the suction force resulting from the operation of the fan blower, and enabling the vacuum cleaner to move in a reciprocating manner.
15. The suction cleaning module of claim 1, wherein there is a first opening formed on the third housing at a position corresponding to the first housing and the second housing; and there is a first fastening frame disposed surrounding two sides of the first opening.
16. The suction cleaning module of claim 1, wherein the second housing further comprises:
a channel panel, for forming the shell section;
a dust collector, coupled to the channel panel while enabling a second opening formed on the dust collector at a position between the first housing and the second housing to be positioned corresponding to the first opening; and
a second fastening frame, disposed surrounding two sides of the second opening of the dust collector while being coupled to the first fastening frame.
17. The suction cleaning module of claim 1, wherein there is a sensor being disposed on the second housing at a position corresponding to the dust collecting space to be used for detecting a dust collecting status of the suction cleaning module.
18. The suction cleaning module of claim 1, wherein a suction inlet in the suction channel is designed for a cartridge base to fitted thereon whereas the cartridge base is formed with a slotting at a position thereof corresponding to the suction inlet; and
the cartridge base is further configured with a dust remover and a flow guide, being disposed respectively at the two sides of the slotting.
19. The suction cleaning module of claim 1, wherein the first housing is further being configured with a handle.
20. The suction cleaning module of claim 1, wherein the first and the second housings are formed in a manner selected from the group consisting of: the first and the second housings are integrally formed, and the first and the second housings are formed by a piecing process.
21. The suction cleaning module of claim 1, wherein the first and the third housings are formed in a manner selected from the group consisting of: the first and the third housings are integrally formed, and the first and the third housings are formed by a piecing process.