All The Claims

1. (canceled)
2. A dental cement comprising:
a liquid agent comprising
5 to 50% by weight of (meth)acrylate monomer having an acid group,
0.1 to 25% by weight of water,
30 to 85% by weight of (meth)acrylate monomer having two or less hydroxyl groups andor amino groups, not having an acid group, and having a molecular weight of 160 or more, and
0.01 to 5% by weight of an amine compound as a polymerization initiator for a polymerization catalyst in a powder agent described below; and

a powder agent comprising
90 to 99.8% by weight of a metal oxide powder used for a fluoroaluminosilicate glass powder, a dental zinc phosphate cement powder or a dental carboxylate cement powder, and
0.01 to 5% by weight of the total of an organic aromatic compound containing at least one \u2014SO2\u2014 group and a peroxide as a polymerization catalyst.
3. The dental cement as claimed in claim 2, wherein
the (meth)acrylate monomer having an acid group has a carboxyl group as the acid group, and is in the form of an aqueous solution.
4. The dental cement as claimed in claim 2, wherein the (meth)acrylate monomer having an acid group has a phosphoric acid group or a carboxyl group as the acid group.
5. The dental cement as claimed in claim 4, wherein the (meth)acrylate monomer having an acid group has a phosphoric acid group.
6. The dental cement as claimed in claim 5, wherein the (meth)acrylate monomer having an acid group is at least one member selected from the group consisting of 2-(meth) acryloyloxyethyl dihydrogen phosphate, bis(meth) acryloxyethyl phosphate, bis2-(meth)acryloyloxyethyl hydrogen phosphate, 2-(meth) acryloyloxyethylphenyl hydrogen phosphate, acid phosphoxyethyl(meth) acrylate, 6-(meth)acryloyloxyhexyl dihydrogen phosphate, 6-(meth)acryloyloxyhexylphenyl hydrogen phosphate, 10-(meth)acryloyloxydecyl dihydrogen phosphate, 1,3-di(meth)acryloylpropane-2-dihydrogen phosphate, 1,3-di(meth)acryloylpropane-2-phenyl hydrogen phosphate, bis5-{2-(meth) acryloyloxyethoxycarbonyl} heptyl hydrogen phosphate, a reaction product obtained by reacting an additional polymer of 6-hexanolide of 2-hydroxyethyl(meth) acrylate with anhydrous phosphoric acid, and mixtures thereof.
7. The dental cement as claimed in claim 4, wherein the (meth)acrylate monomer having an acid group has a carboxyl group as the acid group.
8. The dental cement as claimed in claim 7, wherein the (meth)acrylate monomer having an acid group is at least one member selected from the group consisting of 4-(meth) acryloxyethyltrimellitic acid, 4-(meth)acryloxyethyltrimellitic acid anhydride, 4-(meth)acryloxydecyltrimellitic acid, 4-(meth) acryloxydecyltrimellitic acid anhydride, 11-(meth)acryloyloxy- 1,1-undecanedicarboxylic acid, 1,4 di(meth)acryloyloxypyromellitic acid, 2-(meth)acryloyloxyethylmaleic acid, 2-(meth)acryloyloxyethylphthalic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, and mixtures thereof.
9. The dental cement as claimed in claim 2, wherein the (meth)acrylate monomer having two or less hydroxyl groups andor amino groups, not having an acid group, is at least one member selected from the group consisting of benzyl(meth)acrylate, 2,2-bis(meth) acryloxyphenyl propane, 2,2-bis4-(meth)acryloxydiethoxyphenyl propane, 2,2-bis4-(meth)acryloxypolyethoxyphenyl propane, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, butylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, trimethylolmethane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, 2-hydroxyethyl(meth) acrylate, 2-hydroxypropyl(meth)acrylate, 2-hydroxy- 1,3 -di(meth) acryloxypropane, 1,2-dihydroxy-3-(meth)acryloxypropane, 2,2-bis4-{2-hydroxy-3-(meth)acryloxypropoxy} phenyl propane, and mixtures thereof.
10. The dental cement as claimed in claim 2, wherein the amine compound is at least one member selected from the group consisting of N,N-dimethyl-p-toluidine, N,N-diethyl-p-toluidine, N,N-dimethylaniline, N,N-bis(2-hydroxyethyl)-p-toluidine, N,N-dimethylaminoethylmethacrylate, triethanolamine, 4-methyl dimethylamino benzoate, 4-ethyl dimethylamino benzoate, 4-isoamyl dimethylamino benzoate, triethylamine, N-ethyl diethanol amine, triethanol amine, and mixtures thereof.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A solenoid on-off valve comprising:
a housing including a primary space connected to a primary port, a secondary space connected to a secondary port, and a valve port defined by a valve seat and connecting the primary space and the secondary space;
a main valve body provided in the housing to be displaceable;
a seat member provided at the main valve body and pressed on the valve seat to close the valve port;
a pilot valve body coupled to the main valve body and relatively displaceable with respect to the main valve body; and
an electromagnetic drive unit configured to displace the pilot valve body by an electromagnetic force, wherein
the seat member is configured such that: a pilot passage is formed to connect the primary space and the secondary space; and the pilot valve body is pressed on the seat member to close the pilot passage.
2. The solenoid on-off valve according to claim 1, wherein:
the main valve body includes at one end portion thereof a through hole portion through which the seat member is inserted; and
the seat member includes at an axially intermediate portion of an outer peripheral wall thereof a flange portion projecting in a radially outward direction and is fixed to the main valve body by fitting the flange portion in a concave portion formed at an axially intermediate portion of the through hole portion.
3. The solenoid on-off valve according to claim 2, wherein the through hole portion of the main valve body and the outer peripheral wall of the seat member are formed such that in a state where the seat member is pressed on the valve seat, a fluid flowing therebetween is introduced to the primary space.
4. The solenoid on-off valve according to claim 2, wherein the seat member is formed by insert molding in the through hole portion of the main valve body.

What is claimed is:

1. A charged-particle-beam microlithography apparatus for transferring a pattern, defined on a segmented reticle in which the pattern is divided into multiple subfields each defining a respective portion of the pattern, to a sensitive substrate, the apparatus comprising:
a substrate stage configured to hold the substrate;
a reticle stage situated upstream of the substrate stage and configured to hold the reticle;
an illumination-optical system situated upstream of the reticle stage and configured to successively illuminate groups of subfields on the reticle using a charged-particle illumination beam, each group consisting of at least one respective subfield;
a projection-optical system situated between the reticle stage and the substrate stage, the projection-optical system being configured to direct an imaging beam, formed from particles of the illumination beam passing through the reticle, to the substrate such that respective images of the illuminated subfields are formed at respective positions on the substrate serving to stitch the images together; and
a main controller connected to the reticle stage, substrate stage, illumination-optical system, and projection-optical system, the main controller being configured to command one or both the illumination-optical system and the projection-optical system to perform a respective optical correction as each subfield is being exposed, the optical correction being based on respective reticle-pattern-inspection data for each of the subfields.
2. The apparatus of claim 1, wherein the optical correction is selected from a group consisting of shape-astigmatic aberration, focusing-astigmatic aberration, image focal point, image rotation, image magnification, and image position on the substrate.
3. The apparatus of claim 1, wherein the optical correction is made according to one or more respective correction values determined by actual measurement data of the pattern as defined on the reticle.
4. The apparatus of claim 3, wherein the correction values include one or more apparatus constants selected from a group consisting of beam-acceleration voltage, beam-current density, beam-divergence angle, and optical-system length.
5. A method for performing charged-particle-beam microlithography of a pattern to a sensitive substrate, the method comprising:
(a) defining the pattern on a segmented reticle in which the pattern is divided into multiple subfields each defining a respective portion of the pattern;
(b) successively illuminating groups of subfields on the reticle using a charged-particle illumination beam, each group consisting of at least one respective subfield;
(c) as each group of subfields is illuminated, directing an imaging beam, formed from particles of the illumination beam passing through the reticle, to the substrate such that respective images of the illuminated subfields are formed at respective positions on the substrate serving to stitch the images together; and
(d) as each subfield is exposed, performing a respective optical correction that is based on respective reticle-pattern-inspection data for each of the subfields.
6. The method of claim 5, wherein the optical correction is selected from a group consisting of shape-astigmatic aberration, focusing-astigmatic aberration, image focal point, image rotation, image magnification, and image position on the substrate.
7. The method of claim 5, wherein the optical correction is made according to one or more respective correction values determined by actual measurement data of the pattern as defined on the reticle.
8. The method of claim 7, wherein the correction values include one or more apparatus constants selected from a group consisting of beam-acceleration voltage, beam-current density, beam-divergence angle, and optical-system length.
9. A charged-particle-beam microlithography apparatus for transferring a pattern, defined on a segmented reticle in which the pattern is divided into multiple subfields each defining a respective portion of the pattern, to a sensitive substrate, the apparatus comprising:
a substrate stage configured to hold the substrate;
a reticle stage situated upstream of the substrate stage and configured to hold the substrate;
an illumination-optical system situated upstream of the reticle stage and configured to successively illuminate groups of subfields on the reticle using a charged-particle illumination beam, each group consisting of at least one respective subfield;
a projection-optical system situated between the reticle stage and the substrate stage, the projection-optical system being configured to direct an imaging beam, formed from particles of the illumination beam passing through the reticle, to the substrate such that respective images of the illuminated subfields are formed at respective positions on the substrate in a manner serving to stitch the images together; and
a main controller connected to the reticle stage, substrate stage, illumination-optical system, and projection-optical system, the main controller comprising a memory in which are stored index data for various subfields based on respective reticle-pattern-inspection data for the subfields, and optical-correction data for the various subfields corresponding to the reticle-pattern-inspection data, the index data and corresponding optical-correction data being stored as a look-up table that is consulted as each of the various subfields is being exposed so that exposure of each of the various subfields is optically corrected according to the recalled respective optical-correction data.
10. The apparatus of claim 9, wherein the optical correction is selected from a group consisting of shape-astigmatic aberration, focusing-astigmatic aberration, image focal point, image rotation, image magnification, and image position on the substrate.
11. The apparatus of claim 9, wherein the optical correction is made according to one or more respective correction values determined by actual measurement data of the pattern as defined on the reticle.
12. The apparatus of claim 11, wherein the correction values include one or more apparatus constants selected from a group consisting of beam-acceleration voltage, beam-current density, beam-divergence angle, and optical-system length.
13. The method of claim 9, wherein the index data are obtained from a previously performed reticle inspection made at time of reticle fabrication, the index data including one or more of image rotation and pattern-element positions within the respective subfields.
14. A method for performing charged-particle-beam microlithography of a pattern to a sensitive substrate, the method comprising:
(a) defining the pattern on a segmented reticle in which the pattern is divided into multiple subfields each defining a respective portion of the pattern;
(b) storing index data for various subfields based on respective reticle-pattern-inspection data for the subfields, and optical-correction data for the various subfields corresponding to the reticle-pattern-inspection data, the index data and corresponding optical-correction data being stored as a look-up table;
(c) successively illuminating groups of subfields on the reticle using a charged-particle illumination beam, each group consisting of at least one respective subfield;
(d) as each group of subfields is illuminated, directing an imaging beam, formed from particles of the illumination beam passing through the reticle, to the substrate such that respective images of the illuminated subfields are formed at respective positions on the substrate serving to stitch the images together; and
(e) as each of the various subfields is being exposed, consulting the look-up table to obtain respective optical-correction data for the subfield, and applying the optical-correction data to optically correct exposure of each of the various subfields.
15. The method of claim 14, wherein the index data are obtained from a previously performed reticle inspection made at time of reticle fabrication, the index data including one or more of image rotation and pattern-element positions within the respective subfields.
16. The method of claim 14, wherein the optical correction is selected from a group consisting of shape-astigmatic aberration, focusing-astigmatic aberration, image focal point, image rotation, image magnification, and image position on the substrate.
17. The method of claim 14, wherein the optical correction is made according to one or more respective correction values determined by actual measurement data of the pattern as defined on the reticle.
18. The method of claim 17, wherein the correction values include one or more apparatus constants selected from a group consisting of beam-acceleration voltage, beam-current density, beam-divergence angle, and optical-system length.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A switch pole of a circuit breaker, comprising:
two pole shells including an upper pole shell and a lower pole shell,
at least one switching contact between the two pole shells when the two pole shells are in an assembled state,
current-carrying elements,
an arc quenching device including an arc runner plate and at least one splitter plate delimiting an arc chute,
at least one first slot for accommodating at least one of the at least one splitter plate and the arc runner plate is provided between the pole shells, and
a functional component between the two pole shells, the functional component including at least one second slot spaced apart from the at least one first slot such that the at least one second slot is i) parallel to and aligned with the at least one first slot, and ii) located between the two pole shells at a center portion of the switch pole such that the at least one second slot is usable in cooperation with the at least one first slot to accommodate the at least one of the at least one splitter and the arc runner plate.
2. The switch pole of claim 1, wherein the functional component assumes the function of a cover.
3. The switch pole of claim 1, wherein the functional component is a slot motor cover.
4. The switch pole of claim 1, wherein the functional component is a cover cap of a slot motor side plate.
5. The switch pole of claim 1, wherein the functional component includes a comb-shaped extension in which at least one slot is provided for accommodating the at least one of the at least one splitter and the arc runner plate.
6. The switch pole of claim 1, further comprising a transition or press-fit, between the at least one of the at least one splitter and the arc runner plate and the slot of the functional component.
7. The switch pole of claim 1, wherein there is a slight play between the at least one of the at least one splitter and the arc runner plate and the slot of the upper pole shell placed on top as a lid.
8. The switch pole of claim 1, wherein the functional component is made of a thermoplastic material.
9. The switch pole of claim 1, wherein at least one of the lower and the upper pole shell is made of a thermoplastic material.
10. The switch pole of claim 8, wherein the plastic material is a polyamide.
11. The switch pole of claim 8, wherein the plastic material is a polyamide 66 (PA66).
12. The switch pole of claim 1, wherein the at least one second slot covers no more than 8 to 12% of the surface of the splitter or arc runner plate located in the slot.
13. The switch pole of claim 1, wherein the at least one first slot is provided inside at least one of the lower and upper pole shell.
14. The switch pole of claim 2, wherein the functional component is a slot motor cover.
15. The switch pole of claim 9, wherein the plastic material is a polyamide.