All The Claims

1. Apparatus comprising:
an active antenna; and
an attachment component including a floating portion adapted to resonate in the presence of a carrier wave transmitted by the active antenna.
2. The apparatus of claim 1, wherein the attachment component attaches a wearable electronic device to a user.
3. The apparatus of claim 2, wherein the attachment component is a clip and the wearable electronic device is a stylus.
4. The apparatus of claim 1, wherein the active antenna is attached to a printed circuit board that is positioned parallel to a plane of the floating portion of the attachment component.
5. The apparatus of claim 1, wherein the floating portion of the attachment component is a u-shaped wire structure.
6. The apparatus of claim 1, wherein the floating portion of the attachment component includes one or more coiled regions.
7. The apparatus of claim 1, wherein the floating portion of the attachment component is coupled to a resonant network within the wearable electronic device that tunes the resonant frequency of the floating portion.
8. Apparatus comprising:
a stylus including an active antenna and an attachment component including a floating portion adapted to resonate in the presence of a carrier wave transmitted by the active antenna.
9. The apparatus of claim 8, wherein the active antenna is attached to a printed circuit board that is positioned parallel to a plane of the floating portion of the attachment component.
10. The apparatus of claim 8, wherein the active antenna is positioned internal to an outer casing of the stylus.
11. The apparatus of claim 8, wherein the floating portion of the attachment component is a u-shaped wire structure.
12. The apparatus of claim 8, wherein the floating portion of the attachment component includes one or more coiled regions.
13. The apparatus of claim 8, wherein the floating portion of the attachment component is coupled to a resonant network that tunes a resonant frequency of the floating external clip.
14. The apparatus of claim 8, wherein the floating portion of the attachment component resonates in a frequency range substantially between 2.4 gigahertz (GHz) and 2.485 GHz.
15. A method comprising:
exciting a floating portion of an attachment component into a state of resonance by transmitting a carrier wave via an active antenna of a wearable electronic device, the attachment component attached to an external surface of a wearable electronic device.
16. The method of claim 15, wherein the floating portion of the attachment component resonates in a frequency range substantially between 2.4 GHz and 2.485 GHz.
17. The method of claim 15, wherein the active antenna is attached to a printed circuit board positioned parallel to a plane of the floating portion.
18. The method of claim 15, wherein the floating portion of the attachment component is a u-shaped wire structure.
19. The method of claim 15, wherein the floating portion of the attachment component includes one or more coiled portions.
20. The method of claim 15, wherein the floating portion of the attachment component is coupled to a resonant network that tunes a resonant frequency of the floating portion.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A data storage device, comprising:
a housing;
a rotatable medium connected with the housing, said rotatable medium including a template pattern having a marker zone;
an actuator rotatably connected with the housing;
a head operably connected with the actuator, the head being adapted to access the rotatable medium;
a ramp associated with the housing, ramp being adapted to remove the head from accessing the rotatable medium;
a crash stop associated with the housing;
a machine readable medium having instructions to:
determine a location of a marker zone edge of the template pattern;
determine a location of the ramp relative to the marker zone edge;
determine a location of the crash stop relative to the marker zone edge;
calculate a width of a data stroke based on the location of the ramp and the location of the crash stop;
compare the width of the data stroke to one or more criteria; and

a processor adapted to execute the instructions.
2. The data storage device of claim 1, wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an outer edge of said rotatable medium; and
detect a severe change in the metric.
3. The data storage device of claim 1, wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an inner diameter of said rotatable medium;
detect a severe change in the metric.
4. The data storage device of claim 2, wherein the metric is a bias force.
5. The data storage device of claim 2, wherein the metric is an AGC level.
6. The data storage device of claim 4, wherein the severe change is a severe drop.
7. The data storage device of claim 5, wherein the severe change is a sharp rise.
8. The data storage device of claim 6, wherein the severe change is a sharp rise.
9. the data storage device of claim 1, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head river said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an inner diameter of said rotatable medium; and
detect a severe change in the metric.
10. The data storage device of claim 1, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an outer edge of said rotatable medium; and
detect a severe change in the metric.
11. The data storage device of claim 9, wherein the metric is a bias force.
12. The data storage device of claim 11, wherein the severe change is a sharp rise.
13. The data storage device of claim 11, wherein the severe change is a severe drop.
14. The data storage device of claim 1, wherein the instructions to calculate the width of said data stroke based on the location of said ramp and the location of said crash stop include instructions to:
determine one or more portions of the data stroke within one or more radial zones;
weigh the one or more portions by circumferential density; and
sum the weighted one or more portions.
15. The data storage device of claim 1, wherein the criterion is one of maximum track capacity and minimum track density.
16. A data storage device, comprising:
a housing;
a rotatable medium connected with the housing, said rotatable medium including a template pattern having a marker zone;
an actuator rotatably connected with the housing;
a head operably connected with the actuator the head being adapted to access the rotatable medium;
a ramp associated with the housing, the ramp being adapted to remove the head from accessing the rotatable medium;
a crash stop associated with the housing;
a machine readable medium having instructions to:
determine, a location of a marker zone edge of said template pattern;
determine a location of the ramp relative to the marker zone edge;
determine a location of the crash stop relative to the marker zone edge;
calculate a width of a data stroke based on the location of the ramp and the location of the crash stop;
write a final servo pattern on the rotatable medium based on the width; and

a processor adapted to execute the instructions.
17. The data storage device of claim 16, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an inner diameter of said rotatable medium; and
detect a severe change in the metric.
18. The data storage device of claim 16, wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an inner diameter of said rotatable medium; and
detect a severe change in the metric.
19. The data storage device of claim 17, wherein the metric is a bias force.
20. The data storage device of claim 17, wherein the metric is an AGC level.
21. The data storage device of claim 19, wherein the severe change is a severe drop.
22. The data storage device of claim 19, wherein the severe change is a sharp rise.
23. The data storage device of claim 20, wherein the severe change is a sharp rise.
24. The data storage device of claim 16, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an outer edge of said rotatable medium; and
detect a severe change in the metric.
25. The data storage device of claim 16, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward an inner diameter of said rotatable medium; and
detect a severe change in the metric.
26. The data storage device of claim 24, wherein the metric is a bias force.
27. The data storage device of claim 26, wherein the severe change is a sharp rise.
28. The data storage device of claim 26, wherein the severe change is a severe drop.
29. The data storage device of claim 16, wherein the instructions to calculate the width based on the location of said ramp and the location of the inner diameter include instructions to:
determine one or more portions of the data stroke within one or more radial zones;
weigh the one or more portions by circumferential density; and
sum the weighted one or more portions.
30. The data storage device of claim 16, wherein the instructions to write the final servo pattern on said rotatable medium based on the width include instructions to:
select a track density;
select a capacity; and
determine a first user track and a final user track based on the track density and the capacity;
wherein a distance between said ramp and the first user track is at least a minimum outer guard band and a distance between said crash stop and the final user track is at least a minimum inner guard band.
31. The data storage device of claim 16, wherein the instructions to write the final servo pattern on said rotatable medium based on the width includes instructions to:
select an outer guard band;
select an inner guard band;
select a capacity; and
determine a track density based on the capacity the outer guard band, the inner guard band, and the width.
32. The data storage device of claim 16, wherein the instructions to write the final servo pattern on said rotatable medium based on the width includes instructions to:
select an outer guard band;
select an inner guard band;
select a track density; and
determine a capacity based on the track density, the outer guard band, the inner guard band, and the width.
33. The data storage device of claim 16, wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
locate said marker zone edge using said head;
move said actuator such that said head moves toward an outer edge of said rotatable medium;
measure a plurality of cycles as said head moves from the marker zone edge toward the outer edge of said rotatable medium; and
determine a position of said ramp by detecting a severe change in the metric.
34. The data storage device of claim 16, wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
locate said marker zone edge using said head;
move said actuator such that said head moves toward an inner diameter of said rotatable medium;
measure a plurality of cycles as said head moves from said marker zone edge toward the inner diameter of said rotatable medium; and
determine a position of said crash stop by detecting a severe change in the metric.
35. The data storage device of claim 33, wherein the metric is a bias force.
36. The data storage device of claim 33, wherein the metric is an AGC level.
37. The data storage device of claim 35, wherein the severe change is a severe drop.
38. The data storage device of claim 35, Wherein the severe change is a sharp rise.
39. The data storage device of claim 36, wherein the severe change is a sharp rise.
40. The data storage device of claim 16, wherein said template pattern is one of a media written pattern and a printed media pattern.
41. The data storage device of claim 30, wherein the instructions to write said final servo pattern on said rotatable medium based on the width further includes instructions to write a set of tracks from the first user track to the final user track.
42. The data storage device of claim 31, wherein the instructions to write said final servo pattern on said rotatable medium based on the width further includes instructions to write a set of tracks between said inner guard band and said outer guard band.
43. The data storage device of claim 32, wherein the instructions to write said final servo pattern on said rotatable medium based on the width further includes instructions to write a set of tracks between said inner guard band and said outer guard band.
44. A data storage device, comprising:
a rotatable medium having a template pattern;
a ramp;
a crash stop;
a machine readable medium having instructions to:
determine a location of a marker zone edge of said template pattern;
determine a location of said ramp relative to said marker zone edge;
determine a location of said crash stop relative to said marker zone edge; and
calculate a width of a data stroke based on the location of said ramp and the location of said crash stop; and
write a final servo pattern on the rotatable medium based on the width of the data stroke; and

a processor adapted to execute the instructions.
45. The data storage device of claim 44, further comprising:
an actuator;
a head connected with said actuator;
wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward said ramp across said rotatable medium; and
detect a severe change in the metric.
46. The data storage device of claim 45, wherein the metric is one of a bias force and an AGC level.
47. The data storage device of claim 44, further comprising:
an actuator;
a head connected with said actuator;
wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward said crash stop across said rotatable medium; and
detect a severe change in the metric.
48. The data storage device of claim 45, wherein the metric is a bias force.
49. The data storage device of claim 44, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select a track density;
select a capacity; and
determine a first user track and a final user track based on the track density and the capacity;
wherein a distance between said ramp and the first user track is at least a minimum outer guard band and a distance between said crash stop and the final user track is at least a minimum inner guard band.
50. The data storage device of claim 44, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select an outer guard band;
select an inner guard band;
select a capacity; and
determine a track density based on the capacity, the outer guard band the inner guard band, and the width.
51. The data storage device of claim 44, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select an outer guard band;
select an inner guard band;
select a track density; and
determine a capacity based on the track density, the outer guard band, the inner guard band, and the width.
52. A system to write a final servo pattern on a rotatable medium of a data storage device, the data storage device having an actuator, a head connected with the actuator, a ramp and a crash stop, and the rotatable medium having a template pattern, the system comprising:
a machine readable medium having instructions to:
wherein the instructions to determine a width of a data stroke include instructions to:
determine a location of a marker zone edge of said template pattern;
determine a location of said ramp relative to said marker zone edge;
determine a location of said crash stop relative to said marker zone edge; and
calculate a width of a data stroke based on the location of said ramp and the location of said crash stop; and
write a final servo pattern on the rotatable medium based on the width of the data stroke.
53. The system of claim 52, further comprising:
wherein the instructions to determine a location of said ramp relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward said ramp across said rotatable medium; and
detect a severe change in the metric.
54. The system of claim 53, wherein the metric is one of a bias force and an AGC level.
55. The system of claim 52, further comprising:
wherein the instructions to determine a location of said crash stop relative to said marker zone edge include instructions to:
position said head over said marker zone edge;
read said template pattern with said head;
measure a metric while reading said template pattern with said head;
adjust said actuator such that said head moves toward said crash stop across said rotatable medium; and
detect a severe change in the metric.
56. The system of claim 53, wherein the metric is a bias force.
57. The system of claim 52, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select a track density;
select a capacity; and
determine a first user track and a final user track based on the track density and the capacity;
wherein a distance between said ramp and the first user track is at least a minimum outer guard band and a distance between said crash stop and the final user track is at least a minimum inner guard band.
58. The system of claim 52, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select an outer guard band;
select an inner guard band;
select a capacity; and
determine a track density based on the capacity, the outer guard band, the inner guard band, and the width.
59. The system of claim 52, wherein the instructions to write a final servo pattern on the rotatable medium based on the width; include instructions to:
select an outer guard band;
select an inner guard band;
select a track density; and
determine a capacity based on the track density, the outer guard band, the inner guard band, and the width.

What is claimed is:

1. A microactuator comprising:
a first substrate;
a second substrate, the first substrate and the second substrate facing each other with a distance and movable with respect to each other;
a first comb electrode having a plurality of first comb elements formed on an inner surface of the first substrate;
a second comb electrode having a plurality of second comb elements formed on an inner surface of the second substrate, the first comb elements and the second comb elements being alternately disposed; and
a connecting film formed by partially removing an interlayer formed on the inner face of any one of the first substrate and the second substrate, any one of the first electrode and the second electrode being bonded to the connecting film.
2. A microactuator according to claim 1, wherein the first electrode and the second electrode comprise silicon and the interlayer comprises a material which is selectively etched with respect to the silicon.
3. A microactuator according to claim 1, wherein the first electrode, the second electrode, and the substrate provided with the connecting film comprise silicon and the interlayer comprises at least one of a silicon oxide film and a silicon-boron-oxygen insulating film.
4. A microactuator according to claim 1, wherein the first electrode and the second electrode comprise silicon, the substrate provided with the connecting film comprises any one of glass and ceramic, and the interlayer comprises a polyimide.
5. A method for making a microactuator comprising providing a first substrate and a second substrate facing each other with a distance and movable with respect to each other, and providing a first comb electrode having a plurality of first comb elements formed on an inner surface of the first substrate and a second comb electrode having a plurality of second comb elements formed on an inner surface of the second substrate;
wherein a wafer comprising two substrate layers and an interlayer provided therebetween is used as any one of the first substrate and the second substrate and one of the two substrate layers is etched using a mask having a predetermined pattern to form a first electrode precursor group and a second electrode precursor group for the first electrodes and the second electrodes, respectively, the interlayer below any one of the first and second electrode precursor groups is removed by etching to form any unconnected one of the first and second electrodes and to form the other one of the first and second electrodes supported by connecting films formed by etching of the remaining interlayer, and said unconnected one is bonded to the other one of the first substrate and the second substrate.
6. A method for making a microactuator according to claim 5, wherein one of the two substrate layers comprises silicon and the interlayer comprises a material which is selectively etched with respect to the silicon.
7. A method for making a microactuator according to claim 5, wherein both the substrate layers comprise silicon and the interlayer comprises at least one of a silicon oxide film and a silicon-boron-oxygen insulating film.
8. A method for making a microactuator according to claim 5, wherein one of the two substrate layers comprises silicon, the other of the two substrate layers comprises one of glass and ceramic, and the interlayer comprises a polyimide.
9. A magnetic head unit comprising a microactuator according to any one of claims 1 to 4.
10. A magnetic recording apparatus comprising a magnetic head unit according to claim 9.

The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.

1. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
a process gas tank configured to store the process gas;
a diluent gas tank configured to store the diluent gas;
a main gas duct connecting the process gas tank and the gas using system;
a plurality of flow rate controllers disposed on the main gas duct;
a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side;
a flow rate controller disposed on the diluent gas duct; and
a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side.
2. The process-gas supply system according to claim 1, wherein
a pure process gas or a process gas diluted with a diluent gas to a predetermined density is accommodated in the process gas tank.
3. The process-gas supply system according to claim 1, further comprising a reusable gas duct connecting the surplus-gas discharge duct and the diluent gas duct,
wherein the reusable gas duct is configured such that all the discharged surplus gas or a part thereof in the surplus-gas discharge duct can be reused as the diluent gas.
4. The process-gas supply system according to claim 3, wherein
the reusable gas duct is provided with a process-gas removal filter configured to absorb the process gas from the diluted process gas containing the diluent gas and the process gas, and
the process-gas removal filter is configured to remove the process gas from the diluted process gas flowing through the reusable gas duct, and to allow the diluent gas to pass therethrough.
5. The process-gas supply system according to claim 1, further comprising a reusable gas duct connecting the surplus-gas discharge duct and an exhaust system disposed on the gas using system,
wherein the reusable gas duct is configured such that all the discharged surplus gas or a part thereof in the surplus-gas discharged duct can be reused as a purge gas for a vacuum pump of the exhaust system.
6. The process-gas supply system according to claim 5, wherein
the reusable gas duct is provided with a process-gas removal filter configured to absorb the process gas from the diluted process gas containing the diluent gas and the process gas, and
the process-gas removal filter is configured to remove the process gas from the diluted process gas flowing through the reusable gas duct, and to allow the diluent gas to pass therethrough.
7. The process-gas supply system according to claim 1, further comprising:
a density measuring instrument configured to measure a density of the process gas, the density measuring instrument being disposed on the main gas duct at a position immediately before the gas using system, or on the gas using system; and
a feedback control device configured to feedback-control a flow rate controller based on a value detected by the density measuring instrument.
8. The process-gas supply system according to claim 7, wherein
the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the main gas duct.
9. The process-gas supply system according to claim 7, wherein
the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the diluent gas duct.
10. The process-gas supply system according to claim 1, further comprising a discarded-gas discharge duct connected to the main gas duct at a position on the downstream side of the flow rate controller on the most downstream side,
wherein the discarded-gas discharge duct is configured such that the process gas flowing therethrough bypasses the gas using system and is discarded.
11. The process-gas supply system according to claim 1, wherein
the surplus-gas discharge duct is provided with a check valve that is opened when a pressure of the process gas reaches or exceeds a predetermined pressure.
12. The process-gas supply system according to claim 11, wherein
the surplus-gas discharge duct is provided with a needle valve at a position on the upstream side of the check valve.
13. The process-gas supply system according to claim 1, further comprising:
a pressure gauge disposed on the main gas duct, the pressure gauge being configured to measure a gas pressure in the main gas duct;
a pressure regulating valve disposed on the surplus-gas discharge duct; and
a valve control device configured to control a valve opening degree of the pressure regulating valve based on a value measured by the pressure gauge.
14. The process-gas supply system according to claim 1, wherein
a part of the main gas duct, which part is located between a connection position to which the surplus-gas discharge duct is connected and a connection position to which the diluent gas duct is connected on the downstream side of the former connection point to which the surplus-gas discharge duct is connected, has a cross section smaller than those of other parts of the main gas duct, the other parts being located adjacent to the part on the upstream side and the downstream side.
15. The process-gas supply system according to claim 1, further comprising:
a zirconia-type density measuring instrument disposed on the main gas duct, the zirconia-type measuring instrument being configured to measure an oxygen density of a gas in the main gas duct; and
a feedback control part configured to feedback-control a flow rate controller based on a value detected by the zirconia-type density measuring instrument.
16. The process-gas supply system according to claim 15, further comprising a measuring-instrument bypass pipe provided with an opening and closing valve, the measuring-instrument bypass pipe being disposed on the main gas duct,
wherein the measuring-instrument bypass pipe is configured such that the process gas flowing therethrough bypasses the zirconia-type measuring instrument.
17. The process-gas supply system according to claim 1, wherein
the gas using system is a film deposition apparatus configured to deposit a film on a surface of an object to be processed, or an annealing apparatus configured to anneal an object to be processed on which a film has been formed.
18. The process-gas supply system according to claim 17, wherein
the film is any one of a CuMn film, a high dielectric constant film, an Mn film, and a film containing Mn.
19. The process-gas supply system according to claim 1, further comprising a mixer disposed on the main gas duct at a position to which the diluent gas duct is connected.
20. The process-gas supply system according to claim 1, wherein
the diluent gas is formed of one or more gases selected from the group consisting of an N2 gas and a rare gas.
21. The process-gas supply system according to claim 1, wherein
the process gas is an O2 gas.
22. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
a liquid material tank configured to store a liquid material of the process gas;
a diluent gas tank configured to store the diluent gas;
a main gas duct connecting the liquid material tank and the gas using system;
a flow rate controller disposed on the main gas duct; and
a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on a downstream side of the flow rate controller disposed on the main gas duct.
23. The process-gas supply system according to claim 22, wherein
the liquid material tank is configured such that a process gas, which is generated by evaporating the liquid material in the liquid material tank, outflows to the main gas duct.
24. The process-gas supply system according to claim 22, further comprising:
a plurality of flow rate controllers disposed on the main gas duct; and
a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side,
wherein the diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side.
25. The process-gas supply system according to claim 22, further comprising a pressure regulating valve mechanism disposed on the main gas duct at a position on the immediately
a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on an immediately upstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most upstream side;
wherein the diluent gas duct is connected to the main gas duct at a position on an immediately downstream side of one of the flow rate controllers disposed on the main gas duct other than the flow rate controller on the most downstream side.
30. The process-gas supply system according to claim 27, further comprising a pressure regulating valve mechanism disposed on the main gas duct at a position on an immediately downstream side of the liquid material tank.
31. The process-gas supply system according to claim 27, wherein
the process gas is a steam.
32. A process-gas supply system configured to supply a process gas diluted with a diluent gas to a gas using system, the process-gas supply system comprising:
a process-gas forming part configured to form the process gas;
a diluent gas tank configured to store the diluent gas;
a main gas duct connecting the process-gas forming part and the gas using system;
a flow rate controller disposed on the main gas duct;
a diluent gas duct connecting the diluent gas tank to the main gas duct, the diluent gas duct being connected to the main gas duct at a position on an upstream side of the flow rate controller disposed on the main gas duct;
a flow rate controller disposed on the diluent gas duct; and
a surplus-gas discharge duct through which a surplus diluted process gas is discharged from the main gas duct, the surplus-gas discharge duct being connected to the main gas duct at a position on the immediately upstream side of the flow rate controller disposed on the main gas duct.
33. The process-gas supply system according to claim 32, wherein
the process-gas forming part includes:
a material-gas supply system configured to supply a plurality of material gases for forming the process gas, with flow rates of the material gases being independently controlled; and
a reaction part configured to react the plurality of material gases from the material-gas supply system so as to form the process gas.
34. The process-gas supply system according to claim 32, wherein
the plurality of material gases are an H2 gas and an O2 gas, and the process gas is a steam.
35. The process-gas supply system according to claim 32, further comprising:
a density measuring instrument configured to measure a density of the process gas, the density measuring instrument being disposed on the main gas duct at a position immediately before the gas using system, or on the gas using system; and
a feedback control device configured to feedback-control a flow rate controller based on a value detected by the density measuring instrument.
36. The process-gas supply system according to claim 35, wherein
the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the main gas duct, or a flow rate controller disposed on the process-gas forming part.
37. The process-gas supply system according to claim 35, wherein
the flow rate controller to be feedback-controlled by the feedback control device is the flow rate controller disposed on the diluent gas duct.
38. A processing system configured to subject an object to be processed to a predetermined process, the processing apparatus comprising:
a processing container capable of accommodating one or more objects to be processed;
a gas introduction member configured to introduce a gas into the processing container; and
the process-gas supply system according to claim 1, connected to the gas introduction member for supplying a process gas diluted with a diluent gas into the processing container.
39. The processing system according to claim 38, further comprising an exhaust system configured to discharge an atmosphere in the processing container,
wherein the exhaust system includes: a main exhaust duct provided with an opening and closing valve and a vacuum pump; and a bypass exhaust duct provided with an opening and closing valve, for atmospheric pressure process, the bypass exhaust duct being connected to the main exhaust duct such that the bypass exhaust duct bypasses the vacuum pump.