1. A method of forming a semiconductor device, comprising:
receiving in a processing chamber a semiconductor device substrate comprising a carbon-containing low-k dielectric having a first dielectric constant;
exposing the carbon containing low-k dielectric to a UV treatment, the treatment comprising at least one of:
(a) exposure to UV radiation having a spectral profile characterized by greater than 50% of the UV radiation power having a wavelength of greater than 300 nm; and
(b) exposure to UV radiation and a chemical silylating agent;
such that the dielectric constant of the carbon-containing low-k dielectric is decreased to a second dielectric constant;
wherein the treatment comprises exposure to the chemical silylating agent prior to the UV radiation exposure; and
wherein a second UV radiation exposure precedes the exposing the carbon containing low-k dielectric to the chemical silylating agent.
2. The method of claim 1, wherein there is no air-break between exposures.
3. The method of claim 1, wherein there is an air-break between one or more exposures.
4. The method of claim 1, wherein a thermal anneal exposure precedes the exposing the carbon containing low-k dielectric to the chemical silylating agent.
5. The method of claim 1, wherein the dielectric is selected from the group consisting of carbon doped oxides formed from octamethyl cyclotetrasiloxane (OMCTS), tetramethylcyclotetrasiloxane (TMCTS), dimethyldimethoxysilane (DMDMOS), and diethoxymethylsilane (DEMS).
6. The method of claim 5, wherein the alkyl silane is selected from the group consisting of dimethyldichlorosilane, dimethyldimethoxysilane, dimethyldiethoxysilane, bis(dimethylamino)dimethylsilane, dimethylaminao trimethyl silane, bis(diethylamino)dimethylsilane, ethylmethyldichlorosilane and diethyldichlorosilane, diethyldiethoxysilane.
7. The method of claim 6, wherein the silylating agent is bis(dimethylamino)dimethylsilane.
8. The method of claim 6, wherein the silylating agent is dimethyldichlorosilane.
9. The method of claim 1, wherein greater than 50% of the (a) andor (b) UV radiation power is in a wavelength range of about 300 to 450 nm.
10. The method of claim 1, wherein greater than 50% of the (a) andor (b) UV radiation power is in a wavelength range of about 300 to 400 nm.
11. The method of claim 1, wherein less than 10% of the (a) andor (b) UV radiation power is in a wavelength range below 300 nm.
12. The method of claim 1, wherein less than 5% of the (a) andor (b) UV radiation power is in a wavelength range below 300 nm.
13. The method of claim 1, wherein less than 1% of the (a) andor (b) UV radiation power is in a wavelength range below 300 nm.
14. The method of claim 1, wherein the proportion of (a) andor (b) UV radiation power in a wavelength range of 200 to 240 nm to UV radiation power in a wavelength range of 300 to 400 nm in the UV radiation to which the carbon containing low-k dielectric is exposed is no more than 10%.
15. The method of claim 1, wherein a Fe-filled (\u201cD\u201d) bulb is used a source for the (a) andor (b) UV radiation.
16. The method of claim 15, wherein a high pass filter is used with the D bulb to filter out the UV radiation having a wavelength below 300 nm prior to exposure of the carbon containing low-k dielectric.
17. The method of claim 16, wherein the filter is a 295 nm high pass filter.
18. The method of claim 1, wherein a Ga-filled (\u201cV\u201d) bulb is used a source for the (a) andor (b) UV radiation.
19. The method of claim 18, wherein a high pass filter is used with the V bulb to filter out the UV radiation having a wavelength below 300 nm prior to exposure of the carbon containing low-k dielectric.
20. The method of claim 19, wherein the filter is a 295 nm high pass filter.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A scroll-type fluid machine comprising:
a stationary scroll having a stationary wrap which axially extends;
an orbiting scroll having an orbiting wrap which is engaged with said stationary wrap of said stationary scroll, air being pressurized by revolving said orbiting scroll with respect to the stationary scroll eccentrically;
a discharge bore formed in the stationary scroll to discharge said pressurized air; and
a cooler including a cooling path that communicate with said discharge bore to pass and cool said air.
2. A scroll-type fluid machine as claimed 1 wherein the fluid machine is a scroll compressor.
3. A scroll-type fluid machine as claimed 1, wherein the fluid machine is a scroll vacuum pump.
4. A scroll-type fluid machine as claimed in claim 1, comprising a mechanism for preventing the orbiting scroll from rotating on its own axis so that the orbiting scroll may be revolved with respect to the stationary scroll at predetermined eccentricity.
5. A scroll-type fluid machine as claimed in claim 1 wherein a compression chamber is formed between the orbiting scroll and the stationary scroll so that volume of the compression chamber may become smaller towards a center.
6. A scroll-type fluid machine as claimed in claim 5 wherein the discharge bore communicates with the compression chamber.
7. A scroll-type fluid machine as claimed in claim 1 wherein cooler comprises a rectangular body, and a plurality of cooling fins, opening between the cooling fins being closed a cover bolted to the body.
8. A scroll-type fluid machine as claimed in claim 1 wherein the cooler is made of high thermal conductivity material such as Al alloy or Cu alloy.
9. A scroll-type fluid machine as claimed in claim 1 wherein a plurality of cooling paths are formed in parallel in the cooler and communicate with each other via vertical communicating paths to form a long cooling path that communicates with the discharge bore.
10. A scroll-type fluid machine as claimed in claim 1 wherein the cooling fin of the cooler is covered with a blowing duct, an absorbing fan being provided at an opening of the blowing duct, air from the duct being discharged to cool the cooling fin.
11. A scroll-type fluid machine as claimed in claim 1 wherein the cooler comprises a body and a conduit engaged in a semi-spherical groove, one end of the conduit being connected to discharge bore of the stationary scroll, the other end of the conduit being connected to a cooling outlet.
12. A scroll-type fluid machine as claimed in claim 1, comprising a two-step scroll compressor that comprises an outer low-pressure pressurizing step portion and an inner high-pressure pressurizing step portion, air pressurized in and discharged from the low-pressure pressurizing step portion being further pressurized by the higher-pressure pressurizing step portion.
13. A scroll-type fluid machine comprising:
a stationary scroll having a stationary wrap which axially extends;
an orbiting scroll having an orbiting wrap which is engaged with said stationary wrap of said stationary scroll, air being pressurized by revolving said orbiting scroll with respect to the stationary scroll eccentrically; and
a discharge bore formed in the stationary scroll to discharge said pressurized air, said stationary scroll having a cooling path which communicates with the discharge bore to cool said air from the discharge bore.