1. An apparatus for determining hyperhidrosis zones of a patient, comprising:
a flexible sheet carrying a moisture-indicating substance, such that the moisture indicating substance indicates hyperhidrosis zones when the moisture-indicating substance is placed against the skin of a patient.
2. The apparatus of claim 1, wherein the flexible sheet includes an adhesive layer adapted to adhere to skin of a patient, the adhesive layer being positioned on a first side of the flexible sheet.
3. The apparatus of claim 2, wherein the moisture-indicating substance is carried by the adhesive layer.
4. The apparatus of claim 3, wherein the moisture-indicating substance is adhered to the adhesive layer.
5. The apparatus of claim 1, wherein the moisture-indicating substance comprises a starch iodine mixture.
6. The apparatus of claim 1, wherein the flexible sheet has a series of perforations to allow access to the skin through the flexible sheet by a marking instrument.
7. The apparatus of claim 2, wherein the first side is covered by a removable cover sheet, the removable cover protecting the moisture-indicating substance from undesired contact with moisture.
8. The apparatus of claim 7, wherein the flexible sheet has a flap to aid in handling the flexible sheet, the flap being free of the moisture indicating substance and adhesive.
9. An apparatus for determining hyperhidrosis zones of a patient, the apparatus comprising:
a moisture-indicating substance comprising a first part and a second part, such that the first part and the second part combine and undergo a chemical reaction in the presence of moisture;
a first flexible sheet having a first side, the first side carrying the first part of the moisture-indicating substance;
a second flexible sheet having a first side and a second side, the second flexible sheet being permeable, the second flexible sheet carrying the second part of the moisture-indicating substance, the first side of the first flexible sheet being placed against the first side of the second flexible sheet, and the second side of the second flexible sheet is placed against the skin of the patient, such that moisture from the skin of the patient activates the first part and the second part of the moisture-indicating substance to indicate hyperhidrosis zones on the skin of the patient.
10. The apparatus of claim 9, wherein the first part of the moisture-indicating substance comprises one of iodine or starch, and the second part of the moisture-indicating substance comprises the other of iodine or starch.
11. The apparatus of claim 10, wherein the second flexible sheet comprises fabric that carries a dried solution of one of iodine and starch.
12. The apparatus of claim 11, wherein the first flexible sheet is attached to the second flexible sheet.
13. The apparatus of claim 12, wherein the first part of the moisture-indicating substance, carried on the first flexible sheet, and the second part of the moisture-indicating substance, carried on the second flexible sheet, are separated by a removable impermeable sheet prior to the moisture-indicating substance being activated.
14. The apparatus of claim 12, wherein the first flexible sheet is attached to the second flexible sheet by an adhesive perimeter on the first flexible sheet.
15. The apparatus of claim 14, wherein the adhesive perimeter extends beyond the second flexible sheet and attaches to the skin of the patient.
16. The apparatus of claim 9, wherein the first side of the first flexible sheet has an adhesive layer.
17. The apparatus of claim 16, wherein an outer portion of the adhesive layer adheres to the skin of the patient and to the second flexible sheet, the first part of the moisture-indicating substance being carried by an inner portion of the adhesive layer.
18. The apparatus of claim 9, wherein the first flexible sheet and the second flexible sheet have a series of aligned perforations to allow access to the skin through the first flexible sheet and the second flexible sheet by a marking instrument.
19. The apparatus of claim 9, wherein the second side of the second flexible sheet is covered by a removable cover sheet, the removable cover sheet protecting the moisture-indicating substance from undesired contact with moisture.
20. The apparatus of claim 9, wherein the flexible sheet has a flap to aid in handling the flexible sheet, the flap being free of the moisture indicating substance and adhesive.
21. A method for determining hyperhidrosis zones of a patient, comprising the steps of:
providing an apparatus for determining hyperhidrosis zones, the apparatus comprising at least one flexible sheet carrying a moisture-indicating substance;
placing the apparatus against the skin of a patient and allowing the apparatus to be exposed to moisture excreted by the patient until moisture from the patient reacting with the moisture-indicating substance identifies the patient’s hyperhidrosis zones.
22. The method as defined in claim 21, including a further step of marking the patient’s hyperhidrosis zones.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A coating film forming apparatus for forming a coating film comprising a resist film or a resist film and an additional film on a substrate, in association with light exposure of the resist film, the coating film forming apparatus comprising:
a process section including one or more coating units configured to apply the resist film or the resist film and the additional film onto the substrate, and one or more thermally processing units configured to perform a thermal process necessary for forming the coating film on the substrate;
a pre-coating cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate before transferring the substrate into the process section;
a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate before transferring the substrate into the process section; and
a control section configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a first state of particles on a back surface and an edge portion of the substrate is within a first acceptable range, and permitting transfer of the substrate into the process section where the first state of particles is within the first acceptable range.
2. The coating film forming apparatus according to claim 1, further comprising:
an interface section disposed between the process section and a light exposure apparatus;
a pre-light exposure cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate in the interface section before transferring the substrate into the light exposure apparatus; and
a pre-light exposure check unit configured to check a state of a back surface and an edge portion of the substrate before transferring the substrate into the light exposure apparatus,
wherein the control section is configured to realize a sequence of cleaning the substrate by the pre-light exposure cleaning unit, checking the substrate by the pre-light exposure check unit, making a judgment based on a check result thus obtained of whether or not a second state of particles on a back surface and an edge portion of the substrate is within a second acceptable range, and permitting transfer of the substrate into the light exposure apparatus where the second state of particles is within the second acceptable range.
3. The coating film forming apparatus according to claim 1, further comprising:
a development unit configured to perform a developing process on the substrate after the light exposure, and a thermally processing unit configured to perform a thermal process required before and after the developing process, both of which are disposed in the process section;
a post-development cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate transferred from the process section after the developing process; and
a post-development check unit configured to check a state of a back surface and an edge portion of the substrate after the developing process,
wherein the control section is configured to realize a sequence of cleaning the substrate by the post-development cleaning unit, checking the substrate by the post-development check unit, making a judgment based on a check result thus obtained of whether or not a third state of particles on a back surface and an edge portion of the substrate is within a third acceptable range, and permitting progress of the substrate to a subsequent step where the third state of particles is within the third acceptable range.
4. The coating film forming apparatus according to claim 2, wherein the light exposure apparatus is an immersion light exposure apparatus configured to perform a light exposure process through a liquid.
5. The coating film forming apparatus according to claim 1, wherein the pre-coating cleaning unit includes a cleaning liquid supply mechanism configured to supply a cleaning liquid onto the substrate, and a brush for cleaning a back surface and an edge portion of the substrate.
6. A coating film forming apparatus for forming a coating film comprising a resist film or a resist film and an additional film on a substrate, in association with light exposure of the resist film, the coating film forming apparatus comprising:
a process section including one or more coating units configured to apply the resist film or the resist film and the additional film onto the substrate, and one or more thermally processing units configured to perform a thermal process necessary for forming the coating film on the substrate;
a pre-coating cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate before transferring the substrate into the process section;
a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate before transferring the substrate into the process section; and
a control section configured to realize a sequence of checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a first state of particles on a back surface and an edge portion of the substrate is within a first acceptable range, and permitting transfer of the substrate into the process section where the first state of particles is within the first acceptable range, or cleaning the substrate by the pre-coating cleaning unit and then permitting transfer of the substrate into the process section where the first state of particles is out of the first acceptable range.
7. The coating film forming apparatus according to claim 6, further comprising:
an interface section disposed between the process section and a light exposure apparatus;
a pre-light exposure cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate in the interface section before transferring the substrate into the light exposure apparatus; and
a pre-light exposure check unit configured to check a state of a back surface and an edge portion of the substrate before transferring the substrate into the light exposure apparatus,
wherein the control section is configured to realize a sequence of checking the substrate by the pre-light exposure check unit, making a judgment based on a check result thus obtained of whether or not a second state of particles on a back surface and an edge portion of the substrate is within a second acceptable range, and permitting transfer of the substrate into the light exposure apparatus where the second state of particles is within the second acceptable range, or cleaning the substrate by the pre-light exposure cleaning unit and then permitting transfer of the substrate into the light exposure apparatus where the second state of particles is out of the second acceptable range.
8. The coating film forming apparatus according to claim 6, further comprising:
a development unit configured to perform a developing process on the substrate after the light exposure, and a thermally processing unit configured to perform a thermal process required before and after the developing process, both of which are disposed in the process section;
a post-development cleaning unit configured to perform cleaning on at least a back surface and an edge portion of the substrate transferred from the process section after the developing process; and
a post-development check unit configured to check a state of a back surface and an edge portion of the substrate after the developing process,
wherein the control section is configured to realize a sequence of checking the substrate by the post-development check unit, making a judgment based on a check result thus obtained of whether or not a third state of particles on a back surface and an edge portion of the substrate is within a third acceptable range, and permitting progress of the substrate to a subsequent step where the third state of particles is within the third acceptable range, or cleaning the substrate by the post-development cleaning unit and then permitting progress of the substrate to a subsequent step where the third state of particles is out of the third acceptable range.
9. The coating film forming apparatus according to claim 7, wherein the light exposure apparatus is an immersion light exposure apparatus configured to perform a light exposure process through a liquid.
10. The coating film forming apparatus according to claim 6, wherein the pre-coating cleaning unit includes a cleaning liquid supply mechanism configured to supply a cleaning liquid onto the substrate, and a brush for cleaning a back surface and an edge portion of the substrate.
11. A coating film forming method for forming a coating film comprising a resist film or a resist film and an additional film on a substrate in a process section, in association with light exposure of the resist film in a light exposure apparatus, the coating film forming method comprising:
performing cleaning on at least a back surface and an edge portion of the substrate before transferring the substrate into the process section;
checking a state of a back surface and an edge portion of the substrate before transferring the substrate into the process section after the cleaning;
making a judgment based on a check result thus obtained of whether or not a first state of particles on a back surface and an edge portion of the substrate is within a first acceptable range;
transferring the substrate into the process section where the first state of particles is within the first acceptable range;
applying the resist film or the resist film and the additional film onto the substrate in the process section; and
performing a thermal process necessary for forming the coating film on the substrate in the process section.
12. The coating film forming method according to claim 11, further comprising:
performing pre-light exposure cleaning on at least a back surface and an edge portion of the substrate before transferring the substrate into the light exposure apparatus;
checking a state of a back surface and an edge portion of the substrate after the pre-light exposure cleaning and before transferring the substrate into the light exposure apparatus;
making a judgment based on a check result thus obtained of whether or not a second state of particles on a back surface and an edge portion of the substrate is within a second acceptable range; and
transferring the substrate into the light exposure apparatus where the second state of particles is within the second acceptable range.
13. The coating film forming method according to claim 11, further comprising:
performing a developing process on the substrate after the light exposure;
performing a thermal process required before and after the developing process;
performing post-development cleaning on at least a back surface and an edge portion of the substrate after the developing process;
checking a state of a back surface and an edge portion of the substrate after the post-development cleaning;
making a judgment based on a check result thus obtained of whether or not a third state of particles on a back surface and an edge portion of the substrate is within a third acceptable range; and
sending the substrate to a subsequent step where the third state of particles is within the third acceptable range.
14. The coating film forming method according to claim 11, wherein the light exposure apparatus is an immersion light exposure apparatus configured to perform a light exposure process through a liquid.
15. A coating film forming method for forming a coating film comprising a resist film or a resist film and an additional film on a substrate in a process section, in association with light exposure of the resist film in a light exposure apparatus, the coating film forming method comprising:
checking a state of a back surface and an edge portion of the substrate before transferring the substrate into the process section;
making a judgment based on a check result thus obtained of whether or not a first state of particles on a back surface and an edge portion of the substrate is within a first acceptable range;
transferring the substrate into the process section where the first state of particles is within the first acceptable range, or
cleaning the substrate and then transferring the substrate into the process section where the first state of particles is out of the first acceptable range;
applying the resist film or the resist film and the additional film onto the substrate in the process section; and
performing a thermal process necessary for forming the coating film on the substrate in the process section.
16. The coating film forming method according to claim 15, further comprising:
checking a state of a back surface and an edge portion of the substrate before transferring the substrate into the light exposure apparatus;
making a judgment based on a check result thus obtained of whether or not a second state of particles on a back surface and an edge portion of the substrate is within a second acceptable range; and
transferring the substrate into the light exposure apparatus where the second state of particles is within the second acceptable range, or
cleaning the substrate and then transferring the substrate into the light exposure apparatus where the second state of particles is out of the second acceptable range.
17. The coating film forming method according to claim 15, further comprising:
performing a developing process on the substrate after the light exposure;
performing a thermal process required before and after the developing process;
checking a state of a back surface and an edge portion of the substrate after the developing process;
making a judgment based on a check result thus obtained of whether or not a third state of particles on a back surface and an edge portion of the substrate is within a third acceptable range; and
sending the substrate to a subsequent step where the third state of particles is within the third acceptable range, or
cleaning the substrate and then sending the substrate to a subsequent step where the third state of particles is out of the third acceptable range.
18. The coating film forming method according to claim 15, wherein the light exposure apparatus is an immersion light exposure apparatus configured to perform a light exposure process through a liquid.
19. A computer readable storage medium that stores a control program for execution on a computer to control a coating film forming apparatus, wherein the control program, when executed, causes the computer to control the coating film forming apparatus to perform a coating film forming method for forming a coating film comprising a resist film or a resist film and an additional film on a substrate in a process section, in association with light exposure of the resist film in a light exposure apparatus, the coating film forming method comprising:
performing cleaning on at least a back surface and an edge portion of the substrate before transferring the substrate into the process section;
checking a state of a back surface and an edge portion of the substrate before transferring the substrate into the process section after the cleaning;
making a judgment based on a check result thus obtained of whether or not a first state of particles on a back surface and an edge portion of the substrate is within a first acceptable range;
transferring the substrate into the process section where the first state of particles is within the first acceptable range;
applying the resist film or the resist film and the additional film onto the substrate in the process section; and
performing a thermal process necessary for forming the coating film on the substrate in the process section.