1. An apparatus for tracking locations of a plurality of sound sources, the apparatus comprising:
a microphone array comprising a plurality of linearly disposed microphones; and
a sound source candidate extractor, comprising a processor, to extract sound source candidates at respective predetermined frames from microphone signals received from the microphone array; and
a sound source candidate verifier to perform beamforminq on the sound source candidates extracted by the sound source candidate extractor, to select the plurality of sound source candidates having a predetermined value or higher of signal intensity from the sound source candidates obtained as a result of the beamforminq and to predict locations of actual sound sources based on the selected sound source candidates,
wherein the sound source candidate extractor comprises:
a sound source feature extractor to extract voice features required for tracking locations of sound sources at respective frames from microphone signals received from the microphone array; and
a sound source candidate group extractor to extract the sound source candidates, based on the sound source features extracted by the sound source feature extractor, and to extract a plurality of sound source candidate groups, each including sound source candidates having the same sound source direction, from the extracted sound source candidates.
2. The apparatus according to claim 1, wherein each predetermined frame has a data volume of the microphone signal of 256, 512 or 1024 bits.
3. The apparatus according to claim 1, wherein the sound source candidate extractor transforms the microphone signals through windowing and a fast fourier transform (FFT), extracts voice features via a predetermined algorithm, and extracts the plurality of sound source candidates based on the extracted voice features, wherein sound source candidates in frames having sound source features are assigned a predetermined sound source candidate value other than zero, while sound source candidates in frames having no sound source features are assigned a sound source candidate value of zero, and only the sound source candidates having the sound source candidate value are extracted as candidates at each frame.
4. A method for predicting locations of a plurality of sound sources, the method comprising:
receiving microphone signals from a microphone array comprising a plurality of linearly disposed microphones;
extracting sound source candidates at respective predetermined frames of the received microphone signals;
beamforming the extracted sound source candidates;
selecting sound source candidates having a predetermined value or higher of signal intensity using results of the beamforming; and
predicting locations of actual sound sources based on the selected sound source candidates,
wherein the extracting of sound source candidates comprises:
extracting sound source features at respective predetermined frames of the received microphone signals;
extracting sound source candidates based on the extracted sound source features; and
extracting a plurality of sound source candidate groups, each including sound source candidates having the same sound source direction, from the respective extracted sound source candidates.
5. The method according to claim 4, wherein, during extraction of sound source candidates, each predetermined frame has a data volume of the microphone signal of 256, 512 or 1024 bits.
6. The method according to claim 4, wherein the extracting sound source features at respective predetermined frames of the received microphone signals further comprises:
transforming the microphone signals through windowing and a fast fourier transform (FFT);
extracting voice features via a predetermined algorithm; and
extracting sound source candidates based on the extracted voice features, wherein sound source candidates in frames having sound source features are assigned a predetermined sound source candidate value other than zero, while sound source candidates in frames having no sound source features are assigned a sound source candidate value of zero, and only sound source candidates having the sound source candidate value are extracted as candidates at each frame.
7. The method according to claim 4, wherein in the selecting of the sound source candidates further comprises:
selecting sound source candidates exceeding a predetermined signal intensity from the verified sound source candidates obtained as a result of the beamforming; and
predicting locations of actual sound sources based on the selected sound source candidates.
8. At least one non-transitory medium comprising computer readable code to control at least one processor to implement the method of claim 4.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for exposing a substrate using a lithographic apparatus, the method comprising:
providing a beam of radiation using an illumination system, the illumination system comprising part of the lithographic apparatus and including a reflective integrator disposed along an optical axis of the lithographic apparatus, the reflective integrator having a rectangular cross-section perpendicular to said optical axis;
imparting a pattern to the beam with a patterning device, the patterning device including a patterned area having features that extend in at least one direction parallel to a boundary segment of said cross-section of said reflective integrator, when viewed in a common plane perpendicular to the optical axis;
providing a substrate, the substrate comprising a radiation-sensitive layer and at least one target portion, said target portion being substantially rectangular; and
exposing the substrate such that, a first angle between a boundary segment of said cross-section of said reflective integrator and a boundary segment of said target portion is between 5 and 85 degrees, in a plane perpendicular to the unfolded optical axis.
2. A method according to claim 1, wherein said first angle is further of the form 90n where n is an integer.
3. A method according to claim 1, wherein said patterning device has a maximum usable area, including said patterned area, and wherein during an exposure a second angle between a boundary segment of said target portion and a boundary segment of said maximum usable area is substantially equal to said first angle and wherein a third angle between a boundary segment of said cross-section of said reflective integrator and a boundary segment of said maximum usable area is substantially 0 degrees, in a plane perpendicular to the optical axis.
4. A method according to claim 3, wherein said target portion is rectangular and bounded by 4 line segments.
5. A method according to claim 3, wherein said target portion is an octagon bounded by 8 line segments of which 4 line segments coincide with boundary segments of said maximum usable area.
6. A method according to claim 1, wherein said patterning has a maximum usable area, including said patterned area, and wherein during an exposure a second angle between a boundary segment of said target portion and a boundary segment of said maximum usable area is substantially 0 degrees and wherein a third angle between a boundary segment of said cross-section of said reflective integrator and a boundary segment of said maximum usable area is substantially equal to said first angle, in a plane perpendicular to the optical axis.
7. A method according to claim 6, wherein said patterned area equals said maximum usable area.
8. A method according to claim 6, wherein a beam of radiation is provided with a pupil shape in a pupil plane on an object side of said reflective integrator, and wherein said pupil shape is symmetric with respect to two perpendicular central axes, said axes being parallel to respective boundary segments of said cross-section of said reflective integrator.
9. A patterning device having a maximum usable area, the maximum usable area including a patterned area, and wherein an angle between a boundary segment of said maximum usable area and a boundary segment of said patterned area is between 5 and 85 degrees.
10. A lithographic apparatus comprising:
a reflective integrator disposed along an optical axis of the lithographic apparatus, the reflective integrator having a rectangular cross-section perpendicular to said optical axis and being rotatable around said optical axis, a support structure to support a patterning device, the patterning device having a patterned area serving to impart a projection beam of radiation with a pattern in its cross-section, and a projection system to project said patterned area onto a target portion of a substrate.
11. A lithographic apparatus according to claim 10, wherein the illumination system further comprises an optical element for providing a beam of radiation with a pupil shape in a pupil plane before said reflective integrator, and wherein said pupil shape is mirror-symmetric with respect to two perpendicular central axes, said axes being parallel to respective boundary segments of said cross-section of said reflective integrator.
12. A lithographic apparatus according to claim 11, wherein said optical element is one of a diffractive optical element (DOE), a refractive optical element (ROE), and a holographic optical element (HOE).
13. A lithographic apparatus according to claim 11, wherein said optical element is rotatable around said optical axis.
14. A method for projecting features onto a substrate by a projection system having polarization dependent transmission characteristic, the features extending in at least a first and a second direction with respect to the substrate, comprising:
projecting a first patterned beam of radiation onto a target portion of a substrate having a radiation-sensitive layer, said first patterned beam comprising said features extending in said first direction with respect to said substrate;
rotating the substrate around an axis perpendicular to the substrate over an angle between said first and second directions after projecting the first patterned beam of radiation; and
projecting said second pattern onto said target portion of the substrate after said rotating, the second patterned beam of radiation comprising said features in said second direction with respect to the substrate.
15. A method according to claim 14, wherein the projection beam is substantially literally polarized in a particular polarization direction, and said first and second directions are arranged to be optimal for said particular polarization direction.
16. A method according to claim 14, wherein the substrate is rotated over an angle of 90 degrees.
17. A method according to claim 16, wherein said target portion is square.