1. An nanoimprint resist comprising:
a hyperbranched polyurethane oligomer (HP);
a perfluoropolyether (PFPE);
a methylmethacrylate (MMA); and
a diluent solvent.
2. The nanoimprint resist of claim 1, wherein the hyperbranched polyurethane oligomer (HP) is polymerized by a copolymerization of a trimellitic anhydride, an ethylene glycol, and an epoxy acrylic acid copolymer, or polymerized by a ring-opening copolymerization of an epoxy acrylic acid and an ethylene mercaptan.
3. The nanoimprint resist of claim 2, wherein a chemical structure of the hyperbranched polyurethane oligomer (HP) is:
4. The nanoimprint resist of claim 1, wherein the diluent solvent is 2-hydroxyethyl methacrylate or 2-Hydroxy Ethyl 2-methyl ethylene.
5. The nanoimprint resist of claim 1, wherein a weight percent of the HP is in a range from about 50 wt % to about 60 wt %, a weight percent of the PFPE is in a range from about 3 wt % to about 5 wt %, a weight percent of the MMA is in a range from about 5 wt % to about 10 wt %, and a weight percent of the diluents solvent is in a range from about 25 wt % to about 35 wt %.
6. The nanoimprint resist of claim 5, wherein the nanoimprint resist further comprises a polydimethlsiloxanes (PDMS) or methacrylatesilane with a weight percent in a range from about 5% to about 10%.
7. The nanoimprint resist of claim 5, wherein the naoimprint resist further comprises an initiator with a weight percent in a range from about 0.1% to about 2%.
8. A nanoimprint lithography method comprising:
(S31) providing a substrate and forming a first sacrifice layer, a second sacrifice layer and a nanoimprint resist on the substrate, wherein the nanoimprint resist comprises a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE); a methylmethacrylate (MMA), and a diluent solvent;
(S32) providing a master stamp with a first nanopattern formed by a plurality of projecting portions and gaps, pressing the first nanopattern into the nanoimprint resist, and forming a second nanopattern in the nanoimprint resist; and
(S33) transferring the second nanopattern to the substrate.
9. The nanoimprint lithography method of claim 8, wherein the hyperbranched polyurethane oligomer (HP) is polymerized by a copolymerization of a trimellitic anhydride, an ethylene glycol, and an epoxy acrylic acid copolymer, or is polymerized by a ring-opening copolymerization of an epoxy acrylic acid and an ethylene mercaptan.
10. The nanoimprint lithography method of claim 9, wherein a chemical structure of the hyperbranched polyurethane oligomer (HP) is:
11. The nanoimprint lithography method of claim 8, wherein in the nanoimprint resist, a weight percent of the HP is in a range from about 50 wt % to about 60 wt %, a weight percent of the PFPE is in a range from about 3 wt % to about 5 wt %, a weight percent of the MMA is in a range from about 5 wt % to about 10 wt %, and a weight percent of the diluents solvent is in a range from about 25 wt % to about 35 wt %.
12. The nanoimprint lithography method of claim 11, wherein the nanoimprint resist further comprises a polydimethlsiloxanes (PDMS) or a methacrylatesilane with a weight percent in a range from about 5% to about 10%.
13. The nanoimprint lithography method of claim 11, wherein the naoimprint resist further comprises an initiator with a weight percent in a range from about 0.1% to about 2%.
14. The nanoimprint lithography method of claim 8, wherein the first sacrifice layer is made of a thermoplastic polymer, the thermoplastic polymer is selected from the group consisting of polymethyl methacrylate (PMMA), epoxy resin, unsaturated polyester resins, and silicon ether resin.
15. The nanoimprint lithography method of claim 8, wherein the second sacrifice layer is made of aluminum or cesium.
16. The nanoimprint lithography method of claim 8, wherein the step (S32) comprises:
(S321) compressing the master stamp with the substrate to press the first nanopattern into the nanoimprint resist; and
(S322) curing the nanoimprint resist, and separating the master stamp from the substrate to form the second nanopattern in the nanoimprint resist, the second nanopattern comprising a plurality of protrusions and recesses.
17. The nanoimprint lithography method of claim 16, wherein in step (S322), the nanoimprint resist is cured via heating; after separating the master stamp from the substrate, a plurality of protrusions and recesses are exposed, and remains of the nanoimprrint resist are located at a bottom of the recess.
18. The nanoimprint lithography method of claim 17, wherein the step (S33) comprising:
(S331) removing the remains at the bottom of the recesses to expose the second sacrifice layer in part;
(S332) etching the second sacrifice layer exposed by the recesses to expose the first sacrifice layer in part;
(S333) etching the first sacrifice layer exposed by the recesses to expose the substrate in part; and
(S334) etching the substrate exposed by the recesses.
19. A nanoimprint lithography method comprising the steps of:
(S51) providing a substrate and forming a first sacrifice layer and a second sacrifice layer on the substrate;
(S52) providing a master stamp with a first nanopattern, and depositing a nanoimprint resist on the first nanopattern, the nanoimprint resist comprising a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), and a diluent solvent;
(S53) attaching the second sacrifice layer to the nanoimprint resist, forming a second nanopattern in the naoimprint resist; and
(S54) transferring the second nanopattern to the substrate.
20. The nanoimprint lithography method of claim 19, wherein a chemical structure of the hyperbranched polyurethane oligomer (HP) is:
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An image forming apparatus comprising:
an image forming portion which forms an image onto a sheet; and
a sheet processing apparatus which processes after aligning sheets on which images are formed,
wherein said sheet processing apparatus has:
a stacking portion which stacks sheets on each of which an image is formed, and
a pair of aligning members which are configured to face with each other and movable independently so that said pair of aligning members pinches side edges of the sheets in a direction perpendicular to a conveying direction in which the sheet is conveyed to said stacking portion to align the side edges of the sheets,
wherein one of said aligning members is allowed to be chosen as a reference of the alignment, while the other of said aligning members aligns the side edges of the sheets by pressing the sheets against said one of aligning members, and
wherein when an image forming portion which forms an image onto a sheet, said image forming portion forms an image at an image forming position which reference is on a basis of the sheet side edge to be abutted against said one of the aligning members.
2. An image forming apparatus according to claim 1, further comprising:
a side edge detection portion provided on an upstream side of said image forming portion, said side edge detection portion detecting position of the sheet side edge to be abutted against said one of the aligning member; and
a control portion which controls the image forming position where said image forming portion forms an image,
and wherein on a basis of signals from said side edge detection portion, said control portion controls the image forming portion so as to form an image at the image forming position which reference is on a basis of the sheet side edge to be abutted against said one of the aligning members.
3. An apparatus according to claim 2, further comprising an image memory which stores image data,
wherein said control portion changes the image forming position on a basis of the sheet side edge by shifting a position of an area of the image data in a direction perpendicular to the conveying direction in an image writing area in said image memory.
4. An apparatus according to claim 2, wherein said side edge detection portion has sensors configured to face with each other on an upstream side of said image forming portion so as to respectively detect positions of both side edges in a direction perpendicular to the conveying direction of sheet.
5. An apparatus according to claim 2, wherein said side edge detection portion extends on the upstream side of said image forming portion in the direction perpendicular to the conveying direction of the sheet by a length in which said side edge detection portion is capable of detecting positions of both side edges of the sheet in the direction perpendicular to the conveying direction of the sheet.
6. An apparatus according to claim 5, wherein said side edge detection portion is a contact type line sensor.
7. An apparatus according to claim 1, wherein said stacking portion has a press member which presses the sheets against said one of the aligning members.
8. An apparatus according to claim 2, wherein said stacking portion has a press member which presses the sheets against said one of the aligning members.
9. An apparatus according to claim 1, wherein said sheet processing apparatus has a stapler, said stapler stapling the sheets stacked in said stacking portion,
and wherein said stapler staples the edge portions on the side of the sheet edges which abut against said one aligning member.
10. An apparatus according to claim 2, wherein said sheet processing apparatus has a stapler, said stapler stapling the sheets stacked in said stacking portion,
and wherein said stapler staples the edge portions on the side of the sheet edges which abut against said one aligning member.
11. An apparatus according to claim 1, further comprising:
a side edge detection portion provided on an upstream side of said image forming portion, said side edge detection portion detecting position of the sheet side edge to be abutted against said one of the aligning members;
a sheet moving unit provided on the upstream side of said image forming portion, said sheet moving unit moving the sheet in the direction perpendicular to the conveying direction of the sheet; and
a control portion which controls said sheet moving unit,
wherein on a basis of information from said side edge detection portion, said control portion controls said sheet moving unit to move the sheet at the image forming position which reference is on a basis of the sheet side edge to be abutted against said one of the aligning members.
12. An apparatus according to claim 11, wherein said side edge detection portion having sensors configured to face with each other on an upstream side of said image forming portion so as to respectively detect positions of both side edges in the direction perpendicular to the conveying direction of the sheet.
13. An apparatus according to claim 11, wherein said side edge detection portion extends in the direction perpendicular to the conveying direction of the sheet on the upstream side of said image forming portion by a length in which said side edge detection portion is capable of detecting positions of both side edges of the sheet in the direction perpendicular to the conveying direction of said sheet
14. An apparatus according to claim 13, wherein said side edge detection portion is a contact type line sensor.
15. An apparatus according to claim 11, wherein said stacking portion has a press member which presses the sheets against said one of the aligning member.
16. An apparatus according to claim 11, wherein said sheet processing apparatus has a stapler provided, said stapler stapling the sheets stacked in said stacking portion,
and wherein said stapler staples the edge portions on the side of the sheet edges which abuts against said one of the aligning members.