1. A plasma apparatus, comprising:
a chamber having a supporting table;
an electrode set; and
a gas supplying tube set disposed in the chamber and located between the supporting table and the electrode set, wherein the gas supplying tube set comprises at least one outer gas supplying tube and at least one first inner gas supplying tube, the first inner gas supplying tube is telescoped within the outer gas supplying tube, the outer gas supplying tube and the first inner gas supplying tube both have a plurality of gas apertures, and an amount of the gas apertures of the outer gas supplying tube is greater than an amount of the gas apertures of the first inner gas supplying tube.
2. The plasma apparatus of claim 1, wherein the gas apertures of the outer gas supplying tube and the gas apertures of the first inner gas supplying tube are facing opposite directions.
3. The plasma apparatus of claim 1, wherein the gas apertures of the outer gas supplying tube and the gas apertures of the first inner gas supplying tube are located on a same plane.
4. The plasma apparatus of claim 1, wherein the gas apertures are vertical to an axial direction of the gas supplying tube set, and the gas apertures may be disposed in different angles with the axial direction as a rotating center.
5. The plasma apparatus of claim 1, wherein the gas supplying tube set comprises a plurality of multilayer gas supplying tubes arranged in parallel in the chamber, each of the multilayer gas supplying tubes comprises one of the at least one outer gas supplying tube and one of the at least one inner gas supplying tube.
6. The plasma apparatus of claim 1, wherein the gas supplying tube set further comprises a second inner gas supplying tube, the second inner gas supplying tube is telescoped between the outer gas supplying tube and the first inner gas supplying tube, the second inner gas supplying tube has a plurality of gas apertures, and an amount of the gas apertures of the second inner gas supplying tube is within a range between the amount of the gas apertures of the outer gas supplying tube and the amount of the gas apertures of the first inner gas supplying tube.
7. The plasma apparatus of claim 6, wherein the gas apertures of the outer gas supplying tube and the gas apertures of the first inner gas supplying tube are facing same direction, and the gas apertures of the outer gas supplying tube and the gas apertures of the second inner gas supplying tube are facing opposite directions.
8. The plasma apparatus of claim 6, wherein the gas supplying tube set further comprises a third inner gas supplying tube, the third inner gas supplying tube is telescoped between the outer gas supplying tube and the second inner gas supplying tube, the third inner gas supplying tube has a plurality of gas apertures, and an amount of the gas apertures of the third inner gas supplying tube is within a range between the amount of the apertures of the outer gas supplying tube and the amount of the apertures of the second inner gas supplying tube.
9. The plasma apparatus of claim 8, wherein the gas apertures of the outer gas supplying tube and the gas apertures of the second inner gas supplying tube are facing same direction, the gas apertures of the third gas supplying tube and the gas apertures of the first inner gas supplying tube are facing same direction, and the gas apertures of the outer gas supplying tube and the gas apertures of the third inner gas supplying tube are facing opposite directions.
10. The plasma apparatus of claim 1, wherein the electrode set is partially located in the chamber.
11. The plasma apparatus of claim 10, wherein the electrode set comprises a metal body and a plurality of dielectric sleeves, the dielectric sleeves are telescoped on a portion of the metal body located in the chamber.
12. The plasma apparatus of claim 1, wherein the electrode set is located outside of the chamber.
13. The plasma apparatus of claim 1, wherein the electrode set comprises:
a plurality of linear bodies; and
a plurality of connecting portions connecting two adjacent linear bodies;
wherein, the linear bodies are connected to each other in parallel.
14. The plasma apparatus of claim 13, wherein each of the linear bodies has a straight-line shape.
15. The plasma apparatus of claim 13, wherein the linear bodies are arranged in parallel to each other, a distance between the linear bodies arranged on a middle section is greater than a distance between the linear bodies arranged on two side sections.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A cleaning composition in a concentrated form comprising:
(a) a water-soluble organic solvent, wherein the water soluble organic solvent is tetrahydrofurfuryl alcohol,
(b) at least one surfactant, wherein the at least one surfactant is the product of saponification of at least one fatty acid by an amino alcohol,
(c) at least one additional nonionic surfactant,
(d) a chelating agent, and
(e) the remainder distilled water.
2. The cleaning composition according to claim 1, wherein the amount of water-soluble organic solvent is between about 3% and about 16% by weight of the total composition.
3. The cleaning composition according to claim 1, wherein the amount of water-soluble organic solvent is between about 3% and about 9% by weight of the total composition.
4. The cleaning composition according to claim 1, wherein the amino alcohol is an ethanolamine.
5. The cleaning composition according to claim 1, wherein the amino alcohol is monoethanolamine.
6. The cleaning composition according to claim 1, wherein the amount of amino alcohol is between about 3% and about 9% by weight of the total composition.
7. The cleaning composition according to claim 1, wherein the amount of the at least one fatty acid is between about 7% and about 14% by weight of the total composition.
8. The cleaning composition according to claim 1, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
9. The cleaning composition according to claim 1, wherein the at least one fatty acid is chosen from the group comprising saturated fatty acids of the general formula CxH2xO2, wherein the value of x is any whole number between and including 16 and 24; monounsaturated or polyunsaturated fatty acids of the general formula CxH(2x-y)O2, wherein the value of x is any whole number between and including 16 and 20 and y is either 2 or 4; and mixtures thereof.
10. The cleaning composition according to claim 9, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
11. The cleaning composition according to claim 1, wherein the at least one fatty acid is chosen from the group comprising palmitic acid; palmitoleic acid; stearic acid; oleic acid; linoleic acid; 5,9,12-octadecatrienoic acid; 5,11,14-eicosatrienoic acid; cis,cis-5,9-octadecadienoic acid; cis-11-octadecanoic; eicosanoic acid; docosanoic acid; tetracosanoic acid; and mixtures thereof.
12. The cleaning composition according to claim 11, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
13. The cleaning composition according to claim 1, wherein the at least one fatty acid is tall oil, also known as pine oil.
14. The cleaning composition according to claim 13, wherein the tall oil may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the tall oil.
15. The cleaning composition according to claim 1, wherein the at least one surfactant is at least one fatty acid amide.
16. The cleaning composition according to claim 15, wherein the at least one fatty acid amide is a member of the group of amides comprising compounds with the structure CH3(CH2)xCONH(CH2)2OH, wherein the value of x is any whole number between and including 14 and 22; CH3(CH2)xCH\u2550CH(CH2)yCONH(CH2)2OH, wherein the value of x+y is any whole number between and including 12 and 16;
CH3(CH2)xCH\u2550CH(CH2)yCH\u2550CH(CH2)zCONH(CH2)2OH, wherein the value of x+y is any whole number between and including 10 and 14; and mixtures thereof.
17. The cleaning composition according to claim 1, wherein the amount of the at least one additional nonionic surfactant is between about 7% and about 30% by weight of the total composition.
18. The cleaning composition according to claim 1, wherein the at least one additional nonionic surfactant is a polyethylene oxide condensate of an alkylphenol.
19. The cleaning composition according to claim 1, wherein the at least one additional nonionic surfactant is an octylphenol ethoxylate that has the formula C8H17(C6H4)O(CH2CH2O)xH, wherein the average value of x is any number between and including 3 and 11.
20. The cleaning composition according to claim 1, wherein the amount of the chelating agent is between about 2% and about 8% by weight of the total composition.
21. The cleaning composition according to claim 1, wherein the chelating agent is an aminocarboxylic acid salt.
22. The cleaning composition according to claim 1, wherein the chelating agent is tetrasodium ethylenediaminetetraacetic acid.
23. The cleaning composition according to claim 1, wherein the amount of distilled water is between about 5% and about 53% by weight of the total composition.
24. The cleaning composition according to claim 1, further comprising products of a Diels-Alder cycloaddition of the at least one fatty acid.
25. The cleaning composition according to claim 1, further comprising cyclopinolenic acid.
26. The cleaning composition according to claim 15 further comprising products of a Diels-Alder cycloaddition of the at least one fatty acid amide.
27. A cleaning composition in a concentrated form comprising:
(a) a water-soluble organic solvent, wherein the water-soluble organic solvent is tetrahydrofurfuryl alcohol;
(b) at least one surfactant, wherein the at least one surfactant is the product of the saponification of at least one fatty acid by an amino alcohol;
(c) at least one additional nonionic surfactant, wherein the at least one additional nonionic surfactant is a polyethylene oxide condensate of an alkylphenol;
(d) a chelating agent, wherein the chelating agent is an aminocarboxylic acid salt; and
(e) the remainder distilled water.
28. The cleaning composition according to claim 27, wherein the amount of water-soluble organic solvent is between about 3% and about 16% by weight of the total composition.
29. The cleaning composition according to claim 27, wherein the amount of water-soluble organic solvent is between about 3% and about 9% by weight of the total composition.
30. The cleaning composition according to claim 27, wherein the amino alcohol is an ethanolamine.
31. The cleaning composition according to claim 27, wherein the amino alcohol is monoethanolamine.
32. The cleaning composition according to claim 27, wherein the amount of amino alcohol is between about 3% and about 9% by weight of the total composition.
33. The cleaning composition according to claim 27, wherein the amount of the at least one fatty acid is between about 7% and about 14% by weight of the total composition.
34. The cleaning composition according to claim 27, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
35. The cleaning composition according to claim 27, wherein the at least one fatty acid is chosen from the group comprising saturated fatty acids of the general formula CxH2xO2, wherein the value of x is any whole number between and including 16 and 24; monounsaturated or polyunsaturated fatty acids of the general formula CxH(2x-y)O2, wherein the value of x is any whole number between and including 16 and 20 and y is either 2 or 4; and mixtures thereof.
36. The cleaning composition according to claim 35, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
37. The cleaning composition according to claim 27, wherein the at least one fatty acid is chosen from the group comprising palmitic acid; palmitoleic acid; stearic acid; oleic acid; linoleic acid; 5,9,12-octadecatrienoic acid; 5,11,14-eicosatrienoic acid; cis,cis-5,9-octadecadienoic acid; cis-11-octadecanoic; eicosanoic acid; docosanoic acid; tetracosanoic acid; and mixtures thereof.
38. The cleaning composition according to claim 37, wherein the at least one fatty acid may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the at least one fatty acid.
39. The cleaning composition according to claim 27, wherein the at least one fatty acid is tall oil, also known as pine oil.
40. The cleaning composition according to claim 39, wherein the tall oil may contain rosin acids present in small amounts not to exceed about 5% by weight of the total weight of the tall oil.
41. The cleaning composition according to claim 27, wherein the at least one surfactant is at least one fatty acid amide.
42. The cleaning composition according to claim 41, wherein the at least one fatty acid amide is a member of the group of amides comprising compounds with the structure CH3(CH2)xCONH(CH2)2OH, wherein the value of x is any whole number between and including 14 and 22; CH3(CH2)xCH\u2550CH(CH2)yCONH(CH2)2OH, wherein the value of x+y is any whole number between and including 12 and 16;
CH3(CH2)xCH\u2550CH(CH2)yCH\u2550CH(CH2)zCONH(CH2)2OH, wherein the value of x+y is any whole number between and including 10 and 14; and mixtures thereof.
43. The cleaning composition according to claim 27, wherein the amount of the at least one additional nonionic surfactant is between about 7% and about 30% by weight of the total composition.
44. The cleaning composition according to claim 27, wherein the at least one additional nonionic surfactant is at least one octylphenol ethoxylate that has the formula C8H17(C6H4)O(CH2CH2O)xH, wherein the average value of x for any mixture of these compounds is any number between and including 3 and 11.
45. The cleaning composition according to claim 27, wherein the amount of the chelating agent is between about 2% and about 8% by weight of the total composition.
46. The cleaning composition according to claim 27, wherein the chelating agent is tetrasodium ethylenediaminetetraacetic acid.
47. The cleaning composition according to claim 27, wherein the amount of distilled water is between about 5% and about 53% by weight of the total composition.
48. The cleaning composition according to claim 27, further comprising products of a Diels-Alder cycloaddition of the at least one fatty acid.
49. The cleaning composition according to claim 41, further comprising cyclopinolenic acid.
50. The cleaning composition according to claim 41 further comprising products of a Diels-Alder cycloaddition of the at least one fatty acid amide.