1. A compound represented by the formula (I):
wherein in the formula, Link represents a saturated or unsaturated straight hydrocarbon chain having 1 to 3 carbon atoms,
C2, C3, C4, C5, and C6 in the aromatic ring (E) independently represent a ring-constituting carbon atom, one of the ring-constituting carbon atoms to which Rs and AR do not bind may be replaced with V,
V represents nitrogen atom, or carbon atom substituted with Zx, Zx represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, fluorine atom, chlorine atom, bromine atom, nitro group, \u2014OR9, or \u2014N(Rn1)(Rn2), R9 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qp, wherein A6 represents a single bond or methylene, Qp represents phenyl group, and the phenyl group may be substituted with one of T1 or two or more of the same or different T1, T1 represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, hydroxyl group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, nitro group, an alkoxy group having 1 to 4 carbon atoms, or a mono- or dialkylamino group having 1 to 4 carbon atoms, Rn1 represents hydrogen atom or a linear or branched saturated alkyl group having 1 to 4 carbon atoms, Rn2 has the same meaning as Rn1, or represents \u2014COR23 or \u2014SO2R24, or binds to Rn1 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, R23 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a lower alkoxy group having 1 to 4 carbon atoms, \u2014O-A6-Qp, or \u2014N(R25)(R26), R25 represents hydrogen atom, or a linear or branched saturated alkyl group having 1 to 4 carbon atoms, R26 has the same meaning as R25, or binds to R25 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, R24 represents a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms,
Rs represents -D-Rx or \u2014N(Ry)(Rz),
D represents a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014C(O)\u2014,
Rx represents a linear or branched saturated alkyl group having 3 to 8 carbon atoms, Ra represented by the following formula:
R1(CH2)k\u2014\u2003\u2003(Ra)
Rb represented by the following formula:
or Rc represented by the following formula:
symbol k in Ra represents 0 or an integer of 1 to 3, R1 represents a saturated cyclic alkyl group having 3 to 7 carbon atoms, or a condensed saturated cyclic alkyl group having 6 to 8 carbon atoms, and R1 may be substituted with one of lower alkyl group having 1 to 4 carbon atoms or two or more of the same or different lower alkyl groups having 1 to 4 carbon atoms, Q in Rb represents a partially unsaturated or completely unsaturated monocyclic or condensed bicyclic carbon ring or a heterocyclic ring (q), and binds to A2 at an arbitrary position on the ring, the heterocyclic ring (q) contains the same or different 1 to 4 ring-constituting heteroatoms selected from the group consisting of nitrogen atom, oxygen atom, and sulfur atom, A1 represents a single bond or an alkylene (a) having 1 to 3 carbon atoms, and the alkylene (a) may be substituted with a lower alkyl group having 1 to 4 carbon atoms or phenyl group, A2 represents a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014 (provided that when A2 represents oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014 or \u2014N(R4)\u2014, A1 represents ethylene or trimethylene), R2 and R3 independently represent hydrogen atom, a linear or branched saturated alkyl group having 1 to 4 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, \u2014OR5, \u2014N(R6)(R6\u2032), \u2014NHCOR7, \u2014NHSO2R8, or -A6-Qa, or they bind to each other to represent methylenedioxy group, Qa represents a partially unsaturated or completely unsaturated monocyclic or condensed bicyclic carbon ring or a heterocyclic ring (qa), binds to A6 at an arbitrary position on the ring, and may be substituted with one of T1 or two or more of the same or different T1, the heterocyclic ring (qa) contains the same or different 1 to 4 ring-constituting heteroatoms selected from the group consisting of nitrogen atom, oxygen atom, and sulfur atom, R4 and R6 independently represent hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R5 and R7 independently represent hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qa, R8 represents a lower alkyl group having 1 to 4 carbon atoms, R6\u2032 has the same meaning as R6, or binds to R6 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, symbol p in Rc represents an integer of 2 to 4, A4 represents a single bond, methylene, or ethylene, A5 represents \u2014C(O)\u2014, \u2014C(S)\u2014, or \u2014S(O)2\u2014, Rd represents hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or Qa, Re represents an alkyl group having 1 to 8 carbon atoms, -A6-Qa, \u2014(CH2)iR14, \u2014OR28, \u2014SR28, or \u2014N(R29)(R30), symbol i represents an integer of 1 to 3, R14 represents hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, carboxyl group, or an N,N-dialkylcarbamoyl group having 1 to 4 carbon atoms, R28 represents an alkyl group having 1 to 8 carbon atoms, or -A6-Qa, R29 represents an alkyl group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, or -A6-Qa, R30 represents hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, or binds to R29 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group,
Rz has the same meaning as Rx, or Rz represents methyl group, ethyl group, or -A5-Re, Ry represents hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or -A6-Qp, or Ry may bind to Rz to form, together with a nitrogen atom to which they bind, a saturated or unsaturated 3 to 7-membered nitrogen-containing cyclic group, wherein said nitrogen-containing cyclic group may optionally be substituted with one or two lower alkyl groups having 1 to 4 carbon atoms wherein said two alkyl groups may be the same or different,
AR represents a partially unsaturated or completely unsaturated condensed bicyclic carbon ring or a heterocyclic ring (ar), and may be substituted with one of Xa or two or more of the same or different Xa, the heterocyclic ring (ar) contains the same or different 1 to 4 ring-constituting heteroatoms selected from the group consisting of nitrogen atom, oxygen atom, and sulfur atom, Xa represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, a saturated cyclic alkyl group having 3 to 7 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, trifluoromethyl group, \u2014(CH2)iR14, \u2014OR10, \u2014N(R11)(R12), \u2014SO2R13, or \u2014COR27, R10 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or \u2014(CH2)iR14, R11 represents hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R12 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, \u2014COR15, or \u2014SO2R16, or binds to R11 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, R15 represents a lower alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, amino group, a mono- or dialkylamino group having 1 to 4 carbon atoms, or -A6-Qa, R13 and R16 independently represent a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms, R27 represents hydrogen atom, hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms,
Y represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, \u2014(CH2)mN(R18)(R19), or \u2014C(R20)2OC(O)A3R21, symbol m represents an integer of 2 or 3, R18 is the same as R19, or binds to R19 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, R19 represents methyl group, ethyl group, or propyl group, R20 represents hydrogen atom, methyl group, ethyl group, or propyl group, R21 represents a lower alkyl group having 1 to 4 carbon atoms, a cyclic saturated alkyl group having 3 to 6 carbon atoms, or phenyl group, and A3 represents a single bond, or oxygen atom, or a salt thereof.
2. The compound or salt thereof according to claim 1, which comprises the combination according to general formula (I), wherein in the formula,
Link represents a saturated or unsaturated straight hydrocarbon chain having 1 to 3 carbon atoms,
C2, C3, C4, C5, and C6 in the aromatic ring (E) independently represent a ring-constituting carbon atom, one of the ring-constituting carbon atoms to which Rs and AR do not bind may be replaced with V,
V represents nitrogen atom, or carbon atom substituted with Zx, Zx represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, fluorine atom, chlorine atom, bromine atom, nitro group, \u2014OR9, or \u2014N(Rn1)(Rn2), R9 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qp, wherein A6 represents a single bond or methylene, Qp represents phenyl group, and the phenyl group may be substituted with one of T1 or two or more of the same or different T1, T1 represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, hydroxyl group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, nitro group, an alkoxy group having 1 to 4 carbon atoms, or a mono- or dialkylamino group having 1 to 4 carbon atoms, Rn1 represents hydrogen atom or a linear or branched saturated alkyl group having 1 to 4 carbon atoms, Rn2 has the same meaning as Rn1, or represents \u2014COR23 or \u2014SO2R24, or binds to Rn1 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, R23 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a lower alkoxy group having 1 to 4 carbon atoms, \u2014O-A6-Qp, or \u2014N(R25)(R26), R25 represents hydrogen atom, or a linear or branched saturated alkyl group having 1 to 4 carbon atoms, R26 has the same meaning as R25, or binds to R25 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, R24 represents a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms,
Rs represents -D-Rx or \u2014N(Ry)(Rz),
D represents a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014C(O)\u2014,
Rx represents a linear or branched saturated alkyl group having 3 to 8 carbon atoms, or represents Ra, Rb, or Rc, wherein symbol k in Ra represents 0 or an integer of 1 to 3, R1 represents a saturated cyclic alkyl group having 3 to 7 carbon atoms, or a condensed saturated cyclic alkyl group having 6 to 8 carbon atoms, and R1 may be substituted with one of lower alkyl group having 1 to 4 carbon atoms or two or more of the same or different lower alkyl groups having 1 to 4 carbon atoms, Q in Rb represents a partially unsaturated or completely unsaturated monocyclic or condensed bicyclic carbon ring or a heterocyclic ring (q), and binds to A2 at an arbitrary position on the ring, the heterocyclic ring (q) contains the same or different 1 to 4 ring-constituting heteroatoms selected from the group consisting of nitrogen atom, oxygen atom, and sulfur atom, A1 represents a single bond or an alkylene (a) having 1 to 3 carbon atoms, and the alkylene (a) may be substituted with a lower alkyl group having 1 to 4 carbon atoms or phenyl group, A2 represents a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014 (provided that when A2 represents oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014 or \u2014N(R4)\u2014, A1 represents ethylene or trimethylene), R2 and R3 independently represent hydrogen atom, a linear or branched saturated alkyl group having 1 to 4 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, \u2014OR5, \u2014N(R6)(R6\u2032), \u2014NHCOR7, \u2014NHSO2R8, or -A6-Qa, or they bind to each other to represent methylenedioxy group, Qa represents a partially unsaturated or completely unsaturated monocyclic or condensed bicyclic carbon ring or a heterocyclic ring (qa), binds to A6 at an arbitrary position on the ring, and may be substituted with one of T1 or two or more of the same or different T1, the heterocyclic ring (qa) contains the same or different 1 to 4 ring-constituting heteroatoms selected from the group consisting of nitrogen atom, oxygen atom, and sulfur atom, R4 and R6 independently represent hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R5 and R7 independently represent hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qa, R8 represents a lower alkyl group having 1 to 4 carbon atoms, R6\u2032 has the same meaning as R6, or binds to R6 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, symbol p in Rc represents an integer of 2 to 4, A4 represents a single bond, methylene, or ethylene, A5 represents \u2014C(O)\u2014, \u2014C(S)\u2014, or \u2014S(O)2\u2014, Rd represents hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or Qa, Re represents an alkyl group having 1 to 8 carbon atoms, -A6-Qa, \u2014(CH2)iR14, \u2014OR28, \u2014SR28, or \u2014N(R29)(R30), symbol i represents an integer of 1 to 3, R14 represents hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, carboxyl group, or an N,N-dialkylcarbamoyl group having 1 to 4 carbon atoms, R28 represents an alkyl group having 1 to 8 carbon atoms, or -A6-Qa, R29 represents an alkyl group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, or -A6-Qa, R30 represents hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, or binds to R29 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group,
Rz has the same meaning as Rx, or Rz represents methyl group, ethyl group, or -A5-Re, Ry represents hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or -A6-Qp, or Ry may bind to Rz to form, together with a nitrogen atom to which they bind, a saturated or unsaturated 3 to 7-membered nitrogen-containing cyclic group, wherein said nitrogen-containing cyclic group may optionally be substituted with one or two lower alkyl groups having 1 to 4 carbon atoms wherein said two alkyl groups may be the same or different,
AR is naphthalen-2-yl group, naphthalen-1-yl group, benzofuran-5-yl group, benzofuran-4-yl group, benzofuran-2-yl group, benzobthiophen-5-yl group, benzobthiophen-4-yl group, benzobthiophen-2-yl group, indol-5-yl group, indol-4-yl group, indol-6-yl group, benzothiazol-6-yl group, benzothiazol-7-yl group, benzothiazol-5-yl group, benzothiazol-4-yl group, dihydro-3H-benzothiazol-6-yl group, dihydro-3H-benzothiazol-7-yl group, dihydro-3H-benzothiazol-5-yl group, dihydro-3H-benzothiazol-4-yl group, quinolin-6-yl group, quinolin-3-yl group, quinolin-5-yl group, quinolin-7-yl group, dihydro-1H-quinolin-6-yl group, dihydro-1H-quinolin-5-yl group, benzodisothiazol-5-yl group, benzodisothiazol-4-yl group, benzodisothiazol-6-yl group, benzodisothiazol-7-yl group, 1H-indazol-5-yl group, 1H-indazol-4-yl group, 1H-indazol-6-yl group, benzocisothiazol-5-yl group, benzocisothiazol-4-yl group, benzocisothiazol-6-yl group, benzocisothiazol-7-yl group, 2H-indazol-5-yl group, 2H-indazol-4-yl group, 2H-indazol-6-yl group, imidazo1,2-apyridin-6-yl group, imidazo1,2-apyridin-7-yl group, 1H-pyrrolo2,3-bpyridin-5-yl group, 1H-pyrrolo2,3-bpyridin-4-yl group, isoquinolin-6-yl group, isoquinolin-3-yl group, isoquinolin-5-yl group, isoquinolin-7-yl group, dihydro-2H-isoquinolin-6-yl group, dihydro-2H-isoquinolin-5-yl group, cinnolin-6-yl group, cinnolin-5-yl group, quinazolin-6-yl group, quinazolin-7-yl group, quinazolin-5-yl group, quinoxalin-2-yl group, quinoxalin-6-yl group, quinoxalin-5-yl group, 1H-benzimidazol-5-yl group, 1H-benzimidazol-4-yl group, benzoxazol-5-yl group, benzoxazol-6-yl group, benzoxazol-4-yl group, benzoxazol-7-yl group, 1H-pyrrolo3,2-bpyridin-5-yl group, 1H-pyrrolo3,2-bpyridin-6-yl group, benzo1,2,5thiadiazol-5-yl group, benzo1,2,5thiadiazol-4-yl group, 1H-benzotriazol-5-yl group, 1H-benzotriazol-4-yl group, 1,3-dihydropyrrolo2,3-bpyridin-5-yl group, 1,3-dihydropyrrolo2,3-bpyridin-4-yl group, 1,3-dihydrobenzimidazol-5-yl group, 1,3-dihydrobenzimidazol-4-yl group, dihydro-3H-benzoxazol-6-yl group, dihydro-3H-benzoxazol-7-yl group, dihydro-3H-benzoxazol-5-yl group, dihydro-3H-benzoxazol-4-yl group, phthalazin-6-yl group, phthalazin-5-yl group, 1,8naphthalidin-3-yl group, 1,8naphthalidin-4-yl group, 1,5naphthalidin-3-yl group, 1,5naphthalidin-4-yl group, 1H-pyrrolo3,2-cpyridin-6-yl group, 1H-pyrrolo3,2-cpyridin-4-yl group, 1H-pyrrolo2,3-cpyridin-5-yl group, 1H-pyrrolo2,3-cpyridin-4-yl group, 1H-pyrazolo4,3-bpyridin-5-yl group, 1H-pyrazolo4,3-bpyridin-6-yl group, 1H-pyrazolo4,3-cpyridin-6-yl group, 1H-pyrazolo4,3-cpyridin-4-yl group, 1H-pyrazolo3,4-cpyridin-5-yl group, 1H-pyrazolo3,4-cpyridin-4-yl group, 1H-pyrazolo3,4-bpyridin-5-yl group, 1H-pyrazolo3,4-bpyridin-4-yl group, 1,2,4triazolo4,3-apyridin-6-yl group, 1,2,4triazolo4,3-apyridin-7-yl group, thieno3,2-cpyridin-2-yl group, thieno3,2-cpyridin-3-yl group, thieno3,2-cpyridin-6-yl group, thieno3,2-bpyridin-2-yl group, thieno3,2-bpyridin-3-yl group, thieno3,2-bpyridin-5-yl group, thieno3,2-bpyridin-6-yl group, 1H-thieno3,2-cpyrazol-5-yl group, 1H-thieno3,2-cpyrazol-4-yl group, benzodisoxazol-5-yl group, benzodisoxazol-4-yl group, benzodisoxazol-6-yl group, benzodisoxazol-7-yl group, benzocisoxazol-5-yl group, benzocisoxazol-4-yl group, benzocisoxazol-6-yl group, benzocisoxazol-7-yl group, indolizin-7-yl group, indolizin-6-yl group, indolizine-8-yl group, 1,3-dihydroindol-5-yl group, 1,3-dihydroindol-4-yl group, 1,3-dihydroindol-6-yl group, 1H-pyrazolo3,4-dthiazol-5-yl group, 2H-isoindol-5-yl group, 2H-isoindol-4-yl group, 1,2,4triazolo1,5-apyrimidin-6-yl group, 1H-pyrazolo3,4-bpyrazin-5-yl group, 1H-imidazo4,5-bpyrazin-5-yl group, 7H-purin-2-yl group, 4H-chromen-6-yl group, or 4H-chromen-5-yl group, wherein the aforementioned groups may be substituted with one of Xa or two or more of the same or different Xa, Xa represents a linear or branched saturated alkyl group having 1 to 4 carbon atoms, a saturated cyclic alkyl group having 3 to 7 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, trifluoromethyl group, \u2014(CH2)iR14, \u2014OR10, \u2014N(R11)(R12), \u2014SO2R13, or \u2014COR27, R10 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or \u2014(CH2)iR14, R11 represents hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R12 represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, \u2014COR15, or \u2014SO2R16, or binds to R11 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, R15 represents a lower alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 2 to 4 carbon atoms, amino group, a mono- or dialkylamino group having 1 to 4 carbon atoms, or -A6-Qa, R13 and R16 independently represent a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms, R27 represents hydrogen atom, hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, a lower alkyl group having 1 to 4 carbon atoms, amino group, or a mono- or dialkylamino group having 1 to 4 carbon atoms,
Y represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, \u2014(CH2)mN(R18)(R19), or \u2014C(R20)2OC(O)A3R21, symbol m represents an integer of 2 or 3, R18 is the same as R19, or binds to R19 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to represent a saturated nitrogen-containing cycloalkyl group or morpholino group, R19 represents methyl group, ethyl group, or propyl group, R20 represents hydrogen atom, methyl group, ethyl group, or propyl group, R21 represents a lower alkyl group having 1 to 4 carbon atoms, a cyclic saturated alkyl group having 3 to 6 carbon atoms, or phenyl group, and A3 represents a single bond, or oxygen atom,
provided that the following compounds are excluded:
the compound wherein AR is a residue of naphthalene, benzofuran, benzobthiophene, indole, benzothiazole, dihydro-3H-benzothiazole, quinoline, dihydro-1H-quinoline, benzodisothiazole, 1H-indazole, benzocisothiazole, 2H-indazole, imidazo1,2-apyridine, 1H-pyrrolo2,3-bpyridine, isoquinoline, or dihydro-2H-isoquinoline, wherein the aforementioned residue may be substituted with one of Xa or two or more of the same or different Za;
the compound wherein Link is \u2014(CH2)n\u2014, AR binds to C3 in the aromatic ring (E), Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting atoms, Rx is \u2014O\u2014Rx, and Rx is a linear or branched saturated alkyl group having 3 to 8 carbon atoms, or Rx is Ra or Rb.
3. The compound or salt thereof according to claim 2, wherein Link is \u2014(CH2)n\u2014, n is an integer of 1 to 3, Rz has the same meaning as that of Rx or represents -A5-Re when Rs is \u2014N(Ry)(Rz), and Ry is hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or A6-Qp, or Ry binds to Rz to form, together with a nitrogen atom to which they bind, a saturated or unsaturated 3 to 7-membered nitrogen-containing cyclic group.
4. The compound or salt thereof according to claim 3, wherein Rs is -D-Rx or \u2014N(Ry)(Rz), D is a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014C(O)\u2014, Rx is a linear or branched saturated alkyl group having 3 to 8 carbon atoms, or Ra, Rb, or Rc, k in Ra is 0 or an integer of 1 to 3, R1 is a saturated cycloalkyl group having 3 to 7 carbon atoms or a condensed saturated cycloalkyl group having 6 to 8 carbon atoms, R1 may be substituted with one of lower alkyl group having 1 to 4 carbon atoms or two or more of the same or different lower alkyl groups having 1 to 4 carbon atoms, Q in Rb is phenyl group, thienyl group, furyl group, pyrrolyl group, pyridyl group, oxazolyl group, isoxazolyl group, thiazolyl group, isothiazolyl group, imidazolyl group, pyrazolyl group, oxadiazolyl group, thiadiazolyl group, triazolyl group, tetrazolyl group, naphthyl group, tetrahydronaphthyl group, indanyl group, indenyl group, quinolyl group, isoquinolyl group, indolyl group, benzofuryl group, benzothienyl group, benzimidazolyl group, benzoxazolyl group, benzothiazolyl group, indazolyl group, 4H-chromenyl group, dihydrobenzodioxyl group, benzoisoxazolyl group, pyrrolopyridinyl group, pyrazolopyridinyl group, triazolopyridinyl group, thienopyridinyl group, thienopyrazolyl group, 1,3-dihydrobenzimidazole group, dihydro-3H-benzoxazole group, or dihydro-3H-benzothiazole group (the aforementioned groups bond to A2 at an arbitrary position on the rings), A1 is a single bond or an alkylene (a) having 1 to 3 carbon atoms, the alkylene (a) may be substituted with a lower alkyl group having 1 to 4 carbon atoms or phenyl group, A2 is a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014 (provided that when A2 represents oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014, A1 represents ethylene or trimethylene), R2 and R3 independently represent hydrogen atom, a linear or branched saturated alkyl group having 1 to 4 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, \u2014OR5, \u2014N(R6)(R6\u2032), \u2014NHCOR7, \u2014NHSO2R8, or -A6-Qa, or they bind to each other to represent methylenedioxy group, Qa is phenyl group, pyridyl group, oxazolyl group, isoxazolyl group, thiazolyl group, isothiazolyl group, imidazolyl group, pyrazolyl group, oxadiazolyl group, thiadiazolyl group, triazolyl group, tetrazolyl group, naphthyl group, indanyl group, indenyl group, quinolyl group, isoquinolyl group, indolyl group, benzofuryl group, benzothienyl group, benzimidazolyl group, benzoxazolyl group, benzothiazolyl group, or indazolyl group wherein the aforementioned groups may be substituted with one of T1 or two or more of the same or different T1, and bind to A6 at an arbitrary position on the rings, R4 and R6 independently represent hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R5 and R7 independently represent hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qa, R8 is a lower alkyl group having 1 to 4 carbon atoms, R6\u2032 has the same meaning as R6, or binds to R6 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, p in Rc is an integer of 2 to 4, A4 is a single bond or methylene or ethylene, A5 is \u2014C(O)\u2014, \u2014C(S)\u2014, or \u2014S(O)2\u2014, Rd is hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or Qa, Re is an alkyl group having 1 to 8 carbon atoms, -A6-Qa, \u2014(CH2)iR14, \u2014OR28, \u2014SR28, or \u2014N(R29)(R30), i is an integer of 1 to 3, R14 is hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, carboxyl group, or an N,N-dialkylcarbamoyl group having 1 to 4 carbon atoms, R28 is an alkyl group having 1 to 8 carbon atoms or -A6-Qa, R29 is an alkyl group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, or -A6-Qa group, R30 is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, or binds to R29 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, Rz has the same meaning as Rx, or is -A5-Re, and Ry is hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or -A6-Qp, or binds to Rz to form a saturated or unsaturated nitrogen-containing cyclic substituent having 3 to 7 atoms together with nitrogen atom to which they bind.
5. The compound or salt thereof according to claim 3, wherein Rs is \u2014O\u2014Rx.
6. The compound or salt thereof according to claim 3, wherein AR binds to C3 in the aromatic ring (E), and Rs binds to one of the ring-constituting carbon atoms C4, C5, and C6.
7. The compound or salt thereof according to claim 3, wherein AR binds to C2 in the aromatic ring (E), and Rs binds to one of the ring-constituting carbon atoms C3, C4, and C5.
8. The compound or salt thereof according to claim 6, wherein Rs is \u2014O\u2014Rx, and all of C2, C3, C4, C5, and C6 in the aromatic ring (E) are not replaced with V.
9. The compound or salt thereof according to claim 7, wherein n is an integer of 2, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
10. The compound or salt thereof according to claim 6, wherein Rs binds to the ring-constituting carbon atom C5 or C6 in the aromatic ring (E).
11. The compound or salt thereof according to claim 10, wherein Rs is \u2014O\u2014Rx, and all of C2, C3, C4, C5, and C6 in the aromatic ring (E) are not replaced with V.
12. The compound or salt thereof according to claim 11, wherein n is an integer of 2, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
13. The compound or salt thereof according to claim 6, wherein Rs binds to C4 in the aromatic ring (E), and C6 is replaced with V.
14. The compound or salt thereof according to claim 13, wherein n is an integer of 2, V is carbon atom substituted with Zx, D is oxygen atom, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
15. The compound or salt thereof according to claim 6, wherein Rs binds to C4 in the aromatic ring (E), C5 is nitrogen atom, and C2 and C6 are unsubstituted ring-constituting carbon atoms, or wherein Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, and Rs is \u2014N(Ry)(Rz), or wherein Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is -D-Rx, and D is a single bond, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014C(O)\u2014.
16. The compound or salt thereof according to claim 15, wherein Rs binds to C4 in the aromatic ring (E), C5 is nitrogen atom, and C2 and C6 are unsubstituted ring-constituting carbon atoms.
17. The compound or salt thereof according to claim 16, wherein n is an integer of 2, Rs is \u2014O\u2014Rx, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
18. The compound or salt thereof according to claim 15, wherein Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, and Rs is \u2014N(Ry)(Rz).
19. The compound or salt thereof according to claim 2, wherein Link is \u2014(CH2)n\u2014, n is an integer of 1 to 3, C2 and C6 in the aromatic ring (E) are unsubstituted ring-constituting carbon atoms, AR binds to C3 in the aromatic ring (E), and Rs is \u2014N(Ry)(Rz) and binds to C4 in the aromatic ring (E).
20. The compound or salt thereof according to claim 19, wherein n is 2, and C5 is carbon atom substituted with Zx or unsubstituted ring-constituting carbon atom.
21. The compound or salt thereof according to claim 19, wherein Rz is a linear or branched saturated alkyl group having 1 to 8 carbon atoms, or Rz is Ra, Rb, or Rc, k in Ra is 0 or an integer of 1 to 3, R1 is a saturated cyclic alkyl group having 3 to 7 carbon atoms or a condensed saturated cyclic alkyl group having 6 to 8 carbon atoms, R1 may be substituted with one of lower alkyl group having 1 to 4 carbon atoms or two or more of the same or different lower alkyl groups having 1 to 4 carbon atoms, Q in Rb is phenyl group, thienyl group, furyl group, pyrrolyl group, pyridyl group, oxazolyl group, isoxazolyl group, thiazolyl group, isothiazolyl group, imidazolyl group, pyrazolyl group, oxadiazolyl group, thiadiazolyl group, triazolyl group, tetrazolyl group, naphthyl group, tetrahydronaphthyl group, indanyl group, indenyl group, quinolyl group, isoquinolyl group, indolyl group, benzofuryl group, benzothienyl group, benzimidazolyl group, benzoxazolyl group, benzothiazolyl group, indazolyl group, 4H-chromenyl group, dihydrobenzodioxyl group, benzoisoxazolyl group, pyrrolopyridinyl group, pyrazolopyridinyl group, triazolopyridinyl group, thienopyridinyl group, thienopyrazolyl group, 1,3-dihydrobenzimidazole group, dihydro-3H-benzoxazole group, or dihydro-3H-benzothiazole group, wherein the aforementioned groups binds to A2 at an arbitrary position, A1 is a single bond or an alkylene (a) having 1 to 3 carbon atoms, the alkylene (a) may be substituted with a lower alkyl group having 1 to 4 carbon atoms or phenyl group, A2 is a single bond, oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014, provided that when A2 represents oxygen atom, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014N(R4)\u2014, A1 represents ethylene or trimethylene, R2 and R3 independently represent hydrogen atom, a linear or branched saturated alkyl group having 1 to 4 carbon atoms, oxo group, thioxo group, fluorine atom, chlorine atom, bromine atom, trifluoromethyl group, \u2014OR5, \u2014N(R6)(R6\u2032), \u2014NHCOR7, \u2014NHSO2R8, or -A6-Qa, or they bind to each other to represent methylenedioxy group, Qa is phenyl group, pyridyl group, oxazolyl group, isoxazolyl group, thiazolyl group, isothiazolyl group, imidazolyl group, pyrazolyl group, oxadiazolyl group, thiadiazolyl group, triazolyl group, tetrazolyl group, naphthyl group, indanyl group, indenyl group, quinolyl group, isoquinolyl group, indolyl group, benzofuryl group, benzothienyl group, benzimidazolyl group, benzoxazolyl group, benzothiazolyl group, or indazolyl group, wherein these groups may be substituted with one of T1 or two or more of the same or different T1, and bind to A6 at an arbitrary position on the ring, R4 and R6 independently represent hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R5 and R7 independently represent hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms, or -A6-Qa, R8 is a lower alkyl group having 1 to 4 carbon atoms, R6\u2032 has the same meaning as R6, or binds to R6 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, p in Rc is an integer of 2 to 4, A4 is a single bond or methylene or ethylene, A5 is \u2014C(O)\u2014, \u2014C(S)\u2014, or \u2014S(O)2\u2014, Rd is hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or Qa, Re is an alkyl group having 1 to 8 carbon atoms, -A6-Qa, \u2014(CH2)iR14, \u2014OR28, \u2014SR28, or \u2014N(R29)(R30), i is an integer of 1 to 3, R14 is hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, carboxyl group, or an N,N-dialkylcarbamoyl group having 1 to 4 carbon atoms, R28 is an alkyl group having 1 to 8 carbon atoms or -A6-Qa, R29 is an alkyl group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 4 carbon atoms, or -A6-Qa group, R30 is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, or binds to R29 to form a 3- to 6-membered ring together with the nitrogen atom to which they bind to form a saturated nitrogen-containing cycloalkyl group or morpholino group, and Ry is hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or binds to Rz to form a saturated or unsaturated nitrogen-containing cyclic substituent having 3 to 7 atoms together with nitrogen atom to which they binds and said nitrogen-containing cyclic substituent may be substituted with one or two lower alkyl groups having 1 to 4 carbon atoms wherein said two alkyl groups may be the same or different.
22. The compound or salt thereof according to claim 15, wherein Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is -D-Rx, and D is a single bond, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or \u2014C(O)\u2014.
23. The compound or salt thereof according to claim 6, wherein AR binds to C3 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is -D-Rx, and D is a single bond, sulfur atom, \u2014S(O)\u2014, \u2014S(O)2\u2014, or C(O)\u2014.
24. The compound or salt thereof according to claim 22, wherein Rs is -D-Rx, and D is a single bond.
25. The compound or salt thereof according to claim 22, wherein n is an integer of 2, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
26. The compound or salt thereof according to claim 6, wherein Link is \u2014(CH2)n\u2014, n is an integer of 2, AR binds C3 in the aromatic ring (E), Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with the substituent Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is -D-Rx, D is a single bond, sulfur atom, S(O)\u2014, \u2014S(O)2\u2014, or C(O)\u2014, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
27. The compound or salt thereof according to claim 6, wherein Link is \u2014(CH2)n\u2014, n is an integer of 2, AR binds C3 in the aromatic ring (E), Rs binds to C4 in the aromatic ring (E), C5 may be replaced with V, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is -D-Rx, D is a single bond, sulfur atom, S(O)\u2014, \u2014S(O)2\u2014, or C(O)\u2014, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
28. The compound or salt thereof according to claim 6, wherein n is an integer of 2, Rs binds to C4 in the aromatic ring (E), C5 is a carbon atom substituted with \u2014N(Rn1)(Rn2), provided that one of Rn1 and Rn2 is a substituent other than hydrogen atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is \u2014O\u2014Rx, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
29. The compound or salt thereof according to claim 6, wherein n is an integer of 2, Rs binds to C4 in the aromatic ring (E), C5 is a ring-constituting carbon atom substituted with the substituent Zx, or an unsubstituted ring-constituting carbon atom, C2 and C6 are unsubstituted ring-constituting carbon atoms, Rs is \u2014O\u2014Rc, and Y is hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
30. A medicament containing the compound according to claim 3 or a pharmacologically acceptable salt thereof as an active ingredient together with a pharmaceutically acceptable carrier.
31. A medicament containing the compound according to claim 15 or a pharmacologically acceptable salt thereof as an active ingredient together with a pharmaceutically acceptable carrier.
32. An agent for inhibiting production of a prostaglandin andor leukotriene, which comprises the compound according to claim 3 or a pharmacologically acceptable salt thereof as an active ingredient together with a pharmaceutically acceptable carrier.
33. An agent for inhibiting production of a prostaglandin andor leukotriene, which comprises the compound according to claim 15 or a pharmacologically acceptable salt thereof as an active ingredient together with a pharmaceutically acceptable carrier.
34. An agent for therapeutic treatment of pulmonary fibrosis which comprises the compound according to claim 1 or a pharmacologically acceptable salt thereof as an active ingredient together with a pharmaceutically acceptable carrier.
35. The compound or salt according to claim 23, wherein Rs is -D-Rx and D is a single bond.
36. The compound or salt thereof according to claim 23, wherein n is an integer of 2, and Y is hydrogen atom or lower alkyl group having 1 to 4 carbon atoms.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of forming an elevated containment structure surrounding a surface of a semiconductor wafer comprising:
depositing a layer of liquid material on the surface of the semiconductor wafer;
selectively curing a portion of the layer of the liquid material along a peripheral edge of the surface of the semiconductor wafer to at least a semisolid state to form a first layer of the elevated containment structure bonded to the surface of the semiconductor wafer;
depositing at least another layer of the liquid material on the surface of the semiconductor wafer; and
selectively curing a portion of the at least another layer of the liquid material along the peripheral edge of the surface of the semiconductor wafer to at least a semisolid state to form at least another layer of the elevated containment structure bonded to and superimposed over the first layer of the elevated containment structure.
2. The method of claim 1, wherein selectively curing the portion of the layer of the liquid material and the portion of the at least another layer of the liquid material to at least a semisolid state comprises exposing the liquid material to radiant energy.
3. The method of claim 2, wherein the liquid material is selected to comprise a photocurable polymer liquid.
4. The method of claim 3, wherein the photocurable polymer liquid is selected to comprise a photocurable polymer liquid with substantially no sodium content.
5. The method of claim 1, further comprising forming the elevated containment structure in a substantially ring-shaped pattern surrounding the surface of the semiconductor wafer.
6. The method of claim 5, further comprising forming the elevated containment structure with a width of between about 0.25 mm and about 10 mm.
7. The method of claim 5, further comprising forming the elevated containment structure with a height of between about 1 \u03bcm and about 200 \u03bcm.
8. The method of claim 1, wherein depositing the layer of the liquid material and the at least another layer of the liquid material on the surface of the semiconductor wafer comprises positioning the semiconductor wafer at consecutive depths below a surface of a volume of the liquid material contained within a tank.
9. The method of claim 8, wherein selectively curing the portion of the layer of the liquid material and the portion of the at least another layer of the liquid material to at least a semisolid state comprises exposing a portion of the liquid material to radiant energy at each consecutive depth of the semiconductor wafer below the surface of the volume of the liquid material.
10. The method of claim 1, wherein depositing the layer of the liquid material and the at least another layer of the liquid material on the surface of the semiconductor wafer comprises depositing the liquid material on the semiconductor wafer with a spin coating apparatus.
11. The method of claim 10, wherein selectively curing the portion of the layer of the liquid material and the portion of the at least another layer of the liquid material to at least a semisolid state comprises exposing the liquid material to radiant energy provided by a WEE system associated with the spin coating apparatus.
12. The method of claim 11 wherein exposing the liquid material to radiant energy comprises passing the peripheral edge of the surface of the semiconductor wafer under a focused beam of radiant energy provided by the WEE system.
13. The method of claim 11, wherein exposing the liquid material to radiant energy comprises positioning an opaque plate over a central portion of the surface of the semiconductor wafer and simultaneously flooding the entire peripheral edge of the surface of the semiconductor wafer with the radiant energy provided by the WEE system.
14. The method of claim 13, further comprising moving at least one of a dispensing nozzle of the spin coating apparatus and a source of the radiant energy provided by the WEE system prior to exposing the liquid material to the radiant energy.
15. The method of claim 1, further comprising forming a photoresist over the surface of the semiconductor wafer and forming the elevated containment structure on the photoresist.
16. The method of claim 1, further comprising forming a photoresist over the surface of the semiconductor wafer after forming the elevated containment structure.
17. The method of claim 1, further comprising:
forming a photoresist over the surface of the semiconductor wafer; and
forming the elevated containment structure from a liquid material used to form the photoresist.
18. The method of claim 17, wherein the liquid material used to form the photoresist is selected to comprise a negative acting photoresist material.
19. The method of claim 1, further comprising forming the elevated containment structure on a surface of the semiconductor wafer having a plurality of bond pads.
20. The method of claim 19, further comprising:
containing a volume of the liquid material within the elevated containment structure; and
curing the volume of the liquid material to an at least semisolid state to form a CSP sealing layer over the surface of the semiconductor wafer.
21. The method of claim 20, further comprising forming a plurality of apertures in the CSP sealing layer to expose the plurality of bond pads on the surface of the semiconductor wafer.
22. The method of claim 21, wherein forming the plurality of apertures in the CSP sealing layer comprises leaving portions of the liquid material overlying the plurality of bond pads uncured when forming the CSP sealing layer.
23. The method of claim 21, wherein forming the plurality of apertures in the CSP sealing layer comprises etching the CSP sealing layer after curing the volume of the liquid material.
24. A spin coating apparatus, comprising:
a rotatable chuck configured to receive and hold a semiconductor wafer;
a nozzle configured to dispense a liquid material onto a surface of the semiconductor wafer held in the rotatable chuck; and
a WEE system configured to direct radiant energy along a peripheral edge of the surface of the semiconductor wafer held in the rotatable chuck.
25. The spin coating apparatus of claim 24, wherein the WEE system comprises an energy source configured to direct a focused beam of radiant energy onto the peripheral edge of the surface of the semiconductor wafer held in the rotatable chuck.
26. The spin coating apparatus of claim 25, wherein the energy source comprises one of a laser, a light emitting diode, and a lamp.
27. The spin coating apparatus of claim 24, wherein the WEE system comprises:
an opaque plate configured to be positioned over a central portion of the surface of the semiconductor wafer held in the rotatable chuck; and
an energy source configured to flood the entire peripheral edge of the surface of the semiconductor wafer with radiant energy.
28. The spin coating apparatus of claim 27, further comprising a mechanism for moving at least one of the nozzle and the energy source with respect to the rotatable chuck.
29. A method of processing a wafer by immersion lithography, comprising:
providing a semiconductor wafer having an elevated containment structure bonded thereto, wherein the elevated containment structure surrounds a surface of the semiconductor wafer;
positioning the surface of the semiconductor wafer beneath a lens of an optical system;
at least partially filling an interior of the elevated containment structure with an immersion liquid to cover the surface of the semiconductor wafer with the immersion liquid;
contacting the immersion liquid with the lens of the optical system; and
directing radiant energy onto the surface of the semiconductor wafer by passing the radiant energy through the lens and the immersion liquid.
30. The method of claim 29, wherein the surface of the semiconductor wafer is covered with a layer of circuit material and a photoresist overlying the layer of circuit material, and further comprising:
curing a portion of the photoresist with the radiant energy passed through the lens and the immersion liquid;
draining the immersion liquid from the interior of the elevated containment structure after curing the portion of the photoresist;
applying a developing solution to remove an uncured portion of the photoresist, wherein the cured portion of the photoresist forms a mask overlying the layer of circuit material;
etching a portion of the layer of circuit material exposed through the mask; and
removing the mask from the layer of circuit material.
31. The method of claim 30, further comprising forming the elevated containment structure over the photoresist.
32. The method of claim 31, wherein applying the developing solution to remove the uncured portion of the photoresist detaches the elevated containment structure from the semiconductor wafer.
33. The method of claim 30, further comprising covering the surface of the semiconductor wafer with the layer of circuit material and the photoresist after forming the elevated containment structure on the semiconductor wafer.
34. The method of claim 33, further comprising detaching the elevated containment structure from the semiconductor wafer with a solvent after applying the developing solution to remove the uncured portion of the photoresist.
35. The method of claim 30, wherein the developing solution is selected to comprise a solution of about 2.8% TMAH.
36. The method of claim 29, wherein the immersion liquid is selected to comprise deionized water.
37. The method of claim 29, further comprising forming the elevated containment structure from a photocurable liquid polymer.
38. The method of claim 37, further comprising forming the elevated containment structure from a material used to form the photoresist.
39. The method of claim 38, wherein the material used to form the photoresist is selected to comprise a negative acting photoresist material.
40. The method of claim 29, further comprising forming the elevated containment structure using an STL process.
41. A semiconductor wafer assembly comprising:
an elevated containment structure bonded to a semiconductor wafer, wherein the elevated containment structure comprises bonded, superimposed layers of a material extending about a peripheral edge of the semiconductor wafer and surrounding a surface of the semiconductor wafer.
42. The semiconductor wafer assembly of claim 41, wherein the elevated containment structure comprises layers of a polymer material.
43. The semiconductor wafer assembly of claim 42, wherein the polymer material has substantially no sodium content.
44. The semiconductor wafer assembly of claim 41, wherein the surface of the semiconductor wafer is covered with a layer of circuit material and a photoresist overlying the layer of circuit material.
45. The semiconductor wafer assembly of claim 44, wherein the elevated containment structure is bonded to the photoresist.
46. The semiconductor wafer assembly of claim 44, wherein the layer of circuit material and the photoresist overlie the elevated containment structure.
47. The semiconductor wafer assembly of claim 44, wherein the elevated containment structure and the photoresist are comprised of a common material.
48. The semiconductor wafer assembly of claim 47, wherein the elevated containment structure and the photoresist comprise a negative acting photoresist material.
49. The semiconductor wafer assembly of claim 41, wherein the elevated containment structure surrounds a surface of the semiconductor wafer having a plurality of bond pads.
50. The semiconductor wafer assembly of claim 41, wherein the elevated containment structure comprises a substantially ring-shaped structure surrounding the surface of the semiconductor wafer.
51. The semiconductor wafer assembly of claim 50, wherein the elevated containment structure has a width of between about 0.25 mm and about 10 mm.
52. The semiconductor wafer assembly of claim 50, wherein the elevated containment structure has a height of between about 1 \u03bcm and about 200 \u03bcm.
53. The semiconductor wafer assembly of claim 41, further comprising a liquid at least partially filling an interior of the elevated containment structure and covering the surface of the semiconductor wafer.
54. The semiconductor wafer assembly of claim 53, wherein the liquid comprises one of a photocurable polymer and deionized water.