1. A fluid storage and dispensing apparatus, comprising:
a fluid storage and dispensing vessel, holding a fluid storage and dispensing medium comprising a polyvinylidene fluoride pyrolyzate carbon adsorbent in a monolithic or particulate form, adapted for fluid to be reversibly adsorbed thereon,
wherein the vessel is configured to store adsorbed fluid on the polyvinylidene fluoride pyrolyzate carbon adsorbent, and to discharge fluid desorbed from the polyvinylidene fluoride pyrolyzate carbon adsorbent under dispensing conditions.
2. The fluid storage and dispensing apparatus of claim 1, further comprising a fluid reversibly adsorbed on the polyvinylidene fluoride pyrolyzate carbon adsorbent.
3. The fluid storage and dispensing apparatus of claim 2, wherein the fluid comprises one or more of arsine, phosphine, boron trichloride, boron trifluoride, silane, germane, phosgene, diborane, ammonia, stibine, hydrogen sulfide, hydrogen selenide, hydrogen telluride, nitrous oxide, hydrogen cyanide, ethylene oxide, deuterated hydrides, halide (chlorine, bromine, fluorine, and iodine) compounds, organometallic compounds, nitrogen trifluoride, fluorine, hydrogen fluoride, diboron tetrafluoride, and carbofluoride compounds.
4. A fluid storage and dispensing apparatus, comprising:
a fluid storage and dispensing vessel, holding a fluid storage and dispensing medium comprising a polyvinylidene fluoride pyrolyzate carbon adsorbent adapted for fluid to be reversibly adsorbed thereon,
wherein the vessel is configured to store adsorbed fluid on the polyvinylidene fluoride pyrolyzate carbon adsorbent, and to discharge fluid desorbed from the polyvinylidene fluoride pyrolyzate carbon adsorbent under dispensing conditions,
further comprising a fluid reversibly adsorbed on the polyvinylidene fluoride pyrolyzate carbon adsorbent,
wherein the fluid comprises a fluorine-containing fluid.
5. The fluid storage and dispensing apparatus of claim 4, wherein the fluorine-containing fluid comprises fluorine gas.
6. The fluid storage and dispensing apparatus of claim 4, wherein the fluorine-containing fluid comprises NF3.
7. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent is of monolithic form.
8. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent is of particulate form.
9. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent comprises porosity including pores of a size in a range of from 0.2 to 5 nanometers.
10. The fluid storage and dispensing apparatus of claim 9, having porosity, wherein at least 30% of the porosity of the polyvinylidene fluoride pyrolyzate carbon adsorbent comprises pores having a size in a range of from about 0.3 to about 0.72 nanometer, and at least 50% of the porosity comprises pores of diameter <2 nanometers.
11. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent has a bulk density in a range of from 0.6 to 1.8 grams per cubic centimeter.
12. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent has a fluorine gas permeability in a range of from 100 to 600 ccpsicm2min at 275 kPa pressure.
13. The fluid storage and dispensing apparatus of claim 1, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent is in the form of discs that are vertically stacked in the fluid storage and dispensing vessel to form a stacked array in which successive discs are in face-to-face abutting relationship to one another.
14. The fluid storage and dispensing apparatus of claim 13, wherein the polyvinylidene fluoride pyrolyzate carbon adsorbent has a bulk density in a range of from 0.6 to 1.8 grams per cubic centimeter, a fluorine gas permeability in a range of from 100 to 600 ccpsicm2min at 275 kPa pressure, and porosity including pores of a size in a range of from 0.2 to 5 nanometers, wherein at least 30% of the porosity of the polyvinylidene fluoride pyrolyzate carbon adsorbent comprises pores having a size in a range of from about 0.3 to about 0.72 nanometer, and at least 50% of the porosity comprises pores of diameter <2 nanometers.
15. A method of supplying fluid for use in manufacturing, comprising charging an adsorbable fluid to a fluid storage and dispensing apparatus according to claim 1, for adsorption of the adsorbable fluid on the polyvinylidene fluoride pyrolyzate carbon adsorbent.
16. The method of claim 15, wherein said charging is carried out in a fill operation wherein pressure of the adsorbable fluid is monitored during the fill operation.
17. A manufacturing facility comprising a fluid storage and dispensing apparatus according to claim 2, coupled to flow circuitry for delivering fluid discharged from the fluid storage and dispensing vessel under dispensing conditions to a fluid-utilizing apparatus.
18. A manufacturing facility comprising a fluid storage and dispensing apparatus, comprising:
a fluid storage and dispensing vessel, holding a fluid storage and dispensing medium comprising a polyvinylidene fluoride pyrolyzate carbon adsorbent adapted for fluid to be reversibly adsorbed thereon,
wherein the vessel is configured to store adsorbed fluid on the polyvinylidene fluoride pyrolyzate carbon adsorbent, and to discharge fluid desorbed from the polyvinylidene fluoride pyrolyzate carbon adsorbent under dispensing conditions,
further comprising a fluid reversibly adsorbed on the polyvinylidene fluoride pyrolyzate carbon adsorbent,
wherein the fluid storage and dispensing apparatus is coupled to flow circuitry for delivering fluid discharged from the fluid storage and dispensing vessel under dispensing conditions to a fluid-utilizing apparatus,
wherein the fluid reversibly adsorbed on the polyvinylidene fluoride pyrolyzate carbon adsorbent comprises fluorine gas or nitrogen fluoride gas, the fluid-utilizing apparatus comprises a semiconductor manufacturing apparatus, and the fluid storage and dispensing apparatus is configured to flow the fluid to the semiconductor manufacturing apparatus for cleaning thereof.
19. The manufacturing facility of claim 18, wherein the semiconductor manufacturing apparatus comprises a vapor deposition chamber or an ion implant chamber.
20. A method of manufacturing a semiconductor, flat-panel display, or solar product, comprising supplying gas for said manufacturing from a fluid storage and dispensing apparatus according to claim 1.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of inferring gas production utilizing a conduit having an outlet controlled by a valve in communication with a well space within a well through which a gas volume is being produced, comprising:
taking a selected number of measurements during a selected period of time, each measurement including:
closing the outlet valve to allow gas pressure within the conduit to change;
sampling the gas pressure within the conduit over a sampling time period; calculating a rate of pressure change from samples taken over the sampling time period; and
calculating a rate of gas production in the well space from the calculated rate of change of pressure, the gas volume, well characteristics, and gas properties, wherein calculating the rate of gas production comprises calculating the rate of production using the real gas equation multiplied by k, the ratio of specific heats determined for the gas properties, such that the gas volume within the well space is an adiabatic gas volume; and
summing the calculated rates of gas production for the selected number of measurements to determine an inferred rate of gas production through the well space during the selected period of time.
2. The method of claim 1, wherein summing the calculated rates of gas production comprises summing the calculated rates of gas production during the selected period of time using the trapezoidal rule.
3. The method of claim 1, wherein the gas volume is an adiabatic volume within the space above a fluid level.
4. The method of claim 1, wherein the gas volume is an adiabatic volume within the well space within the well and a space outside the well casing.
5. The method of claim 1, wherein the space comprises an annular space between a well casing and well tubing and above a fluid level of the well.
6. The method of claim 1, wherein the well comprises a gas well and the space comprises a space within at least a selected one of tubing and casing of the well.
7. The method of claim 1, further comprising comparing the inferred rate with a gas rate measured with standard meter equipment to sense a fracture volume outside of the well.
8. The method of claim 1, further comprising comparing the inferred rate with a measured rate to compute a correction factor for correcting the inferred rate.
9. A method of allocating produced gas to a selected well among a plurality of wells at a central facility comprising:
for each well in the facility, inferring gas production up the annulus of the well disposed between the outer wall of tubing of the well and the inner wall of the casing of the well, comprising:
taking a selected number of measurements during a selected period of time, each measurement including closing the annulus to allow gas pressure within the annulus to change, sampling the pressure within the annulus over a sampling time period, calculating the time rate of pressure change from samples taken over the sampling time period;
calculating the production rate of gas in the annulus, wherein a gas volume within the annulus is an adiabatic gas volume such that the production rate of gas in the annulus is calculated using the real gas equation multiplied by k, the ratio of specific heats determined for the properties of the gas; and
summing the calculated production rates for the selected number of measurements to determine an inferred rate of gas production through the annulus of the well during a selected period of time;
for each well in the facility, determining the amount of gas produced through the tubing of the well during a selected period of time;
for each well in the facility, determining the amount of gas used for utilitarian purposes during the selected period of time;
for each well in the facility, determining the total gas production value during the selected period of time as the sum of the inferred production up the annulus and the determined amount of gas through the tubing less the determined amount of gas from the well used for utilitarian purposes;
calculating an allocation factor for the selected well as the ratio of the total gas production value for the selected well described above to the sum of the total gas production values for all of the plurality of wells in the facility; and
determining an allocation to the selected well as the product of the allocation factor and the total amount of gas sold from all of the plurality of wells in the facility during the selected period of time.
10. The method of claim 9, further comprising determining total gas production for a selected well as the sum of the allocation to the selected well plus the amount of gas used by the selected well for utilitarian purposes.