1. A method for forming a resist pattern, comprising:
providing a resist film;
providing a protective film on the resist film using a composition for forming the protective film, the composition comprising a polymer and an organic solvent;
exposing to irradiation with EUV light or an electron beam the resist film on which the protective film is provided; and
developing the exposed resist film.
2. The method according to claim 1, wherein the polymer has a first structural unit including an aromatic group, a heteroaromatic group, or a combination thereof.
3. The method according to claim 2, wherein the polymer has the first structural unit in an amount of no less than 50 mol %.
4. The method according to claim 1, wherein the polymer has a second structural unit including a group represented by a formula (i-1), a group represented by a formula (i-2), a group represented by a formula (i-3), a group represented by a formula (i-4), a group represented by a formula (i-5), a group represented by a formula (i-6), a group represented by a formula (i-7), a group represented by a formula (i-8), or a combination thereof:
wherein,
in the formula (i-1), n is an integer of 0 to 3, and m is an integer that satisfies an expression: 1\u2266m\u22665+2n;
in the formulae (i-2) and (i-5), RA1, RA2 and RA3 each independently represent a fluorine atom or an alkyl group, wherein a part or all of hydrogen atoms that the alkyl group has are unsubstituted or optionally substituted by a fluorine atom;
in the formula (i-6), RA4 represents an aromatic group substituted with a fluorine atom or a fluorinated alkyl group, or a heteroaromatic group substituted with a fluorine atom or a fluorinated alkyl group;
in the formula (i-7), RA5 and RA6 each independently represent a hydrogen atom or an alkyl group, wherein a part or all of hydrogen atoms that the alkyl group has are unsubstituted or optionally substituted by a fluorine atom; and
in the formula (i-8), RA7 represents an alkyl group.
5. The method according to claim 4, wherein the second structural unit comprises the group represented by the above formula (i-1).
6. The method according to claim 5, wherein the second structural unit is represented by a following formula (1):
wherein, in the formula (1), R5 represents a hydrogen atom, a methyl group or a trifluoromethyl group; X represents a single bond, \u2014(CO)O\u2014 or \u2014(CO)NH\u2014; and m and n are as defined in the above formula (i-1).
7. The method according to claim 1, wherein the organic solvent comprises an ether solvent, an alcohol solvent, or a mixture thereof.
8. The method according to claim 7, wherein the organic solvent comprises the ether solvent and a content of the ether solvent is no less than 20% by mass.
9. The method according to claim 1, wherein a greatest value of an extinction coefficient of the protective film in a range of a wavelength of no less than 150 nm and no greater than 350 nm is no less than 0.3.
10. A composition for forming a protective film, comprising:
a polymer;
an organic solvent; and
the composition being used for coating a surface of a resist film in a method for forming a resist pattern using EUV light or an electron beam.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A tablet packing apparatus in which tablets fed from a plurality of feeder vessels in a tablet feed section through a common passage are contained into a tablet vessel fed from a tablet vessel feed section, the apparatus comprising:
a tablet reserving member disposed below the feeder vessel which stores specially administrative tablets, the tablet reserving member having a lower opening, the tablet reserving member receiving the specially administrative tablets fed from the feeder vessel; and
a shutter which is movable to open and close the lower opening of the tablet reserving member, whereby when setting the tablet vessel beneath the tablet reserving member and moving the shutter to open the lower opening of the tablet reserving member, the specially administrative tablets are fed into the tablet vessel without passing through the common passage.
2. The tablet packing apparatus as in claim 1, wherein the tablet reserving member is separated from the feeder vessel and connected to the feeder vessel by means of a tube.
3. The tablet packing apparatus as in claim 1, wherein the tablet reserving member includes a biasing member for biasing the shutter so as to close the lower opening of the tablet reserving member and the shutter is formed with a cutout portion with which the tablet vessel engages, whereby when engaging the tablet vessel with the cutout portion to push the shutter, the shutter open the lower opening of the tablet reserving member.
4. The tablet packing apparatus as in claim 1, wherein the tablet reserving member includes a indicator for indicating that the specially administrative tablets are fed into the tablet reserving member.
5. The tablet packing apparatus as in claim 1, wherein the tablet reserving member includes a sensor for detecting opening or closing of the lower opening of the tablet reserving member by the shutter, whereby the specially administrative tablets can be fed from the tablet vessel only when the sensor detects closing of the lower opening of the tablet reserving member.