1. A resist underlayer film-forming composition comprising:
a polymer comprising a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000; and
a solvent,
wherein
each of R3 to R8 independently represents a group shown by a formula (2), a hydrogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 6 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 6 carbon atoms, a substituted or unsubstituted alkoxycarbonyl group having 2 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 14 carbon atoms, or a substituted or unsubstituted glycidyl ether group having 3 to 6 carbon atoms, wherein at least one of R3 to R8 represents the group shown by the formula (2), and
X represents a substituted or unsubstituted alkanediyl group having 1 to 10 carbon atoms, a substituted or unsubstituted cycloalkanediyl group having 3 to 20 carbon atoms, a substituted or unsubstituted alkanediyloxy group having 1 to 10 carbon atoms, a substituted or unsubstituted cycloalkanediyloxy group having 3 to 20 carbon atoms, a substituted or unsubstituted arenediyl group having 6 to 14 carbon atoms, or a divalent group formed by an arbitrary combination thereof,
wherein
R1 represents a single bond, a substituted or unsubstituted alkanediyl group having 1 to 20 carbon atoms, or a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms, and
R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms.
2. The resist underlayer film-forming composition according to claim 1, wherein the polymer has a dispersity of 1.4 to 5.0.
3. The resist underlayer film-forming composition according to claim 1, further comprising an acid generator.
4. The resist underlayer film-forming composition according to claim 1, further comprising a crosslinking agent.
5. The resist underlayer film-forming composition according to claim 1, the resist underlayer film-forming composition being used to form a pattern on a non-planar substrate.
6. A method for forming a pattern comprising:
providing a resist underlayer film on a substrate using the resist underlayer film-forming composition according to claim 1;
providing a resist film on the resist underlayer film using a resist composition;
exposing the resist film by applying exposure light to the resist film through a photomask;
developing the exposed resist film to form a resist pattern; and
sequentially dry-etching the resist underlayer film and the substrate using the resist pattern as a mask.
7. The method according to claim 6, wherein the substrate is a non-planar substrate.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1) A garden row tool to till the soil, comprising:
a first longitudinal side frame support member;
a second longitudinal side frame support member connected to the first longitudinal side frame member;
a first blade and a second blade to connect to the first longitudinal side support member and the second longitudinal side support member to till the soil;
a traverse frame support member to adjustably connect the first longitudinal side frame member and the second longitudinal side frame support member.
2) A garden row tool to till the soil as in claim 1, wherein the first and second longitudinal side frame support member includes a threaded aperture to connect to the traverse frame support member and wherein the width between the first and second longitudinal side frame support member is adjustable by threading the traverse frame support member in the threaded aperture.
3) A garden row tool to till the soil as in claim 1, wherein the blade is connected to the longitudinal side frame support member by a plate.
4) A garden row tool to till the soil as in claim 1, wherein the longitudinal side frame support member is connected to a connector to connect to a tiller.