1. A utility vehicle with a steering system having single-wheel-suspended steering wheels, which are mounted on a respective wheel carrier (11), wherein each wheel carrier may be swivelled about the axis of at least one rigidly connected bolt (18) and is connected via a ball-and-socket joint (9), on the bolt, to a transverse suspension element (1) that is articulated to the vehicle body, wherein associated with the ball-and-socket joint (9) is a steering angle sensor (22) comprising a rotatable input member (23), which is located at least approximately in the extension of the axis of the swivel bolt (18), the rotatable input member being connected to the bolt via an entrainment element (25) that transmits the swivel motion of said bolt in an angularly precise manner to detect the current swivel position of the wheel carrier (11), wherein the entrainment element (25) is a hinged shaft, which in the end region in proximity to the wheel carrier comprises a cardan joint (25b) and in the end region in proximity to the sensor is connected to the input member (23) via an articulated coupling (26) that compensates variations in distance between the centre point (C) of the ball-and-socket joint (9) and the steering angle sensor (22).
2. A utility vehicle according to claim 1, in which the steering angle sensor (22) is fastened to the transverse suspension element (1) and its input member (23), is located on the extension of the axis of the bolt (18).
3. A utility vehicle according to claim 1 in which a cavity (18b), which encloses at least the centre point (C) of the ball-and-socket joint (9) and in which the entrainment element (25) is at least partially accommodated, is formed in said ball-and-socket joint, and in that the entrainment element (25) is resilient in the region of the centre point (C) of the ball-and-socket joint (9).
4. A utility vehicle according to claim 1 in which the cardan joint (25b) is arranged at the centre point (C) of the ball-and-socket joint (9).
5. A utility vehicle according to claim 1 in which the part of the coupling (26) that is in proximity to the sensor consists of the input member (23) of the steering angle sensor (22), into which an entrainment pin (27) extending transversely to the longitudinal axis of said input member is inserted, and in that the part of the entertainment element adjacent to the sensor is provided with a hole (25d) which receives the input member (23) and with at least two diametrically opposed slots (25f) extending in the axial direction with which the entrainment pin (27) engages.
6. A utility vehicle according to claim 1 in which the entrainment element is a pliable shaft.
7. A utility vehicle according to claim 1 in which the ball (13) of the ball-and-socket joint (9) is arranged in an end region of the bolt (18).
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An analysis method for analyzing an exposure defect of a substrate exposed via a liquid, the method comprising:
a first measuring process, which measures an abnormality of the substrate after the substrate is exposed via the liquid and before the substrate is developed;
a second measuring process, which measures an abnormality of the substrate after the substrate has been developed, and
an analyzing process, which analyzes an exposure defect of the substrate based on a comparison of a measurement result of the first measuring process and a measurement result of the second measuring process,
wherein the exposure via the liquid, which causes exposure defects, is executed prior to the first measuring process and the second measuring process.
2. An analysis method according to claim 1, wherein the exposure defect includes a pattern defect formed on the substrate by the exposure.
3. An analysis method according to claim 1, wherein in the analyzing process, a cause of the exposure defect is identified.
4. An analysis method according to claim 3, wherein
a prescribed film is formed on a surface of the substrate, and
in the analyzing process, a determination is made as to whether the cause of the exposure defect relates to an abnormality of the film.
5. An analysis method according to claim 4, wherein the film includes a protective film that protects a film of a photosensitive material formed on the substrate from the liquid.
6. An analysis method according to claim 4, wherein the abnormality of the film includes at least one of a status in which liquid has soaked into the film and a status in which foreign matter has adhered to the film.
7. An analysis method according to claim 3, wherein, in the analyzing process, a determination is made as to whether the cause of the exposure defect relates to foreign matter in the liquid.
8. An analysis method according to claim 7, wherein the foreign matter includes bubbles.
9. An exposure method, comprising:
exposing a substrate via a liquid; and
analyzing a status of the substrate by means of an analysis method according to claim 1.
10. An exposure method according to claim 9, further comprising a process that sets the exposure conditions based on the analysis results.
11. A device manufacturing method that uses an exposure method according to claim 9.
12. An analysis method for analyzing an exposure defect of a substrate exposed via a liquid, the method comprising:
a measuring process, which measures and images an abnormality of the substrate after the substrate has been developed, and
an analyzing process, which analyzes an exposure defect of the substrate based on a comparison of an imaged result of the measuring process and an image obtained after exposure of the substrate via the liquid and prior to the development of the substrate, wherein the exposure via the liquid, which causes the exposure defect, is executed prior to the measuring process.
13. An exposure method that exposes a substrate via a liquid, the method comprising:
obtaining a relationship between a receding contact angle of the liquid on a film that forms an uppermost layer of the substrate prior to exposure of the substrate and a defect level of the substrate after the substrate has been exposed, the defect level being defined by at least one of a defect density and a number of defects on the substrate;
exposing the substrate using the obtained relationship; and
setting a movement velocity of the substrate during exposure according to the receding contact angle to reduce exposure defects.
14. An exposure method that exposes a substrate via a liquid, the method comprising:
obtaining a relationship between a receding contact angle of the liquid on a film that forms an uppermost layer of the substrate prior to exposure of the substrate and a defect level of the substrate after the substrate has been exposed, the defect level being defined by at least one of a defect density and a number of defects on the substrate;
exposing the substrate using the obtained relationship; and
varying one of an acceleration or movement direction of the substrate during exposure according to the receding contact angle to reduce exposure defects.
15. An exposure method that exposes a substrate via a liquid, the method comprising:
obtaining a relationship between a receding contact angle of the liquid on a film that forms an uppermost layer of the substrate prior to exposure of the substrate and a defect level of the substrate after the substrate has been exposed, the defect level being defined by at least one of a defect density and a number of defects on the substrate;
exposing the substrate using the obtained relationship; and
varying a supply amount of the liquid during exposure according to the receding contact angle to reduce exposure defects.
16. The exposure method of claim 13, the relationship indicating that the defect level decreases as the receding contact angle increases.