1. A method of processing a substrate, the method comprising:
applying a photoresist layer containing a photoacid generator to a substrate;
exposing portions of the photoresist layer to electromagnetic radiation to generate charged species from the photoacid generator and to form substantially parallel lines of material in the photoresist layer having different chemical properties than the portions of the photoresist layer not exposed to the electromagnetic radiation;
after exposing the substrate, heating the substrate within a vacuum processing chamber and reducing the pressure; and
guiding the generated charged species in a direction substantially perpendicular to the substrate supporting surface.
2. The method of claim 1, wherein the guiding comprises flowing a remotely generated plasma into the vacuum processing chamber.
3. The method of claim 2, wherein an energy of the ions in the remotely generated plasma is between about 5 eV and about 50 eV.
4. The method of claim 2, further comprising exposing the photoresist layer to a magnetic field, wherein the magnetic field is oriented to guide the charged species in a direction substantially perpendicular to the substrate supporting surface.
5. The method of claim 1, wherein the generated charged species are guided by an electric field generated by applying to a voltage to a substantially continuous electrode having a flat surface opposite the photoresist layer, wherein the electrode is spaced apart from the substrate support by a distance of at least one 0.1 mm, wherein the voltage is between about 500V and 100 kV and is applied from a pulsed DC power source, wherein the power has a frequency of between about 10 Hz and 1 MHz.
6. The method of claim 5, wherein the duty cycle of the pulsed DC power is between about 5% and about 95%, and wherein the rise and fall time of the pulsed DC power is between about 1 ns about 1000 ns.
7. The method of claim 5, further comprising exposing the photoresist layer to a magnetic field, wherein the magnetic field is oriented in a direction parallel to the electric field.
8. The method of claim 7, wherein the magnetic field strength at the photoresist layer is between about 0.1 T and about 10 T.
9. The method of claim 4, further comprising controlling the temperature of the electrode to substantially match the temperature of the substrate.
10. The method of claim 4, further comprising guiding the generated charged species in a direction substantially parallel to the substrate supporting surface and along the direction of the substantially parallel lines.
11. The method of claim 10, wherein the guiding the generated charged species in a direction substantially perpendicular to the substrate supporting surface and the guiding the generated charged species in a direction substantially parallel to the substrate supporting surface and along the direction of the substantially parallel lines occur at the same time.
12. The method of claim 10, wherein the guiding the generated charged species in a direction substantially perpendicular to the substrate supporting surface occurs during the exposing and the guiding the generated charged species in a direction substantially parallel to the substrate supporting surface and along the direction of the substantially parallel lines occurs during the heating.
13. The method of claim 10, wherein the guiding the generated charged species in a direction substantially perpendicular to the substrate supporting surface occurs during the heating and the guiding the generated charged species in a direction substantially parallel to the substrate supporting surface and along the direction of the substantially parallel lines occurs during the exposing.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. Wrap-around drive, comprising a circulating belt means, which is driven by at least one drive element and which drives at least one driven element, at least one first tensioning device acting on the belt means on a slack strand of the wrap-around drive in an area between where the belt means leaves the drive element in a belt means circulating direction and reaches a closest driven element, and at least one second device acting on a tightened strand of the wrap-around drive in an area located between where the belt means reaches the drive element in the circulating direction and leaves the closest driven element, the second device is constructed for guiding the belt means and there is at least one third device, which is stationary and is arranged in a radial direction inside the wrap-around drive and which is also suitable for limiting excursions of the belt means, the at least one third device including first and second guide rails located opposite each other, the first guide rail is located on an opposite side of the belt means from the first tensioning device, in a directly opposing position forming a first guide channel therebetween for the slack strand which is adapted to contact the first tensioning device and the first guide rail, and the second guide rail is located on an opposite side of the belt means from the second device, in a directly opposing position forming a second guide channel therebetween for the tightened strand which is adapted to contact the second device and the second guide rail.
2. Wrap-around drive according to claim 1, wherein the at least one third device is provided in a region of the drive element.
3. Wrap-around drive according to claim 1, wherein the at least one third device is arranged at a defined distance from an inside of the belt means.
4. Wrap-around drive according to claim 1, wherein the at least one third device is connected mechanically to at least one of the at least one first tensioning device or to the at least one second device.
5. Wrap-around drive according to claim 1, wherein at least one of the first tensioning device, the second device or the third device is provided with a surface for reducing friction.
6. Wrap-around drive according to claim 1, wherein the third device is located entirely inside the wrap-around drive.