1. A display, comprising:
a pixel array substrate, comprising:
a first substrate comprising a plurality of pixel regions, each of the pixel regions comprising a distribution region of pixel electrode and a non-electrode region;
a plurality of pixel structures disposed in the pixel regions, wherein each of the pixel structures comprises:
a pixel electrode disposed in the distribution region of pixel electrode and having at least one slit, an extension direction of the at least one slit extending from the non-electrode region toward the distribution region of pixel electrode, the pixel electrode further comprising at least one protrusion extending from the distribution region of pixel electrode to the non-electrode region;
an insulating layer covering the pixel electrode; and
a hydrophobic layer covering the insulating layer;
a fluid medium comprising a polar fluid and a non-polar fluid; and
an opposite substrate, comprising:
a second substrate; and
a common electrode disposed on the second substrate and contacting the polar fluid,
wherein the polar fluid and the non-polar fluid are present between the first substrate and the second substrate, and the non-polar fluid is contracted toward the non-electrode region when a voltage difference is generated between the pixel electrode and the common electrode.
2. The display as claimed in claim 1, wherein the at least one slit communicates with the non-electrode region.
3. The display as claimed in claim 1, wherein the at least one slit does not communicate with the non-electrode region and a distance between the at least one slit and the non-electrode region is substantially smaller than 30 \u03bcm.
4. The display as claimed in claim 1, wherein the at least one slit comprises a shape of a rod, a needle, an ellipse, a polygon, a wave, a tree branch, or a snowflake.
5. The display as claimed in claim 1, wherein the non-electrode region comprises a shape of a rectangle, a \xbc circle, a triangle, a trapezoid, or a polygon.
6. The display as claimed in claim 1, wherein the at least one slit comprises a plurality of slits arranged radially along an intersecting boundary of the non-electrode region and the distribution region of pixel electrode.
7. The display as claimed in claim 1, wherein the at least one slit is located at an edge of the distribution region of pixel electrode.
8. The display as claimed in claim 1, wherein a width of the at least one slit substantially ranges from 1 \u03bcm to 30 \u03bcm.
9. The display as claimed in claim 1, wherein a total area of the non-electrode region and the at least one slit is 10% to 80% of an area of the pixel region.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An immersion lithographic apparatus comprising:
a substrate table configured to support a substrate;
a projection system configured to direct a patterned beam of radiation onto a substrate;
a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or the substrate table, or both;
a controller to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate andor substrate table relative to the liquid handling system dependent upon a position of the substrate andor substrate table relative to the liquid handling system andor a direction of relative movement between the substrate andor substrate table and the liquid handling system.
2. The immersion lithographic apparatus of claim 1, wherein the angle is adjusted such that a leading edge of the liquid handling system is further from the top surface of the substrate andor substrate table than a trailing edge of the liquid handling system.
3. The immersion lithographic apparatus of claim 2, wherein the angle is adjusted for when an edge of the substrate move to or from under the liquid handling system.
4. The immersion lithographic apparatus of claim 2, wherein the angle is adjusted such that the leading edge of the liquid handling system is further from the top surface of the substrate andor substrate table than a trailing edge of the liquid handling system when the substrate moves away from under the liquid handling system.
5. The immersion lithographic apparatus of claim 2, wherein the angle is adjusted such that the leading edge of the liquid handling system is further from the top surface of the substrate andor substrate table than a trailing edge of the liquid handling system when the substrate moves to under the liquid handling system.
6. The immersion lithographic apparatus of claim 1, wherein the angle is adjusted such that a leading edge of the liquid handling system is nearer to a top surface of the substrate andor substrate table than a trailing edge of the liquid handling system when an edge of the substrate moves to under the liquid handling system.
7. The immersion lithographic apparatus of claim 6, wherein the angle is adjusted such that the leading edge of the liquid handling system is nearer to the top surface of the substrate andor substrate table than a trailing edge of the liquid handling system when the liquid handling system becomes located over the substrate.
8. The immersion lithographic apparatus of claim 1, wherein a smallest distance between the liquid handling system and the top surface of the substrate andor substrate table is maintained substantially constant during the motion.
9. The immersion lithographic apparatus of claim 1, wherein the motion comprises imaging at least two rows of fields one after another.
10. The immersion lithographic apparatus of claim 9, wherein the angle is generated by rotation of the liquid handling system about a direction parallel to the direction in which the rows of fields extend.
11. The immersion lithographic apparatus of claim 1, wherein the angle is adjusted dependent upon the field being imaged andor which fields are being moved between.
12. The immersion lithographic apparatus of claim 1, wherein the angle is adjusted according to the relative velocity between the liquid handling system and the substrate table.
13. The immersion lithographic apparatus of claim 1, wherein the angle is increased when the position is for imaging of fields during which variations in force between the liquid handling system and substrate are above a certain magnitude.
14. The immersion lithographic apparatus of claim 1, wherein the axisaxes of rotation andor magnitude(s) of rotation angle is determined based on the position andor the direction.
15. The immersion lithographic apparatus of claim 14, wherein the axisaxes of rotation andor magnitude(s) of rotation angle is determined based on the position of a portion of the edge of the substrate relative to the optical axis of the projection system.
16. The immersion lithographic apparatus of claim 14, wherein the axisaxes of rotation andor magnitude(s) of rotation angle is determined based on the relative direction of movement of a portion of the edge of the substrate relative to the optical axis of the projection system.
17. The immersion lithographic apparatus of claim 15, wherein the portion of the edge of the substrate is an edge of the substrate closest to the optical axis of the projection system.
18. The immersion lithographic apparatus of claim 15, wherein the determination of the axisaxes of rotation andor magnitude(s) of rotation angle is dependent on a property of a tangent to the portion of the edge of the substrate.
19. The immersion lithographic apparatus of claim 18, wherein the tangent of the portion of the edge of the substrate is in the plane of the substrate, perpendicular to the optical axis, or both.
20. A method of operating a lithographic apparatus, the method comprising:
moving a substrate table supporting a substrate relative to a projection system configured to project a patterned beam of radiation through immersion liquid confined by a liquid handling system onto a substrate; and
adjusting an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate andor substrate table relative to the liquid handling system dependent upon a position of the substrate andor substrate table relative to the liquid handling system andor a direction of relative movement between the substrate andor substrate table and the liquid handling system.