1. A cooling apparatus comprising:
a flat-box-shaped body;
a cooling medium supply tube which is inserted into the body; and
a nozzle which is attached to the cooling medium supply tube so as to eject the cooling medium toward an internal surface of the body.
2. The cooling apparatus according to claim 1, wherein the nozzle is inclined with respect to the internal surface of the body, and the apparatus further comprises another nozzle attached to another cooling medium supply tube near one side of the body so as to eject the cooling medium toward the internal surface of the body, said other nozzle is inclined in an opposite direction of the first mentioned nozzle.
3. A substrate treating apparatus comprising:
an exposure apparatus which is provided in a substrate transfer line; and
the cooling apparatus according to claim 1 which is positioned in front of the exposure apparatus in the course of the substrate transfer line.
4. The substrate treating apparatus according to claim 3, wherein the nozzle is inclined with respect to the internal surface of the body, and the apparatus further comprises another nozzle attached to another cooling medium supply tube near one side of the body so as to eject the cooling medium toward the internal surface of the body, said other nozzle is inclined in an opposite direction of the first mentioned nozzle.
5. The cooling apparatus according to claim 1, wherein the internal surface is a back side of a top planar surface of the body.
6. The cooling apparatus according to claim 1, wherein the internal surface is a back side of a thin metal plate forming a top surface of the body.
7. The cooling apparatus according to claim 1, wherein a space within the body is substantially open such that, apart from the cooling medium supply tube and the nozzle, the cooling medium ejected from the nozzle can freely flow toward the internal surface of the body.
8. The cooling apparatus according to claim 1, wherein the nozzle is inclined obliquely downward with respect to the internal surface of the body.
9. The cooling apparatus according to claim 1, wherein the body has a thickness of approximately 0.5-1.0 mm.
10. The cooling apparatus according to claim 1, wherein the apparatus comprises multiple said cooling medium supply tubes inserted in said body in spaced relation to each other and multiple said nozzles provided on said tubes so as to eject the cooling medium toward the internal surface of the body, wherein most of said nozzles are inclined in one direction toward said internal surface of the body, except for one or more nozzles provided on one of said tubes disposed near one side of said body which are inclined in an opposite direction toward the internal surface.
11. The cooling apparatus according to claim 10, further comprising a circulating pipe for introducing the cooling medium into said supply tubes, a pipe for withdrawing the cooling medium from the body after it is discharged from said nozzles, and a chiller which cools the cooling medium before it is reintroduced into the circulating pipe.
12. The cooling apparatus according to claim 1, wherein the apparatus comprises multiple said cooling medium supply tubes inserted in said body in spaced relation to each other and multiple said nozzles provided on said tubes so as to eject the cooling medium toward the internal surface of the body, wherein said nozzles are all inclined in one direction toward said internal surface of the body such that the cooling medium discharges from the nozzles substantially do not collide with each other within the body and are distributed substantially uniformly over the internal surface.
13. The cooling apparatus according to claim 2, wherein an ejection angle of coolant medium from said nozzles expands radially within said body.
14. The substrate treating apparatus according to claim 3, wherein the internal surface is a back side of a top planar surface of the body.
15. The substrate treating apparatus according to claim 3, wherein the internal surface is a back side of a thin metal plate forming a top surface of the body.
16. The substrate treating apparatus according to claim 3, wherein a space within the body is substantially open such that, apart from the cooling medium supply tube and the nozzle, the cooling medium ejected from the nozzle can freely flow toward the internal surface of the body.
17. The substrate treating apparatus according to claim 3, wherein the nozzle is inclined obliquely downward with respect to the internal surface of the body.
18. The substrate treating apparatus according to claim 3, wherein the body has a thickness of approximately 0.5-1.0 mm.
19. The substrate treating apparatus according to claim 3, wherein the apparatus comprises multiple said cooling medium supply tubes inserted in said body in spaced relation to each other and multiple said nozzles provided on said tubes so as to eject the cooling medium toward the internal surface of the body, wherein most of said nozzles are inclined in one direction toward said internal surface of the body, except for one or more nozzles provided on one of said tubes disposed near one side of said body which are inclined in an opposite direction toward the internal surface.
20. The substrate treating apparatus according to claim 19, further comprising a circulating pipe for introducing the cooling medium into said supply tubes, a pipe for withdrawing the cooling medium from the body after it is discharged from said nozzles, and a chiller which cools the cooling medium before it is reintroduced into the circulating pipe.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A mask, comprising a mask substrate on which a light transmission region and a light shielding region are provided,
wherein a Fresnel zone plate is arranged in the light transmission region and configured to form a spacer on a glass substrate.
2. The mask according to claim 1, wherein the spacer is a cylinder-shaped spacer, an inverse cone-shaped spacer, a positive cone-shaped spacer or a combined spacer of a cylinder and a circular ring.
3. The mask according to claim 1, wherein the Fresnel zone plate has a circular cross section composed of a series of concentric circular ring zones, and
wherein a circular zone is provided on a center of the Fresnel zone plate; a plurality of circular ring-shaped bright zones and dark zones are arranged on the Fresnel zone plate in sequence in a radially outward direction; and the bright zones are light transmission zones while the dark zones are light shielding zones, and
wherein the plurality of bright zones and dark zones are arranged alternately.
4. The mask according to claim 3, wherein the circular zone is a dark zone or a bright zone.
5. The mask according to claim 3, wherein all of the circular zone, the bright zones and the dark zones form zone orders of the Fresnel zone plate and the circular zone forms the first order, and
wherein the number of the zone orders of the Fresnel zone plate is 3 to 13.
6. The mask according to claim 5, wherein the Fresnel zone plate has a radius defined as R, a main focus length defined as f, and a total number of the zone orders defined as m; and
wherein an incident light irradiated on the Fresnel zone plate is a monochromatic parallel light with a wavelength of \u03bb; and
wherein the value of the main focus length f is obtained from a formula of f=R*Rm\u03bb.
7. The mask according to claim 6, wherein the mask is used to form an inverse cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is less than the main focus length f;
the mask is used to form a cylinder-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is equal to the main focus length f;
the mask is used to form a positive cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is greater than the main focus length f.
8. The mask according to claim 4, wherein all of the circular zone, the bright zones and the dark zones form zone orders of the Fresnel zone plate and the circular zone forms the first order, and
wherein the number of the zone orders of the Fresnel zone plate is 3 to 13.
9. The mask according to claim 8, wherein the Fresnel zone plate has a radius defined as R, a main focus length defined as f, and a total number of the zone orders defined as m; and
wherein an incident light irradiated on the Fresnel zone plate is a monochromatic parallel light with a wavelength of \u03bb; and
wherein the value of the main focus length f is obtained from a formula of f=R*Rm\u03bb.
10. The mask according to claim 9, wherein the mask is used to form an inverse cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is less than the main focus length f;
the mask is used to form a cylinder-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is equal to the main focus length f;
the mask is used to form a positive cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is greater than the main focus length f.
11. The mask according to claim 1, wherein the Fresnel zone plate has a circular cross section and is a composite Fresnel zone plate having an inner zone plate and an outer zone plate, the inner zone plate being located at a center of the outer zone plate to form the circular zone of the outer zone plate.
12. The mask according to claim 11, wherein the number of zone orders of the inner zone plate is 11 and the number of zone orders of the outer zone plate is 3.
13. A spacer produced by using a mask, the mask comprising a mask substrate on which a light transmission region and a light shielding region are provided,
wherein a Fresnel zone plate is arranged in the light transmission region and configured to form a spacer on a glass substrate.
14. A method for producing a spacer using a mask, the mask comprising a mask substrate on which a light transmission region and a light shielding region are provided, wherein a Fresnel zone plate is arranged in the light transmission region and configured to form a spacer on a glass substrate, the method comprising:
coating the substrate with a layer of photo resist; and
forming the spacer on the substrate by using the mask to expose the layer of photo resist to light, to develop and etch the layer of photo resist.
15. The method according to claim 14, wherein the spacer is a cylinder-shaped spacer, an inverse cone-shaped spacer, a positive cone-shaped spacer or a combined spacer of a cylinder and a circular ring.
16. The method according to claim 14, wherein the Fresnel zone plate has a circular cross section composed of a series of concentric circular ring zones, and
wherein a circular zone is provided on a center of the Fresnel zone plate; a plurality of circular ring-shaped bright zones and dark zones are arranged on the Fresnel zone plate in sequence in a radially outward direction; and the bright zones are light transmission zones while the dark zones are light shielding zones, and
wherein the plurality of bright zones and dark zones are arranged alternately.
17. The method according to claim 16, wherein the circular zone is a dark zone or a bright zone.
18. The method according to claim 16, wherein all of the circular zone, the bright zones and the dark zones form zone orders of the Fresnel zone plate and the circular zone forms the first order, and
wherein the number of the zone orders of the Fresnel zone plate is 3 to 13.
19. The method according to claim 18, wherein the Fresnel zone plate has a radius defined as R, a main focus length defined as f, and a total number of the zone orders defined as m; and
wherein an incident light irradiated on the Fresnel zone plate is a monochromatic parallel light with a wavelength of \u03bb; and
wherein the value of the main focus length f is obtained from a formula of R*Rm\u03bb.
20. The method according to claim 19, wherein the mask is used to form an inverse cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is less than the main focus length f;
the mask is used to form a cylinder-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is equal to the main focus length f;
the mask is used to form a positive cone-shaped spacer on the glass substrate when the distance between the mask and the glass substrate is greater than the main focus length f.