1. A coloring composition for image formation comprising an azo dye having an aromatic nitrogen-containing 6-membered heterocyclic ring as a coupling component.
2. A coloring composition which comprises an azo compound having an oxidation potential nobler than 1.0 V vs. SCE and comprising at least two substituents having a pKa value of 10 to 5 in water.
3. A method for improving ozone resistance of a color image, the method comprising using a compound having an oxidation potential nobler than 1.0 V vs. SCE and showing a maximum absorption at a wavelength between 500 nm and 580 nm with a half-value width of 150 nm or narrower.
4. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (1):
656
wherein A represents a residue of a 5-membered heterocyclic diazo component A-NH2; B1 and B2 represent CR1 and CR2, respectively, or either one of B1 and B2 represents a nitrogen atom with the other representing CR1 or CR2; R5 and R6 each independently represent a hydrogen atom, an aliphatic group, an aromatic group, a heterocyclic group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, an alkylsulfonyl group, an arylsulfonyl group or a sulfamoyl group, provided that R5 and R6 do not represent a hydrogen atom simultaneously, wherein each group may have a substituent; and G, R1 and R2 each independently represent a hydrogen atom, a halogen atom, an aliphatic group, an aromatic group, a heterocyclic group, a cyano group, a carboxyl group, a carbamoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, a hydroxyl group, an alkoxy group, an aryloxy group, a silyloxy group, an acyloxy group, a carbamoyloxy group, a heterocyclic oxy group, an alkoxycarbonyloxy group, an aryloxycarbonyloxy group, an amino group substituted with an alkyl group, an aryl group or a heterocyclic group, an acylamino group, a ureido group, a sulfamoylamino group, an alkoxycarbonylamino group, an aryloxycarbonylamino group, an alkylsulfonylamino group, an arylsulfonylamino group, a nitro group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group, an alkylsulfinyl group, an arylsulfinyl group, a sulfamoyl group, a sulfo group or a heterocyclic thio group, wherein each group may have a substituent; or R5 may be connected to R1 or R6 to form a 5- or 6-membered ring.
5. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (2):
657
wherein Z1 represents an electron-attracting group having a Hammett’s substituent constant p value of 0.20 or greater; Z2 represents a hydrogen atom, an aliphatic group, an aromatic group or a heterocyclic group; R1, R2, R5, and R6 are as defined in claim 1; R3 and R4 each independently represent a hydrogen atom, an aliphatic group, an aromatic group, a heterocyclic group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, a sulfonyl group or a sulfamoyl group; and Q represents a hydrogen atom, an aliphatic group, an aromatic group or a heterocyclic group; wherein each group as represented by Z1, Z2, R1, R2, R3, R4, R5, R6, and Q may have a substituent.
6. A coloring composition for image formation comprising an azo dye represented by formula (AZ-1):
658
wherein ring J, ring L, and ring M each independently represent a 5- or 6-membered aromatic ring; 1, 2, 3, and 4 are numbers specifying four atoms; and the interfacial angle 1-2-3-4 defined by the numbered four atoms ranges between 45 and 135 in the energically most stable steric structure determined by quantum chemistry calculation by the DFTB3LYP method with the basis set 6-31G* or a higher basis set.
7. The coloring composition for image formation according to claim 6, wherein the azo dye is represented by formula (AZ-2):
659
wherein ring J, ring L, ring M, ring T, and ring U each independently represent a 5- or 6-membered aromatic ring; 1, 2, 3, and 4 are numbers specifying four atoms; and the interfacial angle 1-2-3-4 defined by the numbered four atoms ranges between 45 and 135 in the energically most stable steric structure determined by quantum chemistry calculation by the DFTB3LYP method with the basis set 6-31G* or a higher basis set.
8. The coloring composition for image formation according to claim 7, wherein ring U is a substituted or unsubstituted benzene ring; ring T is a thiazole ring, an imidazole ring or an oxazole ring; ring U and ring Tare condensed with each other; ring J is a substituted or unsubstituted pyrazole ring, a substituted or unsubstituted imidazole ring, a substituted or unsubstituted triazole ring, a substituted or unsubstituted benzene ring or a substituted or unsubstituted pyrimidone ring; ring L is a substituted or unsubstituted benzene ring, a substituted or unsubstituted pyridine ring or a substituted or unsubstituted pyrazole ring; and ring M is a substituted or unsubstituted aromatic ring or a substituted or unsubstituted nitrogen-containing 6-membered heterocyclic ring.
9. The coloring composition for image formation according to claim 6, wherein the interfacial angle 1-2-3-4 ranges between 60 and 120.
10. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (3):
660
wherein Z represents an atomic group necessary to form a hetero ring together with the carbon atom, the nitrogen atom, X, and Y; X represents a nitrogen atom, an oxygen atom or a carbon atom; Y represents a nitrogen atom, an oxygen atom, a sulfur atom or a carbon atom provided that Y is not a nitrogen atom when X is a carbon atom; A1 and A2 each independently represent a substituted or unsubstituted carbon atom or a nitrogen atom provided that A1 and A2 do not simultaneously represent a nitrogen atom and that A2 does not have a nitro group as a substituent; and R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group, an alkenyl group, an aryl group, a heterocyclic group, a sulfonyl group, an acyl group, a carboxyl group or a carbamoyl group, wherein each group may have a substituent, provided that R1 and R2 do not represent a hydrogen atom simultaneously and that R3 and R4 do not represent a hydrogen atom simultaneously.
11. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (4):
661
wherein Z1 represents an atomic group necessary to form a hetero ring together with the carbon atom and the sulfur atom; A11 and A12 each independently represent a substituted or unsubstituted carbon atom or a nitrogen atom provided that A11 and A12 do not represent a nitrogen atom simultaneously; and R11, R12, R13, and R14 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group, an alkenyl group, an aryl group, a heterocyclic group, a sulfonyl group, an acyl group, a carboxyl group or a carbamoyl group, wherein each group may have a substituent, provided that at least one of R11 and R12 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group and that R13 and R14 do not represent a hydrogen atom simultaneously.
12. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (5):
662
wherein Z2 represents an atomic group necessary to form a hetero ring together with the carbon atom and the sulfur atom; R21 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group; R23 and R24 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group, an alkenyl group, an aryl group, a heterocyclic group, a sulfonyl group, an acyl group, a carboxyl group or a carbamoyl group, wherein each group may have a substituent; and R25 and R26 each independently represent a hydrogen atom or a monovalent substituent.
13. The coloring composition for image formation according to claim 1, wherein the azo dye is represented by formula (6):
663
wherein Z3 represents an atomic group necessary to form a hetero ring together with the carbon atom and the sulfur atom; R31 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group; R33 represents an alkyl group, a cycloalkyl group, an aralkyl group, an alkenyl group, an aryl group, a heterocyclic group, a sulfonyl group, an acyl group, a carboxyl group or a carbamoyl group; and R35 and R36 each independently represent a hydrogen atom or a monovalent substituent.
14. The coloring composition according to claim 2, wherein the azo compound is represented by formula (5-I):
Het(A5)-NN-Het(B5)(5-I)
wherein Het(A5) represents a substituted 5- or 6-membered heterocyclic ring; and Het(B5) represents a heterocyclic ring represented by formula (5-II):
664
wherein A51 and A52 each independently represent a carbon atom or a nitrogen atom provided that they do not represent a nitrogen atom simultaneously; R54 and R55 each independently represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a halogen atom, a carboxyl group, a carbamoyl group, a cyano group, an alkoxycarbonyl group or a hydroxyl group; R56, R57, R58, and R59 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted heterocyclic group;
provided that formula (5-I) has at least two substituents having a pKa value of 10 to 5 in water.
15. An ink-jet ink composition comprising the coloring composition according to claim 1.
16. An ink jet recording method comprising ejecting the ink-jet ink composition according to claim 15 on an image-receiving medium comprising a substrate and an ink-receptive layer comprising inorganic white pigment particles to form an image.
17. The method for improving ozone resistance of a color image according to claim 3, wherein the compound is an azo compound.
18. The method for improving ozone resistance of a color image according to claim 17, wherein the azo compound is represented by formula (7):
A6NN-B6(7)
wherein A6 and B6 each independently represent a substituted or unsubstituted aryl group or a substituted or unsubstituted 5- or 6-membered heteryl group.
19. An ink-jet ink composition comprising the coloring composition according to claim 2.
20. An ink-jet ink composition comprising the coloring composition according to claim 6.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for predicting tolerable spacing between conductors, comprising steps of:
providing a wafer with a first normal conductor and a plurality of first testing conductors thereon;
using a photomask with a plurality of strip patterns to form a second normal conductor and a plurality of second testing conductors on the wafer, wherein in one die, there is a distance d between the first normal conductor and the second normal conductor, and there is a distance di between one of the first testing conductor and a corresponding one of the second testing conductor, in which, i is an individual integer, di are different values ranging from d+\u0394d to d\u2212\u0394d, and \u0394d<d; and
inspecting the die to obtain an inspecting result and predicting the tolerable spacing between the first testing conductor and the second testing conductor according to the inspecting result and the distances di.
2. The method according to claim 1 wherein the first normal conductor and the first testing conductors are sourcedrain contacts, and the second normal conductor and the second testing conductors are gate lines.
3. The method according to claim 2 wherein the gate lines are polysilicon gate lines.
4. The method according to claim 1 wherein the die including the first normal conductor, the first testing conductors, the second normal conductor, and the second testing conductors is formed on an unused area of the wafer.
5. The method according to claim 1 wherein before the step of forming the second conductors, the method further comprises a step of shifting the photomask from a predetermined position so as to form deviated second conductors.
6. The method according to claim 1 wherein the step of inspecting the die to obtain the inspecting result comprising steps of:
detecting electrical short between the first testing conductors and the second testing conductors in the die; and
counting the electrical short to obtain failure counts for each distance di.
7. The method according to claim 6 wherein the step of inspecting the die is performed by an electron beam inspection system.
8. The method according to claim 1 wherein the step of predicting the tolerable spacing comprising steps of:
establishing a normal distribution curve associated with the failure counts and the distances di;
defining an acceptable failure possibility; and
calculating the tolerable spacing according to the normal distribution curve and the acceptable failure possibility.
9. The method according to claim 8 wherein the tolerable spacing is n\xd7\u03c3, in which n is an integer determined according to the acceptable failure possibility and \u03c3 is a standard deviation of the normal distribution.
10. The method according to claim 8 wherein the step of predicting the tolerable spacing is performed by a dedicated hardware or computer software.
11. A method for predicting tolerable spacing between conductors, comprising steps of:
providing a wafer with a plurality of first conductors thereon;
using a photomask with a plurality of strip patterns to form a plurality of second conductors on the wafer, wherein there are different distances <di> between the second conductors and corresponding first conductors in one die on the wafer, where i is an integer;
inspecting the die to find a relation between failure counts and the distances, and obtaining a standard deviation from the relation; and
predicting the tolerable spacing between the first conductor and the second conductor according to the standard deviation to meet a predetermined acceptable failure count.
12. The method according to claim 11 wherein the first conductors are sourcedrain contacts and the second conductors are testing gate lines.
13. The method according to claim 12 wherein the testing gate lines are polysilicon gate lines.
14. The method according to claim 11 wherein before the step of forming the second conductors, the method further comprises a step of shifting the photomask from a predetermined position so as to form deviated second conductors.
15. The method according to claim 11 wherein the step of inspecting the die comprising steps of:
detecting electrical short between the first conductors and the second conductors in the die; and
counting the electrical short to obtain the failure counts for each distance di.
16. The method according to claim 15 wherein the step of inspecting the die is preformed by an electron beam inspection system.
17. The method according to claim 11 wherein the step of finding the relation between the failure counts and the distances comprising steps of:
obtaining a regression line through the failure counts and the corresponding distances;
calculating the slope of the regression line; and
calculating the standard deviation according to the slop.
18. The method according to claim 17 wherein the tolerable spacing is n\xd7\u03c3, in which n is an integer determined according to the predetermined acceptable failure count, and \u03c3 is the standard deviation.
19. The method according to claim 18 wherein the tolerable spacing increases when the amount of the first and the second conductors in one die increases.
20. The method according to claim 18 wherein the step of predicting the tolerable spacing is performed by a dedicated hardware or computer software.