1. A computer implemented method for categorizing a document, comprising
receiving an indication from a user to categorize a document including text;
determining a plurality of vocabulary terms, each term representative of a category in which a document can be categorized;
in response to the indication, displaying the plurality of vocabulary terms;
filtering the plurality of vocabulary terms based on user specified criteria;
displaying a plurality of selectors, a selector being associated with each one of the plurality of vocabulary terms matching the user specified criteria;
accepting input indicating selection of at least one of the plurality of vocabulary terms matching the user specified criteria when said selector is selected;
creating an association between the selected vocabulary terms and said document.
2. The method as recited in claim 1 wherein said displaying and accepting are performed on a first computer and wherein storing said vocabulary terms includes providing the selected vocabulary terms to a second computer.
3. The method as recited in claim 1 wherein displaying the plurality of vocabulary terms and plurality of selectors includes displaying the vocabulary terms in a drop-down box.
4. The method as recited in claim 1 further comprising automatically distinguishing the selected vocabulary terms from unselected vocabulary terms.
5. The method as recited in claim 4 wherein distinguishing includes moving the selected vocabulary terms to a top of list of the selected and unselected vocabulary terms.
6. The method as recited in claim 1 further comprising receiving a character match string from the user, and wherein determining the plurality of vocabulary terms includes filtering an available list of plurality of vocabulary terms based on the character match string, and wherein displaying the plurality of vocabulary terms includes displaying only the available list of vocabulary terms containing the character match string.
7. The method as recited in claim 1 wherein storing includes storing the selected vocabulary terms with the document as a tag property.
8. The method as recited in claim 1 wherein the input indicating selection includes an indication that the selected vocabulary term is moved to the top of a list of the plurality of vocabulary terms.
9. The method as recited in claim 1 further comprising accepting a second input indicating a custom vocabulary term, and adding the custom vocabulary term as a selected vocabulary term.
10. The method as recited in claim 9 further comprising storing the custom vocabulary term for use and display with other documents.
11. A system for categorizing a document in a document management system, comprising:
a computer-readable memory comprising at least one module executable on a computer for: receiving from a user an indication to categorize a document including text;
generating a plurality of vocabulary terms;
providing the plurality of vocabulary terms to a display device wherein the vocabulary terms are listed along with a plurality of selectors, a selector being provided for each of the vocabulary terms so that a user may select at least one vocabulary term; and
associating the document with all of a categories corresponding to the selected vocabulary terms wherein the document may be stored in association with the categories.
12. The system as recited in claim 11 further comprising a memory containing a plurality of categories, wherein the document may be associated with at least one of the categories.
13. The system as recited in claim 12 wherein the categories are associated with nodes in a tree data structure.
14. The system as recited in claim 11 wherein the selectors comprise a cheek box.
15. The system as recited in claim 11 comprising a display device associated with a first computer for displaying a list of vocabulary terms and a storage device associated with a second computer wherein documents can be stored.
16. The system as recited in claim 13 wherein the memory containing the tree structure of category nodes is a database operable by a server computer and wherein the display device is a client computer coupled to the server computer by way of a network connection.
17. The system as recited in claim 13 further comprising a module for adding additional vocabulary terms to said system that may be associated with a category label.
18. The method of claim 1 further comprising receiving a request for one or more documents associated with a search category, and returning an indication of the document when one or more of the at least one selected vocabulary term matches the search category.
19. The method of claim 1 further comprising displaying a tree structure containing the plurality of vocabulary terms, and wherein receiving a request includes receiving an indication of a user selecting one or more nodes of the tree structure.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A defect probability calculating method comprising:
assuming a plurality of process conditions containing process variations caused in a process of forming a pattern on a substrate based on a design pattern;
acquiring appearance probabilities of the respective process conditions;
performing process simulation to predict a pattern to be formed on a substrate based on the design pattern for each of the process conditions;
determining whether the pattern predicted by performing the process simulation satisfies preset criteria for each of the process conditions; and
acquiring first probability by adding together appearance probabilities of the process conditions used for process simulation of patterns which are determined not to satisfy the preset criteria.
2. The method according to claim 1, wherein a process from said assuming the plurality of process conditions to said acquiring the first probability is performed for a specified portion extracted from the design pattern.
3. The method according to claim 2, wherein the specified portion is a provisionally rejected portion which is determined by previously performing process simulation for the design pattern.
4. The method according to claim 1, wherein a process from said assuming the plurality of process conditions to said acquiring the first probability is performed for each of a plurality of specified portions extracted from the design pattern, and
wherein the method further comprises one of first and second processes,
the first process comprising: adding together the first probabilities acquired for the respective specified portions,
the second process comprising; calculating a first value by subtracting the first probability from unity for each of the specified portions; calculating a second value by multiplying together the first values calculated for the respective specified portions; and subtracting the second value from unity.
5. The method according to claim 4, wherein the specified portion is a provisionally rejected portion which is determined by previously performing process simulation for the design pattern.
6. The method according to claim 1, wherein the process includes at least one of a photolithography process and etching process.
7. The method according to claim 1, wherein a process from said assuming the plurality of process conditions to said acquiring the first probability is performed for each of plural kinds of unit cells, and
wherein the method further comprises one of first and second processes,
the first process comprising;
acquiring the number of unit cells contained in a design pattern of a desired integrated circuit chip for each kind of unit cells;
calculating a product of the first probability and the number of unit cells for each kind of unit cells; and
calculating defect probability of the desired integrated circuit chip by adding together the products calculated for the respective kinds of unit cells,
the second process comprising;
acquiring the number of unit cells contained in a design pattern of a desired integrated circuit chip for each kind of unit cells;
calculating a first value by subtracting the first probability from unity for each kind of unit cells;
calculating a second value by multiplying the first value by itself by a number of times corresponding to the number of unit cells for each kind of unit cells;
calculating a third value by multiplying together the second values calculated for the respective kinds of unit cells; and
calculating defect probability of the desired integrated circuit chip by subtracting the third value from unity.
8. A defect probability calculating method comprising:
dividing process variations occurring in a process of forming a pattern on a substrate based on a design pattern into a first process variation in which a central value of pattern dimensions shifts and a second process variation in which a pattern dimension varies depending on a pattern arrangement position;
assuming a plurality of process conditions containing the first process variations;
acquiring appearance probabilities of the respective process conditions;
performing process simulation for each of the process conditions with respect to the design pattern to predict a preset pattern;
acquiring a ratio at which the preset pattern predicted for each of the process conditions does not satisfy a preset dimensional condition due to the second process variation;
acquiring a product of the appearance probability and the ratio for each of the process conditions; and
acquiring first probability by adding together the products acquired for the respective process conditions.
9. The method according to claim 8, wherein said acquiring the ratio at which the preset pattern does not satisfy the preset dimensional condition includes predicting dimensional distribution of the preset pattern caused by the second process variation, and acquiring a ratio of a portion which does not satisfy preset criteria in the dimensional distribution.
10. The method according to claim 8, wherein a process from said dividing the process variations into the first process variation and the second process variation to said acquiring the first probability is performed for a specified portion extracted from the design pattern.
11. The method according to claim 10, wherein the specified portion is a provisionally rejected portion which is determined by previously performing process simulation for the design pattern.
12. The method according to claim 8, wherein a process from said dividing the process variations into the first process variation and the second process variation to said acquiring the first probability is performed for each of a plurality of specified portions extracted from the design pattern, and
wherein the method further comprises one of first and second processes,
the first process comprising: adding together the first probabilities acquired for the respective specified portions,
the second process comprising; calculating a first value by subtracting the first probability from unity for each of the specified portions; calculating a second value by multiplying together the first values calculated for the respective specified portions; and subtracting the second value from unity.
13. The method according to claim 12, wherein the specified portion is a provisionally rejected portion which is determined by previously performing process simulation for the design pattern.
14. The method according to claim 8, wherein the first process variation is based on a variation in a process parameter with time.
15. The method according to claim 8, wherein the second process variation is based on a local variation of a process parameter caused by noise.
16. The method according to claim 8, wherein the preset pattern is a photoresist pattern.
17. The method according to claim 8, wherein a process from said dividing the process variations into the first process variation and the second process variation to said acquiring the first probability is performed for each of plural kinds of unit cells, and
wherein the method further comprises one of first and second processes,
the first process comprising;
acquiring the number of unit cells contained in a design pattern of a desired integrated circuit chip for each kind of unit cells;
calculating a product of the first probability and the number of unit cells for each kind of unit cells; and
calculating defect probability of the desired integrated circuit chip by adding together the products calculated for the respective kinds of unit cells,
the second process comprising;
acquiring the number of unit cells contained in a design pattern of a desired integrated circuit chip for each kind of unit cells;
calculating a first value by subtracting the first probability from unity for each kind of unit cells;
calculating a second value by multiplying the first value by itself by a number of times corresponding to the number of unit cells for each kind of unit cells;
calculating a third value by multiplying together the second values calculated for the respective kinds of unit cells; and
calculating defect probability of the desired integrated circuit chip by subtracting the third value from unity.
18. A semiconductor device manufacturing method comprising:
preparing a photomask having a mask pattern corresponding to a fixed design pattern based on the defect probability calculated by the method according to claim 1; and
transferring the mask pattern on the photomask onto a photoresist on a semiconductor substrate.
19. The method according to claim 18, wherein the fixed design pattern is obtained when the defect probability is smaller than a preset value.
20. The method according to claim 18, wherein the defect probability is calculated for each of a plurality of design patterns by the method according to claim 1, and one of the design patterns which has the lowest defect probability is determined as the fixed design pattern.