1. An impeller comprising:
a hub having an annular shape; and
a plurality of blades radially arranged along an outer peripheral surface of the hub,
the impeller being configured in such a manner that a fluid having flowed from a leading edge side of the blade along a rotation axis is discharged from a trailing edge side of the blade outward in the radial direction intersecting the rotation axis, wherein
a pressure surface of the blade includes:
a first pressure surface extending from the hub side at an angle of 90 degrees or less with respect to the forward direction of the direction of rotation of the impeller;
a second pressure surface extending from the first pressure surface at an angle of more than 90 degrees with respect to the forward direction of the direction of rotation of the impeller; and
a third pressure surface extending from the second pressure surface at an angle of 90 degrees or less with respect to the forward direction of the direction of rotation of the impeller, and
the pressure surface of the blade has a curved shape bending forward in the rotation direction on an inner peripheral side, while having an S-shape formed of the first pressure surface, the second pressure surface, and the third pressure surface on the outer peripheral side.
2. (canceled)
3. The impeller according to claim 1, wherein
the first pressure surface and the third pressure surface are inclined forward in the rotation direction with respect to the hub.
4. The impeller according to claim 1,
wherein
the pressure surface of the blade includes the second pressure surface at least on an outer peripheral side of the blade.
5. (canceled)
6. The impeller according to claim 1,
wherein
the second pressure surface is located within one-half (\xbd) or less the length of the blade from the hub in a direction along the rotation axis.
7. The impeller according to claim 1,
wherein
the second pressure surface faces a suction surface in a distal end part of the blade located in front in the rotation direction.
8. A fluid machine comprising:
a casing having a hollow shape;
an impeller rotatably supported in the casing, and having a plurality of blades radially arranged along an outer peripheral surface of a hub having an annular shape;
a suction passage through which a fluid flows along a direction of the axis to be drawn in the impeller from a leading edge side of the impeller; and
a discharge passage through which the fluid having been pressure fed by the impeller flows to be discharged from a trailing edge side of the blade outward in the radial direction intersecting the direction of the axis of the impeller, wherein
a pressure surface of the blade includes:
a first pressure surface extending from the hub side at an angle of 90 degrees or less with respect to the forward direction of the direction of rotation of the impeller;
a second pressure surface extending from the first pressure surface at an angle of more than 90 degrees with respect to the forward direction of the direction of rotation of the impeller; and
a third pressure surface extending from the second pressure surface at an angle of 90 degrees or less with respect to the forward direction of the direction of rotation of the impeller, and
the pressure surface of the blade has a curved shape bending forward in the rotation direction on an inner peripheral side, while having an S-shape formed of the first pressure surface, the second pressure surface, and the third pressure surface on the outer peripheral side.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1,
wherein, in the above Chemical Formula 1, R1 is hydrogen, a methyl group, or CH2CO2R5,
R2 is CR\u2032R\u2033 where R\u2032 and R\u2033 are independently hydrogen, a methyl group, or CO2R5,
R3 is hydrogen, or a linear, branched, or cyclic substituted or unsubstituted alkyl group,
R4 is a hydroxy or CO2R5,
X is (CH2)n (where n is 1 or 2), O, or S,
R5 is a linear, branched, or cyclic substituted or unsubstituted alkyl group, and
A is a linear, branched, or cyclic substituted or unsubstituted alkylene group.
2. The (meth)acrylate compound as claimed in claim 1, wherein the (meth)acrylate compound is a compound represented by one of the following Chemical Formulae 1a to 1p,
3. A photosensitive polymer, comprising:
a repeating unit derived from a compound represented by the following Chemical Formula 1; and
a repeating unit derived from a compound represented by the following Chemical Formula 2,
wherein, in the above Chemical Formula 1, R1 is hydrogen, a methyl group, or CH2CO2R5,
R2 is CR\u2032R\u2033 where R\u2032 and R\u2033 are independently hydrogen, a methyl group, or CO2R5,
R3 is hydrogen, or a linear, branched, or cyclic substituted or unsubstituted alkyl group,
R4 is a hydroxy or CO2R5,
R5 is a linear, branched, or cyclic substituted or unsubstituted alkyl group,
X is (CH2)n (where n is 1 or 2), O, or S, and
A is a linear, branched, or cyclic substituted or unsubstituted alkylene group,
wherein, in the above Chemical Formula 2, R6 is hydrogen or a methyl group, and
R7 is a C4 to C20 acid-labile group being decomposed under an acid catalyst.
4. The photosensitive polymer as claimed in claim 3, wherein R7 is an alkyl group, a norbornyl group, an isobornyl group, a cyclodecanyl group, a norbornyl having a lower alkyl substituent, an isobornyl having a lower alkyl substituent, a cyclodecanyl group having a lower alkyl substituent, an adamantyl group having a lower alkyl substituent, alkoxycarbonyl, alkoxycarbonyl alkyl, amyloxycarbonyl, amyloxycarbonyl alkyl, 2-tetrahydropyranyloxycarbonyl alkyl, 2-tetrahydrofuranyloxycarbonyl alkyl, a tertiary alkyl group, or an acetal group.
5. The photosensitive polymer as claimed in claim 3, wherein a mole fraction of the repeating unit derived from the compound represented by Chemical Formula 1 ranges from 0.2 to 0.8 and a mole fraction of the repeating unit derived from the compound represented by Chemical Formula 2 ranges from 0.2 to 0.8 based on the total moles of the repeating units derived from the compounds represented by Chemical Formulae 1 and 2.
6. The photosensitive polymer as claimed in claim 3, further comprising:
a repeating unit derived from a compound represented by the following Chemical Formula 3,
wherein, in the above Chemical Formula 3, R8 is hydrogen or a methyl group, and
R9 is hydrogen or an alkyl group or cycloalkyl group including a polar functional group of a hydroxy group, a carboxyl group, or a combination thereof.
7. The photosensitive polymer as claimed in claim 6, wherein R9 is 2-hydroxyethyl or 3-hydroxy-1-adamantyl.
8. The photosensitive polymer as claimed in claim 6, wherein the photosensitive polymer further comprises a repeating unit derived from a compound represented by the following Chemical Formula 4,
wherein, in the above Chemical Formula 4, R10 is hydrogen or a methyl group, and
R11 is a lactone-derived group.
9. The photosensitive polymer as claimed in claim 8, wherein R11 is a substituent represented by the following Chemical Formula 5 or Chemical Formula 6,
wherein, in the above Chemical Formula 5, two of X1 to X4 positioned to be adjacent to each other are CO and O, and the remaining two of X1 to X4 except for CO and O are CR\u2033 (where R\u2033 is hydrogen, a C1 to C4 alkyl, or an alkylene forming a fused ring with a five-member ring),
wherein, in the above Chemical Formula 6, two of X5 to X9 positioned to be adjacent to each other are CO and O, and the remaining three of X5 to X9 except for CO and O are CR\u2033(where R\u2033 is hydrogen, a C1 to C4 alkyl, or an alkylene forming a fused ring with a six-member ring); or X5 to X9 are CR\u2032\u2033 (where R\u2032\u2033 is hydrogen, a C1 to C4 alkyl, an ester-containing alkylene forming a fused ring with the six-member ring), and at least two of R\u2032\u2033 are linked to each other to from a lactone ring.
10. The photosensitive polymer as claimed in claim 3, wherein the photosensitive polymer has a weight average molecular weight (Mw) of about 3,000 to about 20,000.
11. The photosensitive polymer as claimed in claim 3, wherein the photosensitive polymer has a polydispersity (MwMn) of about 1.5 to about 2.5.
12. A resist composition, comprising:
a photosensitive polymer including a repeating unit derived from a compound represented by the following Chemical Formula 1 and a repeating unit derived from a compound represented by the following Chemical Formula 2;
a photoacid generator (PAG); and
a solvent,
wherein, in the above Chemical Formula 1, R1 is hydrogen, a methyl group, or CH2CO2R5,
R2 is CR\u2032R\u2033 where R\u2032 and R\u2033 are independently hydrogen, a methyl group, or CO2R5,
R3 is hydrogen, or a linear, branched, or cyclic substituted or unsubstituted alkyl group,
R4 is a hydroxy or CO2R5,
R5 is a linear, branched, or cyclic substituted or unsubstituted alkyl group,
X is (CH2)n (where n is 1 or 2), O, or S, and
A is a linear, branched, or cyclic substituted or unsubstituted alkylene group,
wherein, in the above Chemical Formula 2, R6 is hydrogen or a methyl group, and
R7 is a C4 to C20 acid-labile group being decomposed under an acid catalyst.
13. The resist composition as claimed in claim 12, wherein the photosensitive polymer further includes a repeating unit derived from a compound represented by the following Chemical Formula 3,
wherein, in the above Chemical Formula 3, R8 is hydrogen or a methyl group, and
R9 is hydrogen, an alkyl group, or a cycloalkyl group, the alkyl group and the cycloalkyl group including a hydroxy group, a carboxyl group, or a combination thereof.
14. The resist composition as claimed in claim 13, wherein the photosensitive polymer further includes a repeating unit derived from a compound represented by the following Chemical Formula 4,
wherein, in the above Chemical Formula 4, R10 is hydrogen or a methyl group, and
R11 is a lactone-derived group.
15. The resist composition as claimed in claim 12, wherein the photosensitive polymer is included in an amount of about 5 to about 15 parts by weight based on 100 parts by weight of a resist composition.
16. The resist composition as claimed in claim 12, wherein the photoacid generator is added in an amount of about 1 to about 15 parts by weight based on 100 parts by weight of the photosensitive polymer.
17. The resist composition as claimed in claim 12, wherein the photoacid generator includes a triarylsulfonium salt, a diaryl iodonium salt, a sulfonate, or a mixture thereof.
18. The resist composition as claimed in claim 12, wherein the organic base is included in an amount of about 0.1 to about 1 part by weight based on 100 parts by weight of the photosensitive polymer.
19. The resist composition as claimed in claim 16, wherein the organic base includes triethylamine, triisobutylamine, trioctylamine, triisodecylamine, triethanolamine, or a mixture thereof.