1. A radio communication system comprising:
a first and second transmitters which include one or more of cells or sectors respectively; and
a receiver configured to perform radio communication with the first and second transmitters, wherein
the first transmitter includes:
a process unit configured to perform a scrambling process to a first transmission data by using a common scrambling code when the first transmission data is transmitted to the receiver; and
a transmission unit configured to transmit the scrambling processed first transmission data to the receiver,
the second transmitter includes:
a process unit configured to perform a scrambling process to a second transmission data by using the common scrambling code when the second transmission data is transmitted to the receiver; and
a transmission unit configured to transmit the scrambling processed second transmission data to the receiver, and
the receiver includes a reception unit configured to receive the first and the second transmission data and perform descrambling process to the first and the second transmission data by using the common scrambling code.
2. The radio communication system according to claim 1, wherein
the first transmitter includes a cell information generation unit configured to generate a cell information for generating the common scrambling code, and transmit the cell information to the second transmitter, and
each of the process units of the first and second transmitters generates the common scrambling code based on the cell information.
3. The radio communication system according to claim 2, wherein
the transmission unit transmits the cell information to the receiver, and
the reception unit generates the common scrambling code based on the cell information.
4. The radio communication system according to claim 2, wherein
the first and the second transmitters include one or more of cells or sectors and
the cell information includes a cell number for identifying the cell or sector, a receiver number for identifying the receiver, and a slot number for identifying a slot.
5. The radio communication system according to claim 4, wherein
the cell number, the receiver number, and the slot number correspond to a specific cell number, receiver number, and slot number, which are used in transmitting the first and second transmission data, respectively.
6. The radio communication system according to claim 1, wherein
the first transmitter includes a scheduler configured to generate a precoding information,
the scheduler transmits the precoding information to the second transmitters, and
each of the transmission units of the first and second transmitters weights the first and second transmission data based on the precoding information, and transmits to the receiver.
7. A radio communication method in a radio communication system for performing radio communication between a first and second transmitters which include one or more of cells or sectors, and a receiver, the method comprising:
performing a scrambling process to a first transmission data by using a common scrambling code when the first transmission data is transmitted to the receiver, by the first transmitter;
transmitting the scrambling processed first transmission data to the receiver, by the first transmitter;
performing a scrambling process to a second transmission data by using the common scrambling code when the second transmission data is transmitted to the receiver, by the second transmitter;
transmitting the scrambling processed second transmission data to the receiver, by the second transmitter; and
receiving the first and second transmission data and performing descrambling process to the first and second transmission data by using the common scrambling code, by the receiver.
8. A transmitter, and other transmitter including one or more of cells or sectors, for performing radio communication with a receiver the transmitter comprising:
one or more of the cells or sectors;
a process unit configured to perform a scrambling process to a first and second transmission data by using a common scrambling code when the first and second transmission data are transmitted to the receiver and the other transmitter respectively; and
a transmission unit configured to transmit the scrambling processed first or second transmission data to the receiver.
9. A receiver for performing radio communication with a first and second transmitters which include one or more of cells or sectors, the receiver comprising:
a reception unit configured to receive a scrambling processed first and second transmission data by using a common scrambling code, and perform descrambling process to the first and second transmission data by using the common scrambling code, on receiving the first and second transmission data from the first and second transmitters.
10. A radio communication system comprising:
a first and second transmitters which include one or more of cells or sectors respectively; and
a receiver configured to perform radio communication with the first and second transmitters, wherein
the receiver includes:
a process unit configured to perform a scrambling process to a first and second transmission data by using a common scrambling code; and
a transmission unit configured to transmit the scrambling processed first and second transmission data to the first and second transmitters,
the first transmitter includes a reception unit configured to receive the first transmission data and perform descrambling process to the first transmission data by using the common scrambling code, and
the second transmitter includes a reception unit configured to receive the second transmission data and perform descrambling process to the second transmission data by using the common scrambling code.
11. A radio communication method in a radio communication system for performing radio communication between a first and second transmitters including one or more of cells or sectors and a receiver, the method comprising:
performing a scrambling process to a first and second transmission data by using a common scrambling code, by the receiver;
transmitting the scrambling processed first and second transmission data to the first and the second transmitters, by the receiver;
receiving the first transmission data, and performing descrambling process to the first transmission data by using the scrambling code, by the first transmitter, and
receiving the second transmission data, and performing descrambling process to the second transmission data by using the scrambling data, by the second transmitter.
12. A transmitter for performing radio communication with a receiver and with other transmitter including one or more of cells or sectors, the transmitter comprising:
one or more of the cells or sectors; and
a reception unit configured to receive a first or second transmission data, to which scrambling process is performed by using a common scrambling code.
13. A receiver for performing radio communication with a first and second transmitters including one or more of cells or sectors, the receiver comprising:
a process unit configured to perform a scrambling process to a first and second transmission data by using a common scrambling code, and
a transmission unit configured to transmit the scrambling processed first and the second transmission data to the first and the second transmitters, respectively.
14. A radio communication system comprising:
a transmitter includes a plurality of sectors and a first and second communication units in each of the sectors; and
a receiver, wherein
the first communication unit includes:
a process unit configured to perform a scrambling process to a first transmission data by using a common scrambling code when the first transmission data is transmitted to the receiver; and
a transmission unit configured to transmit the scrambling processed first transmission data to the receiver,
the second communication unit includes:
a process unit configured to perform a scrambling process to a second transmission data by using the common scrambling code when the second transmission data is transmitted to the receiver; and
a transmission unit configured to transmit the scrambling processed second transmission data to the receiver, and
the receiver includes:
a reception unit configured to receive the first and second transmission data, and perform descrambling process to the first and second transmission data by the common scrambling code.
15. A radio communication system comprising:
a transmitter includes a plurality of sectors, and a first and second communication units in each of sectors; and
a receiver, wherein
the receiver includes:
a process unit configured to perform a scrambling processes to each of a first and second transmission data by using a common scrambling code; and
a transmission unit configured to transmit the scrambled processed first and the second transmission data to the transmitter,
the first communication unit configured to receive the first transmission data, and perform descrambling processes to the first transmission data by using the common scrambling code, and
the second communication unit configured to receive the second transmission data, and perform descrambling process to the second transmission data by using the common scrambling code.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A substrate processing apparatus comprising:
a processing chamber in which a substrate is processed;
a processing gas feeding line that feeds a processing gas into said processing chamber;
an inert gas feeding line that feeds an inert gas into said processing chamber;
an inert gas vent line provided in said inert gas feeding line, which exhausts said inert gas fed into said inert gas feeding line without feeding said inert gas into said processing chamber;
a first valve provided in said inert gas feeding line, on a downstream side of a part where said inert gas vent line is provided in said inert gas feeding line;
a second valve provided in said inert gas vent line;
a third valve provided in said processing gas feeding line;
an exhaust line that exhausts an inside of said processing chamber; and
a main controller that is configured to control said first, second and third valves so that:
processing is applied to said substrate by alternately repeating feed of said processing gas into said processing chamber through said processing gas feeding line, and feed of said inert gas into said processing chamber through said inert gas feeding line,
said inert gas fed into said inert gas feeding line is exhausted through said inert gas vent line when said inert gas is not fed into said processing chamber through said inert gas feeding line; and
a flow of said inert gas fed into said inert gas feeding line is switched from said flow toward said inert gas vent line to said flow toward said inside of said processing chamber when said inert gas is fed into said processing chamber through said inert gas feeding line.
2. A substrate processing apparatus comprising:
a processing chamber in which a substrate is processed;
a processing gas feeding line that feeds a processing gas into said processing chamber;
an inert gas feeding line that feeds an inert gas into said processing chamber;
an inert gas vent line provided in said inert gas feeding line, which exhausts said inert gas fed into said inert gas feeding line without feeding said inert gas into said processing chamber;
a first valve provided in said inert gas feeding line, on a downstream side of a part where said inert gas vent line is provided in said inert gas feeding line;
a second valve provided in said inert gas vent line;
a processing gas vent line provided in said processing gas feeding line, which exhausts said processing gas fed into said processing gas feeding line without feeding said processing gas into said processing chamber;
a third valve provided in said processing gas feeding line, on a downstream side of a part where said processing gas vent line is provided in said processing gas feeding line;
a fourth valve provided in said processing gas vent line;
an exhaust line that exhausts an inside of said processing chamber; and
a main controller that is configured to control said first, second, third and fourth valves so that:
processing is applied to said substrate by alternately repeating feed of said processing gas into said processing chamber through said processing gas feeding line, and feed of said inert gas into said processing chamber through said inert gas feeding line,
said inert gas fed into said inert gas feeding line is exhausted through said inert gas vent line without being fed into said processing chamber when said processing gas is fed into said processing chamber through said processing gas feeding line; and
said processing gas fed into said processing gas feeding line is exhausted through said processing gas vent line without being fed into said processing chamber when said inert gas is fed into said processing chamber through said inert gas feeding line.
3. The substrate processing apparatus according to claim 2, wherein
a flow rate controller is provided in each of said processing gas feeding line and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a total flow rate of a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said inert gas vent line when said processing gas is fed into said processing chamber; and
a total flow rate of a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said processing gas vent line when said inert gas is fed into said processing chamber; and so as to make constant:
a ratio between said flow rate of said gas exhausted through said exhaust line and said flow rate of said gas exhausted through said inert gas vent line when said processing gas is fed into said processing chamber; and
a ratio between said flow rate of said gas exhausted through said exhaust line and said flow rate of said gas exhausted through said processing gas vent line when said inert gas is fed into said processing chamber.
4. The substrate processing apparatus according to claim 2, wherein
a flow rate controller is provided in each of said processing gas feeding line and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so that when said feed of said processing gas into said processing chamber through said processing gas feeding line, and said feed of said inert gas into said processing chamber through said inert gas feeding line are alternately repeated, a total gas flow rate of said gas fed into said processing chamber is kept constant.
5. A substrate processing apparatus comprising:
a processing chamber in which a substrate is processed;
a first processing gas feeding line that feeds a first processing gas into said processing chamber;
a second processing gas feeding line that feeds a second processing gas into said processing chamber;
an inert gas feeding line that feeds an inert gas into said processing chamber;
an inert gas vent line provided in said inert gas feeding line, which exhausts said inert gas fed into said inert gas feeding line without feeding said inert gas into said processing chamber;
a first valve provided in said inert gas feeding line, on a downstream side of a part where said inert gas vent line is provided in said inert gas feeding line;
a second valve provided in said inert gas vent line;
a first processing gas vent line provided in said first processing gas feeding line, which exhausts said first processing gas fed into said first processing gas feeding line without feeding said first processing gas into said processing chamber;
a second processing gas vent line provided in said second processing gas feeding line, which exhausts said second processing gas fed into said second processing gas feeding line without feeding said second processing gas into said processing chamber;
a third valve provided in said first processing gas feeding line, on a downstream side of a part where said first processing gas vent line is provided in said first processing gas feeding line;
a fourth valve provided in said first processing gas vent line;
a fifth valve provided in said second processing gas feeding line, on a downstream side of a part where said second processing gas vent line is provided in said second processing gas feeding line;
a sixth valve provided in said second processing gas vent line;
an exhaust line that exhausts an inside of said processing chamber; and
a main controller that is configured to control said first, second, third, fourth, fifth and sixth valves so that:
processing is applied to said substrate by setting feed of said first processing gas into said processing chamber through said first processing gas feeding line, feed of said inert gas into said processing chamber through said inert gas feeding line, feed of said second processing gas into said processing chamber through said second processing gas feeding line, and feed of said inert gas into said processing chamber from said inert gas feeding line, as one cycle and repeating this cycle a multiple number of times;
said inert gas fed into said inert gas feeding line is exhausted through said inert gas vent line without being fed into said processing chamber when said first processing gas is fed into said processing chamber through said first processing gas feeding line, and when said second processing gas is fed into said processing chamber through said second processing gas feeding line; and
said first processing gas fed into said first processing gas feeding line is exhausted through said first processing gas vent line without being fed into said processing chamber, and said second processing gas fed into said second processing gas feeding line is exhausted through said second processing gas vent line without being fed into said processing chamber when said inert gas is fed into said processing chamber through said inert gas feeding line.
6. The substrate processing apparatus according to claim 5, wherein
a flow rate controller is provided in each of said first processing gas feeding line, said second processing gas feeding line, and said inert gas feeding line, and
said main controller is configured to further control said flow rate controllers so that when said cycle is repeated said multiple number of times a total gas flow rate of said gas fed into said processing chamber is constant.
7. The substrate processing apparatus according to claim 1, wherein
a flow rate controller is provided in each of said processing gas feeding line and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so that when said feed of said processing gas into said processing chamber through said processing gas feeding line, and said feed of said inert gas into said processing chamber through said inert gas feeding line are alternately repeated, a total gas flow rate of said gas fed into said processing chamber is kept constant.
8. The substrate processing apparatus according to claim 2, wherein
a flow rate controller is provided in each of said processing gas feeding line and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a total flow rate of a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said inert gas vent line when said processing gas is fed into said processing chamber; and
a total flow rate of a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said processing gas vent line when said inert gas is fed into said processing chamber.
9. The substrate processing apparatus according to claim 2, wherein
a flow rate controller is provided in each of said processing gas feeding line and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a ratio between a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said inert gas vent line when said processing gas is fed into said processing chamber; and
a ratio between a flow rate of said gas exhausted through said exhaust line and a flow rate of said gas exhausted through said processing gas vent line when said inert gas is fed into said processing chamber.
10. The substrate processing apparatus according to claim 5, wherein
a flow rate controller is provided in each of said first processing gas feeding line, said second processing gas feeding line, and said inert as feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said inert gas vent line, and a flow rate of said gas exhausted through said second processing gas vent line when said first processing gas is fed into said processing chamber;
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said first processing gas vent line, and a flow rate of said gas exhausted through said second processing gas vent line when said inert gas is fed into said processing chamber; and
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said inert gas vent line, and a flow rate of said gas exhausted through said first processing gas vent line when said second processing gas is fed into said processing chamber.
11. The substrate processing apparatus according to claim 5, wherein
a flow rate controller is provided in each of said first processing gas feeding line, said second processing gas feeding line, and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said inert gas vent line and said second processing gas vent line when said first processing gas is fed into said processing chamber;
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said first processing gas vent line and said second processing gas vent line when said inert gas is fed into said processing chamber; and
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said inert gas vent line and said first processing gas vent line when said second processing gas is fed into said processing chamber.
12. The substrate processing apparatus according to claim 5, wherein
a flow rate controller is provided in each of said first processing gas feeding line, said second processing gas feeding line, and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so as to make constant:
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said inert gas vent line, and a flow rate of said gas exhausted through said second processing gas vent line when said first processing gas is fed into said processing chamber;
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said first processing gas vent line, and a flow rate of said gas exhausted through said second processing gas vent line when said inert gas is fed into said processing chamber; and
a total flow rate of a flow rate of said gas exhausted through said exhaust line, a flow rate of said gas exhausted through said inert gas vent line, and a flow rate of said gas exhausted through said first processing gas vent line when said second processing gas is fed into said processing chamber; and so as to make constant:
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said inert gas vent line and said second processing gas vent line when said first processing gas is fed into said processing chamber;
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said first processing gas vent line and said second processing gas vent line when said inert gas is fed into said processing chamber; and
a ratio between a flow rate of said gas exhausted through said exhaust line and a total flow rate of said gases exhausted through said inert gas vent line and said first processing gas vent line when said second processing gas is fed into said processing chamber.
13. A substrate processing apparatus comprising:
a processing chamber in which a substrate is processed;
a first processing gas feeding line that feeds a first processing gas into said processing chamber;
a second processing gas feeding line that feeds a second processing gas into said processing chamber;
an inert gas feeding line that feeds an inert gas into said processing chamber;
an inert gas vent line provided in said inert gas feeding line, which exhausts said inert gas fed into said inert gas feeding line without feeding said inert gas into said processing chamber;
a first valve provided in said inert gas feeding line, on a downstream side of a part where said inert gas vent line is provided in said inert gas feeding line;
a second valve provided in said inert gas vent line;
a third valve provided in said first processing gas feeding line;
a fourth valve provided in said second processing gas feeding line;
an exhaust line that exhausts an inside of said processing chamber; and
a main controller that is configured to control said first, second, third and fourth valves so that:
processing is applied to said substrate by setting feed of said first processing gas into said processing chamber through said first processing gas feeding line, feed of said inert gas into said processing chamber through said inert gas feeding line, feed of said second processing gas into said processing chamber through said second processing gas feeding line, and feed of said inert gas into said processing chamber through said inert gas feeding line, as one cycle and repeating this cycle a multiple number of times,
said inert gas fed into said inert gas feeding line is exhausted through said inert gas vent line when said first processing gas is fed into said processing chamber through said first processing gas feeding line, or when said second processing gas is fed into said processing chamber through said second processing gas feeding line; and
a flow of said inert gas fed into said inert gas feeding line is switched from said flow toward said inert gas vent line to said flow toward said inside of said processing chamber when said inert gas is fed into said processing chamber through said inert gas feeding line.
14. The substrate processing apparatus according to claim 13, wherein
a flow rate controller is provided in each of said first processing gas feeding line, said second processing gas feeding line, and said inert gas feeding line; and
said main controller is configured to further control said flow rate controllers so that when said cycle is repeated said multiple number of times, a total gas flow rate of said gas fed into said processing chamber is kept constant.