1. A system, comprising:
a processor configured to:
receive an identifier for an authentication provider; and
automatically configure a website to use the authentication provider for logging into the website; and
a memory coupled to the processor and configured to provide the processor with instructions.
2. The system of claim 1, wherein the processor is further configured to:
configure the authentication provider.
3. The system of claim 1, wherein the identifier comprises at least one of an ID and a secret associated with the authentication provider.
4. The system of claim 1, wherein configuring the website includes associating a portion of the website to use the authentication provider for logging into the website.
5. The system of claim 1, wherein the processor is further configured to:
generate a service configuration associated with the authentication provider.
6. The system of claim 1, wherein the processor is further configured to:
generate a client context associated with a user of the website.
7. The system of claim 1, wherein the processor is further configured to:
establish one or more user groups.
8. The system of claim 1, wherein the processor is further configured to:
access resources associated with the authentication provider for which authorization has been granted.
9. A method, comprising:
receiving an identifier for an authentication provider; and
automatically configuring a website to use the authentication provider for logging into the website.
10. The method of claim 9, further comprising configuring the authentication provider.
11. The method of claim 9, wherein the identifier comprises at least one of an ID and a secret associated with the authentication provider.
12. The method of claim 9, wherein configuring the website includes associating a portion of the website to use the authentication provider for logging into the website.
13. The method of claim 9, further comprising generating a service configuration associated with the authentication provider.
14. The method of claim 9, further comprising generating a client context associated with a user of the website.
15. The method of claim 9, further comprising establishing one or more user groups.
16. The method of claim 9, further comprising accessing resources associated with the authentication provider for which authorization has been granted.
17. A computer program product, the computer program product being embodied in a tangible computer readable storage medium and comprising computer instructions for:
receiving an identifier for an authentication provider; and
automatically configuring a website to use the authentication provider for logging into the website.
18. The computer program product recited in claim 17, further comprising computer instructions for:
configuring the authentication provider.
19. The computer program product recited in claim 17, wherein the identifier comprises at least one of an ID and a secret associated with the authentication provider.
20. The computer program product recited in claim 17, wherein configuring the website includes associating a portion of the website to use the authentication provider for logging into the website.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method for fabricating a plurality of devices on a die, comprising:
patterning a first region to create at least a first gate having a first gate length and a first contacted polysilicon pitch (CPP) with a first process, the first CPP being smaller than a single pattern lithographic limit; and
patterning the first region to create a second gate having a second gate length or a second CPP with a second process, the second CPP being smaller than the single pattern lithographic limit, the second gate length being different than the first gate length.
2. The method of claim 1, in which the second CPP is different from the first CPP.
3. The method of claim 1, in which the first process is a self-aligned double patterning (SADP) process.
4. The method of claim 3, in which the second process is a litho-etch-litho-etch (LELE) process.
5. The method of claim 1, in which the first process is a first lithography process performed in a first region and the second process is a second lithography process performed in a second region.
6. The method of claim 1, in which the second process is a second lithography process performed in between gates formed by the first process.
7. The method of claim 1, in which the plurality of devices are integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, andor a fixed location data unit.
8. An apparatus, comprising:
at least one first gate length device having a first gate length and a first contacted polysilicon pitch (CPP) in a first region, the first CPP being smaller than a single pattern lithographic limit; and
at least one second gate length device in the first region having a second gate length or a second CPP, the second CPP being smaller than the single pattern lithographic limit, the second gate length being different than the first gate length.
9. The apparatus of claim 8, in which the second CPP is different from the first CPP.
10. The apparatus of claim 8, in which the at least one first gate length device has a more uniform critical dimension uniformity than the at least one second gate length device.
11. The apparatus of claim 8, in which the at least one second gate length device further comprises a third gate length device having a third gate length.
12. The apparatus of claim 8 integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, andor a fixed location data unit.
13. An apparatus, comprising:
first means for selectively conducting current having a first gate length and a first contacted polysilicon pitch (CPP) in a first region, the first CPP being smaller than a single pattern lithographic limit; and
second means for selectively conducting current having at least one second gate length device having a second gate length or a second CPP, the second CPP being smaller than the single pattern lithographic limit, the second gate length being different than the first gate length.
14. The apparatus of claim 13, in which the second CPP is different from the first CPP.
15. The apparatus of claim 13, in which the first means is created with a self-aligned double patterning (SADP) process.
16. The apparatus of claim 13, in which the second means is created with a litho-etch-litho-etch (LELE) process.
17. The apparatus of claim 13 integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, andor a fixed location data unit.
18. A method for fabricating a plurality of devices on a die, comprising:
the step of patterning a first region to create at least a first gate having a first gate length and a first contacted polysilicon pitch (CPP) with a first process, the first CPP being smaller than a single pattern lithographic limit; and
the step of patterning the first region to create a second gate having a second gate length or a second CPP with a second process, the second CPP being smaller than the single pattern lithographic limit, the second gate length being different than the first gate length.
19. The method of claim 18, in which the second CPP is different from the first CPP.
20. The method of claim 18, in which the plurality of devices are integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, andor a fixed location data unit.