What is claimed is:
1. An alignment mark configuration, which is applicable on a substrate comprising a plurality of layers, the alignment mark configuration comprising:
an alignment mark on the substrate, wherein the alignment mark comprises a plurality of recesses and a spacing between the neighboring recesses is d; and
a trench, wherein a spacing between the trench and the alignment mark is in a range between about 5d to 80d.
2. The alignment mark configuration according to claim 1, wherein the recesses include a plurality of trenches formed by a shallow trench isolation fabrication process.
3. The alignment mark configuration according to claim 1, wherein the trench includes a shallow trench isolation structure.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
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42. Radiolabeled astemizole of formula (III)
43. A process for preparing radiolabeled astemizole as in claim 42 comprising:
a) demethylating astemizole of formula (I) using a suitable reagent such as 48% aqueous hydrobromic acid:
b) reacting the intermediate of formula (II) as set forth above with 3H-methyliodide (CT3I) optionally in a reaction inert solvent and in the presence of a base to obtain said radiolabeled astemizole:
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