1. A thin-film capacitor comprising:
a base electrode;
two or more dielectric layers laminated on the base electrode; and
an electrode containing Ni as a principal component and laminated between the dielectric layers, wherein
the electrode has through holes that run in a lamination direction,
a surface area of at least some of the through holes is in a range of 0.19 \u03bcm2 to 7.0 \u03bcm2,
a ratio of the surface area of the through holes to a surface area of an entire main surface of the electrode in which the through holes are formed is in a range of 0.05% to 5%, and
the through holes are internally hollow and both ends of the through holes are covered with the dielectric layers.
2. The thin-film capacitor according to claim 1, wherein the surface areas of all the through holes are in the range of 0.19 \u03bcm2 to 7.0 \u03bcm2.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. Method for determining geometrical-optical aberrations up to and including 3rd order in particle-optical, probe-forming systems, in particular scanning electron microscopes, comprising an essentially punctiform source, which emits the particles, lenses for influencing the particle beam, an object, which is imaged by the particles, and a detector for registering the particles or imaging the object,
the object (3) being imaged by means of a particle beam focussed on the object (3), and the image (6) being recorded,
the process being repeated by means of an overfocussed and an overfocussed beam, which produce the images (6a) (overfocussed) and (6b) (underfocussed),
the images (6, 6a, 6b) being transformed in Fourier space,
the transformation of the overfocussed image (7a) being divided by that of the transformed focussed image (7), and the quotient (8) being obtained, and
the transformation of the underfocussed image (7b) being divided by that of the transformed focussed image (7) and the quotient (8a) being obtained, characterised in that
both quotients are reverse transformed and thereby the brightness profiles of the probes (5, 5a), that is to say of the images of the source in overfocus and underfocus, are determined,
the asymmetry (AS) of the profiles (9, 9a) with respect to the centre, the width (BR) of the profiles (9, 9a), in particular the half-value width, andor the curvature (KR) of the profiles (9, 9a) in the centre are determined,
the differences of the profiles (9, 9a) of the probes (5, 5a) with respect to these parameters are used to determine the image aberrations.
2. Method according to claim 1, characterised in that the Fourier transformation andor the reverse transformation is obtained by mathematical andor optical means, preferably by generating the diffraction pattern.
3. Method according to one of the preceding claims, characterised in that the particle beam is influenced with electrical andor magnetic multipoles.
4. Method according to one of the preceding claims, characterised in that the width of the defocussed image (5, 5a) of the source (1) is at least ten times greater than the width of the focussed image of the source (1) or of the source (1) itself.
5. Method according to one of the preceding claims, characterised in that, sections are taken at angular intervals, in particular every 15 degrees, through the probe profiles in overfocus and underfocus, and the aforementioned parameters are determined for each section.
6. Method according to claim 5, characterised in that, for determining the image aberration of the 2nd order axial coma, the mean values of the asymmetries (AS) of the sections through the probes in overfocus and underfocus in dependence on the section angles w are formed, and the magnitude and orientation of the one-fold components of these mean values are determined, preferably by Fourier analysis with respect to the section angle w.
7. Method according to claim 5, characterised in that, for determining the image aberration of the three-fold 2nd order astigmatism, the mean values of the asymmetries (AS) of the sections through the probes in overfocus and underfocus in dependence on the section angle w are formed, and the magnitude and orientation of these mean values are determined, preferably by Fourier analysis over the section angle w.
8. Method according to claim 5, characterised in that, for determining the defocussing, the difference between the widths (BR) of the sections through the probes in overfocus and underfocus in dependence on the section angle w is formed, and the magnitude of the zero-fold component of these differences are determined preferably by Fourier analysis over the section angle w.
9. Method according to claim 5, characterised in that, for determining the two-fold 1st order astigmatism, the difference between the widths (BR) of the sections through the probes in overfocus and underfocus in dependence on the section angle w is formed, and the magnitude of the two-fold component of this difference is determined, preferably by Fourier analysis over the section angle w.
10. Method according to claim 5, characterised in that, for determining the 3rd order spherical aberration, the difference between the curvature KR of the sections through the probes in overfocus and underfocus is formed in dependence on the section angle w and the magnitude of the zero-fold component of these differences is determined, preferably by Fourier analysis over the section angle w.
11. Method according to claim 5, characterised in that, for determining the 3rd order stellar aberration, the difference between the curvature KR of the sections through the probes in overfocus and underfocus is formed in dependence on the section angle w, and the magnitude of the two-fold component of these difference is determined, preferably by Fourier analysis over the section angle w.
12. Method according to claim 5, characterised in that, for determining the four-fold 3rd order astigmatism, the difference between the curvature KR of the sections through the probes in overfocus and underfocus in dependence on the section angles w is formed, and the magnitude of the two-fold component of these difference is determined, preferably by Fourier analysis over the section angle w.
13. Method according to claim 10, characterised in that, for determining the 3rd order spherical aberration, instead of the difference in curvature (KR), the difference of a linear combination of curvature (KR) and width (BR) is used in the form
*BR*KR
and being determined empirically and representing the respective mean value with respect to the section angle w.