1. Apparatus comprising at least one physical computer-readable storage medium having stored thereon computer-executable instructions that, when loaded into at least one hardware processor and executed, transform the hardware processor to perform the following:
present a control portion of a user interface on a fixed-size display device;
present a display portion of the user interface on the display device;
present a movable slider on the display device, so that the slider separates the control portion from the display portion;
display a representation of at least one icon in the control portion of the user interface;
receive an indication that the slider has moved on the display screen; and
adjust relative proportions of the control and display areas in response to the indication.
2. The apparatus of claim 1, wherein the instructions to receive an indication include instructions to transform the hardware processor to receive an indication that a user has directly manipulated the slider.
3. The apparatus of claim 1, further comprising instructions to transform the hardware processor to receive a further indication that the user is activated the icon, and wherein the instructions to receive the indication include instructions to transform the hardware processor to receive an indication that the slider has moved in response to activation of the icon.
4. The apparatus of claim 1, further comprising instructions to transform the hardware processor to alter the control portion, in response to the indication to present at least one further icon.
5. The apparatus of claim 4, wherein the further icon is associated with a function provided by an application or utility.
6. The apparatus of claim 1, wherein the instructions to display a representation of at least one icon include instructions to transform the hardware processor to display at least one icon associated with an application or utility.
7. The apparatus of claim 1, wherein the instructions to display a representation of at least one icon include instructions to transform the hardware processor to display a representation of a keypad, and wherein the instructions to present a display portion include instructions to transform the hardware processor to display alphanumeric text entered via the keypad.
8. The apparatus of claim 7, further comprising instructions to transform the hardware processor to display a first configuration of the keypad when the slider is in a first position relative to the display device, and to display at least a second configuration of the keypad when the slider is in at least a second position relative to the display device.
9. The apparatus of claim 1, further comprising instructions to transform the hardware processor two alter a configuration of a keypad as presented on the split device, in response to detecting that a user has issued at least one explicit command to move the slider.
10. A display device comprising:
a fixed-size hardware display screen operable to provide an input control portion responsive to user input to receive commands from the user, and operable to provide an output display portion for presenting output to the user in response to the commands; and
a separator movable along the display screen, wherein the separator divides the input control portion from the output display portion, and wherein the input control portion and the output display portion are resized relative to one another in response to movement of the separator.
11. The display device of claim 10, wherein the separator is controllable in response to a software-implemented mechanism.
12. The display device of claim 10, wherein the separator is controllable in response to a hardware-implemented mechanism.
13. The display device of claim 10, wherein the separator is responsive to user actions to slide relative to the display screen, and wherein the output control portion is operative to present different sets of icons in response to movement of the separator.
14. The display device of claim 10, wherein the separator is operative to slide relative to the display screen in response to a user activating at least one icon presented in the input control portion.
15. A computer-based device comprising:
at least one instance of processing hardware;
at least one instance of display hardware;
at least one bus system coupled to communicate with the processing hardware and the display hardware; and
at least one computer-readable storage medium coupled to communicate with the processing hardware via the bus system, wherein the storage medium is encoded with computer-executable instructions that, when loaded into the processing hardware, transform the processing hardware to present a user interface on the display hardware, wherein the user interface is divided into an output display portion and an input control portion that are separated by a movable separator, wherein the user interface is responsive to re-positioning of the separator to resize the output display portion and the input control portion, wherein the user interface includes at least one icon presented in the input control portion, and wherein the user interface is responsive to activation of the icon to present content in the output display portion.
16. The device of claim 15, wherein the input control portion is operative to present at least one further icon in the input control portion in response to the user repositioning the separator.
17. The device of claim 16, wherein the icon represents an application or utility installed on the device, and wherein the further icon represents a function of associated with the application or utility.
18. The device of claim 16, wherein the icon represents at least a portion of one configuration of a keypad, and wherein the further icon represents at least a portion of a further configuration of the keypad.
19. The device of claim 15, wherein the icon represents a keypad presented in the input control portion, and wherein the output display portion is operative to display alphanumeric data entered by the user through the keypad.
20. The device of claim 15, wherein the input control portion is operative to present a plurality of icons that represent respectively a plurality of applications installed on the device, and wherein at least one of the icons is responsive to user activation to present a further plurality of icons associated with one of the applications associated with the activated icon.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A substrate table assembly for an immersion lithography apparatus, the substrate table assembly comprising:
a substrate table to support a substrate; and
a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K,
wherein the substrate table comprises a supply port to supply the gas from the gas handling system to the region between the substrate and the substrate table, and an extraction port to extract fluid from the region, the extraction port comprising a peripheral extraction port configured to provide a laterally inward flow of ambient gas, immersion fluid, or both, from a region adjacent to the periphery of the substrate and configured to extract at least some of the gas at a same time as providing the inward flow, wherein the substrate table is configured to provide an open flowpath underneath the substrate when provided on the substrate table, that connects the supply port and the peripheral extraction port and configured to allow the gas from the supply port to cover a majority of the bottom surface of the substrate when provided on the substrate table.
2. The substrate table assembly according to claim 1, wherein the supply and extraction ports are configured to provide a laterally outward flow of the gas provided by the gas handling system in a region directly adjacent to the peripheral extraction port.
3. The substrate table assembly according to claim 2, further comprising a peripheral flow restricting structure in the form of a closed path to restrict flow of fluid between a laterally inner and a laterally outer portion of the region between the substrate and the substrate table, relative to a center of the substrate andor substrate table.
4. The substrate table assembly according to claim 3, wherein the peripheral flow restricting structure comprises an inner peripheral flow restricting structure and an outer peripheral flow restricting structure, the inner peripheral flow restricting structure being surrounded by the outer peripheral flow restricting structure.
5. The substrate table assembly according to claim 4, wherein the peripheral extraction port is located between the inner and outer peripheral flow restricting structures.
6. The substrate table assembly according to claim 5, further comprising an intermediate peripheral flow restricting structure between the inner and outer peripheral flow restricting structures.
7. The substrate table assembly according to claim 6, wherein the peripheral extraction port is located within at least two of the regions between adjacent peripheral flow restricting structures.
8. The substrate table assembly according to claim 1, further comprising a buffer gas supply port configured to supply buffer gas to the region between the substrate table and a substrate mounted on the substrate table.
9. The substrate table assembly according to claim 1, wherein the gas handling system comprises a continuous flow system to provide a continuous flow of the gas having a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K at a substantially constant pressure, the pressure being lower than atmospheric pressure.
10. A substrate table assembly for an immersion lithography apparatus, the substrate table assembly comprising:
a substrate table to support a substrate; and
a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K,
wherein the substrate table comprises a supply port to supply the gas from the gas handling system to the region between the substrate and the substrate table, and an extraction port to extract fluid from the region, the extraction port comprising a peripheral extraction port configured to provide a laterally inward flow of ambient gas, immersion fluid, or both, from a region adjacent to the periphery of the substrate and configured to extract at least some of the gas at a same time as providing the inward flow, wherein the substrate table is configured to provide an open flowpath underneath the substrate when provided on the substrate table, that connects the supply port and the peripheral extraction port and configured to allow the gas from the supply port to cover a majority of the bottom surface of the substrate when provided on the substrate table, and
wherein the substrate table comprises a through-hole having an opening into the region between the substrate and the substrate table.
11. The substrate table assembly according to claim 10, further comprising a through-hole flow restricting structure surrounding the opening of the through-hole.
12. The substrate table assembly according to claim 10, further comprising a through-hole extraction port to extract fluid from the region adjacent to the opening of the through-hole.
13. The substrate table assembly according to claim 12, wherein the through-hole flow restricting structure comprises an inner through-hole flow restricting structure and an outer through-hole flow restricting structure, both surrounding the opening of the through-hole, the through-hole extraction port being located between the inner and outer through-hole flow restricting structures.
14. The substrate table assembly according to claim 13, further comprising an intermediate through-hole flow restricting structure between the inner and outer through-hole flow restricting structures.
15. The substrate table assembly according to claim 14, wherein the through-hole extraction port is located within at least two of the regions between adjacent though-hole flow restricting structures.
16. The substrate table assembly according to claim 10, further configured to supply a flow of buffer gas towards the substrate through the through-hole.
17. The substrate table assembly according to claim 10, wherein the substrate table comprises a through-hole supply port to supply the gas having a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K to the through-hole such that in at least a portion of the through-hole a gas flow away from the substrate is established.
18. The substrate table assembly according to claim 10, wherein the through-hole is configured to provide access to a pin for use during mounting or unmounting of the substrate from the substrate table or to a pin for alignment of the substrate table relative to a mounting block for the substrate table.
19. A device manufacturing method, comprising:
projecting a patterned beam of radiation through an immersion liquid confined to a space between a projection system and a substrate;
providing gas to a region between the substrate and a substrate table using a supply port, wherein the gas has a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K;
providing a laterally inward flow of ambient gas, immersion liquid, or both, from a region adjacent to the periphery of the substrate using a peripheral extraction port; and
extracting at least some of the gas using the peripheral extraction port at a same time as providing the inward flow, wherein there is an open flowpath underneath the substrate that connects the supply port and the peripheral extraction port and wherein the gas from the supply port covers a majority of the bottom surface of the substrate.
20. A device manufacturing method, comprising:
projecting a patterned beam of radiation through an immersion liquid confined to a space between a projection system and a substrate;
providing gas to a region between the substrate and a substrate table using a supply port, wherein the gas has a thermal conductivity greater than or equal to 100 mW(m\xb7K) at 298 K;
providing a laterally inward flow of ambient gas, immersion liquid, or both, from a region adjacent to the periphery of the substrate using a peripheral extraction port; and
extracting at least some of the gas using the peripheral extraction port at a same time as providing the inward flow, wherein there is an open flowpath underneath the substrate that connects the supply port and the peripheral extraction port and wherein the gas from the supply port covers a majority of the bottom surface of the substrate,
wherein the substrate table comprises a through-hole having an opening into the region between the substrate and the substrate table.