1.-35. (canceled)
36. A pharmaceutical composition for treating a Ras-mediated neoplasm in a mammal, comprising:
(i) a pharmaceutically effective amount of approximately 103 to 104 plaque forming units of a mammalian reovirus or 1010 to 1012 plaque forming units of a mammalian reovirus; and
(ii) a physiologically acceptable carrier.
37. The pharmaceutical composition of claim 36, wherein the mammalian reovirus is selected from the group consisting of type 1 reovirus, type 2 reovirus and type 3 reovirus.
38. The pharmaceutical composition of claim 36, wherein the mammalian reovirus is a Dearing strain reovirus.
39. The pharmaceutical composition of claim 36, wherein the mammalian reovirus is a human reovirus.
40. The pharmaceutical composition of claim 36, wherein the pharmaceutically effective amount is approximately 1010 to 1012 plaque forming units of the mammalian reovirus.
41. The pharmaceutical composition of claim 40, wherein the mammalian reovirus is a Dearing strain reovirus.
42. The pharmaceutical composition of claim 40, wherein the mammalian reovirus is a human reovirus.
43. A pharmaceutical composition for treating a Ras-mediated neoplasm in a mammal, comprising:
(i) a pharmaceutically effective amount of a chemically or biochemically pre-treated mammalian reovirus; and
(ii) a physiologically acceptable carrier.
44. The pharmaceutical composition of claim 43, wherein the pharmaceutically effective amount is approximately 103 to 1012 plaque forming units of the mammalian reovirus.
45. The pharmaceutical composition of claim 43, wherein the mammalian reovirus is selected from the group consisting of type 1 reovirus, type 2 reovirus and type 3 reovirus.
46. The pharmaceutical composition of claim 43, wherein the mammalian reovirus is a Dearing strain reovirus.
47. The pharmaceutical composition of claim 43, wherein the mammalian reovirus is a human reovirus.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A lithographic apparatus comprising:
an illumination system constructed to provide a beam of radiation;
a support structure constructed to support a patterning device, said patterning device serving to impart a cross-section of said beam of radiation with a pattern to form a patterned beam;
a substrate table for holding a substrate;
a vacuum chamber provided with a first gas evacuator to generate a vacuum beam path for said beam of radiation;
a projection system that projects said patterned beam onto a target portion of said substrate;
a first conduit inside said vacuum chamber;
a first conduit shield inside said vacuum chamber, providing a first conduit path for at least a part of said first conduit, and shielding said vacuum chamber from said first conduit path;
a first gas passage through said first conduit shield;
a separate gas evacuation feedthrough through a wall of said vacuum chamber; and
a gas evacuation shield extending at least between said first gas passage and said separate gas evacuation feedthrough, providing a gas evacuation path from said first conduit path into an area outside said vacuum chamber, and shielding said vacuum chamber from said first gas evacuation path.
2. A lithographic apparatus according to claim 1, further comprising:
a first conduit feedthrough through said wall of said vacuum chamber, and wherein said first conduit shield is spaced from said first conduit feedthrough.
3. A lithographic apparatus according to claim 1, wherein
said first gas evacuator is coupled to said first gas evacuation shield.
4. A lithographic apparatus according to claim 1, further comprising:
a second gas evacuator coupled to said first gas evacuation shield.
5. A lithographic apparatus according to claim 1, further comprising:
a second conduit inside said vacuum chamber;
a second conduit shield inside said vacuum chamber, providing a second conduit path for at least a part of said second conduit, and shielding said vacuum chamber from said second conduit path;
a second gas passage through said second conduit shield;
wherein said first gas evacuation shield furthermore extends between said second gas passage and said separate gas evacuation feedthrough, and furthermore provides a second gas evacuation path from said second conduit path into an area outside said vacuum chamber, and furthermore shields said vacuum chamber from said second gas evacuation path.
6. A lithographic apparatus according to claim 1, wherein
said first conduit shield includes a branched conduit shield, providing a branched conduit path, and shielding said vacuum chamber from said branched conduit path.
7. A method of manufacturing a device, comprising:
providing a substrate;
providing a beam of radiation;
providing a vacuum to a vacuum chamber;
effecting communication between a conduit extending within a conduit path and a component inside the vacuum chamber;
shielding the vacuum chamber from the conduit path for at least a part of the conduit;
imparting a cross-sectional pattern to the beam of radiation and forming a patterned beam;
projecting the patterned beam of radiation onto a target portion of the substrate;
evacuating gas from the conduit path to an area outside the vacuum chamber; and
shielding the vacuum chamber from the gas being evacuated from the conduit path.
8. A lithographic apparatus comprising:
means for providing a beam of radiation;
means for imparting a pattern to a cross-section of said beam of radiation to form a patterned beam of radiation;
a substrate table for holding a substrate;
means for generating a vacuum beam path for said beam of radiation within a vacuum chamber;
means for projecting said patterned beam onto a target portion of said substrate;
a conduit inside said vacuum chamber;
a first conduit path for at least a part of said first conduit;
means for shielding said vacuum chamber from said first conduit path;
means for providing a gas evacuation path from said first conduit path into an area outside said vacuum chamber, and shielding said vacuum chamber from said first gas evacuation path.
9. A lithographic apparatus comprising:
a vacuum chamber provided with a first gas evacuator to generate a vacuum beam path for a beam of radiation;
a first conduit inside said vacuum chamber;
a first conduit shield inside said vacuum chamber, providing a first conduit path for at least a part of said first conduit, and shielding said vacuum chamber from said first conduit path;
a first gas passage through said first conduit shield;
a separate gas evacuation feedthrough through a wall of said vacuum chamber; and
a gas evacuation shield extending at least between said first gas passage and said separate gas evacuation feedthrough, providing a gas evacuation path from said first conduit path into an area outside said vacuum chamber, and shielding said vacuum chamber from said first gas evacuation path.
10. A method of manufacturing a device, comprising:
providing a vacuum to a vacuum chamber;
projecting a patterned beam of radiation onto a target portion of a substrate within the vacuum chamber;
effecting communication between a conduit extending within a conduit path and a component inside the vacuum chamber;
shielding the vacuum chamber from the conduit path for at least a part of the conduit;
evacuating gas from the conduit path to an area outside the vacuum chamber; and
shielding the vacuum chamber from the gas being evacuated from the conduit path.