1. A system that simplifies the creation of user-defined custom elements for use in a graphical modeling application comprising:
a graphical modeling application configured to graphically facilitate a creation of a semantic model utilizing a plurality of static graphical elements and a plurality of semantic data elements; and
a custom element definition tool configured to facilitate a creation of a user-defined custom element within the graphical modeling application, wherein the user-defined custom element comprises at least one of at least one static graphical element and at least one semantic data element.
2. The system of claim 1, wherein the custom element definition tool generates at least one custom element definition file during the creation of the user-defined custom element, wherein the at least one custom element definition file is stored in a storage location local to and accessible by the graphical modeling application.
3. The system of claim 2, wherein, after a transference of the at least one custom element definition file from an originating device to a secondary device, the user-defined custom element is usable by an instance of the graphical modeling application operating on the secondary device.
4. The system of claim 2, wherein a deletion of the user-defined custom element within the graphical modeling application deletes the at least one custom element definition file.
5. The system of claim 2, wherein, when the user-defined custom element is defined by a plurality of custom element definition files, the plurality of custom element definition files comprises at least one of a template file containing references to the at least one static graphical element contained in the user-defined custom element and a display file.
6. The system of claim 1, wherein the at least one semantic data element comprises at least one of a relationship type of the at least one static graphical element, a requirement of the at least one static graphical element, a metadata value of the at least one static graphical element, and a property of the at least one static graphical element, and, wherein the at least one semantic data element represents a complex relationship between at least two static graphical elements.
7. The system of claim 1, wherein the user-defined custom element created by the custom element definition tool is accessible within a user interface of the graphical modeling application.
8. The system of claim 1, wherein the user-defined custom element defines a static graphical element absent from the plurality of static graphical elements available in the graphical modeling application.
9. A method for simplifying the creation of user-defined custom elements for use in a graphical modeling application comprising:
capturing compositional data and semantic data related to at least one user-selected static graphical element of a semantic model within a graphical modeling application;
storing the captured compositional data and semantic data as a user-defined custom element within at least one custom element definition file in a user-specified location, wherein the user-specified location is local to and accessible by the graphical modeling application; and
automatically registering the user-defined custom element with the graphical modeling application, wherein the user-defined custom element is made accessible from within the graphical modeling application.
10. The method of claim 9, wherein the capturing step further comprises:
receiving a plurality of user-configurable data items that identify the user-defined custom element.
11. The method of claim 10, wherein the plurality of user-configurable data items comprise at least one of an identifier for the user-defined custom element, a textual description of the user-defined custom element, an icon to graphically represent the user-defined custom element, and a storage location for the user-defined custom element.
12. The method of claim 9, wherein the semantic data comprises at least one of a relationship type of the at least one static graphical element, a requirement of the at least one static graphical element, a metadata value of the at least one static graphical element, and a property of the at least one static graphical element.
13. The method of claim 9, wherein, when the user-defined custom element is stored as a plurality of custom element definition files, the plurality of custom element definition files comprises at least one of a template file containing the captured compositional and semantic data and a display file.
14. The method of claim 9, wherein the registering step utilizes an application programming interface (API) of the graphical modeling application.
15. The method of claim 9, wherein said steps of claim 9 are performed by at least one machine in accordance with at least one computer program stored in a computer readable media, said computer programming having a plurality of code sections that are executable by the at least one machine.
16. A method for sharing user-defined custom elements for use in a graphical modeling application comprising:
creating a user-defined custom element using a custom element definition tool within a graphical modeling interface, wherein the user-defined custom element comprises at least one of at least one static graphical element and at least one semantic data element, and, wherein the user-defined custom element is contained within at least one custom element definition file; and
distributing a copy of the at least one custom element definition file to a plurality of users of the graphical modeling application.
17. The method of claim 16, wherein the distributing step further comprises:
storing the copy of the at least one custom element definition file within a version control system (VCS).
18. The method of claim 17, wherein a listening mechanism associated with the VCS synchronizes the stored copy of the at least one custom element definition file with the copy provided to the plurality of users.
19. The method of claim 16, wherein, when the user-defined custom element is stored as a plurality of custom element definition files, the plurality of custom element definition files comprises at least one of a template file and a display file.
20. The method of claim 16, further comprising:
storing the provided copy of the at least one custom element definition file at a specified path within a local data store; and
the plurality of users independently accessing the user-defined custom element within the graphical modeling application.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A method of forming an isolation film in a semiconductor device comprising:
sequentially forming a pad oxide film and a pad nitride film on a semiconductor substrate;
removing the pad nitride film and the pad oxide film in an isolation region so that tapered, inwardly extending protrusions of a tail profile are formed from the pad nitride and pad oxide films at top corners of the isolation region;
etching the semiconductor substrate in the isolation region, while using the protrusions of the pad nitride and pad oxide films as an anti-etch film, to form a trench the top corners of which are made rounded; and
filling the trench with an insulating material and then removing remaining portions of the pad nitride film and the pad oxide film on the semiconductor substrate to form an isolation film.
2. The method as claimed in claim 1, wherein the protrusions are formed by implementing an over-etch process using a CHF3 gas during 1\u02dc10% of time taken to remove the pad nitride film after the pad nitride film in the isolation region is removed.
3. The method as claimed in claim 1, wherein the protrusions are formed by implementing an etch process with a high selectivity ratio to oxide in the etch process for removing the pad nitride film and the pad oxide film.
4. The method as claimed in claim 3, wherein the etch process is implemented using a CF4 gas and a CHF3 gas as an etch gas and wherein the CHF3 gas is more supplied than the CF4 gas so that the selectivity ratio to oxide is increased.
5. The method as claimed in claim 4, wherein the supply ratio of the CHF3 gas and the CF4 gas is 2:1\u02dc10:1.
6. The method as claimed in claim 3, wherein the etch process is implementing by setting a time point when an oxide component of the pad oxide film is detected as an end of point (EOP).
7. The method as claimed in claim 1, wherein a photoresist pattern is formed on the pad nitride film in order to define the isolation region, and wherein the photoresist pattern is removed before the trench is formed after the pad nitride film and the pad oxide film on the isolation region are removed, so that polymer occurring from the photoresist is prevented to affect an etch process for forming the trench.
8. The method as claimed in claim 1, wherein the etch process for forming the trench is implemented in-situ with no time delay at the etch chamber by which the pad nitride film and the pad oxide film are removed, in order to prevent a native oxide film from being formed on the semiconductor substrate of the isolation region.
9. The method as claimed in claim 1, wherein the etch process for forming the trench includes the steps of:
performing a first etch process for the semiconductor substrate only with a process condition having a high selectivity ratio to the protrusions to form the trench the top corners of which are not made rounded; and
performing a second etch process, using a post etch treatment (PET) with a process condition having a low selectivity ratio to the protrusions, to form etch tilt faces at the top corners of the trench while removing the protrusions, thereby forming the trench that is made rounded.
10. The method as claimed in claim 9, wherein the etch selectivity ratio to the protrusions and the semiconductor substrate is controlled by adjusting the flux of an HBr gas among etch gases.
11. The method as claimed in claim 9, wherein in the first etch process, the semiconductor substrate only is etched by increasing the flux of the HBr gas and in the second etch process, the top corners of the trench along with the protrusions are etched by relatively reducing the flux of the HBr gas.