1. A method of shaping a material layer, comprising:
(a) oxidizing a surface of a material layer to form an oxide layer at an initial rate;
(b) terminating formation of the oxide layer when the oxidation rate is about 90% or below of the initial rate;
(c) removing at least some of the oxide layer by an etching process; and
(d) repeating (a) through (c) until the material layer is formed to a desired shape.
2. The method of claim 1, wherein terminating formation of the oxide layer further comprises:
terminating formation of the oxide layer when the oxidation rate is between about 0% to about 90% of the initial rate.
3. The method of claim 1, wherein the material layer comprises polysilicon, silicon, or a metal.
4. The method of claim 1, wherein oxidizing the material layer to form the oxide layer is performed by at least one of wet or dry rapid thermal oxidation, radical oxidation, plasma oxidation, wet or dry chemical oxidation, or photochemical oxidation, and wherein the etch process comprises at least one of wet or dry chemical etch, reactive ion etch, or plasma etch.
5. (canceled)
6. The method of claim 1, further comprising:
providing a substrate having a tunnel oxide layer, the material layer disposed above the tunnel oxide layer, and a shallow trench isolation region disposed adjacent to the tunnel oxide layer.
7. The method of claim 6, wherein the material layer is a floating gate formed into the desired shape having a first width proximate a base of the floating gate that is greater than a second width proximate a top of the floating gate.
8. The method of claim 7, wherein a width of the floating gate decreases non-linearly from the first width to the second width.
9. The method of claim 7, wherein the tunnel oxide layer thickens between about 0 to about 2 nanometers during (a) through (d).
10. The method of claim 6, wherein the shallow trench isolation region is further disposed adjacent to the material layer.
11. The method of claim 10, wherein the material layer is a floating gate formed into the desired shape having a first width proximate a base of the floating gate that is substantially equivalent to a second width proximate a top of the floating gate.
12. The method of claim 11, wherein a height of the floating gate is between about 1 to about 10 nanometers.
13. The method of claim 11, wherein the top of the floating gate and a top of the shallow trench isolation region are substantially planar.
14. The method of claim 13, further comprising:
depositing an inter-poly dielectric layer atop the floating gate and the shallow trench isolation region; and
depositing a conductive layer atop the inter-poly dielectric layer.
15. The method of claim 1, further comprising:
providing a substrate having the material layer disposed thereon and having a mask layer disposed atop an upper surface of the material layer.
16. The method of claim 15, wherein the mask layer comprises at least one of an oxide layer, a nitride layer, a silicide layer, or a silicate layer.
17. The method of claim 15, wherein the material layer is formed into the desired shape having a first width proximate a base of the desired shape that is substantially equivalent to a second width proximate a top of the desired shape.
18. The method of claim 17, wherein the desired shape has an aspect ratio of between about 0.5 to about 20 nanometers.
19. The method of claim 17, wherein the first and second width of the desired shape is between about 1 to about 30 nanometers.
20. The method of claim 17, wherein a height of the desired shape is between about 1 to about 30 nanometers.
21. The method of claim 17, further comprising at least one of oxidizing or removing an exposed portion of the substrate during (a) through (d).
22. The method of claim 21, wherein the substrate further comprises a raised portion having the material layer disposed thereon after (a) through (d).
23. The method of claim 22, wherein the raised portion has a width proximate the first and second width of the desired shape of the material layer.
24. The method of claim 17, wherein the substrate comprises at least one of a silicon-containing layer, an oxygen-containing layer, or a non-silicon containing layer.
25. The method of claim 24, wherein the material layer comprises silicon.
26. The method of claim 1, wherein removing at least some of the oxide layer by an etching process further comprises:
terminating the etch process when the etch rate is about 90% or below of an initial etch rate.
27-57. (canceled)
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1-17. cancelled.
18. A bag for a breast pump comprising:
a plurality of walls;
a first closure, said plurality of walls and said first closure being operably connected to each other to form a first compartment; and
a second closure operably connected to at least one of said plurality of walls, wherein said second closure is a flap having an inside surface, said flap being pivotally connected to said at least one of said plurality of walls, wherein said inside surface of said flap has a holding structure thereon for removably holding the breast pump on said flap.
19. The bag of claim 18, wherein one of said plurality of walls is a rear wall, said rear wall being disposed opposite to said second closure, and wherein said holding structure remains separated from said rear wall when said flap is pivoted into a closed position.
20. The bag of claim 19, wherein another one of said plurality of walls is a front wall having a bottom portion and another of said plurality of walls is a bottom wall, wherein said flap is pivotally connected to said bottom portion of said front wall so that said flap opens into a first position that is substantially adjacent to said bottom wall and substantially parallel with said bottom wall, and wherein said holding structure retains said breast pump on said flap so that said breast pump is in an upright orientation when said flap is in said first position.
21. The bag of claim 19, wherein said holding structure is substantially transparent.
22. The bag of claim 19, wherein said holding structure is a mesh netting that is secured to said inside surface of said flap to form a pocket.
23. The bag of claim 22, wherein said mesh netting covers about half of said inside surface of said flap.
24. The bag of claim 19, wherein said second closure is a zipper.
25. The bag of claim 19, wherein another one of said plurality of walls is a front wall, wherein said second closure is a flap pivotally connected to said front wall, and wherein said front wall and said flap are substantially disposed in a common planar section.
26. The bag of claim 19, wherein said holding structure is a hook and loop fastener.
27. A bag system for a breast pump system having a breast pump, one or more breast cups and one or more bottles, the bag system comprising:
an inner bag; and
an outer bag having:
a plurality of walls;
a first closure, said plurality of walls and said first closure being operably connected to form a first compartment; and
a second closure operably connected to at least one of said plurality of walls, wherein said second closure is a flap having an inside surface, said flap being pivotally connected to said at least one of said plurality of walls, wherein said inside surface of said flap has a holding structure thereon for removably holding said breast pump on said flap and wherein said inner bag has a volume with a size and shape for holding at least one of said one or more breast cups or said one or more bottles.
28. The bag system of claim 27, wherein one of said plurality of walls is a rear wall, said rear wall being opposite to said second closure, and wherein said holding structure remains separated from said rear wall when said flap is pivoted into a closed position.
29. The bag system of claim 27, wherein another one of said plurality of walls is a front wall having a bottom portion and another of said plurality of walls is a bottom wall, wherein said flap is pivotally connected to said bottom portion of said front wall so that said flap opens into a first position that is substantially adjacent to said bottom wall and substantially parallel with said bottom wall, and wherein said holding structure retains said breast pump on said flap so that said breast pump is in an upright orientation when said flap is in said first position.
30. The bag system of claim 27, wherein said holding structure is substantially transparent.
31. The bag system of claim 27, wherein said holding structure is a mesh netting that is secured to said inside surface of said flap to form a pocket.
32. The bag system of claim 27, wherein said holding structure is a hook and loop fastener.
33. The bag system of claim 27, wherein said at least one of said plurality of walls is a front wall, wherein said second closure is a flap pivotally connected to said front wall, and wherein said front wall and said flap are substantially disposed in a common planar section.
34. The bag system of claim 27, wherein said inner bag is a plurality of inner bags, and wherein at least one of said plurality of inner bags is thermally insulated.
35. The bag system of claim 27, wherein said first compartment has an inner surface with a fastening member thereon, said fastening member being removably securable to said inner bag to selectively retain said inner bag in said first compartment.
36. The bag system of claim 27, wherein said first compartment has an inner surface with a housing member disposed thereon, said housing member being a mesh netting that is secured to said inner surface to form a pocket.
37. A bag system for a breast pump system having a breast pump, a breast cup and a bottle, the bag system comprising:
an inner bag having a size and shape to allow for storage of said breast cup or said bottle; and
an outer bag having:
a plurality of walls;
a first closure, said plurality of walls and said first closure being operably connected to form a first compartment; and
a second closure operably connected to at least one of said plurality of walls to form a second compartment, wherein said second closure is connected to at least one of said plurality of walls so that said second closure opens into a first position, and wherein said breast pump is in an upright orientation when said second closure is in said first position.