1. A method for planarization of a wafer having a surface layer with a recess, comprising:
forming an etching-resist layer over the surface layer, a thickness of the etching-resist layer in the recess being larger than that outside the recess;
etching the etching-resist layer and the surface layer; wherein, an etching speed of the surface layer is higher than that of the etching-resist layer, so that the surface layer outside the recess will not be higher than the bottom of recess;
removing the etching-resist layer in the recess.
2. The method according to claim 1, wherein the etching-resist layer is a photoresist layer.
3. The method according to claim 2, wherein the method further comprises a process of patterning the etching-resist layer after the etching-resist layer is formed on the surface layer and before the etching-resist layer and the surface layer are etched, so as to remove the etching-resist layer outside the recess.
4. The method according to claim 1, wherein the etching-resist layer is a Bottom Anti-Reflection Coat layer.
5. The method according to claim 1, wherein the etching-resist layer is formed by a spin-coating process.
6. The method according to claim 1, wherein the surface layer is made of one selected from a group consisting of silicon oxide, silicon nitride and aluminum.
7. The method according to claims 6, wherein the etching-resist layer and the surface layer are etched by a dry etching process.
8. The method according to claim 6, wherein a main etching gas for etching the etching-resist layer and the surface layer comprises at least one of CxFy and CHxFy, wherein 1\u2266X\u22669, 1\u2266Y\u22669, in the case that the surface layer is a silicon oxide or a silicon nitride layer.
9. The method according to claims 6, wherein the etching gas for etching the etching-resist layer and the surface layer comprises an etching gas containing halogen family elements, in the case that the surface layer is an aluminum layer.
10. The method according to claim 1, wherein the etching-resist layer is removed by an ashing process.
11. A method for planarization of a top metal layer on which an insulating oxide layer having a recess is formed, comprising:
forming an etching-resist layer over the insulating oxide layer to fill the recess, the thickness of the etching-resist layer in the recess being larger than that outside the recess;
etching the etching-resist layer and the insulating oxide layer, wherein, the etching speed of the insulating oxide layer is higher than that of the etching-resist layer, so that the insulating oxide layer outside the recess is not higher than the bottom of the recess;
removing the etching-resist layer in the recess; and
etching the insulating oxide layer till the top metal layer is exposed completely.
12. The method according to claim 11, wherein the etching-resist layer is a photoresist layer.
13. The method according to claim 12, wherein the method further comprises a process of patterning the etching-resist layer after the etching-resist layer is formed on the insulating oxide layer and before the etching-resist layer and the insulating oxide layer are etched, so as to remove the etching-resist layer outside the recess.
14. The method according to claim 11, wherein the etching-resist layer is a Bottom Anti-Reflection Coat layer.
15. The method according to claim 11, wherein the etching-resist layer is formed by a spin-coating process.
16. The method according to claim 11, wherein the top metal layer is an aluminum layer.
17. The method according to claim 11, wherein the insulating oxide layer is made of one selected from a group consisting of silicon oxide, oxynitride, tetraethyl orthosilicate, or oxide-nitride-oxide.
18. The method according to claim 17, wherein the main etching gas for etching the etching-resist layer and the insulating oxide layer comprises at least one of CxFy and CHxFy, wherein 1\u2266X\u22669, 1\u2266Y\u22669.
19. The method according to claim 11, wherein the insulating oxide layer is etched till the top metal layer is completely exposed by a dry etching process.
20. The method according to claim 11, wherein the etching-resist layer is removed by an ashing process.
21. A method of isolating a top metal layer for a wafer having an Inter-Layer Dielectric layer and the top metal layer on the Inter-Layer Dielectric layer, comprising:
etching the top metal layer and the Inter-Layer Dielectric layer to a predetermined depth, so as to form a trench in the top metal layer and the Inter-Layer Dielectric layer;
forming an insulating oxide layer over the top metal layer and the trench to fill the trench, the insulating oxide layer having a recess at a position corresponding to the trench;
forming an etching-resist layer over the insulating oxide layer to fill the recess, the thickness of the etching-resist layer in the recess being larger than that outside the recess;
etching the etching-resist layer and the insulating oxide layer, wherein, the etching speed of the insulating oxide layer is higher than that of the etching-resist layer, so that the insulating oxide layer outside the recess will not be higher than the bottom of the recess;
removing the etching-resist layer in the recess; and
etching the insulating oxide layer, till the top metal layer is exposed completely.
22. The method according to claim 21 wherein the etching-resist layer is a photoresist layer.
23. The method according to claim 22, wherein the method further comprises a process of patterning the etching-resist layer after the etching-resist layer is formed on the insulating oxide layer and before the etching-resist layer and the insulating oxide layer are etched, so as to remove the etching-resist layer outside the recess.
24. The method according to claim 21, wherein the etching-resist layer is a Bottom Anti-Reflection Coat layer.
25. The method according to claim 21, wherein the etching-resist layer is formed by a spin-coating process.
26. The method according to claim 21, wherein the top metal layer is an aluminum layer.
27. The method according to claim 21, wherein the insulating oxide layer is made of one selected from a group consisting of silicon oxide, oxynitride, tetraethyl orthosilicate and oxide-nitride-oxide.
28. The method according to claim 27, wherein the main etching gas for etching the etching-resist layer and the insulating oxide layer comprises at least one of CxFy and CHxFy, wherein 1\u2266X\u22669, 1\u2266Y\u22669.
29. The method according to claim 21, wherein the insulating oxide layer is etched till the top metal layer is exposed completely by a dry etching process.
30. The method according to claim 21, wherein the etching-resist layer is removed by an ashing process.
31. The method according to claim 21, wherein the Inter-Layer Dielectric layer is made of one selected from a group consisting of silicon oxide, oxynitride, tetraethyl orthosilicate, oxide-nitride-oxide and any other high K-value insulating material with dielectric constant higher than that of silicon oxide.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. An apparatus for allowing the viewing of three-dimensional images using a display device displaying two-dimensional images, the apparatus comprising:
a blocking grid positioned between the display of the display device and a viewer; and
a drive system for oscillating the blocking grid in accordance with the display of a plurality of images, wherein each image is approximately aligned with the grid and each image is structured such that each eye of the viewer sees only a displayed portion of a displayed image intended for that eye, thereby creating a three-dimensional effect.
2. The apparatus of claim 1 wherein the blocking grid includes a plurality of blocking strips spaced apart.
3. The apparatus of claim 2 wherein the blocking strips are arranged vertically.
4. The apparatus of claim 1 wherein the display device includes an approximately flat display screen, and wherein the blocking grid is positioned in front of the display screen.
5. The apparatus of claim 1 wherein the oscillation of the grid corresponds with the display of images wherein each eye of the viewer is blocked from seeing half of the image that is intended for the other eye of the viewer when the grid is moved to one position, and wherein each eye can see the previously blocked half of the image intended for that eye when the grid is moved to another position.
6. The apparatus of claim 1 further comprising a control system for setting the oscillation of the blocking grid to match the display of the plurality of images.
7. The apparatus of claim 6 wherein the control system includes a sensor system for determining the frequency of the display of images.
8. The apparatus of claim 6 wherein the control system includes a sensor system that determines the current frequency of oscillation of the blocking grid.
9. The apparatus of claim 1 further comprising a spring suspension for allowing the blocking grid to oscillate with respect to a frame supporting the blocking grid.
10. The apparatus of claim 9 wherein the spring suspension includes a plurality of flexure members.
11. The apparatus of claim 9 wherein the spring suspension includes a device that can change the spring rate of at least one spring in the spring suspension to allow the natural frequency of the oscillating grid to be matched to the frequency of the display of images.
12. A method for providing three dimensional images using a display device capable of displaying two-dimensional images, the method comprising:
(a) creating a plurality of composite images, wherein each composite image includes portions of two separate images, each separate image portraying the perspective of one of the eyes of a viewer;
(b) displaying the composite images on the display device, one at a time, at a display frequency; and
(c) oscillating a blocking grid which is positioned between the display of composite images and the viewer such that each eye of the viewer sees only the portions of the composite images that are intended for that eye.
13. The method of claim 12 wherein each composite image includes alternating portions of two separate images.
14. The method of claim 12 wherein each composite image has portions intended for each eye of the viewer, wherein corresponding portions in different composite images have different positions in their respective composite images.
15. The method of claim 12 wherein the oscillation of the grid allows each eye of the viewer to see an image for that eye displayed over a display area of the display device.
16. The method of claim 12 wherein the plurality of composite images are two composite images alternating on the display at the display frequency.
17. The method of claim 12 wherein the plurality of composite images are a repeating set of more than two composite images displayed in a particular sequence.
18. The method of claim 12 wherein the portions of the composite images are vertical strips alternating between a portion intended for one eye of the viewer and a portion intended for the other eye of the viewer.
19. The method of claim 12 further comprising sensing the frequency of display of the composite images and adjusting the frequency of the oscillation of the blocking grid to match the display frequency.
20. The method of claim 19 wherein the adjustment of oscillation frequency includes adjusting a spring rate of a spring system of the blocking grid.
21. The method of claim 12 wherein the display of composite images is repeated to provide a static display of a subject of the composite images.
22. The method of claim 12 wherein different composite images are sequenced to provide a motion picture display of images.
23. A system for providing three-dimensional images, the system comprising:
a display device capable of displaying two-dimensional images, wherein the display device is caused to display a plurality of composite images, wherein each composite image includes alternating portions of two separate images, each separate image taken from the perspective of one of the eyes of a viewer; and
a blocking device positioned between the display device and the viewer, the blocking device including a grid, wherein the blocking grid is oscillated in accordance with the display of the composite images, and wherein each composite image is structured and aligned with the grid such that each eye of the viewer sees only a displayed portion of the composite images intended for that eye through spaces in the grid, thereby creating a three-dimensional effect.
24. The system of claim 23 wherein the grid includes a plurality of blocking strips spaced apart, and wherein each eye of the viewer sees only a displayed portion of the composite images intended for that eye through spaces between the blocking strips.
25. The system of claim 23 wherein the display device includes an approximately flat display screen, and wherein the blocking grid is positioned in front of the display screen.
26. The system of claim 23 wherein the oscillation of the grid corresponds with the display of images wherein each eye of the viewer is blocked from seeing half of the image that is intended for the other eye of the viewer, and wherein each eye can see the previously blocked half of the image intended for that eye when the grid is at a different position.
27. The system of claim 23 further comprising a control system for setting the oscillation of the blocking grid to match the display of the plurality of images.
28. The system of claim 27 wherein the control system is provided on the blocking device, and wherein the control system includes a detection system for determining the frequency of the display of images and for determining the current frequency of oscillation of the blocking grid.
29. The system of claim 23 further comprising a spring suspension for allowing the blocking grid to oscillate with respect to a frame supporting the blocking grid.
30. The system of claim 29 wherein the spring suspension includes a device that can change the spring rate of at least one spring in the spring suspension to allow the natural frequency of the oscillating grid to be matched to the frequency of the display of images.