1.-13. (canceled)
14. A method for manufacturing a semiconductor structure, comprising:
forming a gate over a first semiconductor layer having a first lattice constant;
removing a portion of the first semiconductor layer in proximity to a sidewall of the gate and obtaining a recess; and
forming a second semiconductor layer having a second lattice constant over the recess,
wherein at least one dislocation is in-situ formed in the second semiconductor layer without extending to the first semiconductor layer.
15. The method for manufacturing a semiconductor structure of claim 14, wherein the removing the portion of the first semiconductor layer comprises etching the first semiconductor layer by a wet etching, a dry etching, or the combination thereof to form the recess having a predetermined depth.
16. The method for manufacturing a semiconductor structure of claim 14, wherein the forming the second semiconductor layer comprises performing a cyclic deposition etch operation, a selective epitaxial growth, or the combination thereof.
17. The method for manufacturing a semiconductor structure of claim 14, wherein the forming the second semiconductor layer comprises an in-situ doping operation or an ion-implantation operation.
18. The method for manufacturing a semiconductor structure of claim 14, wherein the forming the second semiconductor layer comprises forming phosphor-doped silicon carbide, pseudocubic Si3P4, or the combination thereof.
19. The method for manufacturing a semiconductor structure of claim 18, wherein a ratio of a flow rate of a silicon precursor and a flow rate of a phosphor precursor is in a range of from about 0.2 to about 5.
20. The method for manufacturing a semiconductor structure of claim 14, wherein the forming the gate over the first semiconductor layer comprises forming a metal gate over a semiconductor fin or forming a polysilicon gate over a planar semiconductor layer.
21. A method for manufacturing a semiconductor structure, comprising:
forming a gate over a first semiconductor layer having a first lattice constant;
removing a portion of the first semiconductor layer in proximity to a sidewall of the gate and obtaining a recess; and
forming a second semiconductor layer having a second lattice constant over the recess,
wherein at least one dislocation is located only in the second semiconductor layer.
22. The method for manufacturing a semiconductor structure of claim 21, wherein the removing the portion of the first semiconductor layer comprises exposing {001} plane and {111} plane at a bottom surface of the recess.
23. The method for manufacturing a semiconductor structure of claim 21, wherein the forming the second semiconductor layer comprises forming a phosphorous-doped silicon carbide (SiC:P).
24. The method for manufacturing a semiconductor structure of claim 23, wherein a ratio of a flow rate of a silicon precursor and a flow rate of a phosphor precursor is in a range of from about 0.2 to about 5.
25. The method for manufacturing a semiconductor structure of claim 23, wherein a growth temperature is in a range of from about 600 to about 700 degrees Celsius, and a chamber pressure is in a range of from about 100 to about 600 Torr.
26. The method for manufacturing a semiconductor structure of claim 23, wherein the forming the SiC:P comprises introducing monomethalsilane as carbon precursors with a flow rate of from about 100 SCCM to about 300 SCCM.
27. A method for manufacturing a semiconductor structure, comprising:
forming a gate over a first semiconductor layer having a first lattice constant;
removing a portion of the first semiconductor layer in proximity to a sidewall of the gate and obtaining a recess; and
forming a second semiconductor layer having a second lattice constant over the recess,
wherein a V-shaped dislocation is formed in the second semiconductor layer and is not extending to the first semiconductor layer.
28. The method for manufacturing a semiconductor structure of claim 27, wherein the forming the second semiconductor layer comprises forming a source region or a drain region of the semiconductor structure.
29. The method for manufacturing a semiconductor structure of claim 27, wherein the forming the second semiconductor layer comprises forming a pseudocubic Si3P4 phase.
30. The method for manufacturing a semiconductor structure of claim 29, wherein the forming the second semiconductor layer comprises an in-situ doping operation.
31. The method for manufacturing a semiconductor structure of claim 29, wherein a ratio of a flow rate of a silicon precursor and a flow rate of a phosphor precursor is in a range of from about 0.2 to about 5.
32. The method for manufacturing a semiconductor structure of claim 29, wherein a growth temperature is in a range of from about 600 to about 700 degrees Celsius, and a chamber pressure is in a range of from about 100 to about 600 Torr.
33. The method for manufacturing a semiconductor structure of claim 27, wherein the forming the second semiconductor layer comprises forming a phosphorous-doped silicon carbide (SiC:P).
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An information service system comprising:
an information server;
a communication unit; and
a positioning unit;
wherein the positioning unit and the communication unit are configured to communicate with a user terminal outside the information service system in an application space;
wherein the communication unit is configured to further communicate with the information server;
wherein the positioning unit is configured to determine a location of the user terminal;
wherein the information server is configured to store service information containing location parameters; and
wherein the information server is configured to provide, via the communication unit, service information to the user terminal that matches the location of the user terminal.
2. The system of claim 1, wherein the communication unit comprises a communication node configured to transmit communication signals, wherein the communication signal are configured to cover the application space.
3. The system of claim 1, wherein the positioning unit comprises at least two first positioning nodes, wherein the first position nodes are configured to transmit positioning signals to the user terminal, wherein the positioning signal are configured to cover the application space.
4. The system of claim 3, wherein the positioning signals transmitted by the first positioning nodes contain identification coding information of the first positioning nodes.
5. The system of claim 4, wherein the positioning signals comprise one or more of a low-frequency electromagnetic signal, an ultrasonic signal, or an infrared signal.
6. The system of claim 1, wherein the positioning unit comprises at least one second positioning node, wherein the second positioning node is configured to store positioning information of the second positioning node, and wherein the positioning information of the second positioning node is configured for capture and storage by the user terminal.
7. The system of claim 6, wherein the positioning information of the second positioning node comprises identification coding information of the second positioning node.
8. A user terminal configured to interact with an information service system,
the information service system comprising:
an information server;
a communication unit; and
a positioning unit;
wherein the positioning unit and the communication unit are configured to communicate with the user terminal outside the information service system in an application space;
wherein the communication unit is configured to further communicate with the information server;
wherein the positioning unit is configured to determine a location of the user terminal;
wherein the information server is configured to store service information containing location parameters;
wherein the information server is configured to provide, via the communication unit, service information to the user terminal that matches the location of the user terminal; and
wherein the user terminal comprises:
a first communication module; and
a detection module,
wherein the first communication module is configured for short-range communication with the communication unit; and
wherein the detection module is configured to receive a positioning signal from the positioning unit, to detect a strength of the positioning signal, and to determine the location of the user terminal.
9. The user terminal of claim 8, further comprising:
a control module;
a second communication module;
a positioning module; and
a memory unit,
wherein the control module is configured to control the second communication module to establish communication with the positioning unit, to obtain a initial position information of the user terminal;
wherein the positioning module is configured to obtain a distance between the user terminal and the positioning unit;
wherein the memory unit is configured to store the initial position information sent by the second communication module;
wherein the second communication module is configured for short-range communication with the communication unit.
10. The user terminal of claim 9, wherein the control module is connected with the second communication module, the positioning module, and the memory unit; and wherein the second communication module is further connected with the memory unit.
11. The user terminal of claim 9, wherein the positioning module comprises an acceleration sensor or a displacement sensor.
12. A method for transmitting real-time information between an information service system and a user terminal,
the information service system comprising:
an information server;
a communication unit; and
a positioning unit;
wherein the positioning unit and the communication unit are configured to communicate with the user terminal outside the information service system in an application space;
wherein the communication unit is configured to further communicate with the information server;
wherein the positioning unit is configured to determine a location of the user terminal;
wherein the information server is configured to store service information containing location parameters;
wherein the information server is configured to provide, via the communication unit, service information to the user terminal that matches the location of the user terminal; and
wherein the method comprises:
communicating the user terminal with the positioning unit to obtain a initial position information of the user terminal;
determining a position of the user terminal based on a distance between the user terminal and the positioning unit; and
receiving, at the user terminal, service information provided by the information server, wherein the service information matches the position of the user terminal.
13. The method of claim 12, wherein:
the user terminal is configured to receive a positioning signal transmitted by the positioning unit and determine the distance between the user terminal and the positioning unit based on a strength of the positioning signal.
14. The method of claim 13, further comprising: if the user terminal receives the positioning signal transmitted by a positioning node in the positioning unit, then using a position of the positioning node as the initial position, and determining the position of the user terminal based on the strength of the positioning signal transmitted by the positioning node.
15. The method of claim 13, further comprising:
if the user terminal receives positioning signals from two or more positioning nodes in the positioning unit, then
determining an intersecting area between the positioning signals transmitted by the two or more positioning nodes;
using a position of at least one positioning node as the initial position; and
determining the position of the user terminal based on the strength of the positioning signals transmitted by the positioning nodes.
16. The method of claim 15, further comprising:
after the determination of the intersecting area, determining the position of the user terminal by:
using the position of any one of the two or more positioning nodes as the initial position;
assessing a distance between the user terminal and the one positioning node by assessing the strength of the positioning signal transmitted by the one positioning node.
17. The method of claim 15, further comprising:
after the determination of the intersecting area, determining the position of the user terminal by:
using positions of the at least two positioning nodes as initial positions;
respectively assessing strengths of the positioning signal transmitted by each of the at least two positioning nodes to determine a distance between the user terminal and each of at least two positioning nodes, thereby determining the location of the user terminal.
18. The method of claim 12, wherein the user terminal receives service information from the information server by:
transmitting, from the user terminal, position information of the user terminal to the information server via the communication unit of the information service system;
receiving, at the information server, the position information;
selecting, from the service information containing position parameters, service information that matches the position information;
transmitting the selected service information from the information server to the user terminal via the communication unit; and
receiving, at the user terminal, the service information transmitted by the communication unit.
19. The method of claim 12, wherein the user terminal receives service information from the information server by:
transmitting, from the information server via the communication unit of the information service system, service information containing positioning parameters to the user terminals; and
comparing, at the user terminal, the positioning parameters contained in the received service information with its own position information, and selecting the service information that matches the position information of the user terminal.
20. The method of claim 11, further comprising:
determining locations of a plurality of user terminals; and
sending location-specific real time information to the plurality of user terminals based on the determined locations of the plurality of user terminals.