1. A method of processing a low k dielectric film, comprising:
supporting in a processing chamber a substrate having a low k dielectric film deposited thereon; and
exposing a surface of a low k dielectric film formed over a substrate to an activated carbon-containing precursor gas to form a conformal carbon-containing film on the surface of the low k dielectric film, wherein the carbon-containing precursor gas has one or more Si\u2014N\u2014Si linkages in the molecular structure.
2. The method of claim 1, wherein the carbon-containing precursor gas is activated by an in-situ plasma source, a remote plasma source, a UV radiation, or any combination thereof.
3. The method of claim 1, wherein the carbon-containing precursor gas has low Si\u2014H concentration.
4. The method of claim 1, wherein the carbon-containing film comprises Si\u2014N\u2014Si bonds.
5. The method of claim 1, wherein the carbon-containing precursor gas comprises an aminosilane.
6. (canceled)
7. The method of claim 5, wherein the aminosilane is hexamethylcyclotrisilazane (HMCTZ) or bis-diethylamine silane (BDEAS).
8. (canceled)
9. The method of claim 1, further comprising:
depositing a first barrier layer on the conformal carbon-containing film.
10. The method of claim 9, further comprising:
depositing a second barrier layer on the first barrier layer, wherein each of the first barrier layer and the second barrier layer has a band gap different from that of the low k dielectric film to create misalignment of band diagrams associated with the first and second barrier layers at the interface between layers.
11. The method of claim 10, wherein the first barrier layer, the second barrier layer, and the low k dielectric film comprise SiN, SiCN, SiC, SiO, SiON, SiOC, or SiOCH.
12. The method of claim 1, further comprising:
subjecting the carbon-containing film to a hydrogen plasma.
13-14. (canceled)
15. The method of claim 9, wherein the first barrier layer is hermetic having a compressive stress of about 20 MPa.
16. The method of claim 9, wherein the first barrier layer has a thickness less than 80 \u212b.
17. A method of processing a damaged low k dielectric film, comprising:
subjecting a surface of a low k dielectric film to a plasma generated from a carbon-containing precursor gas comprising aminosilane to form a conformal carbon-containing film on the surface of the low k dielectric film.
18. The method of claim 17, wherein the aminosilane comprises hexamethylcyclotrisilazane (HMCTZ) or bis-diethylamine silane (BDEAS).
19. The method of claim 17, further comprising:
depositing a first barrier layer on the conformal carbon-containing film; and
subjecting the first barrier layer to a plasma treatment in the nitrogen environment.
20. The method of claim 19, further comprising:
depositing a second barrier layer on the first barrier layer, wherein each of the first barrier layer and the second barrier layer has a band gap different from that of the low k dielectric film to create misalignment of band diagrams associated with the first and second barrier layers at the interface between layers.
21. A method of processing a low k dielectric film, comprising:
exposing a surface of a low k dielectric film formed over a substrate to a plasma formed from a carbon-containing precursor gas to form a conformal carbon-containing film on the surface of the low k dielectric film, wherein the carbon-containing precursor gas has one or more Si\u2014N\u2014Si linkages in the molecular structure; and
exposing the substrate to a plasma formed from a silicon-containing precursor to form a barrier layer onto the conformal carbon-containing film.
22. The method of claim 21, wherein the substrate is further exposed to a plasma formed from a nitrogen-containing precursor during formation of the barrier layer.
23. The method of claim 21, wherein the barrier has a compressive stress of about 20 MPa.
24. The method of claim 21, wherein the carbon-containing precursor gas comprises aminosilanes.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A combination processing apparatus for combining image files, comprising:
a combination unit which combines a first image file with a second image file to generate a third image file;
a selection unit which selects one of a first security processing related to the first image file or a second security processing related to the second image file; and
a processing unit which applies the selected security processing to the generated third image file.
2. The apparatus according to claim 1, wherein the selection unit selects a security processing according to user’s instruction.
3. The apparatus according to claim 1, further comprising a storage unit which stores priority level information for each security processing,
wherein the selection unit selects a security processing according to the priority level information.
4. The apparatus according to claim 3, wherein the selection unit selects a security processing with priority level information indicating a higher priority level.
5. The apparatus according to claim 1, wherein the first security processing is a processing of composing a copy-forgery-inhibited pattern image with an image of the first image file, the second security processing is a processing of embedding digital watermark information into an image of the second image file, and the selection unit selects the first security processing from the first and second security processing.
6. The apparatus according to claim 1, wherein the first security processing is a processing of composing a copy-forgery-inhibited pattern image with an image of the first image file, the second security processing is a processing of composing an image into which information is embedded with an image of the second image file, and the selection unit selects the first security processing from the first and second security processing.
7. The apparatus according to claim 1, wherein the combination unit combines image files each having a different file name to generate an image file having a single file name.
8. The apparatus according to claim 1, wherein each security processing is defined by commands.
9. The apparatus according to claim 1, wherein each security processing is defined in a file.
10. A method of combining image files with a combination processing apparatus, the method comprising:
a combination step of combining a first image file with a second image file to generate a third image file;
a selection step of selecting one of a first security processing related to the first image file or a second security processing related to the second image file; and
a processing step of applying the selected security processing to the generated third image file,
wherein the combination step, the selection step, and the processing step are carried out by the combination processing apparatus.
11. The method according to claim 10, wherein the selection step selects a security processing according to user’s instruction.
12. The method according to claim 10, further comprising a storing step of storing priority level information for each security processing in a storage unit,
wherein the selection step selects a security processing according to the priority level information.
13. The method according to claim 12, wherein the selection step selects a security processing with priority level information indicating a higher priority level.
14. The method according to claim 10, wherein the first security processing is a processing of composing a copy-forgery-inhibited pattern image with an image of the first image file, the second security processing is a processing of embedding digital watermark information into an image of the second image file, and the selection step selects the first security processing from the first and second security processing.
15. The method according to claim 10, wherein the first security processing is a processing of composing a copy-forgery-inhibited pattern image with an image of the first image file, the second security processing is a processing of composing an image into which information is embedded with an image of the second image file, and the selection step selects the first security processing from the first and second security processing.
16. The method according to claim 10, wherein the combination step combines image files each having a different file name to generate an image file having a single file name.
17. The method according to claim 10, wherein each security processing is defined by commands.
18. The method according to claim 10, wherein each security processing is defined in a file.
19. A computer-readable storage medium storing a computer program executable by a computer to combine image files, the computer program comprising:
a combination instruction configured to combine a first image file with a second image file to generate a third image file;
a selection instruction configured to select one of a first security processing related to the first image file or a second security processing related to the second image file; and
a processing instruction configured to apply the selected security processing to the generated third image file.