1. A method of manufacturing a transistor comprising:
forming a doped semiconductor substrate;
forming a drain-extended well within said doped semiconductor substrate, wherein said drain-extended well has an opposite dopant type as said doped semiconductor substrate and said drain-extended well has a low-doped region between at least two high-doped regions; and
forming a gate structure over said doped semiconductor substrate, wherein an edge of said low-doped region is substantially coincident with a perimeter of a gate corner.
2. The method as recited in claim 1, wherein forming said drain-extended well includes forming a mask pattern for said drain-extended well wherein openings in said mask define said high-doped regions and an interior mask portion define said low-doped regions.
3. The method as recited in claim 2, wherein said interior mask portion has a straight edge.
4. The method as recited in claim 2, wherein said interior mask portion has a irregular edge.
5. The method as recited in claim 4, wherein spaces between irregularities of said irregular edge each have a width substantially equal to a minimum lithographic resolution.
6. The method as recited in claim 2, wherein forming said drain-extended well includes implanting dopant through said openings into said doped semiconductor substrate and diffusing a portion of said dopant into said doped semiconductor substrate below said interior mask portion.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. A process for the preparation of N-monosubstituted \u03b2-aminoalcohol sulfonates of formula
wherein R1 is C6-20 aryl or C4-12 heteroaryl, each optionally being substituted with one or more halogen atoms andor one or more C1-4 alkyl or C1-4 alkoxy groups, R2 is selected from the group consisting of C1-4 alkyl, C3-8 cycloalkyl and C6-20 aryl, each aryl optionally being substituted with one or more halogen atoms andor one or more C1-4 alkyl or C1-4 alkoxy groups, and wherein R3 is selected from the group consisting of C1-18 alkyl, C6-20 cycloalkyl, C6-2O aryl and C7-20 aralkyl residues,
comprising the steps of
a) reacting a mixture comprising
(i) a methyl ketone of formula
wherein R1 is as defined above,
(ii) a primary amine of formula
H2N\u2014R2\u2003\u2003V,
wherein R2 is as defined above, and
(iii) formaldehyde or a source of formaldehyde selected from the group consisting of formaldehyde in aqueous solution, 1,3,5-trioxane, paraformaldehyde and mixtures thereof,
in the presence of a sulfonic acid of the formula
R3\u2014SO2\u2014OH\u2003\u2003VI
wherein R3 is as defined above,
optionally in an organic solvent, said organic solvent optionally containing water, to afford a \u03b2-aminoketone sulfonate of formula
wherein R, R2 and R3 are as defined above,
and
b) asymmetrically hydrogenating said sulfonate, to afford a \u03b2-aminoalcohol sulfonate of formula I, wherein R1, R2 and R3 are as defined above, in the presence of a base and a catalyst, the catalyst comprising a transition metal and a diphosphine ligand, at a hydrogen pressure of 5 to 50 bar, in a polar solvent, optionally in the presence of water.
2. A process for the preparation of N-monosubstituted \u03b2-aminoalcohol sulfonates of formula
wherein R1 is C6-20 aryl or C4-12 heteroaryl, each optionally being substituted with one or more halogen atoms andor one or more Ci\u22124 alkyl or C1-4 alkoxy groups, R2 is selected from the group consisting of C1-4 alkyl, C3-8 cycloalkyl and C6-20 aryl, each aryl optionally being substituted with one or more halogen atoms andor one or more C1-4 alkyl or C1-4 alkoxy groups, and wherein R3 is selected from the group consisting of Ci\u221218 alkyl, C6-20 cycloalkyl, C6-20 aryl and C7-20 aralkyl residues,
comprising asymmetrically hydrogenating a \u03b2-aminoketone sulfonate of formula
wherein R, R and R are as defined above,
in the presence of a base and a catalyst, the catalyst comprising a transition metal and a diphosphine ligand, at a hydrogen pressure of 5 to 50 bar, in a polar solvent, optionally in 1 o the presence of water.
3. The process of claim 1, wherein R1 is 2-thienyl, optionally being substituted with one or more halogen atoms, and R2 is selected from the group consisting of methyl, ethyl, tert-butyl and cyclopropyl.
4. The process of claim 1, wherein the \u03b2-aminoalcohol of formula I is selected from the group consisting of (<S)-(\u2212)-3-iV-methylamino-1-(2-thienyl)-1-propanol, (,S)-(\u2212)-3-7V-methyl-amino-1-(3-chloro-2-thienyl)-1-propanol, (i?)-(+)-3-iV-methylamino-1-(2-thienyl)-1-propanol and (i?)-(+)-3-N-methylamino-1-(3-chloro-2-thienyl)-20 1-propanol.
5. The process of claim 1, wherein R3 of the sulfonic acids of the formula VI is selected from the group consisting of
i) linear or branched alkyl residues, consisting of 1 to 18 carbon atoms, containing one 15 or more substituents of the group consisting of amino, halogen and hydroxy,
ii) cycloalkyl residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxy, and
iii) mono- or polycyclic aromatic or araliphatic residues, consisting of 6 to 20 carbon so atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxy.
6. The process of claim 1, wherein the base, is a metal carbonate.
7. The process of claim 1, wherein the transition metal is selected from the group consisting of rhodium, ruthenium or indium, preferably rhodium.
8. The process of claim 1, wherein the diphosphine ligand is selected from the group consisting of
9. \u03b2-Aminoalcohol sulfonates of the formula
wherein R1 is C6-20 aryl or C4-12 heteroaryl, each optionally being substituted with one or more halogen atoms andor one or more C1-4-alkyl or C1-4-alkoxy groups, R2 is C1-4-alkyl or C6-20 aryl, each aryl optionally being substituted with one or more halogen atoms andor one or more C1-4 alkyl or C1-4 alkoxy groups, and wherein R3 is selected from the group consisting of C1-18 alkyl, C6-20 cycloalkyl, C6-20 aryl and C7-20 aralkyl residues.
10. The process of claim 2, wherein R.sup.1 is 2-thienyl, optionally being substituted with one or more halogen atoms, and R.sup.2 is selected from the group consisting of methyl, ethyl, tert-butyl and cyclopropyl.
11. The process of claim 2, wherein the .beta.-aminoalcohol of formula I is selected from the group consisting of (S)-(\u2212)-3-N-methylamino-1-(2-thienyl)-1-propanol, (S)-(\u2212)-3-N-methyl-amino-1-(3-chloro-2-thienyl)-1-propanol, (R)-(+)-3-N-methylamino-1-(2-thienyl)-1-propanol and (R)-(+)-3-N-methylamino-1-(3-chloro-2-thienyl)-1-propanol.
12. The process of claim 3, wherein the .beta.-aminoalcohol of formula I is selected from the group consisting of (S)-(\u2212)-3-N-methylamino-1-(2-thienyl)-1-propanol, (S)-(\u2212)-3-N-methyl-amino-1-(3-chloro-2-thienyl)-1-propanol, (R)-(+)-3-N-methylamino-1-(2-thienyl)-1-propanol and (R)-(+)-3-N-methylamino-1-(3-chloro-2-thienyl)-1-propanol.
13. The process of claim 10, wherein the .beta.-aminoalcohol of formula I is selected from the group consisting of (S)-(\u2212)-3-N-methylamino-1-(2-thienyl)-1-propanol, (S)-(\u2212)-3-N-methyl-amino-1-(3-chloro-2-thienyl)-1-propanol, (R)-(+)-(3)-N-methylamino-1-(2-thienyl)-1-propanol and (R)-(+)-3-N-methylamino-1-(3-chloro-2-thienyl)-1-propanol.
14. The process of claim 2, wherein R.sup.3 of the sulfonic acids of the formula VI is selected from the group consisting of
i) linear or branched alkyl residues, consisting of 1 to 18 carbon atoms, containing one or more substituents of the group consisting of amino, halogen and hydroxyl,
ii) cycloalkyl residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxyl, and
iii) mono- or polycyclic aromatic or araliphatic residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxyl.
15. The process of claim 12, wherein R.sup.3 of the sulfonic acids of the formula VI is selected from the group consisting of
i) linear or branched alkyl residues, consisting of 1 to 18 carbon atoms, containing one or more substituents of the group consisting of amino, halogen and hydroxyl,
ii) cycloalkyl residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxyl, and
iii) mono- or polycyclic aromatic or araliphatic residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxyl.
16. The process of claim 13, wherein R.sup.3 of the sulfonic acids of the formula VI is selected from the group consisting of
i) linear or branched alkyl residues, consisting of 1 to 18 carbon atoms, containing one or more substituents of the group consisting of amino, halogen and hydroxyl,
ii) cycloalkyl residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents, of the group consisting of amino, halogen and hydroxyl, and
iii) mono- or polycyclic aromatic or araliphatic residues, consisting of 6 to 20 carbon atoms, optionally containing one or more nitrogen or oxygen atoms andor one or more substituents of the group consisting of amino, halogen and hydroxyl.
17. The process of claim 2, wherein the base is a metal carbonate.
18. The process of claim 15, wherein the base is a metal carbonate.
19. The process of claim 16, wherein the base is a metal carbonate.
20. The process of claim 2, wherein the transition metal is selected from the group consisting of rhodium, ruthenium or iridium, preferably rhodium.
21. The process of claim 18, wherein the transition metal is selected from the group consisting of rhodium, ruthenium or iridium, preferably rhodium.
22. The process of claim 19, wherein the transition metal is selected from the group consisting of rhodium, ruthenium or iridium, preferably rhodium.
23. The process of claim 2, wherein the diphosphine ligand is selected from the group consisting of
24. The process of claim 21, wherein the diphosphine ligand is selected from the group consisting of
25. The process of claim 22, wherein the diphosphine ligand is selected from the group consisting of