What is claimed is:
1. A method for processing integrated circuit devices including a water recycling process, the process comprising:
operating a chemical mechanical planarization process, the chemical mechanical planarization process including a discharge for process water, the process water being used to process one or more semiconductor wafers;
selectively discharging process water from the discharge;
transferring the process water from the chemical mechanical planarization process to a facility process; and
using the discharged water in the facility process.
2. The method of claim 1 wherein the facility process includes a cooling tower, a local scrubber.
3. The method of claim 1 wherein the discharge water is characterized by a pH value ranging from about 6 to about 10.
4. The method of claim 1 wherein the discharge water is characterized by a conductivity is less than about 2000 siemens per centimeter.
5. The method of claim 1 wherein the selectively discharging is provided using a control valve coupled to the discharge, the control valve being coupled to computer hardware.
6. The method of claim 1 wherein the discharge includes a plurality of lines, each of the lines being coupled to one or more processing stations.
7. The method of claim 1 wherein the transferring to the facility process comprises transferring to a collection tank before transferring the discharge water to the facility process.
8. The method of claim 1 wherein the selectively discharging comprises Outputting a signal in response to process in computer software to open a value to release the process water.
9. The method of claim 1 wherein the process water is ultra-pure water having a resistivity of about 18 Mega-ohms.
10. The method of claim 1 wherein the transferring of the process water from the chemical mechanical planarization process to a facility process occurs free from any chemical treatment between the chemical mechanical planarization process and the facility process.
11. A method for processing integrated circuit devices including a water recycling process, the process comprising:
operating a chemical mechanical polishing process using an incoming stream of ultra-pure water, the chemical mechanical polishing process including a discharge for used ultra-pure water, the ultra-pure water being used to process one or more semiconductor wafers and discharged through the discharge to form a facility water;
selectively discharging the facility water from the discharge of the chemical mechanical polishing process and transferring the facility water from the discharge of the chemical mechanical polishing process to a facility process, the transferring being free from any chemical treatment of the discharged process water; and
using the discharged water in the facility process.
12. The method of claim 11 wherein selectively discharging is provided by a valve coupled to the chemical mechanical planarization process.
13. The method of claim 11 wherein the ultra-pure water is characterized by a resistance of about 18 mega-ohm.
14. The method of claim 13 wherein the ultra-pure water is substantially free from particles greater than about 0.05 microns in dimension.
15. The method of claim 11 wherein the transferring the facility water from the discharge of the chemical mechanical polishing process to a facility process includes storing the facility water in a storage facility before use by the facility process.
16. The method of claim 15 wherein the facility process is selected from a cooling process, a scrubbing process.
17. A system for chemical mechanical polishing, the system comprising:
a plurality of processing stations, each of the processing stations being configured to perform at least one processing operation;
a discharge line coupled to one or more of the processing stations to receive discharge water;
a valve coupled to the discharge line to selectively output the discharge water for use in a facility process; and
a drain line coupled to the discharge line for outputting the discharge water to a drain.
18. The system of claim 17 further comprising a computer system coupled to the valve, the computer system including one or more memories, the one or more memories including a first code directed to actuate the value to output the discharge water for use in the facility process.
19. The system of claim 17 wherein the discharge line comprises a plurality of lines.
20. The system of claim 17 further comprising a source line for ultra-pure water coupled to one or more of the processing stations, the ultra-pure water being discharge water after being used by one or more of the processing stations.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
1. An emergency oxygen system for aircraft passengers, the system comprising:
one of a plurality of oxygen masks;
a sensor means for detecting at least one breathing characteristic value of a passenger using said one of a plurality of oxygen masks;
a control means for determining the oxygen requirement of the passenger based on the detected breathing characteristic value; and
a dosing means actuated by said control means for supplying a customized oxygen quantity corresponding to the determined oxygen requirement to the one of a plurality of oxygen masks.
2. An emergency oxygen system according to claim 1, wherein said at least one breathing characteristic value corresponds the quantity of the oxygen which is breathed in by the passenger.
3. An emergency oxygen system according to claim 1, wherein said at least one breathing characteristic value corresponds to the breathing speed of the passenger.
4. An emergency oxygen system according to claim 1, wherein said at least one breathing characteristic value corresponds to the time within which the passenger inhales a predefined oxygen volume, said control means receiving said at least one characteristic value via said sensor means.
5. An emergency oxygen system according to claim 1, wherein a breathing bag is provided on the oxygen mask.
6. An emergency oxygen system according to claim 1, wherein said sensor means comprises at least one sensor which detects the beginning and the end of a breathing pulse of the passenger.
7. An emergency oxygen system according to claim 1, wherein said oxygen mask comprises an air mixing valve.
8. An emergency oxygen system according to claim 7, wherein said sensor means comprises a sensor arranged on the air mixing valve, said sensor detecting the vacuum acting on the air mixing valve.
9. An emergency oxygen system according to claim 1, wherein said control means comprises a data memory, said data memory receiving predefined values for the oxygen requirement of a passenger which are allocated to individual breathing characteristic values.
10. An emergency oxygen system according to claim 1, wherein said control means receives flight altitude data, said control means determining the individual oxygen requirement of a passenger based on said flight altitude data and said at least one breathing characteristic.
11. An emergency oxygen system according to claim 1, wherein said dosing means doses the oxygen quantity supplied to the oxygen mask via pressure variation andor time variation.
12. A method for determining a customized oxygen requirement of an aircraft passenger with an emergency oxygen supply, the method comprising the steps of:
providing one of a plurality of oxygen masks with a sensor;
detecting with said sensor a breathing characteristic value of the passenger; and
determining the customized oxygen requirement of the passenger based on the detected breathing characteristic value.
13. A method according to claim 12, wherein the breathing characteristic value is the breathing speed andor the breathing volume per breathing pulse.
14. A method according to claim 12, wherein a lung characteristic value which is individual to the passenger is allocated to the breathing characteristic value, for determining the oxygen requirement.
15. A method according to claim 14, wherein a certain oxygen requirement of the passenger is allocated to the lung characteristic value by way of stored tables.
16. A method according to claim 14, wherein an oxygen requirement of the passenger is allocated to the lung characteristic value based on the flight altitude.
17. A passenger oxygen mask for an emergency oxygen supply including a plurality of passenger oxygen masks, each mask comprising:
a mask body;
a breathing bag;
an air mixing valve; and
a sensor for detecting a vacuum acting on the air mixing valve, by the passenger, disposed within an interior of the oxygen mask for customizing a supply of oxygen to each mask.
18. A passenger oxygen mask according to claim 17, further comprising:
a dosing device supplying oxygen to said breathing bag, said vacuum corresponding to a lung capacity volume of a passenger;
a control unit programmed to regulate a flow of oxygen from said dosing device to the passenger based on said vacuum detected via said sensor such that said dosing device delivers an amount of oxygen to the passenger corresponding to said lung capacity volume of the passenger.
19. A method according to claim 12, further comprising the steps of:
providing a dosing device;
providing a control unit;
supplying oxygen to the passenger via said dosing device;
regulating a flow of said oxygen from said dosing device to the passenger with said control unit such that the passenger receives aid individual oxygen requirement, said breathing characteristic value corresponding to a lung capacity value of the passenger.
20. A passenger oxygen mask according to claim 18, wherein said sensor is located on said mask body, said control unit receiving flight altitude data, said control unit regulating said flow of oxygen from the dosing device to the passenger based on said vacuum detected via said sensor and said flight altitude data.