1. A gas bag module, in particular a side gas bag module, for a vehicle occupant protection system, comprising
a gas bag (28),
a gas generator (10), a housing (12) of which has several outflow openings (14) which are disposed such that the gas generator (10) is in principle thrust-neutral, and
a closure element which, in a standard case of release of the gas bag module, prevents gas from flowing out, at least in one direction, and in a case of fire is at least in sections one of thermally weakened and destroyed, such that the gas generator (10) blows out gas thrust-neutrally.
2. The gas bag module according to claim 1, wherein in the region of the outflow openings (14), the closure element is in direct contact with the housing (12) of the gas generator (10).
3. The gas bag module according to claim 1, wherein the closure element is made of synthetic.
4. The gas bag module according to claim 1, wherein the closure element closes part of the outflow openings (14) so as to be largely gas-tight.
5. The gas bag module according to claim 1, wherein the closure element is a covering plate (16) with at least one integrally formed appendage (17, 18).
6. The gas bag module according to claim 5, wherein the covering plate (16) has a material of greater thermal stability than the appendage (17, 18).
7. The gas bag module according to claim 5, wherein the appendage (17) engages in an outflow opening (14) of the housing (12).
8. The gas bag module according to claim 1, wherein the gas generator (10), at least in sections, is surrounded by a bracket (20) which in the region of the outflow openings (14) of the housing (12) also has openings (22).
9. The gas bag module according to claim 8, wherein the closure element is disposed between the gas generator (10) and the bracket (20).
10. The gas bag module according to claim 8, wherein the closure element is a covering plate (16) with at least one integrally formed appendage (18) which engages in an opening (22) of the bracket (20).
11. The gas bag module according to claim 1, wherein the closure element comprises at least one fabric layer (24).
12. The gas bag module according to claim 11, wherein the fabric layer (24) is part of a fabric tube (26, 34) surrounding the gas generator (10).
13. The gas bag module according to claim 12, wherein at least in the region of the outflow openings (14) the fabric tube (26, 34) does not have any seams (30).
14. The gas bag module according to claim 12, wherein the fabric tube (26, 34) is multi-layered, at least in the region of the closure element.
15. The gas bag module according to claim 12, wherein the fabric tube (26, 34) rests against the gas generator (10) in the region of the closure element and has a significantly greater diameter than the gas generator.
16. The gas bag module according to claim 12, wherein the fabric tube (26, 34) is totally without seams.
17. The gas bag module according to claim 12, wherein the gas generator (10) is surrounded by two fabric tubes (26, 34) of different diameter.
18. The gas bag module according to claim 1, wherein in the region of the outflow openings (14), the gas generator (10) is surrounded by a tubular housing (36), a first axial end (38) of which is open, and a second axial end (40) of which is closed at least partially by the closure element.
19. The gas bag module according to claim 18, wherein the closure element is a sleeve (42) disposed between the gas generator (10) and the tubular housing (36).
20. The gas bag module according to claim 18, wherein the tubular housing (36) has at least one radial opening (46) which is at least partially closed by the closure element.
The claims below are in addition to those above.
All refrences to claim(s) which appear below refer to the numbering after this setence.
What is claimed is:
1. A substrate processing method comprising:
a substrate rotating step for rotating a substrate with the substrate held almost horizontally within a chamber;
a peripheral edge processing step for discharging a processing liquid to a lower surface of the substrate rotated in the substrate rotating step and causing the processing liquid to flow around to an upper surface of the substrate at a peripheral edge thereof from the lower surface of the substrate to process the peripheral edge of the upper surface of the substrate in the chamber; and
a both-surface processing step for discharging a processing liquid to both the surfaces of the substrate rotated in the substrate rotating step to process both the surfaces of the substrate in the chamber.
2. The substrate processing method according to claim 1, wherein
the both-surface processing step comprises a post-cleaning step for discharging a cleaning liquid to both the surfaces of the substrate rotated in the substrate rotating step to clean both the surfaces of the substrate after the peripheral edge processing step.
3. The substrate processing method according to claim 2, wherein
the post-cleaning step comprises
a preliminary cleaning step for discharging a preliminary cleaning liquid to the substrate to clean the substrate; and
a deionized water cleaning step for discharging deionized water to the substrate to clean the substrate after the preliminary cleaning step.
4. The substrate processing method according to claim 1, wherein
the both-surface processing step comprises
a pre-cleaning step for discharging a cleaning liquid to both the surfaces of the substrate rotated in the substrate rotating step to clean the substrate before the peripheral edge processing step.
5. The substrate processing method according to claim 1, wherein
the substrate processed in the peripheral edge processing step and the both-surface processing step includes a substrate having a metal thin film formed on its one surface and its end surface.
6. A substrate processing apparatus comprising:
a chamber;
a substrate rotating mechanism disposed in the chamber for rotating a substrate with the substrate held almost horizontally;
a lower surface processing liquid discharge nozzle disposed in the chamber for discharging a processing liquid toward a lower surface of the substrate rotated by the substrate rotating mechanism;
an upper surface processing liquid discharge nozzle disposed in the chamber for discharging a processing liquid toward an upper surface of the substrate rotated by the substrate rotating mechanism; and
a discharge control section for selectively switching, when the substrate is rotated by the substrate rotating mechanism, a peripheral edge processed state where the processing liquid is discharged from the lower surface processing liquid discharge nozzle to process a peripheral edge of the substrate and a both-surface processed state where the processing liquids are simultaneously discharged from the lower surface processing liquid discharge nozzle and the upper surface processing liquid discharge nozzle to process both the surfaces of the substrate, to control the discharge.
7. The substrate processing apparatus according to claim 6, wherein
the substrate rotating mechanism comprises
a spin base arranged almost horizontally in a disk shape, and
a plurality of chuck pins provided in a standing condition at a peripheral edge of an upper surface of the spin base for holding the substrate.
8. The substrate processing apparatus according to claim 6, wherein
the lower surface processing liquid discharge nozzle includes a nozzle for discharging the processing liquid toward the center of the lower surface of the substrate held in the substrate rotating mechanism.
9. The substrate processing apparatus according to claim 6, wherein
the upper surface processing liquid discharge nozzle includes a nozzle for discharging the processing liquid toward the center of the upper surface of the substrate held in the substrate rotating mechanism.
10. The substrate processing apparatus according to claim 9, wherein
the upper surface processing liquid discharge nozzle includes an auxiliary nozzle for discharging the processing liquid toward the peripheral edge of the upper surface of the substrate held in the substrate rotating mechanism.